CN109072413B - 金属蒸发材料 - Google Patents

金属蒸发材料 Download PDF

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Publication number
CN109072413B
CN109072413B CN201780027018.2A CN201780027018A CN109072413B CN 109072413 B CN109072413 B CN 109072413B CN 201780027018 A CN201780027018 A CN 201780027018A CN 109072413 B CN109072413 B CN 109072413B
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CN
China
Prior art keywords
metal
evaporation material
vapor pressure
additive
vapor
Prior art date
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Active
Application number
CN201780027018.2A
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English (en)
Chinese (zh)
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CN109072413A (zh
Inventor
仓内利春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
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Ulvac Inc
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Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of CN109072413A publication Critical patent/CN109072413A/zh
Application granted granted Critical
Publication of CN109072413B publication Critical patent/CN109072413B/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/02—Alloys based on gold

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
CN201780027018.2A 2016-05-18 2017-05-12 金属蒸发材料 Active CN109072413B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016-099815 2016-05-18
JP2016099815 2016-05-18
PCT/JP2017/018022 WO2017199873A1 (ja) 2016-05-18 2017-05-12 金属蒸発材料

Publications (2)

Publication Number Publication Date
CN109072413A CN109072413A (zh) 2018-12-21
CN109072413B true CN109072413B (zh) 2020-07-14

Family

ID=60325041

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780027018.2A Active CN109072413B (zh) 2016-05-18 2017-05-12 金属蒸发材料

Country Status (5)

Country Link
JP (1) JP6697073B2 (ja)
KR (1) KR102174869B1 (ja)
CN (1) CN109072413B (ja)
TW (1) TWI673373B (ja)
WO (1) WO2017199873A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6829340B1 (ja) * 2020-10-01 2021-02-10 松田産業株式会社 金の蒸着材料
JP7021448B1 (ja) 2020-10-01 2022-02-17 松田産業株式会社 金の蒸着材料
CN114284076B (zh) * 2021-12-31 2023-12-01 合肥工业大学 一种基于焦耳热高温快速制备高活性碳纤维超级电容器电极的方法
WO2024209755A1 (ja) * 2023-04-05 2024-10-10 株式会社アルバック 真空蒸着装置用の蒸着源及び真空蒸着方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61235556A (ja) * 1985-04-09 1986-10-20 Mitsubishi Heavy Ind Ltd 蒸発方法
JPS6250460A (ja) * 1985-08-30 1987-03-05 Mitsubishi Heavy Ind Ltd 蒸発方法
JP2010210681A (ja) * 2009-03-06 2010-09-24 Mitsubishi Electric Corp ミラーおよびその製造方法
JP2011074442A (ja) * 2009-09-30 2011-04-14 Mitsubishi Electric Corp 真空蒸着装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61235556A (ja) * 1985-04-09 1986-10-20 Mitsubishi Heavy Ind Ltd 蒸発方法
JPS6250460A (ja) * 1985-08-30 1987-03-05 Mitsubishi Heavy Ind Ltd 蒸発方法
JP2010210681A (ja) * 2009-03-06 2010-09-24 Mitsubishi Electric Corp ミラーおよびその製造方法
JP2011074442A (ja) * 2009-09-30 2011-04-14 Mitsubishi Electric Corp 真空蒸着装置

Also Published As

Publication number Publication date
TW201812031A (zh) 2018-04-01
KR102174869B1 (ko) 2020-11-05
WO2017199873A1 (ja) 2017-11-23
CN109072413A (zh) 2018-12-21
JPWO2017199873A1 (ja) 2018-11-22
JP6697073B2 (ja) 2020-05-20
KR20180130546A (ko) 2018-12-07
TWI673373B (zh) 2019-10-01

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