JP6933239B2 - ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法 - Google Patents

ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法 Download PDF

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JP6933239B2
JP6933239B2 JP2019211183A JP2019211183A JP6933239B2 JP 6933239 B2 JP6933239 B2 JP 6933239B2 JP 2019211183 A JP2019211183 A JP 2019211183A JP 2019211183 A JP2019211183 A JP 2019211183A JP 6933239 B2 JP6933239 B2 JP 6933239B2
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compound
reaction
halogenated
catalyst
general formula
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Japanese (ja)
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JP2021006515A (ja
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友亮 江藤
友亮 江藤
中村　新吾
新吾 中村
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Daikin Industries Ltd
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Daikin Industries Ltd
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Priority to KR1020247027863A priority Critical patent/KR102885018B1/ko
Priority to SG11202109143SA priority patent/SG11202109143SA/en
Priority to CN202080015747.8A priority patent/CN113454052A/zh
Priority to EP20759907.7A priority patent/EP3929172A4/en
Priority to KR1020217030205A priority patent/KR102698639B1/ko
Priority to PCT/JP2020/006018 priority patent/WO2020171011A1/ja
Priority to TW112149097A priority patent/TW202417405A/zh
Priority to TW114116487A priority patent/TW202535816A/zh
Priority to TW109105404A priority patent/TWI836011B/zh
Publication of JP2021006515A publication Critical patent/JP2021006515A/ja
Priority to JP2021078757A priority patent/JP7656182B2/ja
Priority to US17/407,730 priority patent/US11655199B2/en
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Publication of JP6933239B2 publication Critical patent/JP6933239B2/ja
Priority to US18/134,219 priority patent/US20230242466A1/en
Priority to JP2024027595A priority patent/JP2024052857A/ja
Priority to JP2025045887A priority patent/JP2025083595A/ja
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/25—Preparation of halogenated hydrocarbons by splitting-off hydrogen halides from halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/07—Preparation of halogenated hydrocarbons by addition of hydrogen halides
    • C07C17/087—Preparation of halogenated hydrocarbons by addition of hydrogen halides to unsaturated halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00—Acyclic unsaturated compounds containing halogen atoms
    • C07C21/22—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon triple bonds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
JP2019211183A 2019-02-21 2019-11-22 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法 Active JP6933239B2 (ja)

Priority Applications (14)

Application Number Priority Date Filing Date Title
SG11202109143SA SG11202109143SA (en) 2019-02-21 2020-02-17 Methods For Producing Halogenated Alkene Compound And Fluorinated Alkyne Compound
CN202080015747.8A CN113454052A (zh) 2019-02-21 2020-02-17 卤化烯烃化合物和氟化炔烃化合物的制造方法
EP20759907.7A EP3929172A4 (en) 2019-02-21 2020-02-17 HALOGENATED ALKENE COMPOUND AND METHOD FOR MAKING A FLUORINATED ALKYNE COMPOUND
KR1020217030205A KR102698639B1 (ko) 2019-02-21 2020-02-17 할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법
PCT/JP2020/006018 WO2020171011A1 (ja) 2019-02-21 2020-02-17 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法
KR1020247027863A KR102885018B1 (ko) 2019-02-21 2020-02-17 할로겐화알켄 화합물 및 불화알킨 화합물의 제조 방법
TW114116487A TW202535816A (zh) 2019-02-21 2020-02-20 含有鹵化烯化合物之組成物、含有鹵化炔化合物之組成物
TW109105404A TWI836011B (zh) 2019-02-21 2020-02-20 鹵化炔化合物之製造方法及鹵化烯化合物之製造方法
TW112149097A TW202417405A (zh) 2019-02-21 2020-02-20 鹵化烯化合物之製造方法、鹵化炔化合物之製造方法、含有鹵化烯化合物之組成物及含有鹵化炔化合物之組成物
JP2021078757A JP7656182B2 (ja) 2019-02-21 2021-05-06 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法
US17/407,730 US11655199B2 (en) 2019-02-21 2021-08-20 Methods for producing halogenated alkene compound and fluorinated alkyne compound
US18/134,219 US20230242466A1 (en) 2019-02-21 2023-04-13 Methods for producing halogenated alkene compound and fluorinated alkyne compound
JP2024027595A JP2024052857A (ja) 2019-02-21 2024-02-27 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法
JP2025045887A JP2025083595A (ja) 2019-02-21 2025-03-19 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019029426 2019-02-21
JP2019029426 2019-02-21
JP2019124533 2019-07-03
JP2019124533 2019-07-03

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JP2021078757A Division JP7656182B2 (ja) 2019-02-21 2021-05-06 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法

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JP2021006515A JP2021006515A (ja) 2021-01-21
JP6933239B2 true JP6933239B2 (ja) 2021-09-08

