KR102883047B1 - 패턴 형성 장치 - Google Patents

패턴 형성 장치

Info

Publication number
KR102883047B1
KR102883047B1 KR1020227040776A KR20227040776A KR102883047B1 KR 102883047 B1 KR102883047 B1 KR 102883047B1 KR 1020227040776 A KR1020227040776 A KR 1020227040776A KR 20227040776 A KR20227040776 A KR 20227040776A KR 102883047 B1 KR102883047 B1 KR 102883047B1
Authority
KR
South Korea
Prior art keywords
light
light source
substrate
plane
source image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227040776A
Other languages
English (en)
Korean (ko)
Other versions
KR20230004748A (ko
Inventor
슈이치 나카야마
다카유키 나카노
마사카즈 호리
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20230004748A publication Critical patent/KR20230004748A/ko
Application granted granted Critical
Publication of KR102883047B1 publication Critical patent/KR102883047B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020227040776A 2020-05-19 2021-05-18 패턴 형성 장치 Active KR102883047B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2020-087094 2020-05-19
JP2020087094 2020-05-19
PCT/JP2021/018802 WO2021235439A1 (ja) 2020-05-19 2021-05-18 パターン形成装置

Publications (2)

Publication Number Publication Date
KR20230004748A KR20230004748A (ko) 2023-01-06
KR102883047B1 true KR102883047B1 (ko) 2025-11-07

Family

ID=78708549

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227040776A Active KR102883047B1 (ko) 2020-05-19 2021-05-18 패턴 형성 장치

Country Status (4)

Country Link
JP (2) JP7384283B2 (https=)
KR (1) KR102883047B1 (https=)
CN (1) CN115668066A (https=)
WO (1) WO2021235439A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115755964B (zh) * 2022-11-15 2025-05-13 电子科技大学 基于反向学习蛇算法的无人机任务分配方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356193A (ja) 2003-05-27 2004-12-16 Canon Inc 露光装置及び露光方法
JP2006106097A (ja) 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2015152649A (ja) 2014-02-12 2015-08-24 株式会社ニコン 位相差顕微鏡

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04348018A (ja) * 1991-01-14 1992-12-03 Topcon Corp 位置合わせ光学装置
JPH0677116A (ja) * 1992-08-27 1994-03-18 Nikon Corp 位置検出装置
JPH06267822A (ja) * 1993-03-17 1994-09-22 Toshiba Corp 微細パタン形成方法
JPH07161611A (ja) * 1993-12-07 1995-06-23 Nikon Corp 位置検出装置
JP4027080B2 (ja) * 2001-11-02 2007-12-26 キヤノン株式会社 位置検出装置およびそれを用いた露光装置
JP4314082B2 (ja) * 2003-08-19 2009-08-12 キヤノン株式会社 アライメント方法
JP2015125424A (ja) * 2013-12-27 2015-07-06 キヤノン株式会社 光学装置、リソグラフィ装置、及び物品の製造方法
CN110083018A (zh) * 2014-04-01 2019-08-02 株式会社尼康 基板处理装置的调整方法
JP6494259B2 (ja) * 2014-11-21 2019-04-03 キヤノン株式会社 照明光学装置、およびデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356193A (ja) 2003-05-27 2004-12-16 Canon Inc 露光装置及び露光方法
JP2006106097A (ja) 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2015152649A (ja) 2014-02-12 2015-08-24 株式会社ニコン 位相差顕微鏡

Also Published As

Publication number Publication date
WO2021235439A1 (ja) 2021-11-25
JP7384283B2 (ja) 2023-11-21
JPWO2021235439A1 (https=) 2021-11-25
JP7563555B2 (ja) 2024-10-08
JP2024012562A (ja) 2024-01-30
CN115668066A (zh) 2023-01-31
KR20230004748A (ko) 2023-01-06

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