KR101980062B1 - 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 - Google Patents

감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 Download PDF

Info

Publication number
KR101980062B1
KR101980062B1 KR1020187028714A KR20187028714A KR101980062B1 KR 101980062 B1 KR101980062 B1 KR 101980062B1 KR 1020187028714 A KR1020187028714 A KR 1020187028714A KR 20187028714 A KR20187028714 A KR 20187028714A KR 101980062 B1 KR101980062 B1 KR 101980062B1
Authority
KR
South Korea
Prior art keywords
group
mass
less
ring
acid
Prior art date
Application number
KR1020187028714A
Other languages
English (en)
Korean (ko)
Other versions
KR20180113222A (ko
Inventor
요시타카 사와이
리화 페이
아츠야 이토
다츠노리 츠치야
Original Assignee
미쯔비시 케미컬 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔비시 케미컬 주식회사 filed Critical 미쯔비시 케미컬 주식회사
Publication of KR20180113222A publication Critical patent/KR20180113222A/ko
Application granted granted Critical
Publication of KR101980062B1 publication Critical patent/KR101980062B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B5/00—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings
    • C09B5/24—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings the heterocyclic rings being only condensed with an anthraquinone nucleus in 1-2 or 2-3 position
    • C09B5/44—Azines of the anthracene series
    • C09B5/46—Para-diazines
    • C09B5/48—Bis-anthraquinonediazines (indanthrone)
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B7/00—Indigoid dyes
KR1020187028714A 2017-02-15 2018-02-13 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 KR101980062B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2017026369 2017-02-15
JPJP-P-2017-026369 2017-02-15
JPJP-P-2017-166318 2017-08-31
JP2017166318 2017-08-31
PCT/JP2018/004832 WO2018151079A1 (ja) 2017-02-15 2018-02-13 感光性着色組成物、硬化物、着色スペーサー、画像表示装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020197011418A Division KR20190109383A (ko) 2017-02-15 2018-02-13 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치

Publications (2)

Publication Number Publication Date
KR20180113222A KR20180113222A (ko) 2018-10-15
KR101980062B1 true KR101980062B1 (ko) 2019-05-17

Family

ID=63169398

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020197011418A KR20190109383A (ko) 2017-02-15 2018-02-13 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
KR1020187028714A KR101980062B1 (ko) 2017-02-15 2018-02-13 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020197011418A KR20190109383A (ko) 2017-02-15 2018-02-13 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치

Country Status (5)

Country Link
JP (2) JP6380723B1 (ja)
KR (2) KR20190109383A (ja)
CN (1) CN110178083B (ja)
TW (1) TWI759427B (ja)
WO (1) WO2018151079A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7080618B2 (ja) * 2017-10-31 2022-06-06 サカタインクス株式会社 黒色顔料分散組成物及びそれを含有する黒色顔料分散レジスト組成物
KR20200078335A (ko) * 2018-12-21 2020-07-01 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 블랙 매트릭스
JP7360798B2 (ja) * 2019-02-21 2023-10-13 サカタインクス株式会社 着色組成物、及び、それを含有する着色レジスト組成物
JP7263153B2 (ja) * 2019-06-27 2023-04-24 東京応化工業株式会社 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法
JP7464494B2 (ja) 2020-10-02 2024-04-09 東京応化工業株式会社 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス
JP7464493B2 (ja) 2020-10-02 2024-04-09 東京応化工業株式会社 黒色感光性樹脂組成物、パターン化された硬化物の製造方法、パターン化された硬化物、及びブラックマトリクス
JPWO2023054381A1 (ja) * 2021-09-30 2023-04-06
KR102603034B1 (ko) * 2023-07-03 2023-11-20 (주)에스티글로벌 근거리 무선 통신을 활용한 반도체 공정용 약액저장용기 관리시스템

