KR102229605B1 - 어느 하나의 재료 층을 또 다른 층에 본딩하기 위한 방법 및 그 결과의 장치 - Google Patents

어느 하나의 재료 층을 또 다른 층에 본딩하기 위한 방법 및 그 결과의 장치 Download PDF

Info

Publication number
KR102229605B1
KR102229605B1 KR1020147026621A KR20147026621A KR102229605B1 KR 102229605 B1 KR102229605 B1 KR 102229605B1 KR 1020147026621 A KR1020147026621 A KR 1020147026621A KR 20147026621 A KR20147026621 A KR 20147026621A KR 102229605 B1 KR102229605 B1 KR 102229605B1
Authority
KR
South Korea
Prior art keywords
layer
glass material
glass
bonding
bonding material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020147026621A
Other languages
English (en)
Korean (ko)
Other versions
KR20140141599A (ko
Inventor
제임스 그레고리 쿠일라드
크리스토퍼 폴 다이글러
지앙웨이 펭
야웨이 선
릴리 티안
이안 데이비드 트레이시
Original Assignee
코닝 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코닝 인코포레이티드 filed Critical 코닝 인코포레이티드
Publication of KR20140141599A publication Critical patent/KR20140141599A/ko
Application granted granted Critical
Publication of KR102229605B1 publication Critical patent/KR102229605B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C3/00Assembling of devices or systems from individually processed components
    • B81C3/001Bonding of two components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69Insulating materials thereof
    • H10W70/692Ceramics or glasses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
    • B81C2201/019Bonding or gluing multiple substrate layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/03Bonding two components
    • B81C2203/032Gluing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/03Bonding two components
    • B81C2203/033Thermal bonding
    • B81C2203/035Soldering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Joining Of Glass To Other Materials (AREA)
  • Dicing (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
KR1020147026621A 2012-02-29 2013-02-27 어느 하나의 재료 층을 또 다른 층에 본딩하기 위한 방법 및 그 결과의 장치 Expired - Fee Related KR102229605B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261604747P 2012-02-29 2012-02-29
US61/604,747 2012-02-29
PCT/US2013/027977 WO2013130572A1 (en) 2012-02-29 2013-02-27 Methods for bonding material layers to one another and resulting device

Publications (2)

Publication Number Publication Date
KR20140141599A KR20140141599A (ko) 2014-12-10
KR102229605B1 true KR102229605B1 (ko) 2021-03-19

Family

ID=47884547

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147026621A Expired - Fee Related KR102229605B1 (ko) 2012-02-29 2013-02-27 어느 하나의 재료 층을 또 다른 층에 본딩하기 위한 방법 및 그 결과의 장치

Country Status (5)

Country Link
US (1) US8895362B2 (https=)
JP (1) JP6128566B2 (https=)
KR (1) KR102229605B1 (https=)
CN (1) CN105452154B (https=)
WO (1) WO2013130572A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE537869C2 (sv) * 2012-11-01 2015-11-03 Silex Microsystems Ab Substratgenomgående vior
CN105161515B (zh) * 2015-08-11 2018-03-23 京东方科技集团股份有限公司 有机发光二极管显示面板及其封装方法、显示装置
JP7538108B2 (ja) * 2018-08-07 2024-08-21 コーニング インコーポレイテッド 気密封止パッケージ
KR20230058680A (ko) * 2020-09-02 2023-05-03 코닝 인코포레이티드 유리 패키지 및 제조 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040207314A1 (en) * 2003-04-16 2004-10-21 Aitken Bruce G. Glass package that is hermetically sealed with a frit and method of fabrication
WO2007078472A1 (en) 2005-12-16 2007-07-12 Innovative Micro Technology Wafer level hermetic bond using metal alloy with raised feature
CN102130026A (zh) 2010-12-23 2011-07-20 中国科学院半导体研究所 基于金锡合金键合的圆片级低温封装方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1138401A (en) 1965-05-06 1969-01-01 Mallory & Co Inc P R Bonding
AUPQ090299A0 (en) 1999-06-10 1999-07-01 University Of Sydney, The Glass panel
US6537892B2 (en) 2001-02-02 2003-03-25 Delphi Technologies, Inc. Glass frit wafer bonding process and packages formed thereby
US6893574B2 (en) 2001-10-23 2005-05-17 Analog Devices Inc MEMS capping method and apparatus
US7387838B2 (en) * 2004-05-27 2008-06-17 Delaware Capital Formation, Inc. Low loss glass-ceramic materials, method of making same and electronic packages including same
US8637980B1 (en) 2007-12-18 2014-01-28 Rockwell Collins, Inc. Adhesive applications using alkali silicate glass for electronics
FR2905690B1 (fr) 2006-09-12 2008-10-17 Saint Gobain Procede de fabrication d'un dispositif microfluidique.
KR100787463B1 (ko) * 2007-01-05 2007-12-26 삼성에스디아이 주식회사 글래스 프릿, 실링재 형성용 조성물, 발광 장치 및 발광 장치의 제조방법
JP4938478B2 (ja) * 2007-01-31 2012-05-23 京セラキンセキ株式会社 圧電振動子
US7927906B2 (en) 2008-02-04 2011-04-19 Honeywell International Inc. Method for MEMS threshold sensor packaging
JP2009267049A (ja) * 2008-04-24 2009-11-12 Olympus Corp 光学装置および光学装置の製造方法
US8860305B2 (en) 2009-07-09 2014-10-14 Corning Incorporated Methods for forming fritted cover sheets with masks and glass packages comprising the same
KR20120048528A (ko) 2009-07-23 2012-05-15 아사히 가라스 가부시키가이샤 봉착 재료층이 부착된 유리 부재의 제조 방법 및 제조 장치, 그리고 전자 디바이스의 제조 방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040207314A1 (en) * 2003-04-16 2004-10-21 Aitken Bruce G. Glass package that is hermetically sealed with a frit and method of fabrication
WO2007078472A1 (en) 2005-12-16 2007-07-12 Innovative Micro Technology Wafer level hermetic bond using metal alloy with raised feature
CN102130026A (zh) 2010-12-23 2011-07-20 中国科学院半导体研究所 基于金锡合金键合的圆片级低温封装方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
F. Ribeiro et al., Laser assisted glass frit sealing of dye-sensitized solar cells, Solar Energy Materials & Solar Cells, 2012.01., Vol. 96, pp. 43-49 1부.*

