KR102022841B1 - 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법 - Google Patents

물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법 Download PDF

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KR102022841B1
KR102022841B1 KR1020187014528A KR20187014528A KR102022841B1 KR 102022841 B1 KR102022841 B1 KR 102022841B1 KR 1020187014528 A KR1020187014528 A KR 1020187014528A KR 20187014528 A KR20187014528 A KR 20187014528A KR 102022841 B1 KR102022841 B1 KR 102022841B1
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support
substrate
holding member
exposure
holding
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KR20180059948A (ko
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야스오 아오키
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • H01L21/67784—
    • H01L21/6838—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/36—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations using air tracks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020187014528A 2009-08-20 2010-08-19 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법 Active KR102022841B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009190654 2009-08-20
JPJP-P-2009-190654 2009-08-20
PCT/JP2010/064430 WO2011021723A1 (en) 2009-08-20 2010-08-19 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020127003908A Division KR101862234B1 (ko) 2009-08-20 2010-08-19 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20180059948A KR20180059948A (ko) 2018-06-05
KR102022841B1 true KR102022841B1 (ko) 2019-09-19

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KR1020187014528A Active KR102022841B1 (ko) 2009-08-20 2010-08-19 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법
KR1020127003908A Active KR101862234B1 (ko) 2009-08-20 2010-08-19 물체 처리 장치, 노광 장치와 노광 방법, 및 디바이스 제조 방법

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Country Status (6)

Country Link
US (1) US20110053092A1 (https=)
JP (1) JP5573849B2 (https=)
KR (2) KR102022841B1 (https=)
CN (1) CN102483580B (https=)
TW (2) TWI587436B (https=)
WO (1) WO2011021723A1 (https=)

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US8598538B2 (en) 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US8941814B2 (en) * 2011-06-20 2015-01-27 Nikon Corporation Multiple-blade holding devices
WO2013031223A1 (ja) * 2011-08-30 2013-03-07 株式会社ニコン 基板処理装置及び基板処理方法、露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法
JP2013054144A (ja) * 2011-09-02 2013-03-21 Nikon Corp 位置合わせ方法、露光方法、デバイス製造方法、及びフラットパネルディスプレイの製造方法
WO2013133321A1 (ja) * 2012-03-07 2013-09-12 株式会社ニコン マスク、マスクユニット、露光装置、基板処理装置、及びデバイス製造方法
CN103019041B (zh) 2012-11-26 2014-10-22 京东方科技集团股份有限公司 一种曝光机
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TWI735438B (zh) * 2015-03-30 2021-08-11 日商尼康股份有限公司 物體搬運裝置、曝光裝置、平板顯示器的製造方法、元件製造方法、物體搬運方法以及曝光方法
KR102584657B1 (ko) * 2015-03-31 2023-10-04 가부시키가이샤 니콘 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 노광 방법
JP6807334B2 (ja) * 2015-05-13 2021-01-06 ルミレッズ ホールディング ベーフェー ダイレベルのリフトオフの最中におけるメカニカルダメージを低減するためのサファイアコレクタ
JP6802191B2 (ja) * 2015-06-05 2020-12-16 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ サセプタの位置付け及び回転装置、並びに使用の方法
JP6885335B2 (ja) 2015-09-30 2021-06-16 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに物体の移動方法
KR102676391B1 (ko) * 2015-09-30 2024-06-18 가부시키가이샤 니콘 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
EP3403954A4 (en) * 2016-01-15 2019-08-14 Nano-Tem Co., Ltd. CONTACTLESS CARRIER AND CONTACTLESS CARRIER SYSTEM
CN109791369B (zh) * 2016-09-30 2022-01-14 株式会社尼康 物体保持装置、曝光装置、平板显示器之制造方法、元件制造方法、以及物体保持方法
CN109791370B (zh) 2016-09-30 2021-05-18 株式会社尼康 曝光装置、平板显示器的制造方法、元件制造方法、及曝光方法
JP6791255B2 (ja) 2016-09-30 2020-11-25 株式会社ニコン 搬送装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、デバイス製造方法、及び搬送方法
CN108983552B (zh) * 2017-05-31 2020-01-24 上海微电子装备（集团）股份有限公司 一种移入移出机构及光刻机工件台移入移出装置
CN118343498A (zh) * 2018-03-01 2024-07-16 杭州孚亚科技有限公司 吸紧装置
JP7114277B2 (ja) 2018-03-07 2022-08-08 キヤノン株式会社 パターン形成装置及び物品の製造方法
JP7017239B2 (ja) * 2018-06-25 2022-02-08 株式会社ブイ・テクノロジー 露光装置および高さ調整方法
KR102653016B1 (ko) 2018-09-18 2024-03-29 삼성전자주식회사 척 구동 장치 및 기판 처리 장치
TWI691715B (zh) * 2019-06-17 2020-04-21 華矽創新股份有限公司 檢測矽晶圓缺陷的自動光學檢測機構及方法
JP7185674B2 (ja) * 2020-09-30 2022-12-07 キヤノントッキ株式会社 成膜装置、調整方法及び電子デバイスの製造方法
JP7756535B2 (ja) * 2021-10-06 2025-10-20 キヤノン株式会社 位置決め装置、リソグラフィ装置、および物品製造方法

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Also Published As

Publication number Publication date
TWI704640B (zh) 2020-09-11
JP5573849B2 (ja) 2014-08-20
KR101862234B1 (ko) 2018-05-29
WO2011021723A1 (en) 2011-02-24
HK1166140A1 (en) 2012-10-19
TWI587436B (zh) 2017-06-11
TW201729331A (zh) 2017-08-16
US20110053092A1 (en) 2011-03-03
CN102483580A (zh) 2012-05-30
JP2013502600A (ja) 2013-01-24
KR20180059948A (ko) 2018-06-05
CN102483580B (zh) 2015-04-01
KR20120062711A (ko) 2012-06-14
TW201138008A (en) 2011-11-01

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