KR102175071B1 - 이미지 인식 기반 어블레이션 패턴 위치 소환 - Google Patents
이미지 인식 기반 어블레이션 패턴 위치 소환 Download PDFInfo
- Publication number
- KR102175071B1 KR102175071B1 KR1020157029476A KR20157029476A KR102175071B1 KR 102175071 B1 KR102175071 B1 KR 102175071B1 KR 1020157029476 A KR1020157029476 A KR 1020157029476A KR 20157029476 A KR20157029476 A KR 20157029476A KR 102175071 B1 KR102175071 B1 KR 102175071B1
- Authority
- KR
- South Korea
- Prior art keywords
- laser
- sample
- intended
- positioning
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/182—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by the machine tool function, e.g. thread cutting, cam making, tool direction control
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/70—Determining position or orientation of objects or cameras
- G06T7/73—Determining position or orientation of objects or cameras using feature-based methods
- G06T7/74—Determining position or orientation of objects or cameras using feature-based methods involving reference images or patches
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/04—Devices for withdrawing samples in the solid state, e.g. by cutting
- G01N2001/045—Laser ablation; Microwave vaporisation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/50—Machine tool, machine tool null till machine tool work handling
- G05B2219/50057—Compensation error by probing test, machined piece, post or pre process
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0459—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for solid samples
- H01J49/0463—Desorption by laser or particle beam, followed by ionisation as a separate step
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Human Computer Interaction (AREA)
- Laser Beam Processing (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Image Analysis (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Sampling And Sample Adjustment (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020207031514A KR102294198B1 (ko) | 2013-03-15 | 2014-03-14 | 이미지 인식 기반 어블레이션 패턴 위치 소환 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361792016P | 2013-03-15 | 2013-03-15 | |
| US61/792,016 | 2013-03-15 | ||
| PCT/US2014/028241 WO2014144012A1 (en) | 2013-03-15 | 2014-03-14 | Image recognition base ablation pattern position recall |
| US14/211,976 US10026195B2 (en) | 2013-03-15 | 2014-03-14 | Image recognition base ablation pattern position recall |
| US14/211,976 | 2014-03-14 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207031514A Division KR102294198B1 (ko) | 2013-03-15 | 2014-03-14 | 이미지 인식 기반 어블레이션 패턴 위치 소환 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20150129853A KR20150129853A (ko) | 2015-11-20 |
| KR102175071B1 true KR102175071B1 (ko) | 2020-11-06 |
Family
ID=51537588
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207031514A Active KR102294198B1 (ko) | 2013-03-15 | 2014-03-14 | 이미지 인식 기반 어블레이션 패턴 위치 소환 |
| KR1020157029476A Active KR102175071B1 (ko) | 2013-03-15 | 2014-03-14 | 이미지 인식 기반 어블레이션 패턴 위치 소환 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207031514A Active KR102294198B1 (ko) | 2013-03-15 | 2014-03-14 | 이미지 인식 기반 어블레이션 패턴 위치 소환 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10026195B2 (enExample) |
| JP (2) | JP6290371B2 (enExample) |
