KR102409301B1 - electronic device - Google Patents

Abstract

The present invention comprises a substrate, a transverse signal line, a first longitudinal signal line, a second longitudinal longitudinal line, and a first shielding longitudinal line. The transverse signal line, the first longitudinal signal line, the second longitudinal longitudinal line, and the first shielding longitudinal line are all disposed on the substrate. The first longitudinal signal line and the second longitudinal signal line cross each other with the transverse signal line. A second longitudinal signal line is connected to one of the transverse signal lines. The vertical projection of the first shielding longitudinal line on the substrate is located between the vertical projection of the first longitudinal signal line on the substrate and the vertical projection of the second longitudinal signal line on the substrate.

Description

electronic device

The present invention relates to an electronic device.

As electronic products become popular, line layouts in various electronic devices are becoming increasingly complex. Thus, many lines adjacent to each other can be used to transmit different types of signals. However, the fastening action between lines adjacent to each other often affects the signal transmission quality, so that the final function does not meet expectations. Therefore, line layout planning is often one of the important points in electronic product design.

SUMMARY OF THE INVENTION The present invention provides an electronic device designed to provide improved quality by reducing coupling between lines.

An electronic device of the present invention includes a substrate, a plurality of transverse signal lines, a first longitudinal signal line, a second longitudinal signal line, and a first shielding longitudinal line. The plurality of transverse signal lines, the first longitudinal signal line, the second longitudinal signal line and the first shielding longitudinal line are all disposed on the substrate. The first longitudinal signal line crosses each other with the transverse signal line. The second longitudinal signal line crosses each other with the transverse signal line, and the second longitudinal signal line is connected to one of the plurality of transverse signal lines. The vertical projection of the first shielding longitudinal line on the substrate is located between the vertical projection of the first longitudinal signal line on the substrate and the vertical projection of the second longitudinal signal line on the substrate.

In an embodiment of the present invention, the above-described electronic device further includes a plurality of pixel structures disposed on a substrate. One of the plurality of pixel structures is surrounded by two lateral signal lines and a second longitudinal signal line adjacent to each other and includes a pixel electrode. The pixel electrode overlaps the first longitudinal signal line or the second longitudinal signal line in a direction perpendicular to the substrate.

In one embodiment of the present invention, the pixel electrode described above overlaps the first shielding vertical line.

In one embodiment of the present invention, the above-described pixel electrode crosses the second longitudinal signal line, the pixel electrode has a central trunk portion, and the second longitudinal signal line overlaps the central trunk portion.

In one embodiment of the present invention, the first shielding vertical line described above is a transparent wiring.

In one embodiment of the present invention, the above-described electronic device further includes a common electrode line. The common electrode line is disposed on the substrate. The common electrode line is positioned between adjacent two of the plurality of transverse signal lines.

In one embodiment of the present invention, the above-described common electrode line crosses each other with the first vertical signal line and the second vertical signal line.

In an embodiment of the present invention, the first shielding vertical line and the common electrode line are directly stacked on each other.

In one embodiment of the present invention, the above-described electronic device further includes at least one insulating layer and a conductive structure penetrating the insulating layer. The insulating layer is disposed between the first shielding vertical line and the common electrode line, and the conductive structure electrically connects the first shielding vertical line and the common electrode line.

In one embodiment of the present invention, the above-described electronic device further includes a plurality of pixel structures disposed on the substrate. One of the pixel structures is positioned between adjacent two of the plurality of transverse signal lines and includes a pixel electrode. The film layer of the first shielding vertical line is positioned between the film layer of the common electrode line and the film layer of the pixel electrode.

In one embodiment of the present invention, the above-described electronic device further includes a plurality of pixel structures disposed on the substrate. One of the pixel structures is positioned between adjacent two of the plurality of transverse signal lines and includes a pixel electrode. The film layer of the common electrode line is positioned between the film layer of the first shielding vertical line and the film layer of the pixel electrode.

In one embodiment of the present invention, the above-described common electrode line includes a first line and a second line. The first shielding vertical line overlaps the first line, the second line, or both.

In an embodiment of the present invention, the above-described electronic device further includes a second shielding vertical line. The first longitudinal signal line is positioned on the first shielding vertical line and the second shielding vertical line and positioned between the pixel electrodes.

In an embodiment of the present invention, the above-described electronic device further includes a third shielding vertical line. The third shielding vertical line is located between the first vertical signal line and the second shielding vertical line.

In an embodiment of the present invention, the above-described electronic device further includes a fourth vertical signal line. The vertical projection of the first longitudinal signal line and the third longitudinal signal line on the substrate is located between the vertical projection of the second longitudinal signal line on the substrate and the vertical projection of the fourth longitudinal signal line on the substrate.

In an embodiment of the present invention, the above-described electronic device further includes a shielding electrode. The shielding electrode is connected to the first shielding longitudinal line.

In one embodiment of the present invention, the above-described first shielding vertical line is completely positioned between two adjacent signal lines among a plurality of horizontal signal lines.

In an embodiment of the present invention, the above-described electronic device further includes a plurality of pixel structures disposed on the substrate. One of the pixel structures includes a pixel electrode. The vertical projection of the first shielding vertical line on the substrate is outside the vertical projection of the pixel electrode on the substrate.

In an embodiment of the present invention, the above-described electronic device further includes a plurality of pixel structures and a third vertical signal line. An array of a plurality of pixel structures is disposed on a substrate. The second vertical signal line is located between the third vertical signal line and the first vertical signal line, and the first vertical signal line, the second vertical signal line and the third vertical signal line are formed of a plurality of pixel structures. It is located between two adjacent rows.

In one embodiment of the present invention, the above-described electronic device further includes a second shielding vertical line disposed on the substrate. The vertical projection of the second shielding longitudinal line on the substrate is located between the vertical projection of the second longitudinal signal line on the substrate and the vertical projection of the third longitudinal signal line on the substrate.

As described above, in the electronic device according to an embodiment of the present invention, by installing a shielding wiring between adjacent lines for transmitting different signals, adverse effects due to coupling between lines are reduced. Also, in some embodiments, the shielding wiring may be a transparent wiring. Therefore, when the screen is displayed using the electronic device, the display aperture ratio may not be reduced due to the influence of the shielding wiring.

1 is a schematic partial plan view of an electronic device;
2 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure;
3 is a diagram illustrating an embodiment of a cross-section taken along line AA in the electronic device of FIG. 2 .
FIG. 4 is a diagram illustrating another embodiment of a cross-section taken along line AA in the electronic device of FIG. 2 .
5 to 10 are each a partial schematic diagram of an electronic device according to an embodiment of the present disclosure;
11 is a diagram illustrating another embodiment of a cross-section taken along line BB in the electronic device of FIG. 2 .
12 is a view illustrating another embodiment of a cross-section taken along line BB in the electronic device of FIG. 2 .
13 to 19 are each a partial schematic diagram of an electronic device according to an embodiment of the present disclosure.
20 schematically illustrates an embodiment of a cross-sectional structure taken along line CC of the electronic device of FIG. 19 .
21 schematically illustrates an embodiment of a cross-sectional structure taken along line DD of the electronic device of FIG. 19 .
22 schematically illustrates another embodiment of a cross-sectional structure taken along line CC of the electronic device of FIG. 19 .
23 schematically illustrates another embodiment of a cross-sectional structure taken along line DD of the electronic device of FIG. 19 .
24 schematically illustrates another embodiment of a cross-sectional structure taken along line CC of the electronic device of FIG. 19 .
25 schematically illustrates another embodiment of a cross-sectional structure taken along line DD of the electronic device of FIG. 19 .
26 is a plan view illustrating an electronic device according to an embodiment of the present disclosure;
27 is a plan view illustrating an electronic device according to an embodiment of the present disclosure;
28 schematically illustrates an embodiment of a cross-sectional structure taken along line EE of the electronic device of FIG. 27 .
29 schematically illustrates an embodiment of a cross-sectional structure taken along line EE of the electronic device of FIG. 27 .
30 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure;
31 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure;
FIG. 32 schematically illustrates an embodiment of a cross-section of a position where the first shielding vertical line 250A is located in the electronic device 200A of FIG. 31 .
FIG. 33 schematically shows another embodiment of a cross-section of a position where the first shielding vertical line 250A is located in the electronic device 200A of FIG. 31 .
34 to 36 are schematic partial plan views of an electronic device according to an embodiment of the present disclosure, respectively.
37 schematically illustrates an embodiment of a cross-sectional structure in which the first shielding vertical line 350A is positioned in the electronic device 300 .
38 schematically illustrates another embodiment of a cross-sectional structure in which the first shielding vertical line 350A is positioned in the electronic device 300 .
39 schematically shows another embodiment of a cross-sectional structure of an electronic device 300 .

Hereinafter, the present invention will be described in detail in conjunction with the drawings and specific examples, but it is not intended to limit the present invention.

1 is a schematic partial plan view of an electronic device; 1 , an electronic device 100 ′ includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , and a plurality of pixel structures 140 . The pixel structures 140 are disposed on the substrate 110 in an array arrangement. That is, the pixel structure 140 represents an array arrangement along the first direction D1 and the second direction D2 intersecting the first direction D1, among which the first direction D1 is a horizontal direction. This may be understood, and the second direction D2 may be understood as a vertical direction. Accordingly, the horizontal direction and the vertical direction described in the following embodiments may be viewed as the first direction D1 and the second direction D2 in FIG. 1 , respectively. Each pixel structure 140 is coupled to one of a plurality of transverse signal lines 120 . In addition, the plurality of vertical signal lines 130 may be divided into a vertical signal line DL directly connected to the pixel structure 140 and a vertical signal line VL not directly connected to the pixel structure 140 . have. The pixel structures 140 arranged in a row along the second direction D2 are sandwiched between two vertical signal lines DL, and each pixel structure 140 is connected to one of the vertical signal lines DL. do. In some embodiments, the different pixel structures 140 arranged in the same column along the second direction D2 include a vertical signal line DL located on a first side and a vertical signal line located on an opposite side of the second side, respectively. (DL) can be linked. Each vertical signal line VL is interposed between two columns of the pixel structure 140 and between two vertical signal lines DL. In some embodiments, longitudinal signal line VL includes, but is not limited to, longitudinal signal line VL1 connected to lateral signal line 120 via a corresponding conductive structure VIA.

