KR102253410B1 - 조명 광학계, 노광 장치 및 물품 제조 방법 - Google Patents

조명 광학계, 노광 장치 및 물품 제조 방법 Download PDF

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KR102253410B1
KR102253410B1 KR1020170114993A KR20170114993A KR102253410B1 KR 102253410 B1 KR102253410 B1 KR 102253410B1 KR 1020170114993 A KR1020170114993 A KR 1020170114993A KR 20170114993 A KR20170114993 A KR 20170114993A KR 102253410 B1 KR102253410 B1 KR 102253410B1
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South Korea
Prior art keywords
optical system
light
wavelength
illumination
shielding plate
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Korean (ko)
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KR20180028969A (ko
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노보루 오사카
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020170114993A 2016-09-09 2017-09-08 조명 광학계, 노광 장치 및 물품 제조 방법 Active KR102253410B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2016-177138 2016-09-09
JP2016177138 2016-09-09
JP2017142842A JP6970548B2 (ja) 2016-09-09 2017-07-24 照明光学系、露光装置、及び物品製造方法
JPJP-P-2017-142842 2017-07-24

Publications (2)

Publication Number Publication Date
KR20180028969A KR20180028969A (ko) 2018-03-19
KR102253410B1 true KR102253410B1 (ko) 2021-05-20

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KR1020170114993A Active KR102253410B1 (ko) 2016-09-09 2017-09-08 조명 광학계, 노광 장치 및 물품 제조 방법

Country Status (3)

Country Link
JP (1) JP6970548B2 (enrdf_load_stackoverflow)
KR (1) KR102253410B1 (enrdf_load_stackoverflow)
TW (1) TWI668522B (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7533445B2 (ja) * 2019-03-29 2024-08-14 株式会社ニコン 露光装置、照明光学系、およびデバイス製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002075843A (ja) * 2000-08-31 2002-03-15 Nikon Corp 露光装置、デバイス製造方法、及び照明装置
JP2010504650A (ja) * 2006-09-26 2010-02-12 カール・ツァイス・エスエムティー・アーゲー 投影露光法および投影露光法のための投影露光システム
JP5539011B2 (ja) 2010-05-14 2014-07-02 キヤノン株式会社 インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5539011B2 (enrdf_load_stackoverflow) * 1974-06-12 1980-10-08
JP3049774B2 (ja) * 1990-12-27 2000-06-05 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
JPH04104255A (ja) * 1990-08-24 1992-04-06 Hitachi Ltd 縮小投影露光装置
JP3374993B2 (ja) * 1993-06-11 2003-02-10 株式会社ニコン 投影露光方法及び装置、露光装置、並びに素子製造方法
JP2002184676A (ja) * 2000-12-18 2002-06-28 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2003203853A (ja) * 2002-01-09 2003-07-18 Nikon Corp 露光装置及び方法並びにマイクロデバイスの製造方法
TW200301848A (en) * 2002-01-09 2003-07-16 Nikon Corp Exposure apparatus and exposure method
JP5071385B2 (ja) * 2006-06-16 2012-11-14 株式会社ニコン 可変スリット装置、照明装置、露光装置、露光方法及びデバイス製造方法
JP2008263092A (ja) * 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP2009164355A (ja) * 2008-01-07 2009-07-23 Canon Inc 走査露光装置およびデバイス製造方法
WO2010061674A1 (ja) * 2008-11-28 2010-06-03 株式会社ニコン 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010197517A (ja) * 2009-02-23 2010-09-09 Canon Inc 照明光学装置、露光装置およびデバイス製造方法
JP5868094B2 (ja) * 2011-09-26 2016-02-24 キヤノン株式会社 露光装置及びデバイス製造方法
JP2014195048A (ja) * 2013-02-28 2014-10-09 Canon Inc 照明光学系、露光装置及びデバイスの製造方法
US9746777B2 (en) * 2014-01-09 2017-08-29 Taiwan Semiconductor Manufacturing Co., Ltd. Exposure apparatus and exposure method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002075843A (ja) * 2000-08-31 2002-03-15 Nikon Corp 露光装置、デバイス製造方法、及び照明装置
JP2010504650A (ja) * 2006-09-26 2010-02-12 カール・ツァイス・エスエムティー・アーゲー 投影露光法および投影露光法のための投影露光システム
JP5539011B2 (ja) 2010-05-14 2014-07-02 キヤノン株式会社 インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法

Also Published As

Publication number Publication date
KR20180028969A (ko) 2018-03-19
TW201812479A (zh) 2018-04-01
TWI668522B (zh) 2019-08-11
JP2018045228A (ja) 2018-03-22
JP6970548B2 (ja) 2021-11-24

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