KR102087056B9 - Metal plate metal plate production method and method for producing vapor deposition mask using metal plate - Google Patents

Metal plate metal plate production method and method for producing vapor deposition mask using metal plate

Info

Publication number
KR102087056B9
KR102087056B9 KR1020177020095A KR20177020095A KR102087056B9 KR 102087056 B9 KR102087056 B9 KR 102087056B9 KR 1020177020095 A KR1020177020095 A KR 1020177020095A KR 20177020095 A KR20177020095 A KR 20177020095A KR 102087056 B9 KR102087056 B9 KR 102087056B9
Authority
KR
South Korea
Prior art keywords
metal plate
vapor deposition
deposition mask
production method
producing vapor
Prior art date
Application number
KR1020177020095A
Other languages
Korean (ko)
Other versions
KR20170087533A (en
KR102087056B1 (en
Inventor
치카오 이케나가
Original Assignee
다이니폰 인사츠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=50036549&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR102087056(B9) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 다이니폰 인사츠 가부시키가이샤 filed Critical 다이니폰 인사츠 가부시키가이샤
Publication of KR20170087533A publication Critical patent/KR20170087533A/en
Application granted granted Critical
Publication of KR102087056B1 publication Critical patent/KR102087056B1/en
Publication of KR102087056B9 publication Critical patent/KR102087056B9/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/26—Methods of annealing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020177020095A 2013-01-10 2014-01-10 Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate KR102087056B1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2013-002924 2013-01-10
JP2013002924 2013-01-10
JPJP-P-2013-153920 2013-07-24
JP2013153920A JP5382257B1 (en) 2013-01-10 2013-07-24 Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate
KR1020157009821A KR101761494B1 (en) 2013-01-10 2014-01-10 Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020157009821A Division KR101761494B1 (en) 2013-01-10 2014-01-10 Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate

Publications (3)

Publication Number Publication Date
KR20170087533A KR20170087533A (en) 2017-07-28
KR102087056B1 KR102087056B1 (en) 2020-03-10
KR102087056B9 true KR102087056B9 (en) 2022-08-02

Family

ID=50036549

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020157009821A KR101761494B1 (en) 2013-01-10 2014-01-10 Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate
KR1020177020095A KR102087056B1 (en) 2013-01-10 2014-01-10 Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020157009821A KR101761494B1 (en) 2013-01-10 2014-01-10 Metal plate, metal plate production method, and method for producing vapor deposition mask using metal plate

Country Status (4)

