KR101968432B1 - 투영 광학계, 노광 장치, 및 디바이스 제조 방법 - Google Patents

투영 광학계, 노광 장치, 및 디바이스 제조 방법 Download PDF

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Publication number
KR101968432B1
KR101968432B1 KR1020177017295A KR20177017295A KR101968432B1 KR 101968432 B1 KR101968432 B1 KR 101968432B1 KR 1020177017295 A KR1020177017295 A KR 1020177017295A KR 20177017295 A KR20177017295 A KR 20177017295A KR 101968432 B1 KR101968432 B1 KR 101968432B1
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KR
South Korea
Prior art keywords
convex mirror
optical system
concave
support member
projection optical
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KR1020177017295A
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English (en)
Korean (ko)
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KR20170088938A (ko
Inventor
야스히토 사사키
미츠루 세키
다케시 나카지마
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020177017295A 2014-12-02 2015-11-17 투영 광학계, 노광 장치, 및 디바이스 제조 방법 Active KR101968432B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法
JPJP-P-2014-244333 2014-12-02
PCT/JP2015/005744 WO2016088314A1 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method

Publications (2)

Publication Number Publication Date
KR20170088938A KR20170088938A (ko) 2017-08-02
KR101968432B1 true KR101968432B1 (ko) 2019-04-11

Family

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Family Applications (1)

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KR1020177017295A Active KR101968432B1 (ko) 2014-12-02 2015-11-17 투영 광학계, 노광 장치, 및 디바이스 제조 방법

Country Status (6)

Country Link
US (1) US10495978B2 (https=)
JP (1) JP6386896B2 (https=)
KR (1) KR101968432B1 (https=)
CN (1) CN107003615B (https=)
TW (2) TWI609251B (https=)
WO (1) WO2016088314A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080252871A1 (en) * 2007-04-13 2008-10-16 Orc Manufacturing Co., Ltd. Projection exposure apparatus
JP5428701B2 (ja) 2008-09-22 2014-02-26 株式会社ニコン 移動体装置及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
JP5625345B2 (ja) 2008-12-19 2014-11-19 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689844A (ja) * 1992-09-09 1994-03-29 Toshiba Corp 露光装置
JP2001326160A (ja) * 2000-05-16 2001-11-22 Seiko Epson Corp 反射投影露光装置の歪み検出機構
JP2005345582A (ja) 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
JP2008263092A (ja) 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
JP5201979B2 (ja) 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080252871A1 (en) * 2007-04-13 2008-10-16 Orc Manufacturing Co., Ltd. Projection exposure apparatus
JP5428701B2 (ja) 2008-09-22 2014-02-26 株式会社ニコン 移動体装置及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
JP5625345B2 (ja) 2008-12-19 2014-11-19 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

Also Published As

Publication number Publication date
TW201734668A (zh) 2017-10-01
TWI588623B (zh) 2017-06-21
JP6386896B2 (ja) 2018-09-05
CN107003615B (zh) 2019-01-25
CN107003615A (zh) 2017-08-01
US20170315448A1 (en) 2017-11-02
TW201621476A (zh) 2016-06-16
TWI609251B (zh) 2017-12-21
JP2016109741A (ja) 2016-06-20
KR20170088938A (ko) 2017-08-02
US10495978B2 (en) 2019-12-03
WO2016088314A1 (en) 2016-06-09

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