In some embodiments, each pixel structure 140 may include an active element 142 and a pixel electrode 144 coupled to the active element 142 , of which each active element 142 includes a gate, a source and It may be a transistor having a drain, the gate may be connected to one of the horizontal signal lines 120 , the source may be connected to one of the vertical signal lines DL, and the drain may be connected to the pixel electrode 144 . have. Also, each of the horizontal signal lines 120 is connected to one of the vertical signal lines VL1. Accordingly, the signal of the gate of the active element 142 may be transmitted to the horizontal signal line 120 through the vertical signal line VL1 , and may be input to the gate through the horizontal signal line 120 again. Specifically, in order to prevent a short circuit between the horizontal signal line 120 and the vertical signal line 130 , the horizontal signal line 120 and the vertical signal line 130 may be composed of different film layers. , one or more insulating layers may be interposed between the horizontal signal line 120 and the vertical signal line 130 . In some embodiments, a conductive structure ( VIA) can be installed. In this way, the signal required at the gate may be transferred to the lateral signal line 120 by the longitudinal signal line VL1 through the conductive structure VIA, and again to the gate via the lateral signal line 120 . can be transmitted.

In some embodiments, the electronic device 100 ′ may further include a driving circuit IC, which is located at one end of the vertical signal line 130 . The vertical signal line DL and the vertical signal line VL1 may directly receive a signal provided by the driving circuit IC, and the horizontal signal line 120 corresponds to the vertical signal line VL1 through the vertical signal line VL1. signal can be received. In this way, the electronic device 100 ′ can achieve a narrow bezel design without having to install a signal transmission line or related circuit at both ends in the first direction D1 , and The contours need not be constrained either. For example, when viewed from a planar angle, the electronic device 100 ′ may have a non-rectangular outline. In some embodiments, the vertical signal line VL of the electronic device 100 ′ may further include a vertical signal line VL2 , and the vertical signal line VL2 includes the horizontal signal line 120 . Direct current can be input without the need to transmit a required signal. For example, the vertical signal line VL2 does not need to be connected to any horizontal signal line 120 , and may be applied to the implementation of touch control or other functions.

2 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100A of FIG. 2 has a layout design substantially similar to that of the electronic device 100 ′ of FIG. 1 , in describing the two embodiments, the same element numbers are used to refer to the same members. In FIG. 2 , the electronic device 100A includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a plurality of pixel structures 140 , and a plurality of first shielding vertical lines. 150A, including a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a plurality of pixel structures 140 , a plurality of first shielding vertical lines 150A and a common electrode line ( All 160 are disposed on the substrate 110 . The layout and connection relationships of the plurality of horizontal signal lines 120 , the plurality of vertical signal lines 130 , and the plurality of pixel structures 140 are, for example, as shown in FIG. 1 , which will not be repeatedly described herein. does not For convenience of description, a signal line around the single pixel structure 140 located in the middle of FIG. 2 will be mainly described below.

In this embodiment, the extending direction of the transverse signal line 120 is, for example, the first direction D1 shown in FIG. 1 , and the extending direction of the longitudinal signal line 130 is shown in FIG. 1 , for example. in the second direction D2. Among them, the horizontal direction and the vertical direction intersect each other, but the angle at which they intersect is not limited to 90 degrees. The vertical signal line 130 may include a first vertical signal line 132 and a second vertical signal line 134 positioned on one side of the pixel structure 140 , of which, The signal line 132 is directly connected to one of the longitudinal signal lines of the pixel structure 140 , and the second longitudinal signal line 134 is connected to one of the horizontal signal lines 120 throughout the electronic device 100A. can be connected One of the pixel structures 140 is positioned between two horizontal signal lines 120 adjacent to each other and positioned at one side of the second vertical signal line 134 . The single pixel structure 140 may include an active element 142 and a pixel electrode 144 , and three stages of the active element 142 have a corresponding horizontal signal line 120 and a first vertical signal line, respectively. 132 and the pixel electrode 144 .

Here, the horizontal signal line 120 is, for example, a scan signal line used to provide a scan signal to the pixel structure 140 , and the first vertical signal line 132 is a data signal to the pixel structure 140 . is used to provide In other words, the first vertical signal line 132 and the second vertical signal line 134 are adjacent to each other but are used to transmit different types of signals. As the lines are installed in this way, the first vertical signal line 132 and the second vertical signal line 134 may be coupled to each other to affect each other's signal transmission quality. However, in the present embodiment, the vertical projection of the first shielding vertical line 150A on the substrate 110 (ie, the layout area of FIG. 2 ) is of the first vertical signal line 132 on the substrate 110 . located between the vertical projection and the vertical projection of the second longitudinal signal line 134 on the substrate 110 . In addition, the electronic device 100A may further include a common electrode line 160 , and the first shielding vertical line 150A may be connected to the common electrode line 160 to apply a common potential. In this way, by providing the first shielding vertical line 150A, it is advantageous to reduce the interference between the first vertical signal line 132 and the second vertical signal line 134, and the first vertical signal line 132 and to ensure the signal transmission quality of the second longitudinal signal line 134 . Accordingly, a function (eg, screen display, touch sensing, etc.) performed by the electronic device may conform to the prediction. In FIG. 2 , the common electrode line 160 includes a first line 162 and a second line 164 , among which the first line 162 and the second line 164 are two adjacent lines. It is positioned between the horizontal signal lines 120 and positioned on opposite sides of the pixel structure 140 . In addition, the first shielding vertical line 150A may not only overlap the first line 162 but also the second line 164 , but is not limited thereto.

In this embodiment, the vertical signal line 130 may further include a third vertical signal line 136 and a fourth vertical signal line 138 positioned on the other side of the pixel structure 140 . The pixel structure 140 is positioned, for example, between the second longitudinal signal line 134 and the fourth longitudinal signal line 138 . The third longitudinal signal line 136 is positioned between the fourth longitudinal signal line 138 and the first longitudinal signal line 132 . Further, the vertical projection of the first longitudinal signal line 132 and the third longitudinal signal line 136 on the substrate 110 is the same as the vertical projection of the second longitudinal signal line 134 on the substrate 110 . located between the vertical projections of the fourth longitudinal signal line 138 on the substrate 110 . In addition, a shielding vertical line may not be installed between the third vertical signal line 136 and the fourth vertical signal line 138 , but this is not an example. The third vertical signal line 136 is connected to another pixel structure in the same column, and the fourth vertical signal line 138 is, for example, a DC potential or a transverse signal line of one of the entire electronic device 100A ( 120), but is not limited thereto.

In the present embodiment, the pixel electrode 144 of the pixel structure 140 has a first vertical signal line 132 , a second vertical signal line 134 , and a third vertical direction in a direction perpendicular to the substrate 110 . The signal line 136 , the fourth vertical signal line 138 , and the first shielding vertical line 150A) may overlap. Specifically, the pixel electrode 144 may cross the first vertical signal line 132, the first shielding vertical line 150A, and the third vertical signal line 136, and the second vertical signal line ( It may overlap a partial width of 134 and a partial width of the fourth vertical signal line 138 . Since the first vertical shielding line 150A may be a transparent wiring, a portion where the pixel electrode 144 overlaps the first vertical shielding line 150A may still be used as an effective display area. As such, even when the first vertical shielding line 150A is additionally installed in the electronic device 100A, the display area is not reduced due to the first vertical shielding line 150A.

Also, in the present embodiment, the pixel electrode 144 may include a vertical trunk part MV, a horizontal trunk part MH, and a plurality of stripe parts ST, among which, the vertical trunk part MV. ) and the transverse trunk part MH cross each other in a cross shape and are divided into four sub-regions, and the stripe part ST is connected to the longitudinal trunk part MV and the transverse trunk part MH to form a longitudinal trunk part It extends approximately radially outward from the MV and the transverse trunk portion MH. However, in other embodiments, the pixel electrode 144 may have a different pattern or may be viewed as a perfectly rectangular shape.

FIG. 3 is a diagram illustrating an embodiment of a cross-section taken along line A-A in the electronic device of FIG. 2 . 2 and 3 , it can be seen that the common electrode line 160 is disposed on the substrate 110 . In this embodiment, the film layer in which the common electrode line 160 is positioned may be the same as the film layer in which the transverse signal line 120 is positioned. The material of the common electrode line 160 and the transverse signal line 120 includes a material having good conductivity, such as a metal or an alloy. The film layer in which the common electrode line 160 and the transverse signal line 120 are positioned is, for example, closer to the substrate 110 than the film layer in which other lines are positioned, but is not limited thereto.

After the common electrode line 160 and the transverse signal line 120 are manufactured, another conductive layer may be directly formed to manufacture the first shielding vertical line 150A, and the first shielding vertical line 150A may have a common It is made to be directly stacked on the electrode line 160 . That is, the first shielding vertical line 150A directly contacts the common electrode line 160 without an intermediate layer. The first shielding vertical line 150A may be a transparent conductive pattern. The material of the first shielding vertical line 150A may be a metal oxide such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide or other suitable oxide, or a laminated layer of two or more thereof. . Alternatively, the material of the first shielding vertical line 150A may be an organic transparent conductive material. In some embodiments, since the material of the first shielding vertical line 150A has different properties from that of the common electrode line 160 , in the patterning process of the first shielding vertical line 150A, the common electrode line 160 . and less likely to damage the transverse signal line. Therefore, the first shielding vertical line 150A may be directly stacked on the common electrode line 160 without an intermediate layer.

After the first shielding vertical line 150A is completed, the insulating layer I1 may be formed on the substrate 110 to continuously manufacture the vertical signal line 130 . Here, the vertical signal line 130 crosses the horizontal signal line 120 and the common electrode line 160 . Accordingly, the installation of the insulating layer I1 may separate the vertical signal line 130 and the common electrode line 160 to separate the vertical signal line 130 and the horizontal signal line 120 . In some embodiments, the material of the insulating layer I1 may include an inorganic insulating material or an organic insulating material, among which the inorganic insulating material includes silicon oxide, silicon nitride or silicon nitroxide, and the organic insulating material is polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI), and the like. In addition, the material of the vertical signal line 130 includes a material having good conductivity, such as a metal or an alloy.

After the vertical signal line 130 is completed, one or more insulating layers or functional layers may be selectively formed on the substrate 110 . In this embodiment, the insulating layer I2, the filter layer CF, and the insulating layer I3 will be described as examples, but the present invention is not limited thereto. Materials of the insulating layers I2 and I3 may include an inorganic insulating material or an organic insulating material, among which the inorganic insulating material includes silicon oxide, silicon nitride or silicon nitroxide, and the organic insulating material is polymethyl meta acrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP), or polyimide (PI). The material of the filter layer CF may include a color filter material such as a red filter material, a green filter material, and a blue filter material. In addition, the insulating layer I3 may have a relatively thick thickness to be used as a planarization layer, but is not limited thereto.

The pixel electrode 144 may be formed on the insulating layer I3 . The material of the pixel electrode 144 may include a transparent conductive material. The transparent conductive material may include a metal oxide such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium germanium zinc oxide or other suitable oxides, or laminated layers of at least two or more thereof. Alternatively, the transparent conductive material may be an organic transparent material. In some embodiments, the material of the pixel electrode 144 may be the same as that of the first shielding vertical line 150A.

