KR102312556B1 - 유리 기판의 제조 장치 및 제조 방법 - Google Patents

유리 기판의 제조 장치 및 제조 방법 Download PDF

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Publication number
KR102312556B1
KR102312556B1 KR1020197016656A KR20197016656A KR102312556B1 KR 102312556 B1 KR102312556 B1 KR 102312556B1 KR 1020197016656 A KR1020197016656 A KR 1020197016656A KR 20197016656 A KR20197016656 A KR 20197016656A KR 102312556 B1 KR102312556 B1 KR 102312556B1
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KR
South Korea
Prior art keywords
glass substrate
housing
air supply
opening
surface treatment
Prior art date
Application number
KR1020197016656A
Other languages
English (en)
Korean (ko)
Other versions
KR20190084098A (ko
Inventor
요시하루 야마모토
히로키 나카츠카
카즈히로 오노
Original Assignee
니폰 덴키 가라스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 니폰 덴키 가라스 가부시키가이샤 filed Critical 니폰 덴키 가라스 가부시키가이샤
Publication of KR20190084098A publication Critical patent/KR20190084098A/ko
Application granted granted Critical
Publication of KR102312556B1 publication Critical patent/KR102312556B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02—Articles
    • B65G2201/0214—Articles of special size, shape or weigh
    • B65G2201/022—Flat

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
KR1020197016656A 2016-11-16 2017-10-20 유리 기판의 제조 장치 및 제조 방법 KR102312556B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2016-223248 2016-11-16
JP2016223248A JP6665760B2 (ja) 2016-11-16 2016-11-16 ガラス基板の製造装置及び製造方法
PCT/JP2017/037958 WO2018092506A1 (ja) 2016-11-16 2017-10-20 ガラス基板の製造装置及び製造方法

Publications (2)

Publication Number Publication Date
KR20190084098A KR20190084098A (ko) 2019-07-15
KR102312556B1 true KR102312556B1 (ko) 2021-10-14

Family

ID=62146441

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197016656A KR102312556B1 (ko) 2016-11-16 2017-10-20 유리 기판의 제조 장치 및 제조 방법

Country Status (5)

Country Link
JP (1) JP6665760B2 (zh)
KR (1) KR102312556B1 (zh)
CN (1) CN109963820B (zh)
TW (1) TWI722251B (zh)
WO (1) WO2018092506A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022539831A (ja) 2019-07-11 2022-09-13 グッド ティー セルズ、 インコーポレイテッド 免疫チェックポイント阻害剤抵抗性癌の予防、改善または治療用組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014080331A (ja) 2012-10-17 2014-05-08 Asahi Glass Co Ltd 反射防止性ガラスの製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4045592B2 (ja) * 2002-08-22 2008-02-13 三菱マテリアル株式会社 プラズマエッチング用シリコン電極板
JP4381160B2 (ja) * 2003-07-16 2009-12-09 積水化学工業株式会社 表面処理装置
JP4312001B2 (ja) * 2003-07-28 2009-08-12 リアライズ・アドバンストテクノロジ株式会社 基板支持装置および基板取り外し方法
JP4398262B2 (ja) * 2004-01-08 2010-01-13 大日本スクリーン製造株式会社 基板処理装置
WO2007077765A1 (ja) * 2005-12-28 2007-07-12 Sharp Kabushiki Kaisha ステージ装置及びプラズマ処理装置
JP5235293B2 (ja) * 2006-10-02 2013-07-10 東京エレクトロン株式会社 処理ガス供給機構および処理ガス供給方法ならびにガス処理装置
JP5444599B2 (ja) * 2007-09-28 2014-03-19 東京エレクトロン株式会社 ガス供給装置及び成膜装置
CN102473627B (zh) * 2009-07-23 2014-11-05 夏普株式会社 湿蚀刻装置和湿蚀刻方法
JP5874393B2 (ja) * 2011-12-28 2016-03-02 日本電気硝子株式会社 ガラス板加工装置およびその加工方法
JP5865095B2 (ja) * 2012-01-30 2016-02-17 住友精密工業株式会社 エッチング装置
JP6048817B2 (ja) * 2012-12-27 2016-12-21 日本電気硝子株式会社 板状ガラスの表面処理装置及び表面処理方法
JP2016064926A (ja) * 2013-02-07 2016-04-28 旭硝子株式会社 ガラス製造方法
WO2014123089A1 (ja) * 2013-02-07 2014-08-14 旭硝子株式会社 ガラス製造方法
EP3053888B1 (en) * 2013-09-30 2021-02-17 Nippon Sheet Glass Company, Limited Method for producing glass sheet
KR101413626B1 (ko) * 2013-12-31 2014-08-06 김호권 화학강화를 이용한 강화유리 제조장치 및 제조방법
US10358381B2 (en) * 2014-01-31 2019-07-23 Nippon Sheet Glass Company, Limited Method for producing glass sheet, and glass sheet
KR102135740B1 (ko) * 2014-02-27 2020-07-20 주식회사 원익아이피에스 기판 처리 장치 및 기판 처리 방법
KR102368126B1 (ko) * 2014-04-16 2022-02-25 에이지씨 가부시키가이샤 에칭 장치, 에칭 방법, 기판의 제조 방법, 및 기판

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014080331A (ja) 2012-10-17 2014-05-08 Asahi Glass Co Ltd 反射防止性ガラスの製造方法

Also Published As

Publication number Publication date
CN109963820B (zh) 2021-12-31
TW201829339A (zh) 2018-08-16
TWI722251B (zh) 2021-03-21
JP6665760B2 (ja) 2020-03-13
WO2018092506A1 (ja) 2018-05-24
KR20190084098A (ko) 2019-07-15
JP2018080079A (ja) 2018-05-24
CN109963820A (zh) 2019-07-02

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