KR102119429B1 - 노광 묘화 장치, 노광 묘화 시스템, 프로그램, 및 노광 묘화 방법 - Google Patents

노광 묘화 장치, 노광 묘화 시스템, 프로그램, 및 노광 묘화 방법 Download PDF

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KR102119429B1
KR102119429B1 KR1020157005395A KR20157005395A KR102119429B1 KR 102119429 B1 KR102119429 B1 KR 102119429B1 KR 1020157005395 A KR1020157005395 A KR 1020157005395A KR 20157005395 A KR20157005395 A KR 20157005395A KR 102119429 B1 KR102119429 B1 KR 102119429B1
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South Korea
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information
exposure
image
substrate
exposed
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KR1020157005395A
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English (en)
Korean (ko)
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KR20150060682A (ko
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유키히사 오자키
준이치 사토
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가부시키가이샤 아도테크 엔지니어링
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Publication of KR20150060682A publication Critical patent/KR20150060682A/ko
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Publication of KR102119429B1 publication Critical patent/KR102119429B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020157005395A 2012-09-27 2013-08-27 노광 묘화 장치, 노광 묘화 시스템, 프로그램, 및 노광 묘화 방법 KR102119429B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-215122 2012-09-27
JP2012215122A JP6198378B2 (ja) 2012-09-27 2012-09-27 露光描画装置、露光描画システム、プログラム及び露光描画方法
PCT/JP2013/072818 WO2014050405A1 (ja) 2012-09-27 2013-08-27 露光描画装置、露光描画システム、プログラム及び露光描画方法

Publications (2)

Publication Number Publication Date
KR20150060682A KR20150060682A (ko) 2015-06-03
KR102119429B1 true KR102119429B1 (ko) 2020-06-05

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KR1020157005395A KR102119429B1 (ko) 2012-09-27 2013-08-27 노광 묘화 장치, 노광 묘화 시스템, 프로그램, 및 노광 묘화 방법

Country Status (5)

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JP (1) JP6198378B2 (ja)
KR (1) KR102119429B1 (ja)
CN (1) CN104662479B (ja)
TW (1) TWI606307B (ja)
WO (1) WO2014050405A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6096453B2 (ja) * 2012-09-27 2017-03-15 株式会社アドテックエンジニアリング 露光描画装置、露光描画システム、プログラム及び露光描画方法
CN110741746B (zh) * 2017-06-07 2021-05-04 株式会社富士 元件判定系统及元件判定方法
TWI725393B (zh) * 2019-03-12 2021-04-21 萬里科技股份有限公司 用於戒指攝影的轉盤與光箱

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284231A (ja) * 2000-03-31 2001-10-12 Canon Inc 露光装置及びエラー発生時のパターンで処理を振り分ける方法
JP2004279446A (ja) * 2003-03-12 2004-10-07 Shinko Electric Ind Co Ltd パターン描画装置、パターン描画方法、および検査装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6172216A (ja) * 1984-09-17 1986-04-14 Shinku Lab:Kk 露光方法
JPH11307424A (ja) * 1998-04-22 1999-11-05 Hitachi Ltd 半導体製造方法および製造装置、ならびにそれにより製造された半導体デバイス
JP2002341550A (ja) * 2001-05-17 2002-11-27 Dainippon Screen Mfg Co Ltd レーザー露光装置
JP4034975B2 (ja) * 2002-02-13 2008-01-16 株式会社ルネサステクノロジ 半導体デバイスの製造方法
JP4317488B2 (ja) * 2004-05-28 2009-08-19 株式会社オーク製作所 露光装置、露光方法および露光処理プログラム
JP4606990B2 (ja) * 2005-10-07 2011-01-05 富士フイルム株式会社 デジタル露光装置
JP2008242218A (ja) * 2007-03-28 2008-10-09 Fujifilm Corp 描画装置及び描画方法
JP4922071B2 (ja) * 2007-05-28 2012-04-25 株式会社オーク製作所 露光描画装置
JP5004786B2 (ja) * 2007-12-27 2012-08-22 株式会社オーク製作所 露光装置の反転部
JP2009223262A (ja) * 2008-03-19 2009-10-01 Orc Mfg Co Ltd 露光システムおよび露光方法
JP5333063B2 (ja) * 2009-08-28 2013-11-06 ウシオ電機株式会社 両面露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284231A (ja) * 2000-03-31 2001-10-12 Canon Inc 露光装置及びエラー発生時のパターンで処理を振り分ける方法
JP2004279446A (ja) * 2003-03-12 2004-10-07 Shinko Electric Ind Co Ltd パターン描画装置、パターン描画方法、および検査装置

Also Published As

Publication number Publication date
CN104662479A (zh) 2015-05-27
JP6198378B2 (ja) 2017-09-20
KR20150060682A (ko) 2015-06-03
TWI606307B (zh) 2017-11-21
TW201413398A (zh) 2014-04-01
CN104662479B (zh) 2016-11-16
JP2014071158A (ja) 2014-04-21
WO2014050405A1 (ja) 2014-04-03

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