FIG. 4 is a diagram illustrating another embodiment of a cross-section taken along line A-A in the electronic device of FIG. 2 . In FIG. 4 , the first shielding vertical line 150A, the common electrode line 160 , the insulating layer I1 , the longitudinal signal line 130 , the insulating layer I2 , the filter layer CF, and the insulating layer I3 . and pixel electrodes 144 are sequentially stacked on the substrate 110 . Specifically, the cross section of FIG. 4 is different from the cross section of FIG. 3 in the stacking order of the first shielding vertical line 150A and the common electrode line 160 . Therefore, in the cross section of FIG. 4 , the material of each film layer, the lamination relationship, etc. may refer to the related description of FIG. 3 , and will not be repeated.

5 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100B of FIG. 5 is substantially similar to the electronic device 100A of FIG. 2 , the same members described in the two embodiments may refer to the above description. The electronic device 100B includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150B, and a second shielding. A vertical line 152B may be included. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138 ), the pixel structure 140 , the first shielding vertical line 150B, and the common electrode line 160 may refer to the embodiment of FIG. 2 , which will not be repeatedly described herein. Specifically, this embodiment is different from the embodiment of FIG. 2 in that the electronic device 100B further includes a second vertical shielding line 152B and the length of the first vertical shielding line 150B is designed differently. .

In this embodiment, the first shielding vertical line 150B is positioned between the first longitudinal signal line 132 and the second longitudinal signal line 134 , and the second shielding vertical line 152B is the third longitudinal signal line 132B. It is located between the direction signal line 136 and the fourth longitudinal signal line 138 . That is, the first vertical signal line 132 is located between the first shielding vertical line 150B and the second shielding vertical line 152B, and the third vertical signal line 136 is the first vertical signal line ( 132 and the second shielding vertical line 152B. The pixel structure 140 includes an active element 142 and a pixel electrode 144 , and the second shielding vertical line 152B and the first shielding vertical line 150B are disposed on opposite sides of the pixel electrode 144 . Located. Further, the pixel electrode 144 may extend across the first shielding vertical line 150B and the second shielding vertical line 152B to the second vertical signal line 134 and the fourth vertical signal line 138 . can In some embodiments, the first shielding vertical line 150B and the second shielding vertical line 152B are distributed symmetrically about the pixel structure 140 , for example. That is, the distance from the first shielding vertical line 150B to the central axis of the pixel electrode 144 may be approximately equal to the distance from the second shielding vertical line 152B to the central axis of the pixel electrode 144 , but not limited

In the present embodiment, both the first shielding vertical line 150B and the second shielding vertical line 152B may cross the first line 162 of the common electrode line 160 , but It does not intersect the second line 164 . In some embodiments, the first shielding vertical line 150B and the second shielding vertical line 152B may be spaced apart from the second line 164 by a predetermined distance. However, in other embodiments, the first shielding vertical line 150B and the second shielding vertical line 152B may both cross the first line 162 and overlap the second line 164 . Alternatively, in some other embodiments, both the first shielding vertical line 150B and the second shielding vertical line 152B may overlap the second line 164 , but both are spaced apart from the first line 162 by a certain distance. do. Overall, the first shielding vertical line 150B and the second shielding vertical line 152B can receive a common potential if they can make contact with one or both of the first line 162 and the second line 164, thereby acting as a shielding action. can provide In addition, since the second shielding vertical line 152B may be a transparent conductive pattern, the pixel structure 140 does not reduce the effective display area of the pixel structure 140 due to the installation of the second shielding vertical line 152B. 2 It can be effectively displayed even in the area of the shielding vertical line 152B.

6 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100C of FIG. 6 is substantially similar to the electronic device 100B of FIG. 5 , the same members described in the two embodiments may refer to the above description. The electronic device 100C includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150C, and a second shielding. A vertical line 152C may be included. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150C, the second shielding vertical line 152C, and the common electrode line 160 may refer to the above-described embodiment, where repeated do not explain Specifically, this embodiment is different from the embodiment of FIG. 5 in that the widths of the first vertical shielding line 150C and the second vertical shielding line 152C in the electronic device 100C are different in design.

In the present embodiment, the first shielding vertical line 150C has an extended portion 150C1 and an overlapping portion 150C2, and the extended portion 150C1 includes a first vertical signal line 132 and a second vertical signal line. 134 extends in the gap between the first line 162 of the common electrode line 160 and contacts the first line 162 of the common electrode line 160 , and the overlapping portion 150C2 is connected to the extended portion 150C1 to form a first vertical signal line 132 and overlap In addition, the second shielding vertical line 152C also has an extended portion 152C1 and an overlapping portion 152C2, and the extended portion 152C1 includes a third longitudinal signal line 136 and a fourth longitudinal signal line 138. It extends at a gap therebetween to contact the first line 162 of the common electrode line 160 , and the overlapping portion 152C2 is connected to the extension 152C1 to overlap the third vertical signal line 136 . In the present embodiment, the overlapping portion 150C2 is connected to the middle end of the extension portion 150C1 , and the overlapping portion 152C2 is connected to the middle end of the extension portion 152C1 , but is not limited thereto.

7 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100D of FIG. 7 is substantially similar to the electronic device 100C of FIG. 6 , the same members described in the two embodiments may refer to the above description. The electronic device 100D includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150D, and a second shielding. A vertical line 152D may be included. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, and the common electrode line 160 may refer to the above-described embodiment, and will not be repeated herein. Specifically, the present embodiment is different from the embodiment of FIG. 6 in that the design of the overlapping portion of the first vertical shielding line 150D and the second vertical shielding line 152D in the electronic device 100D is different.

Specifically, the first shielding vertical line 150D has an extended portion 150D1 and an overlapping portion 150D2 , and the extended portion 150D1 has a first vertical signal line 132 and a second vertical signal line 134 . ) to contact the first line 160 of the common electrode line 160 , and the overlapping portion 150D2 is connected to the extension 150D1 to overlap the first vertical signal line 132 . . Also, the overlapping portion 150D2 of the first shielding vertical line 150D may extend toward the second line 164 of the common electrode line 160 to overlap the second line 164 . The second shielding vertical line 152D also has an extended portion 152D1 and an overlapping portion 152D2 , and the extended portion 152D1 is formed between the third vertical signal line 136 and the fourth vertical signal line 138 . It extends from the gap to contact the first line 162 of the common electrode line 160 , and the overlapping portion 152D2 is connected to the extension 152D1 to overlap the third vertical signal line 136 . Also, the overlapping portion 152D2 of the second shielding vertical line 152D may extend toward the second line 164 of the common electrode line 160 to overlap the second line 164 .

8 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100E of FIG. 8 is substantially similar to the electronic device 100B of FIG. 5 , the same members described in the two embodiments may refer to the above description. The electronic device 100E includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150B, and a second shielding. It may include a vertical line 152B and a shielding horizontal line 154E. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150B, and the common electrode line 160 may refer to the embodiment of FIG. 2 for the relative relationship, wherein the first shielding vertical line 150B and the second An installation method of the shielding vertical line 152B may refer to the embodiment of FIG. 5 , and will not be repeated herein. Specifically, this embodiment is different from the embodiment of FIG. 5 in that the electronic device 100E further includes a shielding horizontal line 154E.

The shielding transverse line 154E extends transversely from the first shielding vertical line 150B and crosses the first longitudinal signal line 132 and the third longitudinal signal line 136, the second shielding vertical line ( 152B). Since the shielding horizontal line 154E is connected to the middle end of the first shielding vertical line 150B and connected to the middle end of the second shielding vertical line 152B, the shielding horizontal line 154E, the first shielding vertical line 150B ) and the second shielding horizontal line 152B form an H-shaped pattern. In this embodiment, the pixel electrode 144 of the pixel structure 140 has, for example, a transverse trunk portion MH, and the orthographic projection of the shielding transverse line 154E on the substrate 110 is the substrate 110 . It may overlap with the orthogonal projection of the transverse trunk portion MH in , but is not limited thereto. In addition, since the shielding horizontal line 154E may be a transparent conductive pattern, the pixel structure 140 does not reduce the effective display area of the pixel structure 140 due to the installation of the shielding horizontal line 154E and the shielding horizontal line 154E ) can be displayed effectively even in the area of

In some embodiments, the shielding horizontal line 154E connects the first shielding vertical line 150B and the second shielding horizontal line 152B together, and thus the first shielding vertical line 150B and the second shielding horizontal line 152B. Only one of them may be connected to the common electrode line 160 . For example, only one of the first shielding vertical line 150B and the second shielding horizontal line 152B is connected to the first line 162 of the common electrode line 160 or the second line of the common electrode line 160 . It may be connected to 164 or may be simultaneously connected to the first line 162 and the second line 164 of the common electrode line 160 .

9 is a partial schematic diagram of an electronic device according to an embodiment of the present invention. Since the electronic device 100F of FIG. 9 is substantially similar to the electronic device 100E of FIG. 8 , the same members described in the two embodiments may refer to the above description. The electronic device 100F includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150B, and a second shielding. It may include a vertical line 152B, a shielding horizontal line 154E, and a third shielding vertical line 156F. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, and the common electrode line 160 may refer to the embodiment of FIG. 2, and the installation manner of the first shielding vertical line 150B and the second shielding vertical line 152B. may refer to the embodiment of FIG. 5 , and the installation method of the shielding transverse line 154E may refer to the embodiment of FIG. 8 , which will not be repeated herein.

Specifically, this embodiment is different from the embodiment of FIG. 5 in that the electronic device 100F further includes a third shielding vertical line 156F. The third shielding vertical line 156F is positioned between the first shielding vertical line 150B and the second shielding vertical line 152B. The third shielding vertical line 156F may be connected to the shielding horizontal line 154E, and the third shielding vertical line 156F and the shielding horizontal line 154E may cross to form a cross, but is not limited thereto. In this embodiment, the pixel electrode 144 of the pixel structure 140 has, for example, a longitudinal trunk portion MV and a lateral trunk portion MH, of which the third shielding in the substrate 110 is The orthographic projection of the vertical line 156F may overlap the orthographic projection of the longitudinal trunk portion MV on the substrate 110 , and the orthographic projection of the shielding transverse line 154E on the substrate 110 and the substrate 110 . ) may overlap with the orthogonal projection of the transverse trunk portion MH, but is not limited thereto. In addition, since the shielding horizontal line 154E and the third shielding vertical line 156F may be a transparent conductive pattern, the pixel structure 140 is formed due to the installation of the shielding horizontal line 154E and the third shielding vertical line 156F. The effective display area of the pixel structure 140 does not decrease, and it can be effectively displayed even in the area of the shielding horizontal line 154E.