Country Link
JP (1) JP5382257B1 (en)
KR (2) KR101761494B1 (en)
CN (4) CN108048793B (en)
WO (1) WO2014109394A1 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5455099B1 (en) 2013-09-13 2014-03-26 大日本印刷株式会社 Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate
JP5516816B1 (en) 2013-10-15 2014-06-11 大日本印刷株式会社 Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate
JP6698265B2 (en) * 2014-02-14 2020-05-27 大日本印刷株式会社 Method for manufacturing vapor deposition mask device, vapor deposition mask with substrate and laminated body
JP5641462B1 (en) 2014-05-13 2014-12-17 大日本印刷株式会社 Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate
TWI671411B (en) 2015-02-10 2019-09-11 日商大日本印刷股份有限公司 Metal plate for use in vapor deposition mask for organic EL display device, metal plate for use in vapor deposition mask for organic EL display device, and method for producing the same
EP3288097A4 (en) * 2015-04-24 2019-05-15 LG Innotek Co., Ltd. Metal substrate, and deposition mask using same
KR101603200B1 (en) * 2015-04-24 2016-03-14 엘지이노텍 주식회사 Metal substrate and Mask using the same
DE112017002022B4 (en) * 2016-04-14 2023-06-01 Toppan Printing Co., Ltd. Vapor deposition mask substrate, method of manufacturing vapor deposition mask substrate and method of manufacturing vapor deposition mask
KR102624714B1 (en) 2016-09-12 2024-01-12 삼성디스플레이 주식회사 Mask and method for preparing the mask assembly having the same
WO2018051443A1 (en) * 2016-09-14 2018-03-22 シャープ株式会社 Mask sheet, deposition mask, and display panel manufacturing method
KR20240063164A (en) * 2016-09-29 2024-05-09 다이니폰 인사츠 가부시키가이샤 Vapor deposition mask package and vapor deposition mask packaging method
KR20220104846A (en) * 2016-10-07 2022-07-26 다이니폰 인사츠 가부시키가이샤 Vapor deposition mask manufacturing method, vapor deposition mask-allocated intermediate product, and vapor deposition mask
JP7037768B2 (en) * 2016-11-18 2022-03-17 大日本印刷株式会社 Vapor deposition mask
JP7121918B2 (en) * 2016-12-14 2022-08-19 大日本印刷株式会社 Evaporation mask device and method for manufacturing evaporation mask device
JP6851820B2 (en) * 2016-12-28 2021-03-31 マクセルホールディングス株式会社 Thin-film deposition mask and its installation method and manufacturing method
KR102333411B1 (en) * 2017-01-10 2021-12-02 다이니폰 인사츠 가부시키가이샤 Vapor deposition mask, method for manufacturing vapor deposition mask device, and method for manufacturing vapor deposition mask
WO2019235647A1 (en) * 2018-06-08 2019-12-12 大日本印刷株式会社 Metal sheet wound body, packaging provided with wound body, wound body packaging method, wound body storage method, method of manufacturing evaporation mask using wound body metal sheet, and metal sheet
EP3822387A4 (en) * 2018-07-09 2022-05-04 Dai Nippon Printing Co., Ltd. Vapor-deposition mask defective determination method, vapor-deposition mask manufacturing method, vapor deposition mask device manufacturing method, vapor-deposition mask selection method, and vapor-deposition mask
TWI805853B (en) * 2018-09-27 2023-06-21 日商日鐵化學材料股份有限公司 Metal mask material, manufacturing method and metal mask
JP2019151936A (en) * 2019-06-11 2019-09-12 大日本印刷株式会社 Method for manufacturing vapor deposition mask device, vapor deposition mask having substrate, and laminate
CN111254386A (en) * 2020-03-26 2020-06-09 昆山国显光电有限公司 Mask strip and mask plate
WO2022092848A1 (en) * 2020-10-30 2022-05-05 에이피에스홀딩스 주식회사 Deposition mask
KR20220069397A (en) * 2020-11-20 2022-05-27 엘지이노텍 주식회사 Deposition mask for oled pixel deposition
CN113005399A (en) * 2021-02-23 2021-06-22 合肥鑫晟光电科技有限公司 Mask plate manufacturing method and mask plate

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1034237A (en) * 1996-07-30 1998-02-10 Sumitomo Metal Ind Ltd Production of cold rolling stainless steel sheet with excellent flatness
US6423160B1 (en) * 1999-05-07 2002-07-23 Matsushita Electric Industrial Co., Ltd. Stainless steel plate for shadow mask method for production thereof and shadow mask
JP2000319728A (en) * 1999-05-07 2000-11-21 Sumitomo Metal Ind Ltd Manufacture of metal sheet for shadow mask
JP2001131707A (en) * 1999-10-29 2001-05-15 Dainippon Printing Co Ltd Shadow mask for color cathode-ray tube
JP3573047B2 (en) 2000-02-10 2004-10-06 住友金属工業株式会社 Manufacturing method of stainless steel sheet with excellent flatness after etching
JP3651432B2 (en) * 2001-09-25 2005-05-25 セイコーエプソン株式会社 Mask, manufacturing method thereof, and manufacturing method of electroluminescence device
JP2003272839A (en) * 2002-03-14 2003-09-26 Dainippon Printing Co Ltd Manufacturing method of masking member for evaporation treatment
JP4126648B2 (en) * 2002-07-01 2008-07-30 日立金属株式会社 Method for manufacturing metal mask member
KR100523430B1 (en) * 2002-08-23 2005-10-25 닛꼬 긴조꾸 가꼬 가부시키가이샤 MILD STEEL STEM AND Fe-Ni ALLOY BASED STEM FOR SHADOW MASK HAVING GOOD SHAPE AFTER ETCHING
JP2004185890A (en) * 2002-12-02 2004-07-02 Hitachi Metals Ltd Metal mask
EP1449596A1 (en) * 2003-02-24 2004-08-25 Corus Technology BV A method for processing a steel product, and product produced using said method
JP4089632B2 (en) * 2003-03-07 2008-05-28 セイコーエプソン株式会社 Mask manufacturing method, mask manufacturing apparatus, and film forming method of light emitting material
JP4463492B2 (en) * 2003-04-10 2010-05-19 株式会社半導体エネルギー研究所 Manufacturing equipment
JP2004362908A (en) * 2003-06-04 2004-12-24 Hitachi Metals Ltd Metal mask and manufacturing method thereof
JP2005042147A (en) * 2003-07-25 2005-02-17 Dainippon Screen Mfg Co Ltd Method of producing mask for vapor deposition, and mask for vapor deposition
JP2005105406A (en) * 2003-09-10 2005-04-21 Nippon Seiki Co Ltd Mask for vapor deposition
JP5151004B2 (en) * 2004-12-09 2013-02-27 大日本印刷株式会社 Metal mask unit and manufacturing method thereof
JP2006247721A (en) * 2005-03-11 2006-09-21 Jfe Steel Kk Method and apparatus for straightening shape of metallic sheet using roll having uneven cross-sectional shape for pinching metallic sheet
KR100763538B1 (en) * 2006-08-29 2007-10-05 삼성전자주식회사 Method of forming mask pattern and method of forming fine pattern using the same in a semiconductor device fabricating
CN200989993Y (en) * 2006-12-22 2007-12-12 上海集成电路研发中心有限公司 Long mask plate for double-exposure
KR100796617B1 (en) 2006-12-27 2008-01-22 삼성에스디아이 주식회사 Mask device and manufacturing thereof and organic light emitting display device comprising the same
JP5262226B2 (en) * 2007-08-24 2013-08-14 大日本印刷株式会社 Vapor deposition mask and method of manufacturing vapor deposition mask
JP4985227B2 (en) * 2007-08-24 2012-07-25 大日本印刷株式会社 Vapor deposition mask, vapor deposition mask device, vapor deposition mask manufacturing method, vapor deposition mask device production method, and vapor deposition mask sheet-like member production method
JP5486951B2 (en) * 2010-02-12 2014-05-07 株式会社アルバック Vapor deposition mask, vapor deposition apparatus, and thin film formation method
KR101447063B1 (en) * 2010-03-30 2014-10-06 호야 가부시키가이샤 Method for manufacturing substrate for photomask blank, method for manufacturing photomask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
KR101693578B1 (en) * 2011-03-24 2017-01-10 삼성디스플레이 주식회사 Vapor deposition mask

