KR102229384B1 - 다층 전자 기판의 z-축 상호 연결 구조물 - Google Patents
다층 전자 기판의 z-축 상호 연결 구조물 Download PDFInfo
- Publication number
- KR102229384B1 KR102229384B1 KR1020157025261A KR20157025261A KR102229384B1 KR 102229384 B1 KR102229384 B1 KR 102229384B1 KR 1020157025261 A KR1020157025261 A KR 1020157025261A KR 20157025261 A KR20157025261 A KR 20157025261A KR 102229384 B1 KR102229384 B1 KR 102229384B1
- Authority
- KR
- South Korea
- Prior art keywords
- axis interconnect
- axis
- electronic substrate
- electronic
- conductive paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 156
- 229910052751 metal Inorganic materials 0.000 claims abstract description 93
- 239000002184 metal Substances 0.000 claims abstract description 92
- 229920005989 resin Polymers 0.000 claims description 104
- 239000011347 resin Substances 0.000 claims description 104
- 229920001187 thermosetting polymer Polymers 0.000 claims description 64
- 229920000642 polymer Polymers 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 56
- 239000011159 matrix material Substances 0.000 claims description 45
- 239000000203 mixture Substances 0.000 claims description 44
- 239000000463 material Substances 0.000 claims description 40
- 239000011521 glass Substances 0.000 claims description 38
- 230000001681 protective effect Effects 0.000 claims description 36
- 239000004593 Epoxy Substances 0.000 claims description 26
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 claims description 18
- 238000005245 sintering Methods 0.000 claims description 18
- 239000011888 foil Substances 0.000 claims description 15
- 230000003014 reinforcing effect Effects 0.000 claims description 15
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 10
- 229920001169 thermoplastic Polymers 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 9
- 230000000977 initiatory effect Effects 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 6
- 239000004634 thermosetting polymer Substances 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 5
- 229920000728 polyester Polymers 0.000 claims description 5
- 229920001721 polyimide Polymers 0.000 claims description 5
- 239000004416 thermosoftening plastic Substances 0.000 claims description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004643 cyanate ester Substances 0.000 claims description 3
- 238000007646 gravure printing Methods 0.000 claims description 3
- 238000007639 printing Methods 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 239000011236 particulate material Substances 0.000 claims description 2
- 238000010023 transfer printing Methods 0.000 claims description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims 1
- 229920003986 novolac Polymers 0.000 claims 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 85
- 238000003475 lamination Methods 0.000 description 67
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 58
- 229910052802 copper Inorganic materials 0.000 description 49
- 239000010949 copper Substances 0.000 description 49
- 230000008569 process Effects 0.000 description 41
- 230000001070 adhesive effect Effects 0.000 description 36
- 239000000853 adhesive Substances 0.000 description 35
- 238000004519 manufacturing process Methods 0.000 description 28
- 238000002844 melting Methods 0.000 description 25
- 230000008018 melting Effects 0.000 description 25
- 238000001723 curing Methods 0.000 description 21
- 229910045601 alloy Inorganic materials 0.000 description 20
- 239000000956 alloy Substances 0.000 description 20
- 238000000608 laser ablation Methods 0.000 description 18
- 239000000945 filler Substances 0.000 description 13
- 150000002739 metals Chemical class 0.000 description 12
- 239000007791 liquid phase Substances 0.000 description 11