10 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100G of FIG. 10 is substantially similar to the electronic device 100A of FIG. 2 , the same members described in the two embodiments may refer to the above description. The electronic device 100G includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150A, and a shielding horizontal line. (154G). Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138 ), the pixel structure 140 , the first shielding vertical line 150A, and the common electrode line 160 may refer to the embodiment of FIG. 2 , which will not be repeatedly described herein.

Specifically, this embodiment is different from the embodiment of FIG. 2 in that the electronic device 100G further includes a shielding horizontal line 154G. The shielding horizontal line 154G extends horizontally from the first shielding vertical line 150A to cross the first vertical signal line 132 , and the shielding horizontal line 154G is the first shielding vertical line 150A. connected to the end The orthographic projection of the shielding horizontal line 154G on the substrate 110 may overlap with the orthographic projection of the second line 164 of the common electrode line 160 on the substrate 110 , It is installed so that it can be completely positioned within the orthogonal projection of the second line 164 of the common electrode line 160 .

11 is a diagram illustrating another embodiment of a cross-section taken along line B-B in the electronic device of FIG. 2 . 11, the common electrode line 160, the shielding horizontal line 154G, the insulating layer I1, the vertical signal line 130, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel electrode 144 are sequentially stacked, and the shielding horizontal line 154G and the first shielding vertical line 150A are the same film layer. The material of each film layer in this embodiment may refer to the description of FIGS. 3 and 4, and will not be repeated. In addition, section SEC1 in the cross section of FIG. 11 indicates the stacking order of each film layer when the shielding horizontal line 154G not only overlaps the vertical signal line 130 but also overlaps the common electrode line 160 . At the same time, the section SEC2 represents the stacking order of each film layer when the first shielding vertical line 150A and the shielding horizontal line 154G overlap the common electrode line 160 . Here, the number of film layers in the section SEC2 and the stacking order of the film layers are approximately the same as the cross-sectional structure of FIG. 3 . In the section SEC1 , the shielding horizontal line 154G and the first vertical signal line 132 overlap in the thickness direction. However, the insulating layer I1 is provided between the shielding horizontal line 154G and the first vertical signal line 132 . Accordingly, the shielding horizontal line 154G and the first vertical signal line 132 are not shorted to each other.

12 is a diagram illustrating another embodiment of a cross-section taken along line B-B in the electronic device of FIG. 2 . 12 , a shielding horizontal line 154G, a common electrode line 160, an insulating layer I1, a vertical signal line 130, an insulating layer I2, a filter layer CF, an insulating layer I3, and a pixel electrode 144 are sequentially stacked on the substrate 110 . Specifically, the cross section of FIG. 12 is different from the cross section of FIG. 11 in the stacking order of the shielding horizontal line 154G and the common electrode line 160 . Therefore, in the cross section of FIG. 12 , the material of each film layer, the lamination relationship, etc. may refer to the related description of FIG. 11 , and will not be repeated. In the cross section of FIG. 12 , a section SEC1 indicates the stacking order of each film layer when the shielding horizontal line 154G not only overlaps the vertical signal line 130 but also the common electrode line 160 . At the same time, the section SEC2 indicates the stacking order of each film layer when the first shielding vertical line 150A and the shielding horizontal line 154G overlap the common electrode line 160 . Here, the number of film layers in the section SEC2 and the stacking order of the film layers are approximately the same as the cross-sectional structure of FIG. 4 .

In the section SEC1 of FIGS. 11 and 12 , the overlapping relationship between the shielding horizontal line 154G and the vertical signal line 130 and the stacking order of the film layers may be applied to any of the embodiments of FIGS. 6 to 9 . . For example, when the common electrode line 160 of the section SEC1 is removed, in the embodiment of FIGS. 6 and 7 , the overlapping portions 150C2 and 150D2 have a cross-sectional structure overlapping the first vertical signal line 132 . can see. For example, the cross-sectional structure in which the overlapping portions 150C2 and 150D2 overlap the first vertical signal line 132 is the sequentially stacked substrate 110 , the overlapping portion 150C2 or 150D2 , the insulating layer I1 , and the second 1 may include a vertical signal line 132 , an insulating layer I2 , a filter layer CF, an insulating layer I3 , and a pixel electrode 144 . In the embodiment of FIGS. 6 and 7 , the overlapping portions 152C2 and 152D2 overlap the third longitudinal signal line 134 , and in the embodiment of FIGS. 8 and 9 , the shielding horizontal line 154E is the first It has a cross-sectional structure superimposed on the vertical signal line 132 and the third vertical signal line 135 . For example, the cross-sectional structure in which the overlapping portions 150C2 and 150D2 are overlapped with the third vertical signal line 134 has a sequentially stacked substrate 110 , the overlapping portion 150C2 or 150D2 , the insulating layer I1 , and the first 3 may include a vertical signal line 134 , an insulating layer I2 , a filter layer CF , an insulating layer I3 , and a pixel electrode 144 .

13 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100H of FIG. 13 is substantially similar to the electronic device 100G of FIG. 10 , the same members described in the two embodiments may refer to the above description. The electronic device 100H includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150A, and a shielding horizontal line 154G and a second shielding longitudinal line 152B. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150A, and the common electrode line 160 may refer to the above-described embodiment, and are not repeated herein. Specifically, this embodiment is different from the embodiment of FIG. 10 in that the electronic device 100H further includes a second shielding vertical line 152H.

In this embodiment, the first shielding vertical line 150A is positioned between the first longitudinal signal line 132 and the second longitudinal signal line 134 , and the second shielding vertical line 152H is located in the third longitudinal direction. It is located between the signal line 136 and the fourth longitudinal signal line 138 . The shielding horizontal line 154G is connected between the end of the first shielding vertical line 150A and the end of the second shielding vertical line 152H to form a U-shaped pattern, but is not limited thereto. The pixel structure 140 includes an active element 142 and a pixel electrode 144 , and the first shielding vertical line 150A and the second shielding vertical line 152H are disposed on opposite sides of the pixel electrode 144 . Located. The pixel electrode 144 may cross the first vertical shielding line 150A and the second shielding vertical line 152H. Since both the first shielding vertical line 150A and the second shielding vertical line 152H are made of a transparent conductive material, the region where the first shielding vertical line 150A and the second shielding vertical line 152H are positioned has a pixel structure It is advantageous to ensure the display effect of the electronic device 100H regardless of the display area of the 140 .

In this embodiment, the U-shaped pattern formed by connecting the shielding horizontal line 154G, the first shielding vertical line 150A, and the second shielding vertical line 152H to each other is, for example, the first line of the common electrode line 160 . Not only overlapping 162, but also overlapping second line 164 of common electrode line 160, first shielding vertical line 150A and second shielding vertical line 152H even the first line 162 , but this is not an example. In some embodiments, one or both of the shielding horizontal line 154G, the first shielding vertical line 150A, and the second shielding vertical line 152H may overlap and contact the common electrode line 160 . For example, the first shielding vertical line 150A and the second shielding vertical line 152H is one of the first shielding vertical line 150A and the second shielding vertical line 152H is the first line 162 . The other one may have different lengths so as to be spaced apart from the first line 162 by a predetermined distance. Alternatively, in another embodiment, the shielding horizontal line 154G connected between the first shielding vertical line 150A and the second shielding vertical line 152H may not overlap the second line 164 .

14 is a partial schematic diagram of an electronic device according to an embodiment of the present invention. Since the electronic device 100I of FIG. 14 is substantially similar to the electronic device 100H of FIG. 13 , the same members described in the two embodiments may refer to the above description. The electronic device 100I includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150A, and a shielding horizontal line 154G, a second shielding vertical line 152H, and a shielding transverse line 154E. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150A, and the common electrode line 160 may refer to the above-described embodiment, and are not repeated herein.

Specifically, the present embodiment is different from the embodiment of FIG. 13 in that the electronic device 100H further includes a shielding horizontal line 154E, and the installation method of the shielding horizontal line 154E is the shielding horizontal line of FIG. 8 . (154E) is approximately the same. The shielding transverse line 154E extends transversely from the first shielding vertical line 150A to cross the first longitudinal signal line 132 and the third longitudinal signal line 136, and includes a second shielding vertical line ( 152H). The shielding horizontal line 154E is connected to the middle end of the first shielding vertical line 150A and connected to the middle end of the second shielding vertical line 152H. The pixel electrode 144 of the pixel structure 140 has, for example, a horizontal trunk portion MH and a vertical trunk portion MV, and the horizontal trunk portion MH and the vertical trunk portion MV are Intersecting in a cross shape, the orthographic projection of the shielding horizontal line 154E on the substrate 110 may overlap with the orthographic projection of the horizontal trunk portion MH on the substrate 110 , but is not limited thereto.

15 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100J of FIG. 15 is substantially similar to the electronic device 100I of FIG. 14 , the same members described in the two embodiments may refer to the above description. The electronic device 100J includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150A, and a shielding horizontal line 154G, a second shielding vertical line 152H, a shielding horizontal line 154E, and a third shielding vertical line 156F. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150A, and the common electrode line 160 may refer to the above-described embodiment, and are not repeated herein.

Specifically, this embodiment is different from the embodiment of FIG. 13 in that the electronic device 100H further includes a third shielding vertical line 156F, where the installation method of the third shielding vertical line 156F is shown in FIG. The third shielding vertical line 156F of 9 is approximately the same. The third shielding vertical line 156F is positioned between the first shielding vertical line 150A and the second shielding vertical line 152H. The third shielding vertical line 156F may be connected to the shielding horizontal line 154E, and the third shielding vertical line 156F and the shielding horizontal line 154E cross each other to form a cross, but is not limited thereto. In the present embodiment, the pixel electrode 144 of the pixel structure 140 has, for example, a longitudinal trunk MV and a lateral trunk MH, wherein the third shielding longitudinal line in the substrate 110 . The orthographic projection of 156F may overlap with the orthographic projection of the longitudinal trunk portion MV on the substrate 110 , and the orthographic projection of the shielding transverse line 154E on the substrate 110 is at the substrate 110 . may overlap with the orthogonal projection of the transverse trunk portion MH, but is not limited thereto.

16 is a partial schematic diagram of an electronic device according to an embodiment of the present disclosure; Since the electronic device 100K of FIG. 16 is substantially similar to the electronic device 100H of FIG. 13 , the same members described in the two embodiments may refer to the above description. The electronic device 100K includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150K, and a shielding horizontal line 154G and a second shielding longitudinal line 152K. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150A, and the common electrode line 160 may refer to the above-described embodiment, and are not repeated herein.