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JP2019211183A Active JP6933239B2 (ja) 2019-02-21 2019-11-22 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法
JP2021078757A Active JP7656182B2 (ja) 2019-02-21 2021-05-06 ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法

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US (1) US11655199B2 (enExample)
EP (1) EP3929172A4 (enExample)
JP (2) JP6933239B2 (enExample)
KR (1) KR102698639B1 (enExample)
CN (1) CN113454052A (enExample)
SG (1) SG11202109143SA (enExample)
TW (1) TWI836011B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7343796B2 (ja) * 2021-04-27 2023-09-13 ダイキン工業株式会社 フルオロアルキン化合物の製造方法
JP2023131518A (ja) * 2022-03-09 2023-09-22 株式会社クレハ ハロゲン化アルケンの製造方法
JP2023131520A (ja) * 2022-03-09 2023-09-22 株式会社クレハ ハロゲン化アルケンの製造方法
CN116143585B (zh) * 2023-04-04 2023-07-14 北京宇极科技发展有限公司 制备氢卤烯烃的方法和制备含氟炔烃的方法

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US6031141A (en) * 1997-08-25 2000-02-29 E. I. Du Pont De Nemours And Company Fluoroolefin manufacturing process
JP4344915B2 (ja) * 2003-03-26 2009-10-14 日本ゼオン株式会社 パーフルオロアルキン化合物の製造方法
US7897823B2 (en) * 2004-10-29 2011-03-01 E. I. Du Pont De Nemours And Company Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes
JP4867474B2 (ja) * 2006-05-31 2012-02-01 日本ゼオン株式会社 パーフルオロアルキン化合物の製造方法
US8067650B2 (en) 2006-08-24 2011-11-29 Honeywell International Inc. Process for the production of HFO trans-1234ze from HFC-245fa
WO2008120642A1 (ja) * 2007-03-30 2008-10-09 Showa Denko K.K. 1,2,3,4－テトラクロロヘキサフルオロブタンの製造方法および精製方法
WO2008120652A1 (ja) * 2007-03-30 2008-10-09 Showa Denko K.K. 含塩素含フッ素化合物の製造方法
TW200920721A (en) * 2007-07-13 2009-05-16 Solvay Fluor Gmbh Preparation of halogen and hydrogen containing alkenes over metal fluoride catalysts
CN101126515A (zh) * 2007-09-13 2008-02-20 韩久和 节能型炉灶托盘
JP5439739B2 (ja) * 2008-05-12 2014-03-12 日本ゼオン株式会社 含フッ素アルケン化合物とその製造方法
JP5152521B2 (ja) * 2009-02-19 2013-02-27 日本ゼオン株式会社 ハロゲン化化合物を脱ハロゲン化水素する方法
JP2012518599A (ja) 2009-02-23 2012-08-16 ダイキン工業株式会社 含フッ素アルキン化合物の製造方法
US8524955B2 (en) 2010-05-21 2013-09-03 Honeywell International Inc. Process for the preparation of hexafluoro-2-butyne
RU2010147004A (ru) 2010-11-17 2012-05-27 Е.И.Дюпон де Немур энд Компани (US) Каталитический синтез внутренних фторбутенов и внутренних фторпентенов
EP2922809A1 (en) * 2012-09-28 2015-09-30 E. I. du Pont de Nemours and Company Dehydrochlorination of chlorinated reactants to produce 1,1,1,4,4,4-hexafluoro-2-butyne
KR20230031374A (ko) * 2014-02-07 2023-03-07 더 케무어스 컴퍼니 에프씨, 엘엘씨 Z-1,1,1,4,4,4-헥사플루오로-2-부텐의 생산을 위한 통합 공정
US9328042B2 (en) 2014-08-11 2016-05-03 The Chemours Company Fc, Llc Integrated process for the production of Z-1,1,1,4,4,4-hexafluoro-2-butene
JP5900575B1 (ja) * 2014-10-23 2016-04-06 ダイキン工業株式会社 フッ化メタンの製造方法
JP6328589B2 (ja) * 2015-05-29 2018-05-23 ダイキン工業株式会社 含フッ素オレフィンの製造方法
JP6052340B2 (ja) * 2015-05-29 2016-12-27 ダイキン工業株式会社 含フッ素化合物含有組成物の製造方法

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Publication number Publication date
KR102698639B1 (ko) 2024-08-27
US11655199B2 (en) 2023-05-23
US20210380506A1 (en) 2021-12-09
JP2021006515A (ja) 2021-01-21
TW202043183A (zh) 2020-12-01
CN113454052A (zh) 2021-09-28
TWI836011B (zh) 2024-03-21
EP3929172A1 (en) 2021-12-29
EP3929172A4 (en) 2022-12-14
KR20210131383A (ko) 2021-11-02
SG11202109143SA (en) 2021-09-29
JP7656182B2 (ja) 2025-04-03
JP2021138705A (ja) 2021-09-16

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