| KR (2) | KR102294198B1 (enExample) |
| CN (1) | CN105229446B (enExample) |
| WO (1) | WO2014144012A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016042165A1 (en) * | 2014-09-18 | 2016-03-24 | Universiteit Gent | Laser ablation probe |
| JP6955931B2 (ja) * | 2017-08-22 | 2021-10-27 | 株式会社ディスコ | 検査用ウエーハ及びエネルギー分布の検査方法 |
| KR101976441B1 (ko) | 2018-11-27 | 2019-08-28 | 주식회사 21세기 | 펨토초 레이저를 이용한 초정밀 블레이드 엣지 가공방법 |
| KR102028864B1 (ko) * | 2019-05-07 | 2019-11-04 | 연세대학교 산학협력단 | 광원 위치를 보정하기 위한 현미경 장치 및 그 방법 |
| JP6997480B2 (ja) * | 2020-05-12 | 2022-01-17 | オーケーラボ有限会社 | レーザー走査顕微鏡、レーザー走査顕微鏡システム及びレーザーアブレーションシステム |
| CN117388043B (zh) | 2023-11-02 | 2024-03-29 | 中国地质科学院地质研究所 | 一种单颗粒榍石的溶解方法及单颗粒榍石的(铀-钍)/氦定年方法 |
| CN118514871B (zh) * | 2024-07-19 | 2024-09-24 | 江西飞行学院 | 一种激光烧蚀反制无人机试验方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070031993A1 (en) | 2002-05-17 | 2007-02-08 | Gsi Lumonics Corporation | Method and system for machine vision-based feature detection and mark verification in a workpiece or wafer marking system |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5523543A (en) * | 1994-09-09 | 1996-06-04 | Litel Instruments | Laser ablation control system and method |
| JP3210227B2 (ja) * | 1995-11-10 | 2001-09-17 | 日本電子株式会社 | レーザアブレーション分析装置 |
| US5844149A (en) * | 1996-09-19 | 1998-12-01 | Nkk Corporation | Method for analyzing solid specimen and apparatus therefor |
| JPH11201944A (ja) * | 1998-01-09 | 1999-07-30 | Jeol Ltd | レーザーアブレーション装置 |
| JP3610771B2 (ja) * | 1998-04-13 | 2005-01-19 | 松下電器産業株式会社 | ワークの位置認識方法 |
| JP3763229B2 (ja) * | 1999-05-11 | 2006-04-05 | 松下電器産業株式会社 | 画像認識による位置検出方法 |
| AU2002223490A1 (en) * | 2000-11-13 | 2002-05-21 | Micmacmo Aps | Laser ablation |
| JP2003270208A (ja) * | 2002-03-14 | 2003-09-25 | Tdk Corp | 試料ホルダ、レーザアブレーション装置、レーザアブレーション方法、試料分析装置、試料分析方法及び試料ホルダ用保持台 |
| KR20040016067A (ko) * | 2002-08-14 | 2004-02-21 | 삼성전자주식회사 | 감광막 노광 방법 및 이를 이용한 노광 설비 |
| GB2399311B (en) | 2003-03-04 | 2005-06-15 | Xsil Technology Ltd | Laser machining using an active assist gas |
| JP4284104B2 (ja) * | 2003-05-14 | 2009-06-24 | 株式会社日立ハイテクノロジーズ | 大気圧レーザイオン化質量分析装置 |
| US7977026B2 (en) | 2004-02-06 | 2011-07-12 | Rohm And Haas Electronic Materials Llc | Imaging methods |
| CN1303400C (zh) * | 2005-03-04 | 2007-03-07 | 清华大学 | 超精密工作台自标定方法及装置 |
| US20070012665A1 (en) | 2005-07-12 | 2007-01-18 | Hewlett-Packard Development Company Lp | Laser ablation |
| WO2007027562A1 (en) * | 2005-08-31 | 2007-03-08 | Alcon Refractivehorizons, Inc. | System and method for automatic self-alignment of a surgical laser |
| JP2007102462A (ja) * | 2005-10-04 | 2007-04-19 | Nippon Telegr & Teleph Corp <Ntt> | 画像合成方法、システム、端末、および画像合成プログラム |
| GB0622232D0 (en) * | 2006-11-08 | 2006-12-20 | Rumsby Philip T | Method and apparatus for laser beam alignment for solar panel scribing |
| JP2008261837A (ja) * | 2007-03-20 | 2008-10-30 | Mitsubishi Chemicals Corp | マコーレート様構造を有する機能性微粒子 |
| US8274735B2 (en) * | 2007-09-14 | 2012-09-25 | Fry Robert C | Analytical laser ablation of solid samples for ICP, ICP-MS, and FAG-MS analysis |
| CN101990480A (zh) * | 2008-04-10 | 2011-03-23 | 应用材料股份有限公司 | 激光刻划平台与杂合书写策略 |
| WO2009126910A2 (en) * | 2008-04-11 | 2009-10-15 | Applied Materials, Inc. | Laser scribe inspection methods and systems |
