KR102894024B1 - 기화 공급 장치 - Google Patents

기화 공급 장치

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Publication number
KR102894024B1
KR102894024B1 KR1020227005683A KR20227005683A KR102894024B1 KR 102894024 B1 KR102894024 B1 KR 102894024B1 KR 1020227005683 A KR1020227005683 A KR 1020227005683A KR 20227005683 A KR20227005683 A KR 20227005683A KR 102894024 B1 KR102894024 B1 KR 102894024B1
Authority
KR
South Korea
Prior art keywords
vaporization
block
preheating
unit
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227005683A
Other languages
English (en)
Korean (ko)
Other versions
KR20220035485A (ko
Inventor
타카토시 나카타니
아츠시 히다카
이치로 토쿠다
케이스케 나카츠지
Original Assignee
가부시키가이샤 후지킨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 후지킨 filed Critical 가부시키가이샤 후지킨
Publication of KR20220035485A publication Critical patent/KR20220035485A/ko
Application granted granted Critical
Publication of KR102894024B1 publication Critical patent/KR102894024B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020227005683A 2019-09-19 2020-09-03 기화 공급 장치 Active KR102894024B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019170271 2019-09-19
JPJP-P-2019-170271 2019-09-19
PCT/JP2020/033395 WO2021054135A1 (ja) 2019-09-19 2020-09-03 気化供給装置

Publications (2)

Publication Number Publication Date
KR20220035485A KR20220035485A (ko) 2022-03-22
KR102894024B1 true KR102894024B1 (ko) 2025-12-02

Family

ID=74884112

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227005683A Active KR102894024B1 (ko) 2019-09-19 2020-09-03 기화 공급 장치

Country Status (6)

Country Link
US (1) US11976356B2 (https=)
JP (1) JP7577339B2 (https=)
KR (1) KR102894024B1 (https=)
CN (1) CN114269966A (https=)
TW (1) TWI746161B (https=)
WO (1) WO2021054135A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022091713A1 (ja) 2020-10-31 2022-05-05 株式会社フジキン ガス供給システムおよびガス供給方法
JP7699797B2 (ja) * 2021-04-28 2025-06-30 株式会社フジキン ガス供給システムおよびガス供給方法
KR20230041614A (ko) * 2021-09-17 2023-03-24 에이에스엠 아이피 홀딩 비.브이. 액체를 가열하기 위한 방법 및 장치
CN114743900A (zh) * 2022-04-25 2022-07-12 北京北方华创微电子装备有限公司 汽化系统以及半导体工艺设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004071849A (ja) 2002-08-07 2004-03-04 Japan Pionics Co Ltd 気化供給装置及び気化供給方法
JP2014150229A (ja) 2013-02-04 2014-08-21 Taiyo Nippon Sanso Corp 原料ガス生成供給方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1318608B1 (it) * 2000-07-04 2003-08-27 Univ Degli Studi Milano Topo transgenico per lo screening e per studi di farmacodinamica efarmacocinetica di ligandi attivi sul recettore degli estrogeni e sui
JP4884607B2 (ja) * 2001-07-12 2012-02-29 東京エレクトロン株式会社 熱処理装置
KR101121417B1 (ko) 2004-10-28 2012-03-15 주성엔지니어링(주) 표시소자의 제조장치
JP4696561B2 (ja) * 2005-01-14 2011-06-08 東京エレクトロン株式会社 気化装置及び処理装置
JP5461786B2 (ja) 2008-04-01 2014-04-02 株式会社フジキン 気化器を備えたガス供給装置
JP5350824B2 (ja) 2009-02-03 2013-11-27 株式会社フジキン 液体材料の気化供給システム
JP5573666B2 (ja) 2010-12-28 2014-08-20 東京エレクトロン株式会社 原料供給装置及び成膜装置
JP5837869B2 (ja) 2012-12-06 2015-12-24 株式会社フジキン 原料気化供給装置
JPWO2014157210A1 (ja) * 2013-03-26 2017-02-16 株式会社日立国際電気 半導体装置の製造方法、基板処理装置及び記録媒体
CN105714271B (zh) 2014-12-22 2020-07-31 株式会社堀场Stec 汽化系统
JP6578125B2 (ja) 2015-04-30 2019-09-18 株式会社フジキン 気化供給装置
JP7097085B2 (ja) 2017-07-25 2022-07-07 株式会社フジキン 流体制御装置
KR102338026B1 (ko) * 2017-07-25 2021-12-10 가부시키가이샤 후지킨 유체 제어 장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004071849A (ja) 2002-08-07 2004-03-04 Japan Pionics Co Ltd 気化供給装置及び気化供給方法
JP2014150229A (ja) 2013-02-04 2014-08-21 Taiyo Nippon Sanso Corp 原料ガス生成供給方法

Also Published As

Publication number Publication date
TW202124759A (zh) 2021-07-01
KR20220035485A (ko) 2022-03-22
JPWO2021054135A1 (https=) 2021-03-25
WO2021054135A1 (ja) 2021-03-25
JP7577339B2 (ja) 2024-11-05
TWI746161B (zh) 2021-11-11
US20220403508A1 (en) 2022-12-22
US11976356B2 (en) 2024-05-07
CN114269966A (zh) 2022-04-01

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