KR102076885B1 - 검출 디바이스, 노광 디바이스 및 물품의 제조 방법 - Google Patents
검출 디바이스, 노광 디바이스 및 물품의 제조 방법 Download PDFInfo
- Publication number
- KR102076885B1 KR102076885B1 KR1020160172285A KR20160172285A KR102076885B1 KR 102076885 B1 KR102076885 B1 KR 102076885B1 KR 1020160172285 A KR1020160172285 A KR 1020160172285A KR 20160172285 A KR20160172285 A KR 20160172285A KR 102076885 B1 KR102076885 B1 KR 102076885B1
- Authority
- KR
- South Korea
- Prior art keywords
- light
- polarization component
- reflected light
- detection
- reflected
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2015-253117 | 2015-12-25 | ||
JP2015253117A JP6682263B2 (ja) | 2015-12-25 | 2015-12-25 | 検出装置、露光装置および物品の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170077039A KR20170077039A (ko) | 2017-07-05 |
KR102076885B1 true KR102076885B1 (ko) | 2020-02-12 |
Family
ID=59234472
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160172285A KR102076885B1 (ko) | 2015-12-25 | 2016-12-16 | 검출 디바이스, 노광 디바이스 및 물품의 제조 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6682263B2 (zh) |
KR (1) | KR102076885B1 (zh) |
CN (1) | CN106919005B (zh) |
TW (1) | TWI624735B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6891066B2 (ja) * | 2017-07-19 | 2021-06-18 | 株式会社ミツトヨ | 光学式測定装置 |
JP2019032378A (ja) * | 2017-08-04 | 2019-02-28 | 株式会社オーク製作所 | 基板位置検出装置、露光装置および基板位置検出方法 |
US11309202B2 (en) * | 2020-01-30 | 2022-04-19 | Kla Corporation | Overlay metrology on bonded wafers |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004273828A (ja) | 2003-03-10 | 2004-09-30 | Nikon Corp | 面位置検出方法、面位置検出装置、合焦装置、露光装置及びデバイスの製造方法 |
JP2009204512A (ja) | 2008-02-28 | 2009-09-10 | Canon Inc | 表面形状計測装置、露光装置、露光方法及びデバイス製造方法 |
JP2011226939A (ja) | 2010-04-21 | 2011-11-10 | Hitachi High-Technologies Corp | 基板検査方法及び装置 |
Family Cites Families (14)
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JPH0922868A (ja) * | 1995-07-06 | 1997-01-21 | Canon Inc | 投影露光装置及びそれを用いた半導体デバイスの製造方法 |
KR100242983B1 (ko) * | 1996-10-28 | 2000-02-01 | 김영환 | 2중 반사를 이용한 오토포커싱시스템 |
JP4440688B2 (ja) * | 2004-03-31 | 2010-03-24 | Hoya株式会社 | レーザ描画装置、レーザ描画方法及びフォトマスクの製造方法 |
US8149382B2 (en) * | 2005-07-08 | 2012-04-03 | Nikon Corporation | Surface position detection apparatus, exposure apparatus, and exposure method |
JP2009206373A (ja) * | 2008-02-28 | 2009-09-10 | Canon Inc | 露光装置及びデバイス製造方法 |
EP2128701A1 (en) * | 2008-05-30 | 2009-12-02 | ASML Netherlands BV | Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process |
JP5198980B2 (ja) * | 2008-09-02 | 2013-05-15 | 株式会社モリテックス | 光学異方性パラメータ測定方法及び測定装置 |
JP5905729B2 (ja) * | 2011-10-26 | 2016-04-20 | Dmg森精機株式会社 | 変位検出装置 |
JP6025346B2 (ja) * | 2012-03-05 | 2016-11-16 | キヤノン株式会社 | 検出装置、露光装置及びデバイスを製造する方法 |
CN103529650B (zh) * | 2012-07-02 | 2016-01-20 | 上海微电子装备有限公司 | 一种高度测量装置及其测量方法 |
CN104635428B (zh) * | 2013-11-14 | 2017-06-27 | 上海微电子装备有限公司 | 一种基于图像处理的调焦调平测量装置和方法 |
WO2015101461A2 (en) * | 2013-12-30 | 2015-07-09 | Asml Netherlands B.V. | Method and apparatus for design of a metrology target |
CN104849964B (zh) * | 2014-02-14 | 2017-08-25 | 上海微电子装备(集团)股份有限公司 | 一种焦面测量装置及其测量方法 |
NL2013293A (en) * | 2014-06-02 | 2016-03-31 | Asml Netherlands Bv | Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method. |
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2015
- 2015-12-25 JP JP2015253117A patent/JP6682263B2/ja active Active
-
2016
- 2016-12-02 TW TW105139932A patent/TWI624735B/zh active
- 2016-12-16 KR KR1020160172285A patent/KR102076885B1/ko active IP Right Grant
- 2016-12-20 CN CN201611180237.8A patent/CN106919005B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004273828A (ja) | 2003-03-10 | 2004-09-30 | Nikon Corp | 面位置検出方法、面位置検出装置、合焦装置、露光装置及びデバイスの製造方法 |
JP2009204512A (ja) | 2008-02-28 | 2009-09-10 | Canon Inc | 表面形状計測装置、露光装置、露光方法及びデバイス製造方法 |
JP2011226939A (ja) | 2010-04-21 | 2011-11-10 | Hitachi High-Technologies Corp | 基板検査方法及び装置 |
Also Published As
Publication number | Publication date |
---|---|
JP6682263B2 (ja) | 2020-04-15 |
JP2017116769A (ja) | 2017-06-29 |
CN106919005B (zh) | 2020-04-07 |
TWI624735B (zh) | 2018-05-21 |
TW201734653A (zh) | 2017-10-01 |
CN106919005A (zh) | 2017-07-04 |
KR20170077039A (ko) | 2017-07-05 |
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