KR102391780B1 - 감광성 조성물 - Google Patents

감광성 조성물 Download PDF

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Publication number
KR102391780B1
KR102391780B1 KR1020170054320A KR20170054320A KR102391780B1 KR 102391780 B1 KR102391780 B1 KR 102391780B1 KR 1020170054320 A KR1020170054320 A KR 1020170054320A KR 20170054320 A KR20170054320 A KR 20170054320A KR 102391780 B1 KR102391780 B1 KR 102391780B1
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KR
South Korea
Prior art keywords
group
photosensitive composition
formula
preferable
meth
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KR1020170054320A
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English (en)
Korean (ko)
Other versions
KR20170122682A (ko
Inventor
요시노리 다도코로
다이 시오타
Original Assignee
도쿄 오카 고교 가부시키가이샤
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Publication of KR20170122682A publication Critical patent/KR20170122682A/ko
Application granted granted Critical
Publication of KR102391780B1 publication Critical patent/KR102391780B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020170054320A 2016-04-27 2017-04-27 감광성 조성물 KR102391780B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2016-089900 2016-04-27
JP2016089900A JP6860978B2 (ja) 2016-04-27 2016-04-27 感光性組成物

Publications (2)

Publication Number Publication Date
KR20170122682A KR20170122682A (ko) 2017-11-06
KR102391780B1 true KR102391780B1 (ko) 2022-04-28

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170054320A KR102391780B1 (ko) 2016-04-27 2017-04-27 감광성 조성물

Country Status (3)

Country Link
JP (1) JP6860978B2 (ja)
KR (1) KR102391780B1 (ja)
CN (1) CN107315318B (ja)

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CN110066352B (zh) * 2018-01-23 2021-08-17 常州强力先端电子材料有限公司 肟酯类光引发剂、制备方法、感光性树脂组合物及应用
CN110066225B (zh) * 2018-01-23 2022-06-03 常州强力先端电子材料有限公司 双肟酯类光引发剂、制备方法、感光性树脂组合物及应用
EP3992254B1 (en) 2019-06-27 2024-02-21 FUJIFILM Corporation Composition, film, and optical sensor
JP7470780B2 (ja) 2020-03-30 2024-04-18 富士フイルム株式会社 組成物、膜及び光センサ
JP7477628B2 (ja) 2020-09-28 2024-05-01 富士フイルム株式会社 積層体の製造方法、アンテナインパッケージの製造方法、及び積層体
EP4266094A1 (en) 2020-12-16 2023-10-25 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
JPWO2022130773A1 (ja) 2020-12-17 2022-06-23
KR20220094479A (ko) * 2020-12-29 2022-07-06 덕산네오룩스 주식회사 수지, 수지 조성물 및 이를 이용한 표시장치
WO2022196599A1 (ja) 2021-03-19 2022-09-22 富士フイルム株式会社 膜および光センサ
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
JPWO2022210175A1 (ja) 2021-03-29 2022-10-06
KR102627683B1 (ko) 2021-08-31 2024-01-23 후지필름 가부시키가이샤 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액
CN117916279A (zh) 2021-09-29 2024-04-19 富士胶片株式会社 组合物、树脂、膜及光传感器
WO2023085072A1 (ja) * 2021-11-09 2023-05-19 富士フイルム株式会社 着色硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、画像表示装置、及び、ラジカル重合開始剤

Citations (3)

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CN101525393A (zh) * 2009-04-02 2009-09-09 优缔精细化工（苏州）有限公司 一种肟酯光引发剂及其制备方法
WO2014050738A1 (ja) 2012-09-28 2014-04-03 ダイトーケミックス株式会社 フルオレン系化合物、該フルオレン系化合物を含む光重合開始剤、および、該光重合開始剤を含む感光性組成物
KR101558165B1 (ko) * 2014-11-05 2015-10-12 타코마테크놀러지 주식회사 광개시제 및 이를 포함한 감광성 조성물

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US8728686B2 (en) * 2007-07-17 2014-05-20 Fujifilm Corporation Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
EP2625166B1 (en) * 2010-10-05 2014-09-24 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
JP6295506B2 (ja) * 2011-12-07 2018-03-20 住友化学株式会社 界面活性剤含有粒子を用いた重合方法
JP6026757B2 (ja) * 2012-03-12 2016-11-16 東京応化工業株式会社 感光性樹脂組成物、カラーフィルタ、表示装置、光重合開始剤、及び化合物
JP2014182253A (ja) * 2013-03-19 2014-09-29 Toppan Printing Co Ltd 黒色感光性樹脂組成物、カラーフィルタ及び液晶表示装置
KR101508744B1 (ko) 2013-04-23 2015-04-07 대한민국 배추과 작물 종 판별을 위한 엽록체 ｄｎａ 마커 및 이를 이용한 판별 방법
JP6240409B2 (ja) * 2013-05-31 2017-11-29 サンアプロ株式会社 スルホニウム塩および光酸発生剤
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
TWI668210B (zh) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 光起始劑及包括該光起始劑之光敏性組合物
JP6401529B2 (ja) * 2014-07-15 2018-10-10 東京応化工業株式会社 感光性組成物

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
CN101525393A (zh) * 2009-04-02 2009-09-09 优缔精细化工（苏州）有限公司 一种肟酯光引发剂及其制备方法
WO2014050738A1 (ja) 2012-09-28 2014-04-03 ダイトーケミックス株式会社 フルオレン系化合物、該フルオレン系化合物を含む光重合開始剤、および、該光重合開始剤を含む感光性組成物
KR101558165B1 (ko) * 2014-11-05 2015-10-12 타코마테크놀러지 주식회사 광개시제 및 이를 포함한 감광성 조성물

Also Published As

Publication number Publication date
JP2017198865A (ja) 2017-11-02
CN107315318B (zh) 2022-07-01
CN107315318A (zh) 2017-11-03
JP6860978B2 (ja) 2021-04-21
KR20170122682A (ko) 2017-11-06

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