Specifically, in this embodiment, the layout method and pattern design of the first shielding vertical line 150K and the second shielding vertical line 152K is the first shielding vertical line 150C and the second shielding vertical line ( 152C). However, in the electronic device 100K, the first shielding vertical line 150K and the second shielding vertical line 152K may extend to overlap the second line 164 of the common electrode line 160, and at two ends may be connected together by shielding transverse lines 154G.

The first shielding vertical line 150K has an extended portion 150K1 and an overlapping portion 150K2. The extension part 150K1 extends at a gap between the first vertical signal line 132 and the second vertical signal line 134 to form the first line 162 and the second line 164 of the common electrode line 160 . ), the overlapping portion 150K2 is connected to the extension portion 150K1 and overlaps the first longitudinal signal line 132 . In addition, the second shielding vertical line 152K also has an extended portion 152K1 and an overlapping portion 152K2, and the extended portion 152K1 includes a third longitudinal signal line 136 and a fourth longitudinal signal line 138. It extends at an interval therebetween to contact the first line 162 of the common electrode line 160 , and the overlapping portion 152K2 is connected to the extension 152K1 and overlaps the third vertical signal line 136 . In the present embodiment, the overlapping portion 150K2 is connected to the middle end of the extension portion 150K1 , and the overlapping portion 152K2 is connected to the intermediate end of the extension portion 152K1 , but is not limited thereto.

17 is a partial schematic diagram of an electronic device according to an embodiment of the present invention. Since the electronic device 100L of FIG. 17 is substantially similar to the electronic device 100H of FIG. 13 , the same members described in the two embodiments may refer to the above description. The electronic device 100L includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical signal lines 130 , a common electrode line 160 , a first shielding vertical line 150L, and a shielding horizontal line 154G and a second shielding longitudinal line 152L. Here, the vertical signal line 130 connects the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth vertical signal line 138 . may include The substrate 110, the horizontal signal line 120, the first vertical signal line 132, the second vertical signal line 134, the third vertical signal line 136, the fourth vertical signal line ( 138), the pixel structure 140, the first shielding vertical line 150A, and the common electrode line 160 may refer to the above-described embodiment, and are not repeated herein.

In this embodiment, the layout method and pattern design of the first shielding vertical line 150L and the second shielding vertical line 152L is the first shielding vertical line 150D and the second shielding vertical line 152D of FIG. 7 and about the same The first shielding vertical line 150L overlaps the extension 150L1 positioned between the first vertical signal line 132 and the second vertical signal line 134 and the first vertical signal line 132 . An overlapping portion 150L2 may be included. The second shielding vertical line 152L overlaps the extension 152L1 positioned between the third vertical signal line 136 and the fourth vertical signal line 138 and the third vertical signal line 136 . An overlapping portion 152L2 may be included. In addition, the end of the first shielding vertical line 150L and the end of the second shielding vertical line 152L are connected together by the shielding horizontal line 154G.

18 is a partial schematic diagram of an electronic device according to an embodiment of the present invention. The electronic device 100M of FIG. 18 includes a substrate 110 , a horizontal signal line 120 , a first vertical signal line 132 , a second vertical signal line 134 , and a third vertical signal line 136 . ), the fourth longitudinal signal line 138 , the pixel structure 140 , the first shielding vertical line 150M, the second shielding vertical line 152M, the shielding electrode 158M, and the first line 162 and the second and a common electrode line 160 including two lines 164 . In this embodiment, the substrate 110 , the horizontal signal line 120 , the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth The vertical signal line 138 , the pixel structure 140 , and the common electrode line 160 are substantially the same as in the embodiment of FIG. 2 , so for the specific structure, material, and relative arrangement relationship of these members, refer to the related description of FIG. 2 . may be, and will not be repeated here.

In FIG. 18 , the vertical projection of the first shielding longitudinal line 150M at the substrate 110 is the vertical projection of the first longitudinal signal line 132 at the substrate 110 and the second longitudinal at the substrate 110 . Located between the vertical projection of the directional signal line 134 , the vertical projection of the second shielding longitudinal line 152M on the substrate 110 is between the vertical projection of the third longitudinal signal line 136 on the substrate 110 and located between the vertical projections of the fourth longitudinal signal line 138 on the substrate 110 . In addition, the first shielding vertical line 150M and the second shielding vertical line 152M are connected to the shielding electrode 158M, and the first shielding vertical line 150M and the second shielding vertical line 152M are horizontally corresponding to each other. It may extend toward the direction signal line 120 and cross the first line 162 of the common electrode line 160 .

The shielding electrode 158M is, for example, a full-surface electrode and traverses the first longitudinal signal line 132 and the third longitudinal signal line 136 . The shielding electrode 158M does not overlap the second longitudinal signal line 134 and the fourth longitudinal signal line 138 and is approximately between the second longitudinal signal line 134 and the fourth longitudinal signal line 138 . is located in The orthographic projection of the shielding electrode 158M on the substrate 110 overlaps the orthographic projection of the pixel electrode 144 of the pixel structure 140 on the substrate 110 . The shielding electrode 158M, the first shielding vertical line 150M, and the second shielding vertical line 152M are integrally connected, and may be made of, for example, a transparent conductive material. Accordingly, the shielding electrode 158M overlaps most of the area of the pixel electrode 144 but does not affect the effective display area of the pixel structure 140 .

19 is a partial schematic diagram of an electronic device according to an embodiment of the present invention. The electronic device 100N of FIG. 19 includes a substrate 110 , a horizontal signal line 120 , a first vertical signal line 132 , a second vertical signal line 134 , and a third vertical signal line 136 . ), a fourth longitudinal signal line 138 , a pixel structure 140 including an active element 142 and a pixel electrode 144 , a first shielding vertical line 150N, a second shielding vertical line 152N and A common electrode line 160 including a first line 162 and a second line 164 is included. In this embodiment, the substrate 110 , the horizontal signal line 120 , the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth The arrangement method, structure, and stacking order of the vertical signal line 138 , the pixel structure 140 , and the common electrode line 160 are approximately the same as those of the embodiment of FIG. 2 , so the related description may refer to the description of FIG. 2 . .

In this embodiment, the orthographic projection of the first shielding vertical line 150N on the substrate 110 is the orthographic projection of the first vertical signal line 132 on the substrate 110 and the second projection of the first vertical signal line 132 on the substrate 110 . Located between the orthographic projections of the vertical signal lines 134 , the orthographic projection of the second shielding vertical lines 152N on the substrate 110 is the positive projection of the third vertical signal lines 136 on the substrate 110 . located between the projection and the orthographic projection of the fourth longitudinal signal line 138 on the substrate 110 . In addition, both the first shielding vertical line 150N and the second shielding vertical line 152N connect the first line 162 and the second line 164 of the horizontal signal line 120 and the common electrode line 160 to each other. traverse and intersect

The horizontal signal line 120 and the common electrode line 160 may be formed of the same film layer, and among them, a signal transmitted by the horizontal signal line 120 is a scan signal provided to the active element 142 , and , the signal carried by the common electrode line 160 is a common potential. The first shielding vertical line 150N and the second shielding vertical line 152N crossing the horizontal signal line 120 and the common electrode line 160 are connected to the horizontal signal line 120 and the common electrode line 160 and to prevent electrical short circuit. Accordingly, the film layers of the first shielding vertical line 150N and the second shielding vertical line 152N may be different from the film layers of the horizontal signal line 120 and the common electrode line 160 . In addition, in the present embodiment, the first shielding vertical line 150N and the second shielding vertical line 152N may be electrically connected to the common electrode line 160 through the conductive structure TH to receive a common potential. not limited In some embodiments, the conductive structure TH in the electronic device 100N may be omitted, and the first shielding vertical line 150N and the second shielding vertical line 152N are connected to the driving circuit ( For example, it may extend to the driving circuit (IC) shown in FIG. 1 , and a potential necessary for the first shielding vertical line 150N and the second shielding vertical line 152N may be directly provided by the driving circuit.

20 schematically illustrates an embodiment of a cross-sectional structure taken along line C-C of the electronic device of FIG. 19 , and FIG. 21 schematically illustrates an embodiment of a cross-sectional structure taken along line D-D of the electronic device of FIG. 19 . do. 19, 20 and 21 , a first shielding vertical line 150N, an insulating layer I0, a common electrode line 160, an insulating layer I1, a first longitudinal signal line 132, an insulating layer It can be seen that (I2), the filter layer (CF), the insulating layer (I3), and the pixel electrode 144 are sequentially stacked on the substrate 110 . Materials of the insulating layer I0, the insulating layer I1, the insulating layer I2, and the insulating layer I3 may include an inorganic insulating material or an organic insulating material, among which the inorganic insulating material is silicon oxide, silicon Nitride or silicon oxynitride, and organic insulating materials include polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI). The material of the filter layer CF may include a color filter material such as a red filter material, a green filter material, and a blue filter material. The material of the common electrode line 160 and the first longitudinal signal line 132 includes a metal or an alloy. The material of the first shielding vertical line 150N and the pixel electrode 144 includes a transparent conductive material. In addition, the film layer of the transverse signal line 120 of FIG. 19 is the same as the film layer of the common electrode line 160 , and the second shielding vertical line 152N in FIG. 19 is laminated in the cross-sectional structure of the first It may be the same as the shielding vertical line 150N.

As can be seen in FIG. 20 , the conductive structure TH may electrically connect the first shielding vertical line 150N and the first line 162 of the common electrode line 160 , and the conductive structure TH is It can be seen that the conductive structure penetrates the insulating layer I0. As such, the film layer of the first shielding vertical line 150N is different from the film layer of the common electrode line 160 , but may be electrically connected to the common electrode line 160 . When the film layers of the common electrode line 160 and the horizontal signal line 120 are the same, the first shielding vertical line 150N is not connected to the horizontal signal line 120 , but the horizontal signal line 120 is not connected to the horizontal signal line 120 . Electrical characteristics independent of the common electrode line 160 may be maintained.

22 schematically illustrates another embodiment of a cross-sectional structure taken along a line C-C of the electronic device of FIG. 19 , and FIG. 23 schematically illustrates another embodiment of a cross-sectional structure taken along a line D-D of the electronic device of FIG. 19 . 19, 22 and 23 , the common electrode line 160, the insulating layer I1, the first shielding vertical line 150N, the insulating layer I2, the filter layer CF, the insulating layer I3, and the pixel It can be seen that the electrodes 144 are sequentially stacked on the substrate 110 . The film layer of the transverse signal line 120 of FIG. 19 is the same as the film layer of the common electrode line 160, and the second shielding vertical line 152N in FIG. 19 is laminated in the cross-sectional structure of the first shielding vertical It may be the same as the line 150N. In this embodiment, the material of each film layer may refer to the related description of FIGS. 20 and 21 .