| JP5384178B2 (ja) * | 2008-04-21 | 2014-01-08 | 株式会社森精機製作所 | 加工シミュレーション方法及び加工シミュレーション装置 |
| WO2009137494A1 (en) * | 2008-05-05 | 2009-11-12 | Applied Spectra, Inc. | Laser ablation apparatus and method |
| KR101026010B1 (ko) * | 2008-08-13 | 2011-03-30 | 삼성전기주식회사 | 레이저 가공장치 및 레이저 가공방법 |
| WO2011006156A2 (en) * | 2009-07-10 | 2011-01-13 | University Of Florida Research Foundation, Inc. | Method and apparatus to laser ablation-laser induced breakdown spectroscopy |
| JP5552798B2 (ja) * | 2009-11-11 | 2014-07-16 | 新日鐵住金株式会社 | レーザを用いた元素分析方法及び元素分析装置 |
| JP5359924B2 (ja) | 2010-02-18 | 2013-12-04 | 株式会社島津製作所 | 質量分析装置 |
| KR101249950B1 (ko) * | 2010-11-10 | 2013-04-11 | 유병소 | 이미지 취득 장치를 구비하는 레이저 리프트 오프 장비 및 이를 이용한 레이저 가공방법 |
| US8554353B2 (en) * | 2011-12-14 | 2013-10-08 | Gwangju Institute Of Science And Technology | Fabrication system of CIGS thin film solar cell equipped with real-time analysis facilities for profiling the elemental components of CIGS thin film using laser-induced breakdown spectroscopy |
-
2014
- 2014-03-14 KR KR1020207031514A patent/KR102294198B1/ko active Active
- 2014-03-14 KR KR1020157029476A patent/KR102175071B1/ko active Active
- 2014-03-14 CN CN201480015608.XA patent/CN105229446B/zh active Active
- 2014-03-14 WO PCT/US2014/028241 patent/WO2014144012A1/en not_active Ceased
- 2014-03-14 JP JP2016502744A patent/JP6290371B2/ja active Active
- 2014-03-14 US US14/211,976 patent/US10026195B2/en active Active
-
2018
- 2018-02-07 JP JP2018020149A patent/JP6463526B2/ja active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070031993A1 (en) | 2002-05-17 | 2007-02-08 | Gsi Lumonics Corporation | Method and system for machine vision-based feature detection and mark verification in a workpiece or wafer marking system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150129853A (ko) | 2015-11-20 |
| KR20200128448A (ko) | 2020-11-12 |
| CN105229446B (zh) | 2017-10-10 |
| JP6290371B2 (ja) | 2018-03-07 |
| US10026195B2 (en) | 2018-07-17 |
| CN105229446A (zh) | 2016-01-06 |
| US20140288693A1 (en) | 2014-09-25 |
| KR102294198B1 (ko) | 2021-08-30 |
| JP2018126788A (ja) | 2018-08-16 |
| JP6463526B2 (ja) | 2019-02-06 |
| WO2014144012A1 (en) | 2014-09-18 |
| JP2016519289A (ja) | 2016-06-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20151014 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20190313 Comment text: Request for Examination of Application |
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| PN2301 | Change of applicant |
Patent event date: 20190417 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20200731 |
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| PA0104 | Divisional application for international application |
Comment text: Divisional Application for International Patent Patent event code: PA01041R01D Patent event date: 20201030 |
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| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20201030 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20201102 End annual number: 3 Start annual number: 1 |
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| PG1601 | Publication of registration | ||
| PR1001 | Payment of annual fee |
Payment date: 20241015 Start annual number: 5 End annual number: 5 |