KR102414891B1 - 기판 액 처리 장치 - Google Patents

기판 액 처리 장치 Download PDF

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Publication number
KR102414891B1
KR102414891B1 KR1020150148637A KR20150148637A KR102414891B1 KR 102414891 B1 KR102414891 B1 KR 102414891B1 KR 1020150148637 A KR1020150148637 A KR 1020150148637A KR 20150148637 A KR20150148637 A KR 20150148637A KR 102414891 B1 KR102414891 B1 KR 102414891B1
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KR
South Korea
Prior art keywords
liquid
substrate
nozzle
processing
guide wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020150148637A
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English (en)
Korean (ko)
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KR20160049985A (ko
Inventor
쇼우타 우메자키
요시히로 가이
가즈키 고사이
미츠오 다나카
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20160049985A publication Critical patent/KR20160049985A/ko
Application granted granted Critical
Publication of KR102414891B1 publication Critical patent/KR102414891B1/ko
Active legal-status Critical Current
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Classifications

    • H01L21/02282—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0424—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/28—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with integral means for shielding the discharged liquid or other fluent material, e.g. to limit area of spray; with integral means for catching drips or collecting surplus liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • H01L21/67017—
    • H01L21/67051—
    • H01L21/683—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
KR1020150148637A 2014-10-28 2015-10-26 기판 액 처리 장치 Active KR102414891B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014219315A JP6370678B2 (ja) 2014-10-28 2014-10-28 基板液処理装置
JPJP-P-2014-219315 2014-10-28

Publications (2)

Publication Number Publication Date
KR20160049985A KR20160049985A (ko) 2016-05-10
KR102414891B1 true KR102414891B1 (ko) 2022-07-01

Family

ID=55791214

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150148637A Active KR102414891B1 (ko) 2014-10-28 2015-10-26 기판 액 처리 장치

Country Status (3)

Country Link
US (1) US9842751B2 (https=)
JP (1) JP6370678B2 (https=)
KR (1) KR102414891B1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001046918A (ja) * 1999-08-09 2001-02-20 Tokyo Electron Ltd 処理液吐出ノズル、液処理装置および液処理方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112930U (https=) * 1990-03-01 1991-11-19
JP4256583B2 (ja) * 1999-12-17 2009-04-22 東京エレクトロン株式会社 塗布膜形成装置
US7153364B1 (en) * 2000-10-23 2006-12-26 Advance Micro Devices, Inc. Re-circulation and reuse of dummy-dispensed resist
JP4043423B2 (ja) * 2003-09-04 2008-02-06 東京エレクトロン株式会社 現像装置及び現像方法
JP4997080B2 (ja) * 2007-11-28 2012-08-08 大日本スクリーン製造株式会社 基板処理装置
JP5218450B2 (ja) * 2010-03-03 2013-06-26 東京エレクトロン株式会社 液処理装置及び液処理方法
JP5440441B2 (ja) * 2010-08-12 2014-03-12 東京エレクトロン株式会社 液処理装置
JP5667545B2 (ja) * 2011-10-24 2015-02-12 東京エレクトロン株式会社 液処理装置および液処理方法
JP5693438B2 (ja) * 2011-12-16 2015-04-01 東京エレクトロン株式会社 基板処理装置、基板処理方法および記憶媒体
KR20140065655A (ko) 2012-11-19 2014-05-30 주식회사 케이씨텍 분사노즐유닛 및 이를 구비한 기판 세정장치
JP6022430B2 (ja) * 2012-11-21 2016-11-09 東京エレクトロン株式会社 基板処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001046918A (ja) * 1999-08-09 2001-02-20 Tokyo Electron Ltd 処理液吐出ノズル、液処理装置および液処理方法

Also Published As

Publication number Publication date
KR20160049985A (ko) 2016-05-10
US9842751B2 (en) 2017-12-12
US20160114345A1 (en) 2016-04-28
JP2016086116A (ja) 2016-05-19
JP6370678B2 (ja) 2018-08-08

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