KR102174869B1 - 금속 증발 재료 - Google Patents

금속 증발 재료 Download PDF

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Publication number
KR102174869B1
KR102174869B1 KR1020187031428A KR20187031428A KR102174869B1 KR 102174869 B1 KR102174869 B1 KR 102174869B1 KR 1020187031428 A KR1020187031428 A KR 1020187031428A KR 20187031428 A KR20187031428 A KR 20187031428A KR 102174869 B1 KR102174869 B1 KR 102174869B1
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KR
South Korea
Prior art keywords
metal
evaporation material
vapor pressure
melting point
base material
Prior art date
Application number
KR1020187031428A
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English (en)
Korean (ko)
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KR20180130546A (ko
Inventor
토시하루 쿠라우치
Original Assignee
울박, 인크
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Application filed by 울박, 인크 filed Critical 울박, 인크
Publication of KR20180130546A publication Critical patent/KR20180130546A/ko
Application granted granted Critical
Publication of KR102174869B1 publication Critical patent/KR102174869B1/ko

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/02Alloys based on gold
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
KR1020187031428A 2016-05-18 2017-05-12 금속 증발 재료 KR102174869B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016099815 2016-05-18
JPJP-P-2016-099815 2016-05-18
PCT/JP2017/018022 WO2017199873A1 (ja) 2016-05-18 2017-05-12 金属蒸発材料

Publications (2)

Publication Number Publication Date
KR20180130546A KR20180130546A (ko) 2018-12-07
KR102174869B1 true KR102174869B1 (ko) 2020-11-05

Family

ID=60325041

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187031428A KR102174869B1 (ko) 2016-05-18 2017-05-12 금속 증발 재료

Country Status (5)

Country Link
JP (1) JP6697073B2 (ja)
KR (1) KR102174869B1 (ja)
CN (1) CN109072413B (ja)
TW (1) TWI673373B (ja)
WO (1) WO2017199873A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6829340B1 (ja) * 2020-10-01 2021-02-10 松田産業株式会社 金の蒸着材料
JP7021448B1 (ja) 2020-10-01 2022-02-17 松田産業株式会社 金の蒸着材料
CN114284076B (zh) * 2021-12-31 2023-12-01 合肥工业大学 一种基于焦耳热高温快速制备高活性碳纤维超级电容器电极的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010210681A (ja) 2009-03-06 2010-09-24 Mitsubishi Electric Corp ミラーおよびその製造方法
JP2011074442A (ja) 2009-09-30 2011-04-14 Mitsubishi Electric Corp 真空蒸着装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61235556A (ja) * 1985-04-09 1986-10-20 Mitsubishi Heavy Ind Ltd 蒸発方法
JPS6250460A (ja) * 1985-08-30 1987-03-05 Mitsubishi Heavy Ind Ltd 蒸発方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010210681A (ja) 2009-03-06 2010-09-24 Mitsubishi Electric Corp ミラーおよびその製造方法
JP2011074442A (ja) 2009-09-30 2011-04-14 Mitsubishi Electric Corp 真空蒸着装置

Also Published As

Publication number Publication date
CN109072413B (zh) 2020-07-14
CN109072413A (zh) 2018-12-21
TW201812031A (zh) 2018-04-01
JP6697073B2 (ja) 2020-05-20
JPWO2017199873A1 (ja) 2018-11-22
WO2017199873A1 (ja) 2017-11-23
TWI673373B (zh) 2019-10-01
KR20180130546A (ko) 2018-12-07

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