KR101919268B1 - 산화물 소결체 및 그 제조 방법, 스퍼터 타겟, 그리고 반도체 디바이스의 제조 방법 - Google Patents
산화물 소결체 및 그 제조 방법, 스퍼터 타겟, 그리고 반도체 디바이스의 제조 방법 Download PDFInfo
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- KR101919268B1 KR101919268B1 KR1020177013037A KR20177013037A KR101919268B1 KR 101919268 B1 KR101919268 B1 KR 101919268B1 KR 1020177013037 A KR1020177013037 A KR 1020177013037A KR 20177013037 A KR20177013037 A KR 20177013037A KR 101919268 B1 KR101919268 B1 KR 101919268B1
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| PCT/JP2016/063646 WO2017047152A1 (ja) | 2015-09-16 | 2016-05-06 | 酸化物焼結体およびその製造方法、スパッタターゲット、ならびに半導体デバイスの製造方法 |
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| KR1020177013037A Active KR101919268B1 (ko) | 2015-09-16 | 2016-05-06 | 산화물 소결체 및 그 제조 방법, 스퍼터 타겟, 그리고 반도체 디바이스의 제조 방법 |
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| TW (1) | TWI704123B (enExample) |
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| JP7024774B2 (ja) | 2017-02-20 | 2022-02-24 | 住友電気工業株式会社 | 酸化物焼結体およびその製造方法、スパッタターゲット、ならびに半導体デバイスの製造方法 |
| KR102401708B1 (ko) * | 2017-02-20 | 2022-05-26 | 스미토모덴키고교가부시키가이샤 | 산화물 소결체 및 그의 제조 방법, 스퍼터 타겟, 그리고 반도체 디바이스의 제조 방법 |
| MX2020004605A (es) * | 2017-10-31 | 2020-10-19 | Corning Inc | Cuerpo en forma de panal y filtro de partículas que comprende un cuerpo en forma de panal. |
| JP2020143359A (ja) * | 2019-03-08 | 2020-09-10 | Jx金属株式会社 | スパッタリングターゲット部材の製造方法及びスパッタリングターゲット部材 |
| JP2020153014A (ja) * | 2019-03-15 | 2020-09-24 | 三菱マテリアル株式会社 | 酸化タングステンスパッタリングターゲット |
| KR102253914B1 (ko) * | 2019-10-14 | 2021-05-20 | 가천대학교 산학협력단 | 금속산화물 타겟의 제조 방법, 및 이를 이용하여 제조된 다중 유전 박막 |
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| JP2005314131A (ja) * | 2004-04-27 | 2005-11-10 | Sumitomo Metal Mining Co Ltd | 酸化物焼結体、スパッタリングターゲット、透明導電性薄膜およびその製造方法 |
| JP2015107907A (ja) * | 2013-10-23 | 2015-06-11 | 住友電気工業株式会社 | 酸化物焼結体および半導体デバイス |
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| JP3746094B2 (ja) | 1995-06-28 | 2006-02-15 | 出光興産株式会社 | ターゲットおよびその製造方法 |
| JP2006160535A (ja) * | 2004-12-02 | 2006-06-22 | Sumitomo Metal Mining Co Ltd | 酸化物焼結体、スパッタリングターゲットおよび透明導電性薄膜 |
| US8524123B2 (en) * | 2005-09-01 | 2013-09-03 | Idemitsu Kosan Co., Ltd. | Sputtering target, transparent conductive film and transparent electrode |
| WO2007141994A1 (ja) * | 2006-06-08 | 2007-12-13 | Sumitomo Metal Mining Co., Ltd. | 酸化物焼結体、ターゲット、およびそれを用いて得られる透明導電膜、並びに透明導電性基材 |
| KR101420992B1 (ko) * | 2006-12-13 | 2014-07-17 | 이데미쓰 고산 가부시키가이샤 | 스퍼터링 타겟 |
| JP5143410B2 (ja) * | 2006-12-13 | 2013-02-13 | 出光興産株式会社 | スパッタリングターゲットの製造方法 |
| JP4662075B2 (ja) | 2007-02-02 | 2011-03-30 | 株式会社ブリヂストン | 薄膜トランジスタ及びその製造方法 |
| KR101312259B1 (ko) | 2007-02-09 | 2013-09-25 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조방법 |
| JP5591523B2 (ja) * | 2009-11-19 | 2014-09-17 | 出光興産株式会社 | 長期成膜時の安定性に優れたIn−Ga−Zn−O系酸化物焼結体スパッタリングターゲット |
| JP5817327B2 (ja) * | 2010-09-29 | 2015-11-18 | 東ソー株式会社 | 酸化物焼結体、その製造方法、それを用いて得られる酸化物透明導電膜及び太陽電池 |
| JP5966840B2 (ja) * | 2012-10-11 | 2016-08-10 | 住友金属鉱山株式会社 | 酸化物半導体薄膜および薄膜トランジスタ |
| JP2014214359A (ja) * | 2013-04-26 | 2014-11-17 | 出光興産株式会社 | スパッタリングターゲット、酸化物半導体薄膜及び当該酸化物半導体薄膜を備える薄膜トランジスタ |
| WO2015118724A1 (ja) * | 2014-02-07 | 2015-08-13 | リンテック株式会社 | 透明導電性積層体、透明導電性積層体の製造方法、および透明導電性積層体を用いてなる電子デバイス |
| US10087517B2 (en) * | 2014-10-22 | 2018-10-02 | Sumitomo Electric Industries, Ltd. | Oxide sintered body and semiconductor device |
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- 2015-09-16 JP JP2015182931A patent/JP6308191B2/ja active Active
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- 2016-05-06 KR KR1020187032478A patent/KR101996778B1/ko active Active
- 2016-05-06 EP EP16846025.1A patent/EP3345881A1/en not_active Withdrawn
- 2016-05-06 KR KR1020177013037A patent/KR101919268B1/ko active Active
- 2016-05-06 CN CN201680003741.2A patent/CN107001146B/zh active Active
- 2016-06-24 TW TW105120063A patent/TWI704123B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005314131A (ja) * | 2004-04-27 | 2005-11-10 | Sumitomo Metal Mining Co Ltd | 酸化物焼結体、スパッタリングターゲット、透明導電性薄膜およびその製造方法 |
| JP2015107907A (ja) * | 2013-10-23 | 2015-06-11 | 住友電気工業株式会社 | 酸化物焼結体および半導体デバイス |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017047152A1 (ja) | 2017-03-23 |
| KR20170072259A (ko) | 2017-06-26 |
| CN107001146A (zh) | 2017-08-01 |
| US20180023188A1 (en) | 2018-01-25 |
| JP2017057109A (ja) | 2017-03-23 |
| EP3345881A1 (en) | 2018-07-11 |
| CN107001146B (zh) | 2020-03-03 |
| US10655213B2 (en) | 2020-05-19 |
| JP6308191B2 (ja) | 2018-04-11 |
| KR20180123597A (ko) | 2018-11-16 |
| KR101996778B1 (ko) | 2019-07-04 |
| TWI704123B (zh) | 2020-09-11 |
| TW201711982A (zh) | 2017-04-01 |
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