TWI677758B - 藍色感光性樹脂組成物、濾色器及影像顯示裝置 - Google Patents
藍色感光性樹脂組成物、濾色器及影像顯示裝置 Download PDFInfo
- Publication number
- TWI677758B TWI677758B TW107127503A TW107127503A TWI677758B TW I677758 B TWI677758 B TW I677758B TW 107127503 A TW107127503 A TW 107127503A TW 107127503 A TW107127503 A TW 107127503A TW I677758 B TWI677758 B TW I677758B
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- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- blue
- blue photosensitive
- patent application
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
??10-2017-0110890 | 2017-08-31 | ||
KR10-2017-0110890 | 2017-08-31 | ||
KR1020170110890A KR102362443B1 (ko) | 2017-08-31 | 2017-08-31 | 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201913234A TW201913234A (zh) | 2019-04-01 |
TWI677758B true TWI677758B (zh) | 2019-11-21 |
Family
ID=65514526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107127503A TWI677758B (zh) | 2017-08-31 | 2018-08-07 | 藍色感光性樹脂組成物、濾色器及影像顯示裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6650976B2 (ja) |
KR (1) | KR102362443B1 (ja) |
CN (1) | CN109426071B (ja) |
TW (1) | TWI677758B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111752097A (zh) * | 2019-03-29 | 2020-10-09 | 常州强力电子新材料股份有限公司 | 自发光感光性树脂组合物、彩色滤光片和图像显示装置 |
CN111752098A (zh) * | 2019-03-29 | 2020-10-09 | 常州强力电子新材料股份有限公司 | 自发光感光性树脂组合物、彩色滤光片和图像显示装置 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1057808A2 (en) * | 1999-06-01 | 2000-12-06 | Mitsui Chemicals, Inc. | Sulfur-containing unsaturated carboxylate compound and its use |
JP2002128827A (ja) * | 2000-10-30 | 2002-05-09 | Mitsui Chemicals Inc | 含硫(メタ)アクリル酸チオエステル化合物およびその用途 |
JP2014012825A (ja) * | 2012-06-07 | 2014-01-23 | Osaka Gas Chem Kk | 硬化性組成物およびその硬化物 |
US20150111156A1 (en) * | 2013-10-23 | 2015-04-23 | Cheil Industries Inc. | Photosensitive Resin Composition and Light Blocking Layer Using the Same |
TW201518275A (zh) * | 2013-09-10 | 2015-05-16 | Basf Se | 肟酯光起始劑 |
KR20150055417A (ko) * | 2013-11-13 | 2015-05-21 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물 |
TW201539139A (zh) * | 2013-12-25 | 2015-10-16 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物 |
WO2017086590A1 (en) * | 2015-11-19 | 2017-05-26 | Rohm And Haas Electronic Materials Korea Ltd. | Method for preparing column spacer |
CN107003448A (zh) * | 2014-12-24 | 2017-08-01 | Dnp精细化工股份有限公司 | 色材分散液、感光性着色树脂组合物、彩色滤光片、液晶显示设备、及有机发光显示设备 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101337023B1 (ko) * | 2007-12-28 | 2013-12-05 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 |
KR101793741B1 (ko) | 2011-06-23 | 2017-11-03 | 엘지이노텍 주식회사 | 표시장치 |
TWI514072B (zh) * | 2013-08-09 | 2015-12-21 | Cheil Ind Inc | 光敏樹脂組合物和使用其的光阻擋層 |
KR101636865B1 (ko) * | 2013-09-10 | 2016-07-06 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
KR101879016B1 (ko) * | 2014-11-21 | 2018-07-16 | 동우 화인켐 주식회사 | 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치 |
KR101811103B1 (ko) * | 2015-08-11 | 2018-01-25 | 동우 화인켐 주식회사 | 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 구비한 화상표시장치 |
CN108137794B (zh) * | 2015-10-01 | 2020-05-15 | 塔科马科技有限公司 | 粘合剂树脂及包含其的感光性树脂组合物 |
KR102368547B1 (ko) * | 2015-12-08 | 2022-02-28 | 동우 화인켐 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 |
CN110506235B (zh) * | 2017-03-30 | 2023-11-21 | 东友精细化工有限公司 | 蓝色感光性树脂组合物、利用其制造的滤色器及图像显示装置 |
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2017
- 2017-08-31 KR KR1020170110890A patent/KR102362443B1/ko active IP Right Grant
-
2018
- 2018-08-07 TW TW107127503A patent/TWI677758B/zh active
- 2018-08-07 CN CN201810893188.5A patent/CN109426071B/zh active Active
- 2018-08-27 JP JP2018158420A patent/JP6650976B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1057808A2 (en) * | 1999-06-01 | 2000-12-06 | Mitsui Chemicals, Inc. | Sulfur-containing unsaturated carboxylate compound and its use |
JP2002128827A (ja) * | 2000-10-30 | 2002-05-09 | Mitsui Chemicals Inc | 含硫(メタ)アクリル酸チオエステル化合物およびその用途 |
JP2014012825A (ja) * | 2012-06-07 | 2014-01-23 | Osaka Gas Chem Kk | 硬化性組成物およびその硬化物 |
TW201518275A (zh) * | 2013-09-10 | 2015-05-16 | Basf Se | 肟酯光起始劑 |
US20150111156A1 (en) * | 2013-10-23 | 2015-04-23 | Cheil Industries Inc. | Photosensitive Resin Composition and Light Blocking Layer Using the Same |
KR20150055417A (ko) * | 2013-11-13 | 2015-05-21 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물 |
TW201539139A (zh) * | 2013-12-25 | 2015-10-16 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物 |
CN107003448A (zh) * | 2014-12-24 | 2017-08-01 | Dnp精细化工股份有限公司 | 色材分散液、感光性着色树脂组合物、彩色滤光片、液晶显示设备、及有机发光显示设备 |
WO2017086590A1 (en) * | 2015-11-19 | 2017-05-26 | Rohm And Haas Electronic Materials Korea Ltd. | Method for preparing column spacer |
Also Published As
Publication number | Publication date |
---|---|
KR102362443B1 (ko) | 2022-02-11 |
JP2019045857A (ja) | 2019-03-22 |
JP6650976B2 (ja) | 2020-02-19 |
CN109426071B (zh) | 2022-02-25 |
TW201913234A (zh) | 2019-04-01 |
CN109426071A (zh) | 2019-03-05 |
KR20190024167A (ko) | 2019-03-08 |
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