In FIG. 22 , the channel structure TH may electrically connect the first shielding vertical line 150N and the first line 162 of the common electrode line 160 , and the conductive structure TH includes the insulating layer I1 . It can be seen that it is a penetrating conductive structure. As such, the film layer of the first shielding vertical line 150N is different from the film layer of the common electrode line 160 , but may be electrically connected to the common electrode line 160 . When the film layers of the common electrode line 160 and the horizontal signal line 120 are the same, the first shielding vertical line 150N is not connected to the horizontal signal line 120 , but is not connected to the horizontal signal line 120 and the horizontal signal line 120 . The common electrode line 160 may maintain electrical characteristics independent of each other.

Further, in this embodiment, both the first vertical signal line 132 and the first shielding vertical line 150N are interposed between the insulating layer I1 and the insulating layer I2. However, the first vertical signal line 132 and the first shielding vertical line 150N may be manufactured using different film layers. Accordingly, the first longitudinal signal line 132 and the first shielding vertical line 150N may be members of different materials. For example, the material of the first vertical signal line 132 may include a material such as a metal or an alloy, and the material of the first shielding vertical line 150N is a transparent conductive material such as a metal oxide and an organic conductive material. may include

FIG. 24 schematically shows another embodiment of a cross-sectional structure taken along line C-C of the electronic device of FIG. 19 , and FIG. 25 schematically shows another embodiment of a cross-sectional structure of the electronic device of FIG. 19 taken along line D-D do. 19, 24 and 25, the first line 162 and the second line 164 of the common electrode line 160, the insulating layer I1, the first longitudinal signal line 132, the insulating layer ( It can be seen that I2), the first shielding vertical line 150N, the filter layer CF, the insulating layer 13 and the pixel electrode 144 are sequentially stacked on the substrate 110 . The film layer of the transverse signal line 120 in FIG. 19 is the same as the film layer of the common electrode line 160, and the second shielding vertical line 152N in FIG. 19 is laminated in the cross-sectional structure of the first shielding method It may be the same as the vertical line 150N. In this embodiment, the material of each film layer may refer to the related description of FIGS. 20 and 21 . In this embodiment, the film layer of the first shielding vertical line 150N is installed on the insulating layer I2 , and the film layer of the common electrode line 160 is installed under the insulating layer I1 . Accordingly, the conductive structure TH for electrically connecting the first shielding vertical line 150N to the common electrode line 160 may penetrate the insulating layer I1 and the insulating layer I2 .

20, 22, and 24 each show an embodiment in which the first shielding vertical line 150N is in a different stacking order, but the present disclosure is not limited thereto. In addition, in some embodiments, the conductive structure TH may be omitted, and the first shielding vertical line 150N and the second shielding vertical line 152N are driving installed around the electronic device 100N to receive a necessary signal. circuit can be extended.

26 is a plan view illustrating an electronic device according to an embodiment of the present disclosure; The electronic device 100O of FIG. 26 includes a substrate 110 , a horizontal signal line 120 , a first vertical signal line 132 , a second vertical signal line 134 , and a third vertical signal line 136 . ) and a fourth longitudinal signal line 138 , a pixel structure 140 comprising an active element 142 and a pixel electrode 144 , a first shielding vertical line 150O, a second shielding vertical line 152O; A common electrode line 160 including a first line 162 and a second line 164 is included. In this embodiment, the substrate 110 , the horizontal signal line 120 , the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth The arrangement method, structure, and stacking order of the vertical signal line 138 , the pixel structure 140 , and the common electrode line 160 are approximately the same as in the embodiment of FIG. can refer to

In this embodiment, the orthographic projection of the first shielding vertical line 150O on the substrate 110 is the orthographic projection of the first vertical signal line 132 on the substrate 110 and the second projection of the first vertical signal line 132 on the substrate 110 . Located between the orthographic projection of the longitudinal signal line 134 , the orthographic projection of the second shielding vertical line 1520 on the substrate 110 is the orthographic projection of the third longitudinal signal line 136 on the substrate 110 . and the orthographic projection of the fourth longitudinal signal line 138 on the substrate 110 . The first shielding vertical line 150O and the second shielding vertical line 1520 do not overlap the horizontal signal line 120 and do not overlap the second line 164 of the common electrode line 160 .

In addition, the first vertical shielding line 150O and the second shielding vertical line 152O may be different from the film layer of the common electrode line 160 . The first shielding vertical line 150O and the second shielding vertical line 152O may be connected to the first line 162 of the common electrode line 160 through a conductive structure to receive a common potential. Specifically, the stacking method of the first shielding vertical line 150O and the second shielding vertical line 1520 in the cross-sectional structure may refer to the description of FIGS. 20 to 24 . That is, the cross-sectional structure of FIGS. 20 to 24 may be used as an embodiment of the electronic device 100O.

27 is a plan view illustrating an electronic device according to an embodiment of the present disclosure; The electronic device 100P of FIG. 27 includes a substrate 110 , a horizontal signal line 120 , a first vertical signal line 132 , a second vertical signal line 134 , and a third vertical signal line 136 . ), a fourth longitudinal signal line 138 , a pixel structure 140 including an active element 142 and a pixel electrode 144 , a first shielding vertical line 150P, a second shielding vertical line 152P; and a common electrode line 160 including a shielding horizontal line 154P and a first line 162 and a second line 164 . In this embodiment, the substrate 110 , the horizontal signal line 120 , the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth The arrangement method, structure, and stacking order of the vertical signal line 138 , the pixel structure 140 , and the common electrode line 160 are approximately the same as in the embodiment of FIG. can refer to

In the present embodiment, the orthographic projection of the first shielding vertical line 150P on the substrate 110 is the orthographic projection of the first vertical signal line 132 on the substrate 110 and the second projection of the first vertical signal line 132 on the substrate 110 . Located between the orthographic projection of the longitudinal signal line 134 , the orthographic projection of the second shielding vertical line 152P on the substrate 110 is the orthographic projection of the third longitudinal signal line 136 on the substrate 110 . and the orthographic projection of the fourth longitudinal signal line 138 on the substrate 110 . The shielding horizontal line 154P extends in the horizontal direction from the first shielding vertical line 150P to cross the first vertical signal line 132 and the third vertical signal line 136, and the shielding horizontal line 154P. is connected between the first shielding vertical line 150P and the second shielding vertical line 152P. Also, the orthographic projection of the shielding horizontal line 154P on the substrate 110 may overlap the orthographic projection of the second line 164 of the common electrode line 160 on the substrate 110 .

28 schematically illustrates an embodiment of a cross-sectional structure taken along line E-E of the electronic device of FIG. 27 . 27 and 28, the first shielding vertical line 150P and the shielding horizontal line 154P, the insulating layer I0, the common electrode line 160, the insulating layer I1, and the first vertical signal line 132 in FIGS. , it can be seen that the insulating layer I2 , the filter layer CF, the insulating layer 13 , and the pixel electrode 144 are sequentially stacked on the substrate 110 . The insulating layer I0, the insulating layer I1, the insulating layer I2, and the insulating layer I3 may include an inorganic insulating material or an organic insulating material, and the inorganic insulating material is silicon oxide, silicon nitride, or silicon. and the like, and the organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI). The material of the filter layer CF may include a color filter material such as a red filter material, a green filter material, and a blue filter material. The material of the common electrode line 160 and the first longitudinal signal line 132 includes a metal or an alloy. The material of the first shielding vertical line 150P, the shielding horizontal line 154P, and the pixel electrode 144 includes a transparent conductive material. In addition, the film layer of the horizontal signal line 120 of FIG. 27 is the same as the film layer of the common electrode line 160 , and the second shielding vertical line 152P in FIG. 27 is laminated in the cross-sectional structure of the first It may be the same as the shielding vertical line 150P. Also, it can be seen that the shielding horizontal line 154P and the first vertical signal line 132 overlap in the thickness direction D3 in FIG. 28 .

29 schematically illustrates an embodiment of a cross-sectional structure taken along line E-E of the electronic device of FIG. 27 . 27 and 29, the common electrode line 160, the insulating layer I1, the first longitudinal signal line 132, the insulating layer I2, the first shielding vertical line 150P, and the shielding horizontal line 154P. , it can be seen that the filter layer CF, the insulating layer I3 and the pixel electrode 144 are sequentially stacked on the substrate 110 . Materials of the insulating layer (I1), the insulating layer (I2), and the insulating layer (I3) may include an inorganic insulating material or an organic insulating material, and the inorganic insulating material includes silicon oxide, silicon nitride or silicon nitride, etc.; The organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI) and the like. The material of the filter layer CF may include a color filter material such as a red filter material, a green filter material, and a blue filter material. The material of the common electrode line 160 and the first longitudinal signal line 132 includes a metal or an alloy. The material of the first shielding vertical line 150P, the shielding horizontal line 154P, and the pixel electrode 144 includes a transparent conductive material. In addition, the film layer of the transverse signal line 120 of FIG. 27 is the same as the film layer of the common electrode line 160 , and the second shielding vertical line 152P in FIG. 27 is laminated in the cross-sectional structure of the first It may be the same as the shielding vertical line 150P. In this embodiment, the shielding horizontal line 154P overlaps the first vertical signal line 132 in the thickness direction D3, and the film layer of the shielding horizontal line 154P and the first vertical signal line 132 are formed. At least an insulating layer I2 is provided between the film layers. As such, the shielding horizontal line 154P intersects the first longitudinal signal line 132, but the two lines are not electrically connected.

30 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure; The electronic device 100Q of FIG. 30 includes a substrate 110 , a horizontal signal line 120 , a first vertical signal line 132 , a second vertical signal line 134 , and a third vertical signal line 136 . ), a fourth longitudinal signal line 138 , a pixel structure 140 including an active element 142 and a pixel electrode 144 , a first shielding vertical line 150Q, a second shielding vertical line 152Q; and a common electrode line 160 including a shielding horizontal line 154G and a first line 162 and a second line 164 . In this embodiment, the substrate 110 , the horizontal signal line 120 , the first vertical signal line 132 , the second vertical signal line 134 , the third vertical signal line 136 , and the fourth The arrangement method, structure, and stacking order of the vertical signal line 138 , the pixel structure 140 , and the common electrode line 160 are approximately the same as those of the embodiment of FIG. 27 , so the related description may refer to the description of FIG. 27 . .

In this embodiment, the first shielding vertical line 150Q is located between the first longitudinal signal line 132 and the second longitudinal signal line 134 , and the second shielding vertical line 152Q is located in the third longitudinal direction. It is located between the signal line 136 and the fourth longitudinal signal line 138 . The first shielding vertical line 150Q and the second shielding vertical line 152Q may be electrically connected to the first line 162 of the common electrode line 160 through the conductive structure TH, respectively. The first shielding vertical line 150Q and the second shielding vertical line 152Q do not overlap the horizontal signal line 120 , and the shielding horizontal line 154G is connected to the end of the first shielding vertical line 150Q and the second It is connected between the ends of the shielding vertical line 152Q to form a U-shaped pattern, but is not limited thereto. Also, the shielding horizontal line 154G may overlap the second line 164 of the common electrode line 160 . The cross-sectional structure of the first shielding vertical line 150Q, the second shielding vertical line 152Q, and the shielding horizontal line 154G is the first shielding vertical line 150P and the second shielding vertical line 152P in FIGS. 28 and 29 . ) and the shielding horizontal line 154P may be the same.

