JP2016519289A - 画像認識に基づくアブレーションパターン位置の再現 - Google Patents
画像認識に基づくアブレーションパターン位置の再現 Download PDFInfo
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- JP2016519289A JP2016519289A JP2016502744A JP2016502744A JP2016519289A JP 2016519289 A JP2016519289 A JP 2016519289A JP 2016502744 A JP2016502744 A JP 2016502744A JP 2016502744 A JP2016502744 A JP 2016502744A JP 2016519289 A JP2016519289 A JP 2016519289A
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- 238000002679 ablation Methods 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 37
- 230000008569 process Effects 0.000 claims abstract description 18
- 239000013078 crystal Substances 0.000 claims description 29
- 238000000608 laser ablation Methods 0.000 claims description 12
- 238000012937 correction Methods 0.000 claims description 8
- 238000002474 experimental method Methods 0.000 claims description 4
- 238000005286 illumination Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000005070 sampling Methods 0.000 claims description 2
- 229910052845 zircon Inorganic materials 0.000 abstract description 23
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 abstract description 23
- 238000004458 analytical method Methods 0.000 abstract description 6
- 239000002245 particle Substances 0.000 description 11
- 239000012159 carrier gas Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 4
- 230000002457 bidirectional effect Effects 0.000 description 3
- 229910052770 Uranium Inorganic materials 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000005258 radioactive decay Effects 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical group [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008713 feedback mechanism Effects 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/182—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by the machine tool function, e.g. thread cutting, cam making, tool direction control
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/70—Determining position or orientation of objects or cameras
- G06T7/73—Determining position or orientation of objects or cameras using feature-based methods
- G06T7/74—Determining position or orientation of objects or cameras using feature-based methods involving reference images or patches
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/04—Devices for withdrawing samples in the solid state, e.g. by cutting
- G01N2001/045—Laser ablation; Microwave vaporisation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/50—Machine tool, machine tool null till machine tool work handling
- G05B2219/50057—Compensation error by probing test, machined piece, post or pre process
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0459—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for solid samples
- H01J49/0463—Desorption by laser or particle beam, followed by ionisation as a separate step
Abstract
Description
Claims (5)
- レーザアブレーション手順中に支持面上の試料上の結晶粒上でレーザを位置決めするための方法であって、
運動制御システムを用いてレーザに対して前記試料を前記試料上の複数のレーザ予定位置に位置決めし、
それぞれのレーザ予定位置に対して位置座標を保存し、
前記レーザ予定位置のうち少なくとも1つに対するカーネル画像を保存することにより、
スキャン配置プロセス中に試料用のアブレーションパターンを設定し、
前記レーザ予定位置のうち選択されたものの前記保存された座標に基づいて保存されたカーネル画像を用いて前記試料に対して前記レーザを現在の位置に位置決めし、
前記現在の位置の現在の画像を前記レーザ予定に対する前記保存されたカーネル画像と比較し、
前記比較に基づいて位置誤差を決定し、
前記位置誤差が許容範囲内にない場合に、前記運動制御システムを用いて前記位置誤差に基づいて前記試料に対して前記レーザのオフセット移動を行って、前記位置誤差を補正し、前記比較と決定のステップを繰り返し、
前記位置誤差が前記許容範囲内にある場合に、前記レーザ予定位置上にレーザビームを照射することにより、
実験を開始する
方法。 - 前記運動制御システムは開ループシステムであり、
前記現在の位置は開ループを仮定した補正位置である、
請求項1の方法。 - 前記カーネル画像及び前記現在の画像を前記レーザに対して固定されたカメラにより撮影する、請求項1の方法。
- 前記試料に対して前記レーザを現在の位置に位置決めするステップは、基準ブランクをサンプリングした後に行われる、請求項1の方法。
- 前記レーザ予定位置のうち少なくとも1つに対するカーネル画像を保存するステップでは、さらに、前記カーネル画像をキャプチャする際に使用される照明レベル、ズームレベル、又はカメラ特性のうち少なくとも1つを保存する、請求項1の方法。
Applications Claiming Priority (5)
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US201361792016P | 2013-03-15 | 2013-03-15 | |
US61/792,016 | 2013-03-15 | ||
US14/211,976 | 2014-03-14 | ||
PCT/US2014/028241 WO2014144012A1 (en) | 2013-03-15 | 2014-03-14 | Image recognition base ablation pattern position recall |
US14/211,976 US10026195B2 (en) | 2013-03-15 | 2014-03-14 | Image recognition base ablation pattern position recall |
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JP2018020149A Division JP6463526B2 (ja) | 2013-03-15 | 2018-02-07 | レーザアブレーション装置 |
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JP2016519289A true JP2016519289A (ja) | 2016-06-30 |
JP2016519289A5 JP2016519289A5 (ja) | 2017-03-23 |
JP6290371B2 JP6290371B2 (ja) | 2018-03-07 |
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JP2016502744A Active JP6290371B2 (ja) | 2013-03-15 | 2014-03-14 | 画像認識に基づくアブレーションパターン位置の再現 |
JP2018020149A Active JP6463526B2 (ja) | 2013-03-15 | 2018-02-07 | レーザアブレーション装置 |
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US (1) | US10026195B2 (ja) |
JP (2) | JP6290371B2 (ja) |
KR (2) | KR102175071B1 (ja) |
CN (1) | CN105229446B (ja) |
WO (1) | WO2014144012A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2021179608A (ja) * | 2020-05-12 | 2021-11-18 | オーケーラボ有限会社 | レーザー走査顕微鏡、レーザー走査顕微鏡システム及びレーザーアブレーションシステム |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US11293872B2 (en) * | 2014-09-18 | 2022-04-05 | Universiteit Gent | Laser ablation probe |
JP6955931B2 (ja) * | 2017-08-22 | 2021-10-27 | 株式会社ディスコ | 検査用ウエーハ及びエネルギー分布の検査方法 |
KR101976441B1 (ko) * | 2018-11-27 | 2019-08-28 | 주식회사 21세기 | 펨토초 레이저를 이용한 초정밀 블레이드 엣지 가공방법 |
KR102028864B1 (ko) * | 2019-05-07 | 2019-11-04 | 연세대학교 산학협력단 | 광원 위치를 보정하기 위한 현미경 장치 및 그 방법 |
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2014
- 2014-03-14 KR KR1020157029476A patent/KR102175071B1/ko active IP Right Grant
- 2014-03-14 JP JP2016502744A patent/JP6290371B2/ja active Active
- 2014-03-14 KR KR1020207031514A patent/KR102294198B1/ko active IP Right Grant
- 2014-03-14 CN CN201480015608.XA patent/CN105229446B/zh active Active
- 2014-03-14 US US14/211,976 patent/US10026195B2/en active Active
- 2014-03-14 WO PCT/US2014/028241 patent/WO2014144012A1/en active Application Filing
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2018
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Publication number | Publication date |
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KR20200128448A (ko) | 2020-11-12 |
US10026195B2 (en) | 2018-07-17 |
JP6290371B2 (ja) | 2018-03-07 |
KR20150129853A (ko) | 2015-11-20 |
KR102294198B1 (ko) | 2021-08-30 |
KR102175071B1 (ko) | 2020-11-06 |
CN105229446A (zh) | 2016-01-06 |
JP2018126788A (ja) | 2018-08-16 |
JP6463526B2 (ja) | 2019-02-06 |
CN105229446B (zh) | 2017-10-10 |
WO2014144012A1 (en) | 2014-09-18 |
US20140288693A1 (en) | 2014-09-25 |
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