KR101941305B1 - 증착 장치 및 증착 방법 - Google Patents

증착 장치 및 증착 방법 Download PDF

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Publication number
KR101941305B1
KR101941305B1 KR1020137021171A KR20137021171A KR101941305B1 KR 101941305 B1 KR101941305 B1 KR 101941305B1 KR 1020137021171 A KR1020137021171 A KR 1020137021171A KR 20137021171 A KR20137021171 A KR 20137021171A KR 101941305 B1 KR101941305 B1 KR 101941305B1
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KR
South Korea
Prior art keywords
mask
deposition
substrate
evaporation
deposition mask
Prior art date
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KR1020137021171A
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English (en)
Korean (ko)
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KR20140018232A (ko
Inventor
히로지 나루미
마사히로 이치하라
히로유키 다무라
에이이치 마츠모토
미유키 다지마
히로아키 나가타
마사키 요시오카
Original Assignee
캐논 톡키 가부시키가이샤
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Publication of KR20140018232A publication Critical patent/KR20140018232A/ko
Application granted granted Critical
Publication of KR101941305B1 publication Critical patent/KR101941305B1/ko

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020137021171A 2011-02-10 2012-02-07 증착 장치 및 증착 방법 KR101941305B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011027900A JP5616812B2 (ja) 2011-02-10 2011-02-10 蒸着装置並びに蒸着方法
JPJP-P-2011-027900 2011-02-10
PCT/JP2012/052735 WO2012108426A1 (ja) 2011-02-10 2012-02-07 蒸着装置並びに蒸着方法

Publications (2)

Publication Number Publication Date
KR20140018232A KR20140018232A (ko) 2014-02-12
KR101941305B1 true KR101941305B1 (ko) 2019-04-10

Family

ID=46638639

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137021171A KR101941305B1 (ko) 2011-02-10 2012-02-07 증착 장치 및 증착 방법

Country Status (4)

Country Link
JP (1) JP5616812B2 (ja)
KR (1) KR101941305B1 (ja)
TW (1) TW201247912A (ja)
WO (1) WO2012108426A1 (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5957322B2 (ja) * 2012-07-19 2016-07-27 キヤノントッキ株式会社 蒸着装置並びに蒸着方法
JP2014065936A (ja) * 2012-09-25 2014-04-17 Canon Tokki Corp 蒸着装置並びに蒸着方法
JP6008731B2 (ja) * 2012-12-18 2016-10-19 キヤノントッキ株式会社 成膜装置
JP5827965B2 (ja) * 2013-02-05 2015-12-02 シャープ株式会社 表示装置の製造方法
CN104233193A (zh) * 2013-06-06 2014-12-24 上海和辉光电有限公司 蒸镀装置及蒸镀方法
JP5856584B2 (ja) * 2013-06-11 2016-02-10 シャープ株式会社 制限板ユニットおよび蒸着ユニット並びに蒸着装置
US9537096B2 (en) * 2013-06-21 2017-01-03 Sharp Kabushiki Kaisha Method for producing organic electroluminescent element, and organic electroluminescent display device
JP2016011438A (ja) * 2014-06-27 2016-01-21 キヤノントッキ株式会社 蒸着装置並びに蒸着マスク
WO2016171075A1 (ja) * 2015-04-22 2016-10-27 シャープ株式会社 蒸着装置および蒸着方法
WO2017069036A1 (ja) * 2015-10-20 2017-04-27 シャープ株式会社 制限ユニット、蒸着装置、蒸着膜製造方法、エレクトロルミネッセンス表示装置の生産方法およびエレクトロルミネッセンス表示装置
CN109097728B (zh) * 2018-09-26 2021-11-02 京东方科技集团股份有限公司 一种掩膜板及其张网方法、张网装置
JP7026143B2 (ja) * 2019-01-10 2022-02-25 株式会社アルバック 蒸着装置
CN112289711B (zh) * 2020-10-23 2024-04-26 西北工业大学 用于生长半导体薄膜的低温型衬底加热台及其制作方法
CN113337803B (zh) * 2021-06-07 2022-11-15 京东方科技集团股份有限公司 一种蒸镀载板、蒸镀装置及蒸镀方法
CN116607120A (zh) * 2023-05-30 2023-08-18 中信戴卡股份有限公司 一种用于轮毂套色的三仓pvd镀膜装置及方法
CN118064842B (zh) * 2024-04-22 2024-08-09 季华实验室 一种多蒸发源间隔蒸镀装置及镀膜方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009170200A (ja) 2008-01-15 2009-07-30 Sony Corp 表示装置の製造方法
JP2010185121A (ja) 2009-02-13 2010-08-26 Ulvac Japan Ltd 真空蒸着装置及び真空蒸着方法
JP2010270396A (ja) * 2009-05-22 2010-12-02 Samsung Mobile Display Co Ltd 薄膜蒸着装置
JP2013163837A (ja) 2012-02-09 2013-08-22 Canon Tokki Corp 蒸着装置並びに蒸着装置を用いた成膜方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080131587A1 (en) 2006-11-30 2008-06-05 Boroson Michael L Depositing organic material onto an oled substrate
JP5328726B2 (ja) * 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009170200A (ja) 2008-01-15 2009-07-30 Sony Corp 表示装置の製造方法
JP2010185121A (ja) 2009-02-13 2010-08-26 Ulvac Japan Ltd 真空蒸着装置及び真空蒸着方法
JP2010270396A (ja) * 2009-05-22 2010-12-02 Samsung Mobile Display Co Ltd 薄膜蒸着装置
JP2013163837A (ja) 2012-02-09 2013-08-22 Canon Tokki Corp 蒸着装置並びに蒸着装置を用いた成膜方法

Also Published As

Publication number Publication date
JP2012167309A (ja) 2012-09-06
WO2012108426A1 (ja) 2012-08-16
TW201247912A (en) 2012-12-01
JP5616812B2 (ja) 2014-10-29
KR20140018232A (ko) 2014-02-12

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