KR102648624B1 - 비-안료처리 분산제 조성물 - Google Patents

비-안료처리 분산제 조성물 Download PDF

Info

Publication number
KR102648624B1
KR102648624B1 KR1020217038199A KR20217038199A KR102648624B1 KR 102648624 B1 KR102648624 B1 KR 102648624B1 KR 1020217038199 A KR1020217038199 A KR 1020217038199A KR 20217038199 A KR20217038199 A KR 20217038199A KR 102648624 B1 KR102648624 B1 KR 102648624B1
Authority
KR
South Korea
Prior art keywords
block
composition
group
groups
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020217038199A
Other languages
English (en)
Korean (ko)
Other versions
KR20220005510A (ko
Inventor
안드레아스 오켈
히로시 요네하라
벤야민 린트너
외르크 뵈머
알베르트 프랑크
우도 크라페
요시즈미 코하라
료 다카바야시
Original Assignee
비와이케이-케미 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 비와이케이-케미 게엠베하 filed Critical 비와이케이-케미 게엠베하
Publication of KR20220005510A publication Critical patent/KR20220005510A/ko
Application granted granted Critical
Publication of KR102648624B1 publication Critical patent/KR102648624B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/106Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D11/107Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/14Methyl esters, e.g. methyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/322Pigment inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/324Inkjet printing inks characterised by colouring agents containing carbon black
    • C09D11/326Inkjet printing inks characterised by colouring agents containing carbon black characterised by the pigment dispersant
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/328Inkjet printing inks characterised by colouring agents characterised by dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/02Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/003Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • C09D17/001Pigment pastes, e.g. for mixing in paints in aqueous medium
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/02Emulsion paints including aerosols
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/45Anti-settling agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/65Additives macromolecular
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
KR1020217038199A 2019-04-26 2020-04-22 비-안료처리 분산제 조성물 Active KR102648624B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP19171337 2019-04-26
EP19171337.9 2019-04-26
PCT/EP2020/061242 WO2020216800A1 (en) 2019-04-26 2020-04-22 Non-pigmented dispersant composition

Publications (2)

Publication Number Publication Date
KR20220005510A KR20220005510A (ko) 2022-01-13
KR102648624B1 true KR102648624B1 (ko) 2024-03-20

Family

ID=66290291

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020217038199A Active KR102648624B1 (ko) 2019-04-26 2020-04-22 비-안료처리 분산제 조성물
KR1020217038202A Active KR102589005B1 (ko) 2019-04-26 2020-04-22 컬러 필터를 제조하기 위한 조성물

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020217038202A Active KR102589005B1 (ko) 2019-04-26 2020-04-22 컬러 필터를 제조하기 위한 조성물

Country Status (7)

Country Link
US (1) US12116492B2 (https=)
EP (1) EP3959274B1 (https=)
JP (2) JP7303902B2 (https=)
KR (2) KR102648624B1 (https=)
CN (2) CN113748171B (https=)
ES (1) ES2954761T3 (https=)
WO (2) WO2020216801A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113748171B (zh) 2019-04-26 2022-12-13 毕克化学有限公司 用于制备彩色滤光片的组合物
JP7152625B1 (ja) * 2022-06-23 2022-10-12 大日精化工業株式会社 水性インク用バインダー成分及び水性インク

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030105201A1 (en) * 2001-05-21 2003-06-05 Clemens Auschra Pigment compositions with modified block copolymer dispersants
JP2013203887A (ja) * 2012-03-28 2013-10-07 Dainichiseika Color & Chem Mfg Co Ltd 顔料着色剤組成物、カラーフィルター用着色剤、高分子分散剤及び該高分子分散剤の製造方法
JP2017082198A (ja) * 2015-09-23 2017-05-18 ベーイプシロンカー ヘミー ゲゼルシャフト ミット ベシュレンクター ハフトゥング 低アミン価の湿潤及び/又は分散剤を含有する着色剤組成物
WO2019096891A1 (en) * 2017-11-15 2019-05-23 Byk-Chemie Gmbh Block co-polymer

