KR102853866B1 - 패턴 형성 장치 및 패턴 형성 방법 - Google Patents

패턴 형성 장치 및 패턴 형성 방법

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Publication number
KR102853866B1
KR102853866B1 KR1020227034595A KR20227034595A KR102853866B1 KR 102853866 B1 KR102853866 B1 KR 102853866B1 KR 1020227034595 A KR1020227034595 A KR 1020227034595A KR 20227034595 A KR20227034595 A KR 20227034595A KR 102853866 B1 KR102853866 B1 KR 102853866B1
Authority
KR
South Korea
Prior art keywords
substrate
mark
pattern
light
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227034595A
Other languages
English (en)
Korean (ko)
Other versions
KR20220150942A (ko
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Priority to KR1020257028795A priority Critical patent/KR20250133998A/ko
Publication of KR20220150942A publication Critical patent/KR20220150942A/ko
Application granted granted Critical
Publication of KR102853866B1 publication Critical patent/KR102853866B1/ko
Active legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Document Processing Apparatus (AREA)
KR1020227034595A 2020-04-06 2021-04-05 패턴 형성 장치 및 패턴 형성 방법 Active KR102853866B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020257028795A KR20250133998A (ko) 2020-04-06 2021-04-05 패턴 형성 장치 및 패턴 형성 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020068034 2020-04-06
JPJP-P-2020-068034 2020-04-06
PCT/JP2021/014467 WO2021206044A1 (ja) 2020-04-06 2021-04-05 パターン形成装置、並びにパターン形成方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020257028795A Division KR20250133998A (ko) 2020-04-06 2021-04-05 패턴 형성 장치 및 패턴 형성 방법

Publications (2)

Publication Number Publication Date
KR20220150942A KR20220150942A (ko) 2022-11-11
KR102853866B1 true KR102853866B1 (ko) 2025-09-02

Family

ID=78023054

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020227034595A Active KR102853866B1 (ko) 2020-04-06 2021-04-05 패턴 형성 장치 및 패턴 형성 방법
KR1020257028795A Pending KR20250133998A (ko) 2020-04-06 2021-04-05 패턴 형성 장치 및 패턴 형성 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020257028795A Pending KR20250133998A (ko) 2020-04-06 2021-04-05 패턴 형성 장치 및 패턴 형성 방법

Country Status (5)

Country Link
JP (1) JP7435748B2 (https=)
KR (2) KR102853866B1 (https=)
CN (1) CN115380253A (https=)
TW (2) TWI781572B (https=)
WO (1) WO2021206044A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102515305B1 (ko) * 2022-05-18 2023-03-29 에스케이엔펄스 주식회사 섀도우 마스크 및 이를 이용한 블랭크 마스크의 제조방법
JP2024014031A (ja) 2022-07-21 2024-02-01 キヤノン株式会社 検出装置、リソグラフィー装置および物品製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004069585A (ja) 2002-08-08 2004-03-04 Fuji Photo Optical Co Ltd 平行度測定方法
WO2015152218A1 (ja) * 2014-04-01 2015-10-08 株式会社ニコン 基板処理装置、デバイス製造方法及び基板処理方法
US20160313653A1 (en) 2013-12-05 2016-10-27 Asml Netherlands B.V. Method and Apparatus for Measuring a Structure on a Substrate, Models for Error Correction, Computer Program Products for Implementing such Methods and Apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677116A (ja) * 1992-08-27 1994-03-18 Nikon Corp 位置検出装置
JP3445100B2 (ja) * 1997-06-02 2003-09-08 キヤノン株式会社 位置検出方法及び位置検出装置
JP2006098726A (ja) 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd アライメント部の校正方法と、アライメント校正可能な描画装置と、搬送装置
JP2014081452A (ja) * 2012-10-16 2014-05-08 Nikon Corp 露光装置、およびデバイス製造方法
JP2015125424A (ja) * 2013-12-27 2015-07-06 キヤノン株式会社 光学装置、リソグラフィ装置、及び物品の製造方法
CN110083018A (zh) * 2014-04-01 2019-08-02 株式会社尼康 基板处理装置的调整方法
JP6465591B2 (ja) * 2014-08-27 2019-02-06 株式会社オーク製作所 描画装置
CN107329379B (zh) * 2016-04-29 2019-01-18 上海微电子装备（集团）股份有限公司 双层对准装置和双层对准方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004069585A (ja) 2002-08-08 2004-03-04 Fuji Photo Optical Co Ltd 平行度測定方法
US20160313653A1 (en) 2013-12-05 2016-10-27 Asml Netherlands B.V. Method and Apparatus for Measuring a Structure on a Substrate, Models for Error Correction, Computer Program Products for Implementing such Methods and Apparatus
WO2015152218A1 (ja) * 2014-04-01 2015-10-08 株式会社ニコン 基板処理装置、デバイス製造方法及び基板処理方法

Also Published As

Publication number Publication date
CN115380253A (zh) 2022-11-22
WO2021206044A1 (ja) 2021-10-14
JPWO2021206044A1 (https=) 2021-10-14
TW202303300A (zh) 2023-01-16
JP7435748B2 (ja) 2024-02-21
TWI781572B (zh) 2022-10-21
TWI869708B (zh) 2025-01-11
KR20220150942A (ko) 2022-11-11
KR20250133998A (ko) 2025-09-09
TW202205031A (zh) 2022-02-01

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