KR102161039B1 - 컨트롤러 조정 시스템 및 조정 방법 - Google Patents
컨트롤러 조정 시스템 및 조정 방법 Download PDFInfo
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- KR102161039B1 KR102161039B1 KR1020180058203A KR20180058203A KR102161039B1 KR 102161039 B1 KR102161039 B1 KR 102161039B1 KR 1020180058203 A KR1020180058203 A KR 1020180058203A KR 20180058203 A KR20180058203 A KR 20180058203A KR 102161039 B1 KR102161039 B1 KR 102161039B1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B23/00—Testing or monitoring of control systems or parts thereof
- G05B23/02—Electric testing or monitoring
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/14—Automatic controllers electric in which the output signal represents a discontinuous function of the deviation from the desired value, i.e. discontinuous controllers
- G05B11/18—Multi-step controllers
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Health & Medical Sciences (AREA)
- Artificial Intelligence (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Evolutionary Computation (AREA)
- Medical Informatics (AREA)
- Software Systems (AREA)
- Feedback Control In General (AREA)
- Control Of Temperature (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017103410A JP6858077B2 (ja) | 2017-05-25 | 2017-05-25 | コントローラ調整システムおよび調整方法 |
JPJP-P-2017-103410 | 2017-05-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20180129660A KR20180129660A (ko) | 2018-12-05 |
KR102161039B1 true KR102161039B1 (ko) | 2020-09-29 |
Family
ID=64499901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020180058203A KR102161039B1 (ko) | 2017-05-25 | 2018-05-23 | 컨트롤러 조정 시스템 및 조정 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6858077B2 (zh) |
KR (1) | KR102161039B1 (zh) |
CN (1) | CN108958213B (zh) |
TW (1) | TWI677775B (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001296902A (ja) | 2000-04-14 | 2001-10-26 | Omron Corp | 制御装置、温度調節器および熱処理装置 |
JP2002519778A (ja) | 1998-05-15 | 2002-07-02 | バース・テック・リミテッド | マルチポイントデジタル温度制御装置 |
JP2007193527A (ja) | 2006-01-18 | 2007-08-02 | Omron Corp | ヒータ駆動制御方法 |
Family Cites Families (29)
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JPS5935212A (ja) * | 1982-08-20 | 1984-02-25 | Daido Steel Co Ltd | 複数の加熱域を有する炉の温度制御装置 |
JPH0459371A (ja) | 1990-06-29 | 1992-02-26 | Casio Comput Co Ltd | データ処理装置 |
US5895596A (en) * | 1997-01-27 | 1999-04-20 | Semitool Thermal | Model based temperature controller for semiconductor thermal processors |
US7635414B2 (en) * | 2003-11-03 | 2009-12-22 | Solaicx, Inc. | System for continuous growing of monocrystalline silicon |
JP2006113724A (ja) * | 2004-10-13 | 2006-04-27 | Omron Corp | 制御方法、温度制御方法、温度調節器、熱処理装置、プログラムおよび記録媒体 |
US7368303B2 (en) * | 2004-10-20 | 2008-05-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for temperature control in a rapid thermal processing system |
US7577493B2 (en) * | 2004-12-27 | 2009-08-18 | Hitachi Kokusai Electric Inc. | Temperature regulating method, thermal processing system and semiconductor device manufacturing method |
JP4373909B2 (ja) * | 2004-12-28 | 2009-11-25 | 本田技研工業株式会社 | プラントの温度制御装置 |
JP4978001B2 (ja) * | 2005-01-17 | 2012-07-18 | オムロン株式会社 | 温度制御方法、温度制御装置および熱処理装置 |
