KR102139020B1 - 기판 처리 장치 및 기판 처리 방법 - Google Patents

기판 처리 장치 및 기판 처리 방법 Download PDF

Info

Publication number
KR102139020B1
KR102139020B1 KR1020197006620A KR20197006620A KR102139020B1 KR 102139020 B1 KR102139020 B1 KR 102139020B1 KR 1020197006620 A KR1020197006620 A KR 1020197006620A KR 20197006620 A KR20197006620 A KR 20197006620A KR 102139020 B1 KR102139020 B1 KR 102139020B1
Authority
KR
South Korea
Prior art keywords
chamber
substrate
cup
cup portion
chamber body
Prior art date
Application number
KR1020197006620A
Other languages
English (en)
Korean (ko)
Other versions
KR20190034654A (ko
Inventor
다케미츠 미우라
Original Assignee
가부시키가이샤 스크린 홀딩스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 스크린 홀딩스 filed Critical 가부시키가이샤 스크린 홀딩스
Publication of KR20190034654A publication Critical patent/KR20190034654A/ko
Application granted granted Critical
Publication of KR102139020B1 publication Critical patent/KR102139020B1/ko

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
KR1020197006620A 2016-09-23 2017-07-10 기판 처리 장치 및 기판 처리 방법 KR102139020B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2016-185657 2016-09-23
JP2016185657A JP6706564B2 (ja) 2016-09-23 2016-09-23 基板処理装置および基板処理方法
PCT/JP2017/025122 WO2018055877A1 (ja) 2016-09-23 2017-07-10 基板処理装置および基板処理方法

Publications (2)

Publication Number Publication Date
KR20190034654A KR20190034654A (ko) 2019-04-02
KR102139020B1 true KR102139020B1 (ko) 2020-07-28

Family

ID=61690264

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197006620A KR102139020B1 (ko) 2016-09-23 2017-07-10 기판 처리 장치 및 기판 처리 방법

Country Status (5)

Country Link
JP (1) JP6706564B2 (ja)
KR (1) KR102139020B1 (ja)
CN (1) CN109716489B (ja)
TW (1) TWI635529B (ja)
WO (1) WO2018055877A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7055720B2 (ja) * 2018-08-10 2022-04-18 株式会社荏原製作所 基板回転装置、基板洗浄装置および基板処理装置ならびに基板回転装置の制御方法
KR102583555B1 (ko) * 2020-12-09 2023-09-26 세메스 주식회사 처리액 공급 유닛을 포함하는 기판 처리 장치 및 기판 처리 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014049605A (ja) 2012-08-31 2014-03-17 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2014179491A (ja) 2013-03-15 2014-09-25 Dainippon Screen Mfg Co Ltd 基板処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4803592B2 (ja) * 2006-06-16 2011-10-26 東京エレクトロン株式会社 液処理装置および液処理方法
KR100900628B1 (ko) * 2006-09-15 2009-06-02 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법
JP5606992B2 (ja) * 2011-06-09 2014-10-15 東京エレクトロン株式会社 液処理装置および液処理方法
JP6057624B2 (ja) * 2012-09-03 2017-01-11 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ カップおよび基板処理装置
JP6017262B2 (ja) * 2012-10-25 2016-10-26 東京エレクトロン株式会社 基板処理装置および基板処理方法
JP5956946B2 (ja) * 2013-03-13 2016-07-27 東京エレクトロン株式会社 液処理装置および液処理方法
JP2014179489A (ja) * 2013-03-15 2014-09-25 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2015012013A (ja) * 2013-06-26 2015-01-19 京セラ株式会社 多層配線基板およびそれを備えたプローブカード用基板
CN105849871B (zh) * 2013-12-25 2018-05-29 株式会社思可林集团 基板处理装置
JP6057886B2 (ja) * 2013-12-25 2017-01-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014049605A (ja) 2012-08-31 2014-03-17 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2014179491A (ja) 2013-03-15 2014-09-25 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
TWI635529B (zh) 2018-09-11
WO2018055877A1 (ja) 2018-03-29
KR20190034654A (ko) 2019-04-02
TW201814766A (zh) 2018-04-16
JP2018049985A (ja) 2018-03-29
CN109716489A (zh) 2019-05-03
CN109716489B (zh) 2022-11-15
JP6706564B2 (ja) 2020-06-10

Similar Documents

Publication Publication Date Title
KR102389767B1 (ko) 기판 처리 장치
KR101699657B1 (ko) 기판 처리 장치
KR101512560B1 (ko) 기판처리장치
JP6010398B2 (ja) 基板処理装置
KR101756047B1 (ko) 기판 처리 장치
JP2014194965A (ja) 基板処理装置
JP5978071B2 (ja) 基板処理装置
JP5973299B2 (ja) 基板処理装置
JP5973300B2 (ja) 基板処理装置
KR102139020B1 (ko) 기판 처리 장치 및 기판 처리 방법
JP6292934B2 (ja) 基板処理装置
JP6294121B2 (ja) 基板処理装置
JP6230941B2 (ja) 基板処理装置
JP6057886B2 (ja) 基板処理装置
JP6211424B2 (ja) 基板処理装置
JP6208028B2 (ja) 基板処理装置
JPH08172075A (ja) ドライエッチング装置
JP6216279B2 (ja) 基板処理装置
JP5936505B2 (ja) 基板処理装置
JP6258741B2 (ja) 基板処理装置
JP2015188031A (ja) 基板処理装置

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant