KR102168151B1 - 위상 시프트 마스크 및 그의 제조방법 - Google Patents

위상 시프트 마스크 및 그의 제조방법 Download PDF

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Publication number
KR102168151B1
KR102168151B1 KR1020157015967A KR20157015967A KR102168151B1 KR 102168151 B1 KR102168151 B1 KR 102168151B1 KR 1020157015967 A KR1020157015967 A KR 1020157015967A KR 20157015967 A KR20157015967 A KR 20157015967A KR 102168151 B1 KR102168151 B1 KR 102168151B1
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KR
South Korea
Prior art keywords
phase shift
line
layer
light
transmittance
Prior art date
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KR1020157015967A
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English (en)
Korean (ko)
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KR20150102004A (ko
Inventor
사토루 모치쥬키
다이슈케 나카무라
카게히로 카지야마
Original Assignee
알박 세이마쿠 가부시키가이샤
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Publication of KR20150102004A publication Critical patent/KR20150102004A/ko
Application granted granted Critical
Publication of KR102168151B1 publication Critical patent/KR102168151B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020157015967A 2012-12-27 2013-12-19 위상 시프트 마스크 및 그의 제조방법 KR102168151B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012285845 2012-12-27
JPJP-P-2012-285845 2012-12-27
PCT/JP2013/084059 WO2014103867A1 (ja) 2012-12-27 2013-12-19 位相シフトマスクおよびその製造方法

Publications (2)

Publication Number Publication Date
KR20150102004A KR20150102004A (ko) 2015-09-04
KR102168151B1 true KR102168151B1 (ko) 2020-10-20

Family

ID=51020954

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157015967A KR102168151B1 (ko) 2012-12-27 2013-12-19 위상 시프트 마스크 및 그의 제조방법

Country Status (5)

Country Link
JP (1) JP5982013B2 (zh)
KR (1) KR102168151B1 (zh)
CN (1) CN104737072B (zh)
TW (1) TWI592738B (zh)
WO (1) WO2014103867A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6767735B2 (ja) * 2015-06-30 2020-10-14 Hoya株式会社 フォトマスク、フォトマスクの設計方法、フォトマスクブランク、および表示装置の製造方法
JP6259508B1 (ja) * 2016-12-28 2018-01-10 株式会社エスケーエレクトロニクス ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法
JP7176843B2 (ja) * 2017-01-18 2022-11-22 Hoya株式会社 表示装置製造用の位相シフトマスクブランク、表示装置製造用の位相シフトマスクの製造方法、並びに表示装置の製造方法
JP6840807B2 (ja) * 2019-09-10 2021-03-10 Hoya株式会社 フォトマスクの設計方法および製造方法、並びに表示装置の製造方法
KR20210099922A (ko) 2020-02-05 2021-08-13 정현서 바이오헬스 기술을 이용한 스마트 글래스

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012230379A (ja) * 2011-04-22 2012-11-22 S&S Tech Corp ブランクマスク及びフォトマスク

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5674647A (en) * 1992-11-21 1997-10-07 Ulvac Coating Corporation Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
JP3064769B2 (ja) * 1992-11-21 2000-07-12 アルバック成膜株式会社 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法
JPH0798493A (ja) * 1993-09-28 1995-04-11 Toppan Printing Co Ltd 位相シフトマスク及びその製造方法
JP2591469B2 (ja) * 1994-04-22 1997-03-19 日本電気株式会社 位相シフトマスクの製造方法
KR100800301B1 (ko) * 2005-07-05 2008-02-01 주식회사 에스앤에스텍 그레이톤 블랭크마스크 및 포토마스크 제조방법
KR100886802B1 (ko) * 2006-03-30 2009-03-04 주식회사 에스앤에스텍 블랭크마스크, 이를 이용한 투과 제어 슬릿 마스크 및 그제조방법
JP5588633B2 (ja) * 2009-06-30 2014-09-10 アルバック成膜株式会社 位相シフトマスクの製造方法、フラットパネルディスプレイの製造方法及び位相シフトマスク

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012230379A (ja) * 2011-04-22 2012-11-22 S&S Tech Corp ブランクマスク及びフォトマスク

Also Published As

Publication number Publication date
KR20150102004A (ko) 2015-09-04
WO2014103867A1 (ja) 2014-07-03
TW201435476A (zh) 2014-09-16
CN104737072B (zh) 2020-01-07
JP5982013B2 (ja) 2016-08-31
JPWO2014103867A1 (ja) 2017-01-12
CN104737072A (zh) 2015-06-24
TWI592738B (zh) 2017-07-21

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