SG11202109143SA - Methods For Producing Halogenated Alkene Compound And Fluorinated Alkyne Compound - Google Patents
Methods For Producing Halogenated Alkene Compound And Fluorinated Alkyne CompoundInfo
- Publication number
- SG11202109143SA SG11202109143SA SG11202109143SA SG11202109143SA SG11202109143SA SG 11202109143S A SG11202109143S A SG 11202109143SA SG 11202109143S A SG11202109143S A SG 11202109143SA SG 11202109143S A SG11202109143S A SG 11202109143SA SG 11202109143S A SG11202109143S A SG 11202109143SA
- Authority
- SG
- Singapore
- Prior art keywords
- compound
- methods
- halogenated alkene
- producing halogenated
- fluorinated alkyne
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/25—Preparation of halogenated hydrocarbons by splitting-off hydrogen halides from halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/07—Preparation of halogenated hydrocarbons by addition of hydrogen halides
- C07C17/087—Preparation of halogenated hydrocarbons by addition of hydrogen halides to unsaturated halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C21/00—Acyclic unsaturated compounds containing halogen atoms
- C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
- C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C21/00—Acyclic unsaturated compounds containing halogen atoms
- C07C21/22—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon triple bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019029426 | 2019-02-21 | ||
| JP2019124533 | 2019-07-03 | ||
| JP2019211183A JP6933239B2 (ja) | 2019-02-21 | 2019-11-22 | ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法 |
| PCT/JP2020/006018 WO2020171011A1 (ja) | 2019-02-21 | 2020-02-17 | ハロゲン化アルケン化合物及びフッ化アルキン化合物の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202109143SA true SG11202109143SA (en) | 2021-09-29 |
Family
ID=74174700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202109143SA SG11202109143SA (en) | 2019-02-21 | 2020-02-17 | Methods For Producing Halogenated Alkene Compound And Fluorinated Alkyne Compound |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11655199B2 (enExample) |
| EP (1) | EP3929172A4 (enExample) |
| JP (2) | JP6933239B2 (enExample) |
| KR (1) | KR102698639B1 (enExample) |
| CN (1) | CN113454052A (enExample) |
| SG (1) | SG11202109143SA (enExample) |
| TW (1) | TWI836011B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7343796B2 (ja) * | 2021-04-27 | 2023-09-13 | ダイキン工業株式会社 | フルオロアルキン化合物の製造方法 |
| JP2023131518A (ja) * | 2022-03-09 | 2023-09-22 | 株式会社クレハ | ハロゲン化アルケンの製造方法 |
| JP2023131520A (ja) * | 2022-03-09 | 2023-09-22 | 株式会社クレハ | ハロゲン化アルケンの製造方法 |
| CN116143585B (zh) * | 2023-04-04 | 2023-07-14 | 北京宇极科技发展有限公司 | 制备氢卤烯烃的方法和制备含氟炔烃的方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6031141A (en) * | 1997-08-25 | 2000-02-29 | E. I. Du Pont De Nemours And Company | Fluoroolefin manufacturing process |
| JP4344915B2 (ja) * | 2003-03-26 | 2009-10-14 | 日本ゼオン株式会社 | パーフルオロアルキン化合物の製造方法 |
| US7897823B2 (en) * | 2004-10-29 | 2011-03-01 | E. I. Du Pont De Nemours And Company | Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes |
