KR101918768B1 - 하프늄 산화물 또는 지르코늄 산화물 코팅 - Google Patents

하프늄 산화물 또는 지르코늄 산화물 코팅 Download PDF

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Publication number
KR101918768B1
KR101918768B1 KR1020117012503A KR20117012503A KR101918768B1 KR 101918768 B1 KR101918768 B1 KR 101918768B1 KR 1020117012503 A KR1020117012503 A KR 1020117012503A KR 20117012503 A KR20117012503 A KR 20117012503A KR 101918768 B1 KR101918768 B1 KR 101918768B1
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South Korea
Prior art keywords
coating
hafnium
substrate
layer
reactive
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English (en)
Korean (ko)
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KR20110098720A (ko
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미하엘 쉐러
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뷔흘러 알제나우 게엠베하
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)
KR1020117012503A 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅 Active KR101918768B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
PCT/EP2008/009206 WO2010048975A1 (de) 2008-10-31 2008-10-31 Hafniumoxid-beschichtung
WOPCT/EP2008/009206 2008-10-31
PCT/EP2009/002138 WO2010049012A1 (de) 2008-10-31 2009-03-24 Hafnium- oder zirkoniumoxid-beschichtung

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020167020033A Division KR20160093080A (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅

Publications (2)

Publication Number Publication Date
KR20110098720A KR20110098720A (ko) 2011-09-01
KR101918768B1 true KR101918768B1 (ko) 2018-11-14

Family

ID=40810751

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020117012503A Active KR101918768B1 (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅
KR1020167020033A Ceased KR20160093080A (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020167020033A Ceased KR20160093080A (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅

Country Status (4)

Country Link
JP (2) JP5665751B2 (enExample)
KR (2) KR101918768B1 (enExample)
CN (1) CN102264940B (enExample)
WO (2) WO2010048975A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100279124A1 (en) 2008-10-31 2010-11-04 Leybold Optics Gmbh Hafnium or zirconium oxide Coating
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung
KR102241852B1 (ko) * 2019-12-31 2021-04-20 주식회사 이노션테크 친환경 하이브리드 자동차 부품용 코팅재 및 코팅 시스템
US11752228B2 (en) * 2020-08-24 2023-09-12 Lumenlabs Llc Highly efficient UV C bulb with multifaceted filter

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005197675A (ja) * 2003-12-11 2005-07-21 Mitsubishi Materials Corp ハフニウム含有膜形成材料及び該材料から作製されたハフニウム含有膜

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU616736B2 (en) 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
JP2576662B2 (ja) * 1989-03-07 1997-01-29 旭硝子株式会社 熱線遮断ガラス
JP2720919B2 (ja) * 1989-03-07 1998-03-04 旭硝子株式会社 ターゲット
JPH03187955A (ja) * 1989-03-07 1991-08-15 Asahi Glass Co Ltd 選択透過物品及びその製造方法
JP2917432B2 (ja) * 1989-08-01 1999-07-12 旭硝子株式会社 電導性ガラスの製造方法
US5268217A (en) * 1990-09-27 1993-12-07 Diamonex, Incorporated Abrasion wear resistant coated substrate product
JPH04291981A (ja) * 1991-03-20 1992-10-16 Fujitsu Ltd 半導体レーザ装置
US6587264B2 (en) * 2001-01-18 2003-07-01 Thermo Corion Corporation Selectively tuned ultraviolet optical filters and methods of use thereof
JP3995082B2 (ja) * 2001-07-18 2007-10-24 日鉱金属株式会社 ゲート酸化膜形成用ハフニウムシリサイドターゲット及びその製造方法
DE10141102A1 (de) * 2001-08-22 2003-04-03 Schott Glas Cadmiumfreie optische Steilkantenfilter
US20030207549A1 (en) * 2002-05-02 2003-11-06 Jenq Jason Jyh-Shyang Method of forming a silicate dielectric layer
US8454804B2 (en) * 2005-10-28 2013-06-04 Applied Materials Inc. Protective offset sputtering
JP4177857B2 (ja) * 2006-04-28 2008-11-05 株式会社東芝 半導体装置およびその製造方法
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005197675A (ja) * 2003-12-11 2005-07-21 Mitsubishi Materials Corp ハフニウム含有膜形成材料及び該材料から作製されたハフニウム含有膜

Also Published As

Publication number Publication date
WO2010048975A1 (de) 2010-05-06
KR20110098720A (ko) 2011-09-01
CN102264940A (zh) 2011-11-30
CN102264940B (zh) 2015-06-10
JP5916821B2 (ja) 2016-05-11
JP5665751B2 (ja) 2015-02-04
JP2012506950A (ja) 2012-03-22
WO2010049012A1 (de) 2010-05-06
JP2015025207A (ja) 2015-02-05
KR20160093080A (ko) 2016-08-05

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