- 239000002923 metal particle Substances 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000011049 filling Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 230000008901 benefit Effects 0.000 description 9
- 239000011889 copper foil Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000003570 air Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000007547 defect Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000003365 glass fiber Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000000265 homogenisation Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 235000005633 Chrysanthemum balsamita Nutrition 0.000 description 5
- -1 HMP metals Chemical class 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 229910052797 bismuth Inorganic materials 0.000 description 5
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 5
- 238000005266 casting Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 241000894007 species Species 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- 241000723353 Chrysanthemum Species 0.000 description 4
- 239000002313 adhesive film Substances 0.000 description 4
- 239000004840 adhesive resin Substances 0.000 description 4
- 229920006223 adhesive resin Polymers 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000000454 talc Substances 0.000 description 4
- 229910052623 talc Inorganic materials 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 229910052699 polonium Inorganic materials 0.000 description 3
- HZEBHPIOVYHPMT-UHFFFAOYSA-N polonium atom Chemical compound [Po] HZEBHPIOVYHPMT-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000002787 reinforcement Effects 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229920003319 Araldite® Polymers 0.000 description 2
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 2
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229920006397 acrylic thermoplastic Polymers 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 150000001913 cyanates Chemical class 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000008240 homogeneous mixture Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 241000132023 Bellis perennis Species 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 229910000946 Y alloy Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000002998 adhesive polymer Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 150000005130 benzoxazines Chemical class 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000010382 chemical cross-linking Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000012705 liquid precursor Substances 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000003278 mimic effect Effects 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005594 polymer fiber Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4069—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4623—Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10227—Other objects, e.g. metallic pieces
- H05K2201/10378—Interposers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1194—Thermal treatment leading to a different chemical state of a material, e.g. annealing for stress-relief, aging
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361765250P | 2013-02-15 | 2013-02-15 | |
| US61/765,250 | 2013-02-15 | ||
| PCT/US2014/016999 WO2014127381A1 (en) | 2013-02-15 | 2014-02-18 | Structures for z-axis interconnection of multilayer electronic substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160003635A KR20160003635A (ko) | 2016-01-11 |
| KR102229384B1 true KR102229384B1 (ko) | 2021-03-18 |
Family
ID=51350335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020157025261A Active KR102229384B1 (ko) | 2013-02-15 | 2014-02-18 | 다층 전자 기판의 z-축 상호 연결 구조물 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9545017B2 (enExample) |
| JP (1) | JP6423369B2 (enExample) |
| KR (1) | KR102229384B1 (enExample) |