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015046178A1 (ja) 2013-09-25 2015-04-02 三菱化学株式会社 感光性着色組成物、ブラックマトリクス、着色スペーサー、画像表示装置及び顔料分散液
JP2016164623A (ja) 2015-03-06 2016-09-08 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP2016167030A (ja) * 2015-03-10 2016-09-15 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008040486A (ja) * 2006-07-11 2008-02-21 Fujifilm Corp カラーフィルタ、カラーフィルタの製造方法、及び液晶表示装置
JP5448352B2 (ja) * 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
KR102078989B1 (ko) * 2012-01-31 2020-02-19 미쯔비시 케미컬 주식회사 착색 감광성 조성물, 블랙 포토 스페이서 및 컬러 필터
KR101658374B1 (ko) 2013-01-25 2016-09-22 롬엔드하스전자재료코리아유한회사 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물
KR101474803B1 (ko) * 2014-03-27 2014-12-19 제일모직주식회사 블랙 컬럼 스페이서 제조방법, 블랙 컬럼 스페이서 및 컬러 필터
EP3185054A4 (en) * 2014-08-20 2018-03-28 Toray Industries, Inc. Photosensitive coloring composition, method for manufacturing solid-state imaging element using same, and solid-state imaging element
KR101784049B1 (ko) * 2014-11-14 2017-10-10 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
KR102491215B1 (ko) * 2015-03-11 2023-01-20 미쯔비시 케미컬 주식회사 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
KR20160140227A (ko) * 2015-05-29 2016-12-07 삼성에스디아이 주식회사 감광성 이중층 수지막, 이를 이용한 블랙 컬럼 스페이서, 및 컬러필터
JP6985715B2 (ja) * 2016-06-15 2021-12-22 山陽色素株式会社 黒色顔料組成物及びこれを含む黒色塗膜形成組成物
JP2018009132A (ja) * 2016-07-15 2018-01-18 Jsr株式会社 着色組成物、着色硬化膜及びその形成方法、並びに表示素子
KR101848567B1 (ko) * 2016-11-18 2018-04-12 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015046178A1 (ja) 2013-09-25 2015-04-02 三菱化学株式会社 感光性着色組成物、ブラックマトリクス、着色スペーサー、画像表示装置及び顔料分散液
JP2016164623A (ja) 2015-03-06 2016-09-08 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP2016167030A (ja) * 2015-03-10 2016-09-15 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置

Also Published As

Publication number Publication date
CN110178083A (zh) 2019-08-27
TW201835682A (zh) 2018-10-01
WO2018151079A1 (ja) 2018-08-23
KR20180113222A (ko) 2018-10-15
JPWO2018151079A1 (ja) 2019-02-21
JP6380723B1 (ja) 2018-08-29
TWI759427B (zh) 2022-04-01
JP2019040181A (ja) 2019-03-14
CN110178083B (zh) 2023-03-24
KR20190109383A (ko) 2019-09-25

Similar Documents

Publication Publication Date Title
KR101980062B1 (ko) 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
JP6361838B2 (ja) 感光性着色組成物、硬化物、ブラックマトリクス、着色スペーサー及び画像表示装置
JP6268508B2 (ja) 感光性着色組成物、硬化物、着色スペーサー、画像表示装置
KR20170126912A (ko) 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
JP7283519B2 (ja) 感光性樹脂組成物、硬化物及び画像表示装置
KR20180107146A (ko) 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
KR20160145589A (ko) 차광재가 형성된 기판, 컬러 필터 및 액정 표시 장치 그리고 이 차광재를 형성하기 위한 착색 수지 조성물
JP6543968B2 (ja) 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP2022078139A (ja) 感光性着色組成物、硬化物、着色スペーサー、画像表示装置
JP2019015966A (ja) 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP7351221B2 (ja) 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP7006358B2 (ja) 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP7375773B2 (ja) 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP7230559B2 (ja) 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP2020181122A (ja) 感光性着色樹脂組成物、硬化物、及び画像表示装置

Legal Events

Date Code Title Description
A201 Request for examination
A302 Request for accelerated examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant