CN107315318B - 感光性组合物 - Google Patents

感光性组合物 Download PDF

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Publication number
CN107315318B
CN107315318B CN201710281862.XA CN201710281862A CN107315318B CN 107315318 B CN107315318 B CN 107315318B CN 201710281862 A CN201710281862 A CN 201710281862A CN 107315318 B CN107315318 B CN 107315318B
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China
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group
formula
photosensitive composition
meth
compound
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English (en)
Chinese (zh)
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CN107315318A (zh
Inventor
田所惠典
盐田大
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201710281862.XA 2016-04-27 2017-04-26 感光性组合物 Active CN107315318B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-089900 2016-04-27
JP2016089900A JP6860978B2 (ja) 2016-04-27 2016-04-27 感光性組成物

Publications (2)

Publication Number Publication Date
CN107315318A CN107315318A (zh) 2017-11-03
CN107315318B true CN107315318B (zh) 2022-07-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710281862.XA Active CN107315318B (zh) 2016-04-27 2017-04-26 感光性组合物

Country Status (3)

Country Link
JP (1) JP6860978B2 (ja)
KR (1) KR102391780B1 (ja)
CN (1) CN107315318B (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110066352B (zh) * 2018-01-23 2021-08-17 常州强力先端电子材料有限公司 肟酯类光引发剂、制备方法、感光性树脂组合物及应用
CN110066225B (zh) * 2018-01-23 2022-06-03 常州强力先端电子材料有限公司 双肟酯类光引发剂、制备方法、感光性树脂组合物及应用
WO2020262270A1 (ja) 2019-06-27 2020-12-30 富士フイルム株式会社 組成物、膜および光センサ
EP4130147A4 (en) 2020-03-30 2023-08-09 FUJIFILM Corporation COMPOSITION, FILM AND OPTICAL SENSOR
WO2022065006A1 (ja) 2020-09-28 2022-03-31 富士フイルム株式会社 積層体の製造方法、アンテナインパッケージの製造方法、積層体及び組成物
WO2022131191A1 (ja) 2020-12-16 2022-06-23 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
WO2022130773A1 (ja) 2020-12-17 2022-06-23 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ
KR20220094479A (ko) * 2020-12-29 2022-07-06 덕산네오룩스 주식회사 수지, 수지 조성물 및 이를 이용한 표시장치
TW202244147A (zh) 2021-03-19 2022-11-16 日商富士軟片股份有限公司 膜及光感測器
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
JPWO2022210175A1 (ja) 2021-03-29 2022-10-06
JP7259141B1 (ja) 2021-08-31 2023-04-17 富士フイルム株式会社 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液
WO2023054142A1 (ja) 2021-09-29 2023-04-06 富士フイルム株式会社 組成物、樹脂、膜および光センサ
KR20240064022A (ko) * 2021-11-09 2024-05-10 후지필름 가부시키가이샤 착색 경화성 조성물, 경화물의 제조 방법, 막, 광학 소자, 이미지 센서, 고체 촬상 소자, 화상 표시 장치, 및, 라디칼 중합 개시제

Citations (7)

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Publication number Priority date Publication date Assignee Title
CN102617445A (zh) * 2007-07-17 2012-08-01 富士胶片株式会社 感光性组合物、可固化组合物、新化合物、可光聚合组合物、滤色器和平版印刷版原版
CN103309154A (zh) * 2012-03-12 2013-09-18 东京应化工业株式会社 感光性树脂组合物、滤色器、显示装置、光聚合引发剂以及化合物
JP2014182253A (ja) * 2013-03-19 2014-09-29 Toppan Printing Co Ltd 黒色感光性樹脂組成物、カラーフィルタ及び液晶表示装置
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
CN104684888A (zh) * 2012-09-28 2015-06-03 大东凯米克斯株式会社 芴系化合物、含有该芴系化合物的光聚合引发剂、以及含有该光聚合引发剂的光敏性组合物
KR101558165B1 (ko) * 2014-11-05 2015-10-12 타코마테크놀러지 주식회사 광개시제 및 이를 포함한 감광성 조성물
CN105278242A (zh) * 2014-07-15 2016-01-27 东京应化工业株式会社 感光性组合物

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CN101525393B (zh) * 2009-04-02 2011-04-27 优缔精细化工（苏州）有限公司 一种肟酯光引发剂及其制备方法
JP6038033B2 (ja) * 2010-10-05 2016-12-07 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ベンゾカルバゾール化合物のオキシムエステル誘導体ならびに前記誘導体の光重合性の組成物における光開始剤としての使用
JP6295506B2 (ja) * 2011-12-07 2018-03-20 住友化学株式会社 界面活性剤含有粒子を用いた重合方法
KR101508744B1 (ko) 2013-04-23 2015-04-07 대한민국 배추과 작물 종 판별을 위한 엽록체 ｄｎａ 마커 및 이를 이용한 판별 방법
JP6240409B2 (ja) * 2013-05-31 2017-11-29 サンアプロ株式会社 スルホニウム塩および光酸発生剤
TWI668210B (zh) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 光起始劑及包括該光起始劑之光敏性組合物

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102617445A (zh) * 2007-07-17 2012-08-01 富士胶片株式会社 感光性组合物、可固化组合物、新化合物、可光聚合组合物、滤色器和平版印刷版原版
CN103309154A (zh) * 2012-03-12 2013-09-18 东京应化工业株式会社 感光性树脂组合物、滤色器、显示装置、光聚合引发剂以及化合物
CN104684888A (zh) * 2012-09-28 2015-06-03 大东凯米克斯株式会社 芴系化合物、含有该芴系化合物的光聚合引发剂、以及含有该光聚合引发剂的光敏性组合物
JP2014182253A (ja) * 2013-03-19 2014-09-29 Toppan Printing Co Ltd 黒色感光性樹脂組成物、カラーフィルタ及び液晶表示装置
JP2015041104A (ja) * 2013-08-22 2015-03-02 東友ファインケム株式会社 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置
CN105278242A (zh) * 2014-07-15 2016-01-27 东京应化工业株式会社 感光性组合物
KR101558165B1 (ko) * 2014-11-05 2015-10-12 타코마테크놀러지 주식회사 광개시제 및 이를 포함한 감광성 조성물

Also Published As

Publication number Publication date
CN107315318A (zh) 2017-11-03
KR20170122682A (ko) 2017-11-06
KR102391780B1 (ko) 2022-04-28
JP2017198865A (ja) 2017-11-02
JP6860978B2 (ja) 2021-04-21

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