KR102009333B1 - 스테이지장치 - Google Patents

스테이지장치 Download PDF

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Publication number
KR102009333B1
KR102009333B1 KR1020170045372A KR20170045372A KR102009333B1 KR 102009333 B1 KR102009333 B1 KR 102009333B1 KR 1020170045372 A KR1020170045372 A KR 1020170045372A KR 20170045372 A KR20170045372 A KR 20170045372A KR 102009333 B1 KR102009333 B1 KR 102009333B1
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KR
South Korea
Prior art keywords
axis
axis direction
moving body
driving unit
movable
Prior art date
Application number
KR1020170045372A
Other languages
English (en)
Korean (ko)
Other versions
KR20170129046A (ko
Inventor
류타 나카지마
Original Assignee
스미도모쥬기가이고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 스미도모쥬기가이고교 가부시키가이샤 filed Critical 스미도모쥬기가이고교 가부시키가이샤
Publication of KR20170129046A publication Critical patent/KR20170129046A/ko
Application granted granted Critical
Publication of KR102009333B1 publication Critical patent/KR102009333B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67715—Changing the direction of the conveying path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
KR1020170045372A 2016-05-16 2017-04-07 스테이지장치 KR102009333B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016097770A JP6723642B2 (ja) 2016-05-16 2016-05-16 ステージ装置
JPJP-P-2016-097770 2016-05-16

Publications (2)

Publication Number Publication Date
KR20170129046A KR20170129046A (ko) 2017-11-24
KR102009333B1 true KR102009333B1 (ko) 2019-10-21

Family

ID=60417376

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170045372A KR102009333B1 (ko) 2016-05-16 2017-04-07 스테이지장치

Country Status (3)

Country Link
JP (1) JP6723642B2 (ja)
KR (1) KR102009333B1 (ja)
TW (1) TWI708653B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7370920B2 (ja) * 2020-03-31 2023-10-30 住友重機械工業株式会社 ステージ装置
KR102547187B1 (ko) * 2021-02-16 2023-06-26 재단법인대구경북과학기술원 갠트리 스테이지장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3634483B2 (ja) * 1996-02-13 2005-03-30 キヤノン株式会社 ステージ装置、及びこれを用いた露光装置やデバイス生産方法
JP2006173238A (ja) * 2004-12-14 2006-06-29 Nikon Corp ステージ装置、露光装置及びデバイスの製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2714502B2 (ja) * 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
JPH0786377A (ja) * 1993-09-10 1995-03-31 Canon Inc 位置決め装置
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JP3635600B2 (ja) * 1996-08-29 2005-04-06 キヤノン株式会社 送り装置
JPH10293611A (ja) * 1997-04-21 1998-11-04 Canon Inc 位置決め装置
JP2001307983A (ja) * 2000-04-20 2001-11-02 Nikon Corp ステージ装置及び露光装置
JP4162838B2 (ja) * 2000-07-07 2008-10-08 住友重機械工業株式会社 Ｘ−ｙステージ装置
KR100396020B1 (ko) * 2001-04-16 2003-08-27 박희재 초정밀 위치결정시스템
JP4231486B2 (ja) * 2005-02-14 2009-02-25 住友重機械工業株式会社 Ｘ−ｙステージ装置
TWI457193B (zh) * 2006-03-02 2014-10-21 Sumitomo Heavy Industries Stage device
JP5106981B2 (ja) 2007-10-19 2012-12-26 住友重機械工業株式会社 ステージ装置
JP2009105439A (ja) * 2009-02-03 2009-05-14 Advanced Mask Inspection Technology Kk 基板検査装置
US8988655B2 (en) * 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP5785722B2 (ja) * 2011-02-02 2015-09-30 住友重機械工業株式会社 ステージ装置
JP6132079B2 (ja) * 2012-04-04 2017-05-24 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP2014098731A (ja) * 2012-11-13 2014-05-29 Nikon Corp 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
CN204248537U (zh) * 2014-11-26 2015-04-08 广东工业大学 异构电机共定子多驱动宏微一体化高速精密运动二维平台

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3634483B2 (ja) * 1996-02-13 2005-03-30 キヤノン株式会社 ステージ装置、及びこれを用いた露光装置やデバイス生産方法
JP2006173238A (ja) * 2004-12-14 2006-06-29 Nikon Corp ステージ装置、露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
TW201741063A (zh) 2017-12-01
JP6723642B2 (ja) 2020-07-15
KR20170129046A (ko) 2017-11-24
TWI708653B (zh) 2020-11-01
JP2017208373A (ja) 2017-11-24

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