CN100570507C (zh) * | 2005-11-25 | 2009-12-16 | 夏普株式会社 | 成像装置中的温控装置及方法 |
JP4444915B2 (ja) * | 2005-12-15 | 2010-03-31 | 株式会社山武 | 制御装置および制御方法 |
JPWO2008105144A1 (ja) * | 2007-02-28 | 2010-06-03 | 株式会社山武 | センサ、センサの温度制御方法及び異常回復方法 |
KR20080109981A (ko) * | 2007-06-14 | 2008-12-18 | 주식회사 아이피에스 | 웨이퍼 가열 장치 제어 시스템, 및 방법 |
WO2009026970A1 (en) * | 2007-08-24 | 2009-03-05 | Carl Zeiss Smt Ag | Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography |
US8404572B2 (en) * | 2009-02-13 | 2013-03-26 | Taiwan Semiconductor Manufacturing Co., Ltd | Multi-zone temperature control for semiconductor wafer |
JP5428525B2 (ja) * | 2009-05-22 | 2014-02-26 | 富士電機株式会社 | 精密温調システム、その制御装置 |
JP6126083B2 (ja) * | 2011-05-17 | 2017-05-10 | キヤノン ユー.エス. ライフ サイエンシズ, インコーポレイテッドCanon U.S. Life Sciences, Inc. | マイクロ流体デバイス内で外部ヒータ・システムを使用するシステムおよび方法 |
JP5829066B2 (ja) * | 2011-07-11 | 2015-12-09 | アズビル株式会社 | 制御装置および方法 |
CN102354172B (zh) * | 2011-07-21 | 2013-04-17 | 张晓华 | 多温区电阻炉智能化综合温度控制系统 |
CN202904399U (zh) * | 2012-09-04 | 2013-04-24 | 中晟光电设备(上海)有限公司 | 温度控制系统及金属有机化学气相沉淀设备及半导体薄膜沉积设备 |
CN103668128B (zh) * | 2012-09-04 | 2016-02-24 | 中晟光电设备(上海)有限公司 | Mocvd设备、温度控制系统及控制方法 |
CN103805966A (zh) * | 2012-11-07 | 2014-05-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 用于加热静电卡盘上晶片的方法、系统及cvd设备 |
US9029740B2 (en) * | 2013-01-15 | 2015-05-12 | Nordson Corporation | Air impingement heater |
FR3015913B1 (fr) * | 2013-12-26 | 2016-05-13 | Fives Stein | Procede de pilotage d'une ligne de traitement thermique d'une bande metallique, et ligne pour la mise en oeuvre du procede. |
DE102014203657A1 (de) * | 2014-02-28 | 2015-09-03 | Siemens Aktiengesellschaft | Leistungsmodul und Schnittstellenmodul für eine Heizungssteuerung und/oder -regelung sowie modulares System zur Heizungssteuerung und/oder -regelung |
US10007255B2 (en) * | 2014-06-27 | 2018-06-26 | Sunedison Semiconductor Limited (Uen201334164H) | Systems and methods for controlling temperatures in an epitaxial reactor |
US20160096326A1 (en) * | 2014-10-03 | 2016-04-07 | Tyco Electronics Corporation | Selective zone temperature control build plate |
CN104865989B (zh) * | 2015-03-26 | 2017-02-22 | 中南大学 | 一种用于温度场分区控制系统的解耦控制方法及系统 |
CN105034394B (zh) * | 2015-06-26 | 2017-06-20 | 西安交通大学 | 一种大尺寸激光选区烧结分区域预热方法 |
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2017
- 2017-05-25 JP JP2017103410A patent/JP6858077B2/ja active Active
-
2018
- 2018-05-23 CN CN201810500843.6A patent/CN108958213B/zh active Active
- 2018-05-23 KR KR1020180058203A patent/KR102161039B1/ko active IP Right Grant
- 2018-05-24 TW TW107117691A patent/TWI677775B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002519778A (ja) | 1998-05-15 | 2002-07-02 | バース・テック・リミテッド | マルチポイントデジタル温度制御装置 |
JP2001296902A (ja) | 2000-04-14 | 2001-10-26 | Omron Corp | 制御装置、温度調節器および熱処理装置 |
JP2007193527A (ja) | 2006-01-18 | 2007-08-02 | Omron Corp | ヒータ駆動制御方法 |
Also Published As
Publication number | Publication date |
---|---|
CN108958213B (zh) | 2021-03-23 |
KR20180129660A (ko) | 2018-12-05 |
JP6858077B2 (ja) | 2021-04-14 |
JP2018198032A (ja) | 2018-12-13 |
CN108958213A (zh) | 2018-12-07 |
TW201907258A (zh) | 2019-02-16 |
TWI677775B (zh) | 2019-11-21 |
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