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2726854A1 (de) 1977-06-15 1979-01-11 Bayer Ag Phosphorsaeureester
JPS5774794A (en) 1980-10-29 1982-05-11 Suwa Seikosha Kk Piezoelectric speaker driving circuit for electronic timepiece
US4746462A (en) 1985-02-21 1988-05-24 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Phosphoric ester compound
US4755563A (en) 1986-12-29 1988-07-05 E. I. Du Pont De Nemours And Company Block copolymer dispersants containing ionic moieties
US5219945A (en) * 1992-02-20 1993-06-15 E. I. Du Pont De Nemours And Company ABC triblock methacrylate polymers
EP0556649B1 (en) * 1992-02-20 1999-06-23 E.I. Du Pont De Nemours & Company Incorporated Aqueous dispersions containing ABC triblock polymer dispersants
US6413306B1 (en) * 1999-10-07 2002-07-02 E. I. Du Pont De Nemours And Company Pigment dispersions containing ABC-block polymer dispersant
JP4334272B2 (ja) 2003-05-14 2009-09-30 大日本印刷株式会社 カラーフィルター用インクジェットインク用エポキシ樹脂組成物、カラーフィルターの製造方法、カラーフィルター、及び表示パネル
JP2006343648A (ja) 2005-06-10 2006-12-21 Mitsubishi Chemicals Corp カラーフィルター用色材分散液、カラーフィルター用硬化性樹脂組成物及びその製造方法、並びにカラーフィルター及び液晶表示装置
JP4793360B2 (ja) 2007-02-26 2011-10-12 大日本印刷株式会社 カラーフィルタ用ネガ型レジスト組成物、およびこれを用いたカラーフィルタ、液晶表示装置
JP5487564B2 (ja) * 2007-06-21 2014-05-07 三菱化学株式会社 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機elディスプレイ
JP5540599B2 (ja) 2008-10-31 2014-07-02 Jsr株式会社 着色層形成用感放射線性組成物、カラーフィルタ及びカラー液晶表示素子
JP5147770B2 (ja) 2009-03-26 2013-02-20 富士フイルム株式会社 液滴吐出ヘッドおよび画像形成装置
JP5863232B2 (ja) 2010-10-08 2016-02-16 株式会社Dnpファインケミカル 顔料分散液の製造方法
US8292452B2 (en) 2010-06-07 2012-10-23 Ko Joseph Y Solar power alarm lamp
WO2012063435A1 (ja) * 2010-11-08 2012-05-18 日本曹達株式会社 新規共重合体
JP6078999B2 (ja) 2011-09-02 2017-02-15 大日本印刷株式会社 カラーフィルタ用赤色顔料分散液及びその製造方法、カラーフィルタ用赤色感光性樹脂組成物及びその製造方法、カラーフィルタ、並びに、液晶表示装置及び有機発光表示装置
JP5734821B2 (ja) * 2011-12-06 2015-06-17 大塚化学株式会社 ブロック共重合体、分散剤及び顔料分散組成物
JP2014028891A (ja) 2012-07-31 2014-02-13 Kao Corp カラーフィルター用顔料分散体
JP6248838B2 (ja) 2013-07-22 2017-12-20 Jsr株式会社 着色組成物、着色硬化膜、並びに表示素子及び固体撮像素子
JP6206780B2 (ja) * 2014-12-23 2017-10-04 ベーイプシロンカー−シェミー ゲーエムベーハーBYK−Chemie GmbH 保護基を有する分散剤を含む配合
JP6488143B2 (ja) 2015-02-13 2019-03-20 株式会社Dnpファインケミカル ジケトピロロピロール系顔料誘導体組成物、顔料組成物、顔料分散液、着色樹脂組成物、カラーフィルタ、及び表示装置
JP6755715B2 (ja) 2015-06-01 2020-09-16 株式会社Dnpファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
KR102077415B1 (ko) * 2016-02-03 2020-02-13 오츠카 가가쿠 가부시키가이샤 Aba형 블록 공중합체, 분산제 및 안료 분산 조성물
JP6740765B2 (ja) 2016-07-19 2020-08-19 東洋インキScホールディングス株式会社 カラーフィルタ用着色組成物、その製造方法及びカラーフィルタ
US20200347171A1 (en) * 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer
CN113748171B (zh) 2019-04-26 2022-12-13 毕克化学有限公司 用于制备彩色滤光片的组合物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030105201A1 (en) * 2001-05-21 2003-06-05 Clemens Auschra Pigment compositions with modified block copolymer dispersants
JP2013203887A (ja) * 2012-03-28 2013-10-07 Dainichiseika Color & Chem Mfg Co Ltd 顔料着色剤組成物、カラーフィルター用着色剤、高分子分散剤及び該高分子分散剤の製造方法
JP2017082198A (ja) * 2015-09-23 2017-05-18 ベーイプシロンカー ヘミー ゲゼルシャフト ミット ベシュレンクター ハフトゥング 低アミン価の湿潤及び/又は分散剤を含有する着色剤組成物
WO2019096891A1 (en) * 2017-11-15 2019-05-23 Byk-Chemie Gmbh Block co-polymer

Also Published As

Publication number Publication date
CN113728061A (zh) 2021-11-30
EP3959274A1 (en) 2022-03-02
US20220213337A1 (en) 2022-07-07
KR102589005B1 (ko) 2023-10-17
CN113748171B (zh) 2022-12-13
US12116492B2 (en) 2024-10-15
WO2020216801A1 (en) 2020-10-29
KR20220005512A (ko) 2022-01-13
EP3959274B1 (en) 2023-06-07
WO2020216800A1 (en) 2020-10-29
JP7253080B2 (ja) 2023-04-05
JP7303902B2 (ja) 2023-07-05
JP2022530230A (ja) 2022-06-28
CN113728061B (zh) 2023-06-02
JP2022530152A (ja) 2022-06-27
KR20220005510A (ko) 2022-01-13
CN113748171A (zh) 2021-12-03
ES2954761T3 (es) 2023-11-24

Similar Documents

Publication Publication Date Title
US9957343B2 (en) Ionic bonding group-containing comb polymers
JP5145345B2 (ja) 構造化コポリマーの混合物をベースとする湿潤剤および分散剤
US12570797B2 (en) Acid functional compound
KR102648624B1 (ko) 비-안료처리 분산제 조성물
JP2018168376A (ja) 接着強化添加剤およびそれを含むコーティング組成物
CN107722171B (zh) 一种磷酸酯分散剂及其制备方法和应用
JP2013053231A (ja) アミノ基を含有するジブロック共重合体の調製方法
JP7702500B2 (ja) 塩官能基を有するコームポリマー
JP6437628B2 (ja) ブロック共重合体、分散剤及び顔料分散組成物
JP6322226B2 (ja) アミノ基を含有するジブロック共重合体の調製方法
WO2016176264A1 (en) Fluorinated amine complex additives for architectural coatings
DE102025101979A1 (de) Zweiteilige (2k) beschichtungszusammensetzung auf wasserbasis

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

Patent event date: 20211123

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20211123

Comment text: Request for Examination of Application

PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20230921

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20240306

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20240313

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20240314

End annual number: 3

Start annual number: 1

PG1601 Publication of registration