31 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure; 31 shows the substrate 210 , the first vertical signal line 232 , the second vertical signal line 234 , the third vertical signal line 236 , and the pixel structure 240 of the electronic device 200A. A pixel electrode 244 , a first shielding vertical line 250A and a second shielding vertical line 252A are shown. Specifically, the electronic device 200A may be configured in the structure array arrangement shown in FIG. 31 , and the electronic device 200A further includes line and circuit structures such as lateral signal lines and active elements of the pixel structure 240 . may be included, but in order to clearly explain the installation of the longitudinal line, FIG. 31 indicates the positions of these members with an abbreviation block (BK). In some embodiments, the arrangement method of the transverse signal line and the active element may refer to the description of the embodiment, such as FIG. 2 , but is not limited thereto.

In this embodiment, the pixel electrode 244 may include a first sub-electrode 244A and a second sub-electrode 244B, and the first sub-electrode 244A and the second sub-electrode 244B are omitted, respectively. (BK) located on opposite sides of each other. The first longitudinal signal line 232 and the third longitudinal signal line 236 are positioned around the pixel electrode 244 . The second longitudinal signal line 234 approximately overlaps the central trunk portion MV of the first sub-electrode 244A of the pixel electrode 244 . Specifically, the orthographic projection of the second longitudinal signal line 234 on the substrate 210 approximately overlaps with the center line of the orthographic projection of the first sub-electrode 244A on the substrate 110 , and the substrate 110 . It overlaps with the center line of the orthographic projection of the second sub-electrode 244B in . The first shielding vertical line 250A and the second shielding vertical line 252A are respectively positioned on opposite sides of the pixel electrode 244 . At the same time, the vertical projection of the first shielding longitudinal line 250A on the substrate 210 is the vertical projection of the first longitudinal signal line 232 on the substrate 210 and the second longitudinal signal on the substrate 210 . Located between the vertical projection of the line 234 , the vertical projection of the second shielding longitudinal line 252A on the substrate 210 is the vertical projection of the third longitudinal signal line 236 on the substrate 210 and the vertical projection of the third longitudinal signal line 236 on the substrate 210 . located between the vertical projections of the second longitudinal signal line 234 at 210 .

32 is an exemplary embodiment illustrating a cross-section of a position where the first shielding vertical line 250A is positioned in the electronic device 200A of FIG. 31 . 32 , it can be seen that the first shielding vertical line 250A, the insulating layer I1 , the insulating layer I2 , and the pixel electrode 244 may be sequentially stacked on the substrate 210 . Materials of the insulating layer I1 and the insulating layer I2 may include an inorganic insulating material or an organic insulating material, among which the inorganic insulating material includes silicon oxide, silicon nitride, silicon nitroxide, or the like, and an organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI). The material of the first shielding vertical line 250A and the pixel electrode 244 may include a transparent conductive material. In addition, the film layers of the first longitudinal signal line 232 , the second longitudinal signal line 234 , and the third longitudinal signal line 236 in FIG. 31 are disposed between the insulating layer I1 and the insulating layer I2 . In FIG. 31 , the stacking method of the second shielding vertical line 252A in the cross-sectional structure may be the same as that of the first vertical shielding line 250A.

FIG. 33 schematically shows another embodiment of a cross-section of a position where the first shielding vertical line 250A is located in the electronic device 200A of FIG. 31 . 33 , a first shielding vertical line 250A, an insulating layer I1 , an insulating layer I2 , and a pixel electrode 244 may be sequentially stacked on a substrate 210 , and the insulating layer I2 and the pixel It can be seen that a filter layer CF and a third insulating layer I3 may be further disposed between the electrodes 244 . In this embodiment, materials of the insulating layer I1, the insulating layer I2, and the insulating layer I3 may include an inorganic insulating material or an organic insulating material, and the inorganic insulating material is silicon oxide, silicon nitride, silicon nitroxide, etc. and, the organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI). The material of the filter layer CF may include a color filter material such as a red filter material, a green filter material, and a blue filter material. The material of the first shielding vertical line 250A and the pixel electrode 244 may include a transparent conductive material. In addition, the film layers of the first longitudinal signal line 232 , the second longitudinal signal line 234 , and the third longitudinal signal line 236 in FIG. 31 are disposed between the insulating layer I1 and the insulating layer I2 . In FIG. 31 , the stacking method of the second shielding vertical line 252A in the cross-sectional structure may be the same as that of the first vertical shielding line 250A.

In FIG. 33 , the film layer of the first shielding vertical line 250A is positioned between the insulating layer I1 and the substrate 210 . In some embodiments, the first shielding vertical line 250A and the transverse signal line (not shown) may be composed of successively stacked film layers, so that the first shielding vertical line 250A is the transverse signal line ( not shown) may be connected. Also, in another embodiment, the film layer of the first shielding vertical line 250A may be selectively positioned between the insulating layer I2 and the filter layer CF or between the filter layer CF and the insulating layer I3 .

34 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure; 34 shows a substrate 210 , a first longitudinal signal line 232 , a second longitudinal signal line 234 , a third longitudinal signal line 236 , and a pixel structure 240 of the electronic device 200B. Pixel electrode 244 , first shielding vertical line 250B and second shielding vertical line 252B are shown. Specifically, the electronic device 200B may be configured in the structure array arrangement shown in FIG. 34 , wherein the electronic device 200B further includes line and circuit structures such as lateral signal lines and active elements in the pixel structure 240 . However, in order to more clearly explain the installation of the longitudinal lines, Fig. 34 shows the positions of these members with an abbreviation block BK. In some embodiments, the arrangement method of the transverse signal line and the active element may refer to the description of the embodiment, such as FIG. 2 .

Since the electronic device 200B is similar to the electronic device 200A, in the two embodiments, the same element code indicates the same member and may refer to each other. Specifically, the electronic device 200B is different from the electronic device 200A mainly in the layout method of the first shielding vertical line 250B and the second shielding vertical line 252B. In the present embodiment, the pixel electrode 244 may include a first sub-electrode 244A and a second sub-electrode 244B, and the first sub-electrode 244A and the second sub-electrode 244B are in the omitted block. Located on opposite sides of each other, the first vertical shielding line 250B and the second vertical shielding line 252B do not overlap the first sub-electrode 244B. That is, the first shielding vertical line 250B and the second shielding vertical line 252B overlap only the second sub-electrode 244A. The first vertical shielding line 250B and the second vertical shielding line 252B are positioned on opposite sides of the first sub-electrode 244A. The first shielding vertical line 250B is positioned between the first longitudinal signal line 232 and the second longitudinal signal line 234 , and the second shielding vertical line 252B is the second longitudinal signal line 234 . and the third longitudinal signal line 236 . For the stacking order in the cross-section of the first shielding vertical line 250B and the second shielding vertical line 252B, reference may be made to the description of the first shielding vertical line 250A in FIGS. 32 and 33 .

35 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure; 34 shows the substrate 210, the first vertical signal line 232, the second vertical signal line 234, the third vertical signal line 236, and the pixel structure 240 of the electronic device 200C. A pixel electrode 244 , a first shielding vertical line 250C and a second shielding vertical line 252C are shown. In detail, since the electronic device 200C is similar to the electronic device 200A, in both embodiments, the same element code indicates the same member and may refer to each other.

The electronic device 200C is different from the electronic device 200A mainly in the layout method of the first shielding vertical line 250C and the second shielding vertical line 252C. In the present embodiment, the pixel electrode 244 may include a first sub-electrode 244A and a second sub-electrode 244B, and the first sub-electrode 244A and the second sub-electrode 244B are in the omitted block. Located on opposite sides of each other, the first vertical shielding line 250C and the second vertical shielding line 252C do not overlap the first sub-electrode 244A. That is, the first vertical shielding line 250C and the second vertical shielding line 252C overlap only the second sub-electrode 244B. The first shielding vertical line 250C and the second shielding vertical line 252C are positioned on opposite sides of the second sub-electrode 244B. The first shielding vertical line 250C is positioned between the first longitudinal signal line 232 and the second longitudinal signal line 234 , and the second shielding vertical line 252C is the second longitudinal signal line 234 . and the third longitudinal signal line 236 . For the stacking order in the cross-section of the first shielding vertical line 250C and the second shielding vertical line 252C, reference may be made to the description of the first shielding vertical line 250A in FIGS. 32 and 33 .

36 is a schematic partial plan view of an electronic device according to an embodiment of the present disclosure; 36 shows the substrate 310, the first longitudinal signal line 332, the second longitudinal signal line 334, the third longitudinal signal line 336, and the pixel structure 340 of the electronic device 300A. A pixel electrode 344, a first shielding vertical line 350A, and a second shielding vertical line 352A are shown. Specifically, the electronic device 300A may be configured in the structure array arrangement shown in FIG. 36 , wherein the electronic device 300A further includes line and circuit structures such as lateral signal lines and active elements of the pixel structure 240 . may be included, but in order to clearly explain the installation of the longitudinal line, FIG. 36 indicates the position of these members with an abbreviation block (BK). In some embodiments, the arrangement method of the transverse signal line and the active element may refer to the description of the embodiment, such as FIG. 2 .

36 shows two pixel structures 340 , wherein the first longitudinal signal line 332 , the second longitudinal signal line 334 and the third longitudinal signal line 336 have the two pixel structures 340 . ) is located between The second longitudinal signal line 334 is located between the first longitudinal signal line 332 and the third longitudinal signal line 336 . In the present embodiment, the vertical projection of the first shielding longitudinal line 350A at the substrate 310 is the vertical projection of the first longitudinal signal line 332 at the substrate 310 and the second at the substrate 310 . Located between the vertical projections of the longitudinal signal line 334 , the vertical projection of the second shielding longitudinal line 352A on the substrate 310 is the vertical projection of the second longitudinal signal line 334 on the substrate 310 . and the vertical projection of the third longitudinal signal line 336 on the substrate 310 . Accordingly, the vertical projection of the first shielding vertical line 350A on the substrate 310 is outside the vertical projection of the pixel electrode 344 on the substrate 310 , and the second shielding vertical line 352A on the substrate 310 is located outside the vertical projection of the pixel electrode 344 on the substrate 310 . ) lies outside the vertical projection of the pixel electrode 344 on the substrate 310 .