| WO (1) | WO2014127381A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024112064A1 (ko) * | 2022-11-23 | 2024-05-30 | 한국전자기술연구원 | 일괄적층형 다층 폴리이미드 회로배선기판 및 그의 제조방법 |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11440142B2 (en) | 2012-11-16 | 2022-09-13 | Ormet Circuits, Inc. | Alternative compositions for high temperature soldering applications |
| WO2016100470A1 (en) * | 2014-12-17 | 2016-06-23 | Alpha Metals, Inc. | Method for die and clip attachment |
| US9831201B2 (en) | 2015-03-11 | 2017-11-28 | Guy F. Burgess | Methods for forming pillar bumps on semiconductor wafers |
| CN205282448U (zh) * | 2015-05-28 | 2016-06-01 | 意法半导体股份有限公司 | 表面安装类型半导体器件 |
| CN111263535A (zh) * | 2015-07-15 | 2020-06-09 | 印刷电路板公司 | 制造印刷电路板的方法 |
| ITUB20153344A1 (it) * | 2015-09-02 | 2017-03-02 | St Microelectronics Srl | Modulo di potenza elettronico con migliorata dissipazione termica e relativo metodo di fabbricazione |
| WO2018030262A1 (ja) * | 2016-08-09 | 2018-02-15 | 株式会社村田製作所 | モジュール部品の製造方法 |
| JP6810617B2 (ja) * | 2017-01-16 | 2021-01-06 | 富士通インターコネクトテクノロジーズ株式会社 | 回路基板、回路基板の製造方法及び電子装置 |
| US10178755B2 (en) * | 2017-05-09 | 2019-01-08 | Unimicron Technology Corp. | Circuit board stacked structure and method for forming the same |
| EP3419390A1 (en) * | 2017-06-21 | 2018-12-26 | Heraeus Deutschland GmbH & Co. KG | Thick-film paste mediated ceramics bonded with metal or metal hybrid foils and vias |
| US10902769B2 (en) | 2017-07-12 | 2021-01-26 | Facebook Technologies, Llc | Multi-layer fabrication for pixels with calibration compensation |
| US10733930B2 (en) * | 2017-08-23 | 2020-08-04 | Facebook Technologies, Llc | Interposer for multi-layer display architecture |
| US11167375B2 (en) | 2018-08-10 | 2021-11-09 | The Research Foundation For The State University Of New York | Additive manufacturing processes and additively manufactured products |
| JP7134803B2 (ja) * | 2018-09-19 | 2022-09-12 | 株式会社東芝 | プリント基板 |
| CN110783726A (zh) * | 2018-11-09 | 2020-02-11 | 广州方邦电子股份有限公司 | 柔性连接器及制作方法 |
| CN110783727A (zh) * | 2018-11-09 | 2020-02-11 | 广州方邦电子股份有限公司 | 一种连接器及制作方法 |
| CN110783728A (zh) * | 2018-11-09 | 2020-02-11 | 广州方邦电子股份有限公司 | 一种柔性连接器及制作方法 |
| CN110783742A (zh) * | 2018-11-09 | 2020-02-11 | 广州方邦电子股份有限公司 | 连接器及制作方法 |
| US11195789B2 (en) * | 2018-11-30 | 2021-12-07 | International Business Machines Corporation | Integrated circuit module with a structurally balanced package using a bottom side interposer |
| CN110797686A (zh) * | 2019-01-30 | 2020-02-14 | 广州方邦电子股份有限公司 | 一种集成器件 |
| WO2020179874A1 (ja) * | 2019-03-06 | 2020-09-10 | 日立化成株式会社 | 電子部品装置を製造する方法 |
| US12262482B2 (en) | 2019-05-07 | 2025-03-25 | AT&SAustria Technologie&Systemtechnik Aktiengesellschaft | Method of manufacturing component carrier and component carrier intermediate product |
| EP3736852A1 (en) | 2019-05-07 | 2020-11-11 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Aligning component carrier structure with known-good sections and critical section with other component carrier with components and dummies |
| JP7384934B2 (ja) * | 2019-05-28 | 2023-11-21 | リキッド ワイヤ インコーポレイテッド | 異種材料間の連続した相互接続部 |
| US11887962B2 (en) * | 2020-06-16 | 2024-01-30 | Intel Corporation | Microelectronic structures including bridges |
| CN112164677A (zh) * | 2020-08-25 | 2021-01-01 | 珠海越亚半导体股份有限公司 | 一种线路预排布散热嵌埋封装结构及其制造方法 |
| CN112867243A (zh) * | 2021-01-06 | 2021-05-28 | 英韧科技(上海)有限公司 | 多层电路板 |
| EP4040926A1 (en) | 2021-02-09 | 2022-08-10 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Component carriers connected by staggered interconnect elements |
| CN114980572A (zh) * | 2021-02-25 | 2022-08-30 | 深南电路股份有限公司 | 一种软硬结合电路板及加工方法 |
| KR102537710B1 (ko) * | 2021-05-28 | 2023-05-31 | (주)티에스이 | 일괄 접합 방식의 다층 회로기판 및 그 제조 방법 |
| KR20220160967A (ko) * | 2021-05-28 | 2022-12-06 | (주)티에스이 | 이종 재질의 다층 회로기판 및 그 제조 방법 |