Also Published As

Publication number Publication date
CN105452154A (zh) 2016-03-30
US20130221510A1 (en) 2013-08-29
WO2013130572A1 (en) 2013-09-06
JP2015511063A (ja) 2015-04-13
JP6128566B2 (ja) 2017-05-17
US8895362B2 (en) 2014-11-25
CN105452154B (zh) 2017-07-18
KR20140141599A (ko) 2014-12-10

Similar Documents

Publication Publication Date Title
KR101650065B1 (ko) 광학 필터 부재 및 이것을 구비한 촬상장치
TWI451610B (zh) 發光裝置之母板結構以及發光裝置及其製造方法
KR102229605B1 (ko) 어느 하나의 재료 층을 또 다른 층에 본딩하기 위한 방법 및 그 결과의 장치
CN101897018B (zh) 半导体装置及其制造方法
US10488721B2 (en) Liquid crystal on silicon packaging
JP2006147864A (ja) 半導体パッケージ及びその製造方法
JP5145593B2 (ja) 重ねられた要素から成る微細構造の集合的な製作方法
KR20090106393A (ko) 봉지 패키지용 리드 또는 케이스 및 그들의 제조방법
JP2014022395A (ja) 半導体パッケージ用透明基板および半導体パッケージの製造方法
CN111261647B (zh) 一种透光盖板、光学传感器及其制造方法
US20100193940A1 (en) Wafer level package and method of manufacturing the same
US7510947B2 (en) Method for wafer level packaging and fabricating cap structures
JP2016031949A (ja) ウエハレベルパッケージング構造体及びその製造方法
US9245814B2 (en) Substrate assembly, method of manufacturing substrate assembly and method of manufacturing chip package
JP2012019022A (ja) 電子部品モジュールの製造方法
CN116034098A (zh) 接合体的制造方法
JP5349024B2 (ja) 光学装置および光学装置の製造方法
US20060124915A1 (en) Production of an optoelectronic component that is enclosed in plastic, and corresponding methods
EP2287910A1 (en) Improvements in or relating to filters in an image sensor
JP2006162877A (ja) 反射型液晶表示素子の製造方法
EP3609688B1 (de) Verfahren zur herstellung von linsenelementen und von gehäusten, strahlungsempfindlichen bauelementen auf waferebene
KR101073560B1 (ko) 마스크 및 이를 이용한 표시 장치의 제조 방법
JP4663450B2 (ja) 光電集積回路装置の製造方法
WO2017154408A1 (ja) パワー半導体モジュール、並びにそれに搭載されるSiC半導体素子およびその製造方法
JPH04301879A (ja) 表示パネルの製造方法

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R15-X000 Change to inventor requested

St.27 status event code: A-3-3-R10-R15-oth-X000

R16-X000 Change to inventor recorded

St.27 status event code: A-3-3-R10-R16-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T12-X000 Administrative time limit extension not granted

St.27 status event code: U-3-3-T10-T12-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

X091 Application refused [patent]
T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0701 Decision of registration after re-examination

St.27 status event code: A-3-4-F10-F13-rex-PX0701

X701 Decision to grant (after re-examination)
GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20250313

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

H13 Ip right lapsed

Free format text: ST27 STATUS EVENT CODE: N-4-6-H10-H13-OTH-PC1903 (AS PROVIDED BY THE NATIONAL OFFICE); TERMINATION CATEGORY : DEFAULT_OF_REGISTRATION_FEE

Effective date: 20250313

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20250313