JP7384283B2 - パターン形成装置 - Google Patents

パターン形成装置 Download PDF

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Publication number
JP7384283B2
JP7384283B2 JP2022524490A JP2022524490A JP7384283B2 JP 7384283 B2 JP7384283 B2 JP 7384283B2 JP 2022524490 A JP2022524490 A JP 2022524490A JP 2022524490 A JP2022524490 A JP 2022524490A JP 7384283 B2 JP7384283 B2 JP 7384283B2
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JP
Japan
Prior art keywords
light
light source
substrate
pattern forming
illumination
Prior art date
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Active
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JP2022524490A
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English (en)
Japanese (ja)
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JPWO2021235439A5 (https=
JPWO2021235439A1 (https=
Inventor
修一 中山
貴之 中野
正和 堀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
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Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2021235439A1 publication Critical patent/JPWO2021235439A1/ja
Publication of JPWO2021235439A5 publication Critical patent/JPWO2021235439A5/ja
Priority to JP2023191770A priority Critical patent/JP7563555B2/ja
Application granted granted Critical
Publication of JP7384283B2 publication Critical patent/JP7384283B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022524490A 2020-05-19 2021-05-18 パターン形成装置 Active JP7384283B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023191770A JP7563555B2 (ja) 2020-05-19 2023-11-09 パターン形成装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020087094 2020-05-19
JP2020087094 2020-05-19
PCT/JP2021/018802 WO2021235439A1 (ja) 2020-05-19 2021-05-18 パターン形成装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023191770A Division JP7563555B2 (ja) 2020-05-19 2023-11-09 パターン形成装置

Publications (3)

Publication Number Publication Date
JPWO2021235439A1 JPWO2021235439A1 (https=) 2021-11-25
JPWO2021235439A5 JPWO2021235439A5 (https=) 2022-11-15
JP7384283B2 true JP7384283B2 (ja) 2023-11-21

Family

ID=78708549

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022524490A Active JP7384283B2 (ja) 2020-05-19 2021-05-18 パターン形成装置
JP2023191770A Active JP7563555B2 (ja) 2020-05-19 2023-11-09 パターン形成装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023191770A Active JP7563555B2 (ja) 2020-05-19 2023-11-09 パターン形成装置

Country Status (4)

Country Link
JP (2) JP7384283B2 (https=)
KR (1) KR102883047B1 (https=)
CN (1) CN115668066A (https=)
WO (1) WO2021235439A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115755964B (zh) * 2022-11-15 2025-05-13 电子科技大学 基于反向学习蛇算法的无人机任务分配方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356193A (ja) 2003-05-27 2004-12-16 Canon Inc 露光装置及び露光方法
JP2015152649A (ja) 2014-02-12 2015-08-24 株式会社ニコン 位相差顕微鏡

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04348018A (ja) * 1991-01-14 1992-12-03 Topcon Corp 位置合わせ光学装置
JPH0677116A (ja) * 1992-08-27 1994-03-18 Nikon Corp 位置検出装置
JPH06267822A (ja) * 1993-03-17 1994-09-22 Toshiba Corp 微細パタン形成方法
JPH07161611A (ja) * 1993-12-07 1995-06-23 Nikon Corp 位置検出装置
JP4027080B2 (ja) * 2001-11-02 2007-12-26 キヤノン株式会社 位置検出装置およびそれを用いた露光装置
JP4314082B2 (ja) * 2003-08-19 2009-08-12 キヤノン株式会社 アライメント方法
JP4491311B2 (ja) 2004-09-30 2010-06-30 富士フイルム株式会社 画像記録装置及び画像記録方法
JP2015125424A (ja) * 2013-12-27 2015-07-06 キヤノン株式会社 光学装置、リソグラフィ装置、及び物品の製造方法
CN110083018A (zh) * 2014-04-01 2019-08-02 株式会社尼康 基板处理装置的调整方法
JP6494259B2 (ja) * 2014-11-21 2019-04-03 キヤノン株式会社 照明光学装置、およびデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356193A (ja) 2003-05-27 2004-12-16 Canon Inc 露光装置及び露光方法
JP2015152649A (ja) 2014-02-12 2015-08-24 株式会社ニコン 位相差顕微鏡

Also Published As

Publication number Publication date
WO2021235439A1 (ja) 2021-11-25
KR102883047B1 (ko) 2025-11-07
JPWO2021235439A1 (https=) 2021-11-25
JP7563555B2 (ja) 2024-10-08
JP2024012562A (ja) 2024-01-30
CN115668066A (zh) 2023-01-31
KR20230004748A (ko) 2023-01-06

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