| EP4099807A1 (en) * | 2021-06-01 | 2022-12-07 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Component carrier interconnection and manufacturing method |
| CN116939950A (zh) * | 2022-04-08 | 2023-10-24 | Dsbj私人有限公司 | 在内部铜焊盘上设有阻焊层的电路板 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3705370B2 (ja) * | 1995-04-11 | 2005-10-12 | 日立化成工業株式会社 | 多層プリント配線板の製造方法 |
| US6163957A (en) * | 1998-11-13 | 2000-12-26 | Fujitsu Limited | Multilayer laminated substrates with high density interconnects and methods of making the same |
| US6326555B1 (en) * | 1999-02-26 | 2001-12-04 | Fujitsu Limited | Method and structure of z-connected laminated substrate for high density electronic packaging |
| US6638607B1 (en) * | 2002-10-30 | 2003-10-28 | International Business Machines Corporation | Method and structure for producing Z-axis interconnection assembly of printed wiring board elements |
| JP2007129124A (ja) * | 2005-11-07 | 2007-05-24 | Matsushita Electric Ind Co Ltd | 多層プリント配線基板及びその製造方法 |
| JP4073945B1 (ja) * | 2007-01-12 | 2008-04-09 | 新光電気工業株式会社 | 多層配線基板の製造方法 |
| JP5756922B2 (ja) * | 2011-05-24 | 2015-07-29 | パナソニックIpマネジメント株式会社 | 樹脂組成物、樹脂ワニス、プリプレグ、金属張積層板、及びプリント配線板 |
| WO2013023101A1 (en) * | 2011-08-10 | 2013-02-14 | Cac, Inc. | Multiple layer z-axis interconnect apparatus and method of use |
-
2014
- 2014-02-18 WO PCT/US2014/016999 patent/WO2014127381A1/en not_active Ceased
- 2014-02-18 US US14/183,488 patent/US9545017B2/en active Active
- 2014-02-18 JP JP2015558214A patent/JP6423369B2/ja active Active
- 2014-02-18 KR KR1020157025261A patent/KR102229384B1/ko active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024112064A1 (ko) * | 2022-11-23 | 2024-05-30 | 한국전자기술연구원 | 일괄적층형 다층 폴리이미드 회로배선기판 및 그의 제조방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20160003635A (ko) | 2016-01-11 |
| WO2014127381A1 (en) | 2014-08-21 |
| US9545017B2 (en) | 2017-01-10 |
| US20140231126A1 (en) | 2014-08-21 |
| JP6423369B2 (ja) | 2018-11-14 |
| JP2016510169A (ja) | 2016-04-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102229384B1 (ko) | 다층 전자 기판의 z-축 상호 연결 구조물 | |
| US6664127B2 (en) | Method of manufacturing multi-layer printed wiring board | |
| US6972070B2 (en) | Method of manufacturing a printed wiring board | |
| KR102433141B1 (ko) | 인터포져 층과 전도성 페이스트를 사용하는 다층 회로 기판 | |
| CN101124861B (zh) | 半导体装置用多层印刷线路板及其制造方法 | |
| JP3375555B2 (ja) | 回路部品内蔵モジュールおよびその製造方法 | |
| JPH107933A (ja) | 焼結性組成物及びそれを用いた多層電気的組立体並びにその製造方法 | |
| JP3981090B2 (ja) | 電子機器装置の製造方法 | |
| JP4765125B2 (ja) | 多層プリント配線板形成用多層基材及び多層プリント配線板 | |
| US11477893B2 (en) | Catalytic laminate with conductive traces formed during lamination | |
| JP2004234900A (ja) | 導電性粒子を用いた導電性ペースト、及び、これを用いた接続用シート | |
| JP4481734B2 (ja) | 多層配線基板用導電性ペースト組成物 | |
| JP5077800B2 (ja) | 多層プリント配線板の製造方法 | |
| KR101281898B1 (ko) | 다층 프린트배선판 및 그 제조방법 | |
| JP2009065009A (ja) | 多層配線基板 | |
| JP4881193B2 (ja) | 導電性ペースト組成物 | |
| JP4481733B2 (ja) | 多層配線基板用導電性ペースト組成物 | |
| JP2004327744A (ja) | 多層配線基板及びその製造方法 | |
| JP4965286B2 (ja) | 多層配線基板 | |
| JP2005039136A (ja) | 回路基板および回路基板の接続方法 | |
| JP2008181915A (ja) | 多層プリント配線板及びその製造方法 | |
| JP4277723B2 (ja) | 多層回路基板及び多層回路基板の製造方法 | |
| JP5077801B2 (ja) | 多層プリント配線板の製造方法 | |
| CN116939950A (zh) | 在内部铜焊盘上设有阻焊层的电路板 | |
| JP2005235981A (ja) | 多層回路基板の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20150914 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20190129 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20200316 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20210107 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20210312 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20210312 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20240119 Start annual number: 4 End annual number: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 20250108 Start annual number: 5 End annual number: 5 |