| JP4867474B2 (ja) * | 2006-05-31 | 2012-02-01 | 日本ゼオン株式会社 | パーフルオロアルキン化合物の製造方法 |
| US8067650B2 (en) | 2006-08-24 | 2011-11-29 | Honeywell International Inc. | Process for the production of HFO trans-1234ze from HFC-245fa |
| WO2008120642A1 (ja) * | 2007-03-30 | 2008-10-09 | Showa Denko K.K. | 1,2,3,4－テトラクロロヘキサフルオロブタンの製造方法および精製方法 |
| WO2008120652A1 (ja) * | 2007-03-30 | 2008-10-09 | Showa Denko K.K. | 含塩素含フッ素化合物の製造方法 |
| TW200920721A (en) * | 2007-07-13 | 2009-05-16 | Solvay Fluor Gmbh | Preparation of halogen and hydrogen containing alkenes over metal fluoride catalysts |
| CN101126515A (zh) * | 2007-09-13 | 2008-02-20 | 韩久和 | 节能型炉灶托盘 |
| JP5439739B2 (ja) * | 2008-05-12 | 2014-03-12 | 日本ゼオン株式会社 | 含フッ素アルケン化合物とその製造方法 |
| JP5152521B2 (ja) * | 2009-02-19 | 2013-02-27 | 日本ゼオン株式会社 | ハロゲン化化合物を脱ハロゲン化水素する方法 |
| JP2012518599A (ja) | 2009-02-23 | 2012-08-16 | ダイキン工業株式会社 | 含フッ素アルキン化合物の製造方法 |
| US8524955B2 (en) | 2010-05-21 | 2013-09-03 | Honeywell International Inc. | Process for the preparation of hexafluoro-2-butyne |
| RU2010147004A (ru) | 2010-11-17 | 2012-05-27 | Е.И.Дюпон де Немур энд Компани (US) | Каталитический синтез внутренних фторбутенов и внутренних фторпентенов |
| EP2922809A1 (en) * | 2012-09-28 | 2015-09-30 | E. I. du Pont de Nemours and Company | Dehydrochlorination of chlorinated reactants to produce 1,1,1,4,4,4-hexafluoro-2-butyne |
| KR20230031374A (ko) * | 2014-02-07 | 2023-03-07 | 더 케무어스 컴퍼니 에프씨, 엘엘씨 | Z-1,1,1,4,4,4-헥사플루오로-2-부텐의 생산을 위한 통합 공정 |
| US9328042B2 (en) | 2014-08-11 | 2016-05-03 | The Chemours Company Fc, Llc | Integrated process for the production of Z-1,1,1,4,4,4-hexafluoro-2-butene |
| JP5900575B1 (ja) * | 2014-10-23 | 2016-04-06 | ダイキン工業株式会社 | フッ化メタンの製造方法 |
| JP6328589B2 (ja) * | 2015-05-29 | 2018-05-23 | ダイキン工業株式会社 | 含フッ素オレフィンの製造方法 |
| JP6052340B2 (ja) * | 2015-05-29 | 2016-12-27 | ダイキン工業株式会社 | 含フッ素化合物含有組成物の製造方法 |
-
2019
- 2019-11-22 JP JP2019211183A patent/JP6933239B2/ja active Active
-
2020
- 2020-02-17 KR KR1020217030205A patent/KR102698639B1/ko active Active
- 2020-02-17 CN CN202080015747.8A patent/CN113454052A/zh active Pending
- 2020-02-17 EP EP20759907.7A patent/EP3929172A4/en not_active Withdrawn
- 2020-02-17 SG SG11202109143SA patent/SG11202109143SA/en unknown
- 2020-02-20 TW TW109105404A patent/TWI836011B/zh active
-
2021
- 2021-05-06 JP JP2021078757A patent/JP7656182B2/ja active Active
- 2021-08-20 US US17/407,730 patent/US11655199B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR102698639B1 (ko) | 2024-08-27 |
| US11655199B2 (en) | 2023-05-23 |
| US20210380506A1 (en) | 2021-12-09 |
| JP2021006515A (ja) | 2021-01-21 |
| JP6933239B2 (ja) | 2021-09-08 |
| TW202043183A (zh) | 2020-12-01 |
| CN113454052A (zh) | 2021-09-28 |
| TWI836011B (zh) | 2024-03-21 |
| EP3929172A1 (en) | 2021-12-29 |
| EP3929172A4 (en) | 2022-12-14 |
| KR20210131383A (ko) | 2021-11-02 |
| JP7656182B2 (ja) | 2025-04-03 |
| JP2021138705A (ja) | 2021-09-16 |
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