KR102698639B1 - 할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법 - Google Patents

할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법 Download PDF

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KR102698639B1
KR102698639B1 KR1020217030205A KR20217030205A KR102698639B1 KR 102698639 B1 KR102698639 B1 KR 102698639B1 KR 1020217030205 A KR1020217030205 A KR 1020217030205A KR 20217030205 A KR20217030205 A KR 20217030205A KR 102698639 B1 KR102698639 B1 KR 102698639B1
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halogenated
compound
general formula
reaction
formula
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KR20210131383A (ko
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유우스케 에토우
신고 나카무라
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다이킨 고교 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/25—Preparation of halogenated hydrocarbons by splitting-off hydrogen halides from halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/07—Preparation of halogenated hydrocarbons by addition of hydrogen halides
    • C07C17/087—Preparation of halogenated hydrocarbons by addition of hydrogen halides to unsaturated halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/22—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon triple bonds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
KR1020217030205A 2019-02-21 2020-02-17 할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법 Active KR102698639B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020247027863A KR102885018B1 (ko) 2019-02-21 2020-02-17 할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JPJP-P-2019-029426 2019-02-21
JP2019029426 2019-02-21
JP2019124533 2019-07-03
JPJP-P-2019-124533 2019-07-03
JP2019211183A JP6933239B2 (ja) 2019-02-21 2019-11-22 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法
JPJP-P-2019-211183 2019-11-22
PCT/JP2020/006018 WO2020171011A1 (ja) 2019-02-21 2020-02-17 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法

Related Child Applications (1)

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KR1020247027863A Division KR102885018B1 (ko) 2019-02-21 2020-02-17 할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법

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KR20210131383A KR20210131383A (ko) 2021-11-02
KR102698639B1 true KR102698639B1 (ko) 2024-08-27

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Country Status (7)

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US (1) US11655199B2 (enExample)
EP (1) EP3929172A4 (enExample)
JP (2) JP6933239B2 (enExample)
KR (1) KR102698639B1 (enExample)
CN (1) CN113454052A (enExample)
SG (1) SG11202109143SA (enExample)
TW (1) TWI836011B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7343796B2 (ja) * 2021-04-27 2023-09-13 ダイキン工業株式会社 フルオロアルキン化合物の製造方法
JP2023131518A (ja) * 2022-03-09 2023-09-22 株式会社クレハ ハロゲン化アルケンの製造方法
JP2023131520A (ja) * 2022-03-09 2023-09-22 株式会社クレハ ハロゲン化アルケンの製造方法
CN116143585B (zh) * 2023-04-04 2023-07-14 北京宇极科技发展有限公司 制备氢卤烯烃的方法和制备含氟炔烃的方法

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US6031141A (en) * 1997-08-25 2000-02-29 E. I. Du Pont De Nemours And Company Fluoroolefin manufacturing process
JP4344915B2 (ja) * 2003-03-26 2009-10-14 日本ゼオン株式会社 パーフルオロアルキン化合物の製造方法
US7897823B2 (en) * 2004-10-29 2011-03-01 E. I. Du Pont De Nemours And Company Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes
JP4867474B2 (ja) * 2006-05-31 2012-02-01 日本ゼオン株式会社 パーフルオロアルキン化合物の製造方法
US8067650B2 (en) * 2006-08-24 2011-11-29 Honeywell International Inc. Process for the production of HFO trans-1234ze from HFC-245fa
CN101646640B (zh) * 2007-03-30 2013-01-09 昭和电工株式会社 含氯含氟化合物的制造方法
WO2008120642A1 (ja) * 2007-03-30 2008-10-09 Showa Denko K.K. 1,2,3,4－テトラクロロヘキサフルオロブタンの製造方法および精製方法
TW200920721A (en) * 2007-07-13 2009-05-16 Solvay Fluor Gmbh Preparation of halogen and hydrogen containing alkenes over metal fluoride catalysts
CN101126515A (zh) * 2007-09-13 2008-02-20 韩久和 节能型炉灶托盘
JP5439739B2 (ja) * 2008-05-12 2014-03-12 日本ゼオン株式会社 含フッ素アルケン化合物とその製造方法
JP5152521B2 (ja) * 2009-02-19 2013-02-27 日本ゼオン株式会社 ハロゲン化化合物を脱ハロゲン化水素する方法
WO2010095764A1 (en) * 2009-02-23 2010-08-26 Daikin Industries, Ltd. Process for preparing fluorine-containing alkyne compound
US8524955B2 (en) * 2010-05-21 2013-09-03 Honeywell International Inc. Process for the preparation of hexafluoro-2-butyne
RU2010147004A (ru) 2010-11-17 2012-05-27 Е.И.Дюпон де Немур энд Компани (US) Каталитический синтез внутренних фторбутенов и внутренних фторпентенов
EP2922809A1 (en) 2012-09-28 2015-09-30 E. I. du Pont de Nemours and Company Dehydrochlorination of chlorinated reactants to produce 1,1,1,4,4,4-hexafluoro-2-butyne
MX394632B (es) * 2014-02-07 2025-03-24 Chemours Co Fc Llc Proceso integrado para la produccion de z-1,1,1,4,4,4-hexafluoro-2-buteno.
US9328042B2 (en) * 2014-08-11 2016-05-03 The Chemours Company Fc, Llc Integrated process for the production of Z-1,1,1,4,4,4-hexafluoro-2-butene
JP5900575B1 (ja) * 2014-10-23 2016-04-06 ダイキン工業株式会社 フッ化メタンの製造方法
JP6328589B2 (ja) * 2015-05-29 2018-05-23 ダイキン工業株式会社 含フッ素オレフィンの製造方法
JP6052340B2 (ja) * 2015-05-29 2016-12-27 ダイキン工業株式会社 含フッ素化合物含有組成物の製造方法

Also Published As

Publication number Publication date
TW202043183A (zh) 2020-12-01
US20210380506A1 (en) 2021-12-09
TWI836011B (zh) 2024-03-21
JP6933239B2 (ja) 2021-09-08
JP2021138705A (ja) 2021-09-16
JP7656182B2 (ja) 2025-04-03
EP3929172A1 (en) 2021-12-29
JP2021006515A (ja) 2021-01-21
CN113454052A (zh) 2021-09-28
US11655199B2 (en) 2023-05-23
SG11202109143SA (en) 2021-09-29
EP3929172A4 (en) 2022-12-14
KR20210131383A (ko) 2021-11-02

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