KR102362443B1 - 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 - Google Patents

청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 Download PDF

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Publication number
KR102362443B1
KR102362443B1 KR1020170110890A KR20170110890A KR102362443B1 KR 102362443 B1 KR102362443 B1 KR 102362443B1 KR 1020170110890 A KR1020170110890 A KR 1020170110890A KR 20170110890 A KR20170110890 A KR 20170110890A KR 102362443 B1 KR102362443 B1 KR 102362443B1
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KR
South Korea
Prior art keywords
blue
resin composition
photosensitive resin
group
blue photosensitive
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KR1020170110890A
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English (en)
Korean (ko)
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KR20190024167A (ko
Inventor
왕현정
김정식
김형주
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동우 화인켐 주식회사
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Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020170110890A priority Critical patent/KR102362443B1/ko
Priority to TW107127503A priority patent/TWI677758B/zh
Priority to CN201810893188.5A priority patent/CN109426071B/zh
Priority to JP2018158420A priority patent/JP6650976B2/ja
Publication of KR20190024167A publication Critical patent/KR20190024167A/ko
Application granted granted Critical
Publication of KR102362443B1 publication Critical patent/KR102362443B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyesters Or Polycarbonates (AREA)
KR1020170110890A 2017-08-31 2017-08-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 KR102362443B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020170110890A KR102362443B1 (ko) 2017-08-31 2017-08-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
TW107127503A TWI677758B (zh) 2017-08-31 2018-08-07 藍色感光性樹脂組成物、濾色器及影像顯示裝置
CN201810893188.5A CN109426071B (zh) 2017-08-31 2018-08-07 蓝色感光性树脂组合物、滤色器及图像显示装置
JP2018158420A JP6650976B2 (ja) 2017-08-31 2018-08-27 青色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170110890A KR102362443B1 (ko) 2017-08-31 2017-08-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Publications (2)

Publication Number Publication Date
KR20190024167A KR20190024167A (ko) 2019-03-08
KR102362443B1 true KR102362443B1 (ko) 2022-02-11

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Application Number Title Priority Date Filing Date
KR1020170110890A KR102362443B1 (ko) 2017-08-31 2017-08-31 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Country Status (4)

Country Link
JP (1) JP6650976B2 (ja)
KR (1) KR102362443B1 (ja)
CN (1) CN109426071B (ja)
TW (1) TWI677758B (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111752097A (zh) * 2019-03-29 2020-10-09 常州强力电子新材料股份有限公司 自发光感光性树脂组合物、彩色滤光片和图像显示装置
CN111752098A (zh) * 2019-03-29 2020-10-09 常州强力电子新材料股份有限公司 自发光感光性树脂组合物、彩色滤光片和图像显示装置

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JP4375643B2 (ja) * 2000-10-30 2009-12-02 三井化学株式会社 含硫（メタ）アクリル酸チオエステル化合物およびその用途
KR101337023B1 (ko) * 2007-12-28 2013-12-05 코오롱인더스트리 주식회사 감광성 수지 조성물
KR101793741B1 (ko) 2011-06-23 2017-11-03 엘지이노텍 주식회사 표시장치
JP6117623B2 (ja) * 2012-06-07 2017-04-19 大阪ガスケミカル株式会社 硬化性組成物およびその硬化物
TWI514072B (zh) * 2013-08-09 2015-12-21 Cheil Ind Inc 光敏樹脂組合物和使用其的光阻擋層
KR101636865B1 (ko) * 2013-09-10 2016-07-06 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
EP3044208B1 (en) * 2013-09-10 2021-12-22 Basf Se Oxime ester photoinitiators
KR101686567B1 (ko) * 2013-10-23 2016-12-14 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR20150055417A (ko) * 2013-11-13 2015-05-21 동우 화인켐 주식회사 착색 감광성 수지 조성물
JP6309755B2 (ja) * 2013-12-25 2018-04-11 東京応化工業株式会社 感光性樹脂組成物
KR101879016B1 (ko) * 2014-11-21 2018-07-16 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치
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WO2017057813A1 (ko) * 2015-10-01 2017-04-06 타코마테크놀러지 주식회사 바인더 수지 및 이를 포함하는 감광성 수지 조성물
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CN110506235B (zh) * 2017-03-30 2023-11-21 东友精细化工有限公司 蓝色感光性树脂组合物、利用其制造的滤色器及图像显示装置

Also Published As

Publication number Publication date
KR20190024167A (ko) 2019-03-08
CN109426071B (zh) 2022-02-25
JP2019045857A (ja) 2019-03-22
TW201913234A (zh) 2019-04-01
CN109426071A (zh) 2019-03-05
TWI677758B (zh) 2019-11-21
JP6650976B2 (ja) 2020-02-19

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