In this embodiment, the first shielding vertical line 350A and the second shielding vertical line 352A are, for example, both transparent wirings. That is, the first shielding vertical line 350A and the second shielding vertical line 352A are made of a transparent conductive material. Further, the pixel electrode 344 is also made of a transparent material. In some embodiments, the pixel electrode 344 , the first shielding vertical line 350A, and the second shielding vertical line 352A may be the same film layer, while in other embodiments the film layer of the pixel electrode 344 is the first It may be different from the film layer of the shielding vertical line 350A and the second shielding vertical line 352A.

37 schematically illustrates an embodiment of a cross-sectional structure in which the first shielding vertical line 350A is positioned in the electronic device 300 . 37 , it can be seen that the insulating layer I1 , the insulating layer I2 , the first shielding vertical line 350A, and the insulating layer I3 may be sequentially stacked on the substrate 310 . Materials of the insulating layer I1, the insulating layer I2, and the insulating layer I3 may include an inorganic insulating material or an organic insulating material, among which the inorganic insulating material is silicon oxide, silicon nitride or silicon nitroxide. and the organic insulating material includes polymethyl methacrylate (PMMA), polyvinyl alcohol (PVA), polyvinyl phenol (PVP) or polyimide (PI). The first shielding vertical line 350A disposed between the insulating layer I2 and the insulating layer I3 may be made of, for example, a transparent conductive material. In this embodiment, the film layers of the first longitudinal signal line 332 , the second longitudinal signal line 334 and the third longitudinal signal line 336 are interposed between the insulating layer I1 and the insulating layer I2 . may be positioned, and the film layer of the transverse signal line (not shown) may be positioned between the substrate 310 and the insulating layer I1 . Also, a film layer of the pixel electrode 344 may be provided on the insulating layer I3 . That is, the insulating layer I3 may be provided between the film layer of the pixel electrode 344 and the film layer of the first shielding vertical line 350A.

38 schematically illustrates another embodiment of a cross-sectional structure in which the first shielding vertical line 350A of the electronic device 300 is positioned. Since the cross-sectional structure of FIG. 38 is similar to the cross-sectional structure of FIG. 37, the same elements are denoted by the same element symbols in both embodiments. 38 , it can be seen that the insulating layer I1 , the insulating layer I2 , the first shielding vertical line 350A, the filter layer CF, and the insulating layer I3 may be sequentially stacked on the substrate 310 . . For a description of the stacking order and material of the insulating layer I1 , the insulating layer I2 , the first shielding vertical line 350A, and the insulating layer I3 , reference may be made to the related description of FIG. 37 . The material of the filter layer CF may include a color filter material such as a red filter material, a green filter material, and a blue filter material.

39 schematically shows another embodiment of a cross-sectional structure of an electronic device 300 . In FIG. 39, in addition to showing the first vertical signal line 332, the pixel electrode 344, and the first shielding vertical line 350A of FIG. 36, the horizontal signal line 320 installed in the omitted block BK is also shown. A stacking relationship of each member in the electronic device 300 will be described with reference to FIG. In FIG. 39 , a horizontal signal line 320 , an insulating layer I1 , a first vertical signal line 332 , an insulating layer I2 , and a pixel electrode 344 are sequentially stacked on a substrate 310 , and a pixel It can be seen that the electrode 344 and the first longitudinal signal line 332 are the same film layer.

As described above, in the electronic device according to the embodiment of the present invention, a shielding line (eg, a first shielding vertical line, a second shielding vertical line, etc.) is installed between different signal lines. The shielding line may be connected to a common potential to provide a signal shielding action, thereby reducing interference between the signal lines. Accordingly, the electronic device of the embodiment of the present disclosure may have a relatively desirable quality.

Of course, the present invention may have other various embodiments, and those of ordinary skill in the art may make various corresponding changes and modifications according to the present invention within the scope without departing from the spirit and essence of the present invention. and such corresponding changes and modifications are intended to fall within the protection scope of the claims appended hereto.

Industrial Applicability

In the electronic device according to an embodiment of the present invention, a shielding wiring is installed between adjacent lines for transmitting different signals to reduce adverse effects due to coupling between lines. Also, in some embodiments, the shielding wiring may be a transparent wiring. Therefore, when the screen is displayed using the electronic device, the display aperture ratio may not be reduced because it is not affected by the shielding wiring.

100`, 100A to 100Q, 200A to 200C, 300 electronic devices
110, 210, 310 substrate
120, 320 horizontal signal line
130, DL, VL, VL1, VL2 vertical signal line
132, 232, 332 first longitudinal signal line
134, 234, 334 second longitudinal signal line
136, 236, 336 third longitudinal signal line
138 Fourth longitudinal signal line
140, 240 and 340 pixel structures
142 active element
144, 244, 344 pixel electrodes
150A to 150D, 150K, 150L to 150Q, 250A to 250C, 350A 1st shielding vertical line
150C1, 152C1, 150D1, 152D1, 150K1, 152K1, 150L1, 152L1 Extension
150C2, 152C2, 150D2, 152D2, 150K2, 152K2, 150L2, 152L2 overlap
152B to 152E, 152K to 152Q, 252A to 252C Second shielded vertical line
154E, 154G, 154P turn horizontal line
156F Third Shielding Vertical Line
158M shielded electrode
160 common electrode line
162 first line
164 second line
244A first sub-electrode
244B second sub-electrode
AA, BB, CC, DD, EE section line
BK omitted block
CF filter layer
D1 first direction
D2 second direction
D3 thickness direction
I0 ~ I3 insulating layer
MH transverse trunk section
MV vertical trunk
TH, VIA conductive structure
SEC1, SEC2 section
ST stripe part

Claims (20)

In an electronic device,
board and
a plurality of transverse signal lines disposed on the substrate;
a first insulating layer disposed on the substrate and a first conductive structure penetrating the first insulating layer;
a first vertical signal line disposed on the substrate and crossing the plurality of horizontal signal lines;
a second longitudinal signal line disposed on the substrate, intersecting the plurality of transverse signal lines, and connected to one of the plurality of transverse signal lines through the first conductive structure;
a first shield disposed on the substrate, wherein a vertical projection on the substrate is between a vertical projection of the first longitudinal signal line on the substrate and a vertical projection of the second longitudinal signal line on the substrate As a vertical line,
The plurality of horizontal signal lines extend in a first direction, wherein each of the first vertical signal line, the second vertical signal line, and the first shielding vertical line extends along a second direction, The first direction and the second direction cross each other, the first shielding vertical line,
A common electrode line disposed on the substrate, wherein the common electrode line is positioned between two adjacent to each other of the plurality of transverse signal lines and extends in the first direction, and the first shielding vertical line comprises the electrically connected to a common electrode line, the common electrode line including a first line and a second line, the first line and the second line being positioned between two directly adjacent transverse signal lines, Each of the first line and the second line extends along the first direction, the common electrode line
An electronic device comprising a. The method of claim 1,
and a plurality of pixel structures disposed on the substrate, wherein one of the plurality of pixel structures is positioned between adjacent two of the plurality of horizontal signal lines and is disposed on one side of the second vertical signal line. and a pixel electrode positioned on the , wherein the pixel electrode overlaps the first vertical signal line or the second vertical signal line in a direction perpendicular to the substrate. 3. The method of claim 2,
The pixel electrode overlaps the first shielding vertical line. 3. The method of claim 2,
wherein the pixel electrode crosses the second longitudinal signal line, the pixel electrode has a central trunk, and the second longitudinal signal line overlaps the central trunk. The method of claim 1,
The first shielding vertical line is an electronic device, characterized in that the transparent wiring. The method of claim 1,
and the common electrode line crosses the first vertical signal line and the second vertical signal line. The method of claim 1,
The first shielding vertical line is directly stacked on the common electrode line. The method of claim 1,
The first insulating layer is disposed between the first vertical shielding line and the common electrode line, and another first conductive structure electrically connects the first vertical shielding line and the common electrode line. . The method of claim 1,
and a plurality of pixel structures disposed on the substrate, wherein one of the plurality of pixel structures includes a pixel electrode positioned between adjacent two of the plurality of transverse signal lines, the first shielding The film layer of the vertical line is positioned between the film layer of the common electrode line and the film layer of the pixel electrode. The method of claim 1,
a plurality of pixel structures disposed on the substrate, wherein one of the plurality of pixel structures includes a pixel electrode positioned between adjacent two of the plurality of transverse signal lines, the common electrode line The film layer of the electronic device, characterized in that located between the film layer of the first shielding vertical line and the film layer of the pixel electrode. The method of claim 1,
The first shielding vertical line overlaps the first line, the second line, or both lines. The method of claim 1,
The electronic device further comprising a second shielding vertical line, wherein the first vertical signal line is positioned between the first vertical shielding line and the second shielding vertical line. 13. The method of claim 12,
The electronic device of claim 1, further comprising: a third vertical signal line, wherein the third vertical signal line is positioned between the first vertical signal line and the second shielding vertical line. 14. The method of claim 13,
and a fourth longitudinal signal line, wherein the vertical projection of the first longitudinal signal line and the third longitudinal signal line on the substrate is equal to the vertical projection of the second longitudinal signal line on the substrate and the and located between the vertical projections of the fourth longitudinal signal line on the substrate. The method of claim 1,
The electronic device of claim 1, further comprising a shielding electrode connected to the first shielding vertical line. The method of claim 1,
The first shielding vertical line is positioned between two adjacent to each other of the plurality of horizontal signal lines. The method of claim 1,
further comprising a plurality of pixel structures disposed on the substrate, wherein one of the plurality of pixel structures comprises a pixel electrode, wherein the vertical projection of the first shielding vertical line on the substrate is the pixel electrode at the substrate An electronic device characterized in that it does not overlap with the vertical projection of The method of claim 1,
further comprising a plurality of pixel structures and a third longitudinal signal line, wherein the plurality of pixel structures are disposed in an array on the substrate, wherein the second longitudinal signal line comprises the third longitudinal signal line and the first is located between vertical signal lines, and the first vertical signal line, the second vertical signal line and the third vertical signal line are located between two adjacent rows of the plurality of pixel structures. electronic device. 19. The method of claim 18,
and a second shielding vertical line disposed on the substrate, wherein a vertical projection of the second shielding vertical line on the substrate comprises a vertical projection of the second vertical signal line on the substrate and the vertical projection of the second vertical signal line on the substrate. An electronic device located between the vertical projections of the third longitudinal signal line. The method of claim 1,
and a plurality of pixel structures disposed on the substrate, wherein one of the plurality of pixel structures includes a pixel electrode positioned between adjacent two of the plurality of transverse signal lines, the first shielding The electronic device according to claim 1, wherein the film layer of the vertical line is positioned below the film layer of the pixel electrode.

Images