KR102001747B1 - In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 - Google Patents
In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 Download PDFInfo
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2010-006831 | 2010-01-15 | ||
| JP2010006831A JP5437825B2 (ja) | 2010-01-15 | 2010-01-15 | In−Ga−O系酸化物焼結体、ターゲット、酸化物半導体薄膜及びこれらの製造方法 |
| PCT/JP2011/000169 WO2011086940A1 (ja) | 2010-01-15 | 2011-01-14 | In-Ga-O系酸化物焼結体、ターゲット、酸化物半導体薄膜及びこれらの製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127018153A Division KR20120123322A (ko) | 2010-01-15 | 2011-01-14 | In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170087977A KR20170087977A (ko) | 2017-07-31 |
| KR102001747B1 true KR102001747B1 (ko) | 2019-07-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177020621A Active KR102001747B1 (ko) | 2010-01-15 | 2011-01-14 | In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 |
| KR1020127018153A Ceased KR20120123322A (ko) | 2010-01-15 | 2011-01-14 | In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 |
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| JP5301021B2 (ja) | 2011-09-06 | 2013-09-25 | 出光興産株式会社 | スパッタリングターゲット |
| JP5966840B2 (ja) | 2012-10-11 | 2016-08-10 | 住友金属鉱山株式会社 | 酸化物半導体薄膜および薄膜トランジスタ |
| JP6107085B2 (ja) * | 2012-11-22 | 2017-04-05 | 住友金属鉱山株式会社 | 酸化物半導体薄膜および薄膜トランジスタ |
| JP5883990B2 (ja) * | 2013-03-29 | 2016-03-15 | Jx金属株式会社 | Igzoスパッタリングターゲット |
| WO2015008805A1 (ja) * | 2013-07-16 | 2015-01-22 | 住友金属鉱山株式会社 | 酸化物半導体薄膜および薄膜トランジスタ |
| CN106132901A (zh) * | 2014-03-14 | 2016-11-16 | 住友金属矿山株式会社 | 氧化物烧结体、溅射用靶、以及用其得到的氧化物半导体薄膜 |
| JPWO2016084636A1 (ja) * | 2014-11-25 | 2017-10-12 | 住友金属鉱山株式会社 | 酸化物焼結体、スパッタリング用ターゲット、及びそれを用いて得られる酸化物半導体薄膜 |
| JP2017154910A (ja) * | 2016-02-29 | 2017-09-07 | 住友金属鉱山株式会社 | 酸化物焼結体及びスパッタリング用ターゲット |
| WO2018143280A1 (ja) | 2017-02-01 | 2018-08-09 | 出光興産株式会社 | 非晶質酸化物半導体膜、酸化物焼結体、及び薄膜トランジスタ |
| KR102598375B1 (ko) | 2018-08-01 | 2023-11-06 | 이데미쓰 고산 가부시키가이샤 | 결정 구조 화합물, 산화물 소결체, 스퍼터링 타깃, 결정질 산화물 박막, 아모르퍼스 산화물 박막, 박막 트랜지스터, 및 전자 기기 |
| WO2023189834A1 (ja) | 2022-03-29 | 2023-10-05 | 出光興産株式会社 | スパッタリングターゲット、スパッタリングターゲットの製造方法、結晶酸化物薄膜、薄膜トランジスタ、及び電子機器 |
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| JP2008285760A (ja) * | 2001-08-02 | 2008-11-27 | Idemitsu Kosan Co Ltd | スパッタリングターゲット、透明導電膜およびそれらの製造法 |
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| JP3947575B2 (ja) | 1994-06-10 | 2007-07-25 | Hoya株式会社 | 導電性酸化物およびそれを用いた電極 |
| JPH09259640A (ja) * | 1996-03-25 | 1997-10-03 | Uchitsugu Minami | 透明導電膜 |
| US7211825B2 (en) * | 2004-06-14 | 2007-05-01 | Yi-Chi Shih | Indium oxide-based thin film transistors and circuits |
| JP2006165530A (ja) * | 2004-11-10 | 2006-06-22 | Canon Inc | センサ及び非平面撮像装置 |
| JP5058469B2 (ja) | 2005-09-06 | 2012-10-24 | キヤノン株式会社 | スパッタリングターゲットおよび該ターゲットを用いた薄膜の形成方法 |
| KR101080527B1 (ko) * | 2005-09-20 | 2011-11-04 | 이데미쓰 고산 가부시키가이샤 | 스퍼터링 타겟, 투명 도전막 및 투명 전극 |
| JP4805648B2 (ja) * | 2005-10-19 | 2011-11-02 | 出光興産株式会社 | 半導体薄膜及びその製造方法 |
| EP1950177A4 (en) * | 2005-11-18 | 2009-02-25 | Idemitsu Kosan Co | SEMICONDUCTOR THIN FILM, MANUFACTURING METHOD AND THIN FILM TRANSISTOR |
| CN102593161B (zh) * | 2007-03-20 | 2014-11-05 | 出光兴产株式会社 | 半导体器件 |
| CN101679124A (zh) * | 2007-07-06 | 2010-03-24 | 住友金属矿山株式会社 | 氧化物烧结体及其制造方法、靶、使用该靶得到的透明导电膜以及透明导电性基材 |
| WO2009084537A1 (ja) | 2007-12-27 | 2009-07-09 | Nippon Mining & Metals Co., Ltd. | a-IGZO酸化物薄膜の製造方法 |
| WO2009128424A1 (ja) * | 2008-04-16 | 2009-10-22 | 住友金属鉱山株式会社 | 薄膜トランジスタ型基板、薄膜トランジスタ型液晶表示装置および薄膜トランジスタ型基板の製造方法 |
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2010
- 2010-01-15 JP JP2010006831A patent/JP5437825B2/ja active Active
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2011
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- 2011-01-14 KR KR1020177020621A patent/KR102001747B1/ko active Active
- 2011-01-14 TW TW100101510A patent/TWI496758B/zh active
- 2011-01-14 US US13/522,198 patent/US20120292617A1/en not_active Abandoned
- 2011-01-14 CN CN201180004849.0A patent/CN102652119B/zh active Active
- 2011-01-14 KR KR1020127018153A patent/KR20120123322A/ko not_active Ceased
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Patent Citations (1)
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| JP2008285760A (ja) * | 2001-08-02 | 2008-11-27 | Idemitsu Kosan Co Ltd | スパッタリングターゲット、透明導電膜およびそれらの製造法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120292617A1 (en) | 2012-11-22 |
| JP5437825B2 (ja) | 2014-03-12 |
| KR20170087977A (ko) | 2017-07-31 |
| CN102652119B (zh) | 2014-04-02 |
| EP2524905A1 (en) | 2012-11-21 |
| KR20120123322A (ko) | 2012-11-08 |
| JP2011146571A (ja) | 2011-07-28 |
| TWI496758B (zh) | 2015-08-21 |
| WO2011086940A1 (ja) | 2011-07-21 |
| EP2524905A4 (en) | 2014-05-07 |
| TW201134781A (en) | 2011-10-16 |
| CN102652119A (zh) | 2012-08-29 |
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