Also Published As

Publication number Publication date
JP5382257B1 (en) 2014-01-08
KR101761494B1 (en) 2017-07-25
KR20170087533A (en) 2017-07-28
CN107858644A (en) 2018-03-30
KR102087056B1 (en) 2020-03-10
CN108048793B (en) 2020-11-03
WO2014109394A1 (en) 2014-07-17
JP2014148740A (en) 2014-08-21
CN104838037B (en) 2017-11-21
CN104838037A (en) 2015-08-12
CN108048793A (en) 2018-05-18
CN110938798A (en) 2020-03-31
KR20150103655A (en) 2015-09-11

Similar Documents

Publication Publication Date Title
KR102087056B9 (en) Metal plate metal plate production method and method for producing vapor deposition mask using metal plate
KR102205800B9 (en) Metal sheet method for manufacturing metal sheet and method for manufacturing vapor deposition mask using metal sheet
KR102163526B9 (en) Metal plate metal plate manufacturing method and method for manufacturing mask using metal plate
HK1217978A1 (en) Method of treating a metal substrate
HK1217977A1 (en) Method of treating a metal substrate
KR102123317B9 (en) Metal plate method for manufacturing metal plate and method for manufacturing mask using metal plate
EP2977349A4 (en) Method for producing disulfonylamine alkali metal salt
EP2946031A4 (en) Method for producing a chromium coating on a metal substrate
SI3004408T1 (en) Method for producing a metal film
SI3004409T1 (en) Method for producing a metal film
SG11201604993WA (en) A method for producing 2-fluoro-4-borono-l-phenylalanine, and precursor of 2-fluoro-4-borono-l-phenylalanine
EP2990143A4 (en) Method for producing metal nanoparticles
HK1218842A1 (en) Method for producing fried-noodle cluster
PL3042880T3 (en) Method for producing glass plate
EP2975633A4 (en) Method for forming pattern
TWI562728B (en) A process for producing co-crystal
HK1218112A1 (en) Process for producing polyhydric alcohol
EP3006129A4 (en) Method for press-molding steel pipe and method for producing steel pipe
HRP20181223T1 (en) Process for producing fructose
GB201305688D0 (en) A method of producing biochar
IL241287A0 (en) Processes for producing sovaprevir
LT3008198T (en) Process for producing cathine
IL239987A0 (en) Process for producing pyridazinone compound and production intermediates thereof
SG11201604094VA (en) Method for producing 2,3-butanediol
PL3004065T3 (en) Method for producing pyridazine compound

Legal Events

Date Code Title Description
A107 Divisional application of patent
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
Z072 Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301]
Z131 Decision taken on request for patent cancellation [new post grant opposition system as of 20170301]