JP5665751B2 - 酸化ハフニウム−コーティング - Google Patents

酸化ハフニウム−コーティング Download PDF

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Publication number
JP5665751B2
JP5665751B2 JP2011533551A JP2011533551A JP5665751B2 JP 5665751 B2 JP5665751 B2 JP 5665751B2 JP 2011533551 A JP2011533551 A JP 2011533551A JP 2011533551 A JP2011533551 A JP 2011533551A JP 5665751 B2 JP5665751 B2 JP 5665751B2
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JP
Japan
Prior art keywords
coating
substrate
optical member
hafnium
oxide
Prior art date
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JP2011533551A
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English (en)
Japanese (ja)
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JP2012506950A (ja
JP2012506950A5 (enExample
Inventor
シェーラー ミヒャエル
シェーラー ミヒャエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buehler Alzenau GmbH
Original Assignee
Leybold Optics GmbH
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Publication date
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Publication of JP2012506950A publication Critical patent/JP2012506950A/ja
Publication of JP2012506950A5 publication Critical patent/JP2012506950A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
JP2011533551A 2008-10-31 2009-03-24 酸化ハフニウム−コーティング Active JP5665751B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EPPCT/EP2008/009206 2008-10-31
PCT/EP2008/009206 WO2010048975A1 (de) 2008-10-31 2008-10-31 Hafniumoxid-beschichtung
PCT/EP2009/002138 WO2010049012A1 (de) 2008-10-31 2009-03-24 Hafnium- oder zirkoniumoxid-beschichtung

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014182334A Division JP5916821B2 (ja) 2008-10-31 2014-09-08 酸化ハフニウムコーティング

Publications (3)

Publication Number Publication Date
JP2012506950A JP2012506950A (ja) 2012-03-22
JP2012506950A5 JP2012506950A5 (enExample) 2012-05-24
JP5665751B2 true JP5665751B2 (ja) 2015-02-04

Family

ID=40810751

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011533551A Active JP5665751B2 (ja) 2008-10-31 2009-03-24 酸化ハフニウム−コーティング
JP2014182334A Active JP5916821B2 (ja) 2008-10-31 2014-09-08 酸化ハフニウムコーティング

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2014182334A Active JP5916821B2 (ja) 2008-10-31 2014-09-08 酸化ハフニウムコーティング

Country Status (4)

Country Link
JP (2) JP5665751B2 (enExample)
KR (2) KR20160093080A (enExample)
CN (1) CN102264940B (enExample)
WO (2) WO2010048975A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015025207A (ja) * 2008-10-31 2015-02-05 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツングＬｅｙｂｏｌｄ Ｏｐｔｉｃｓ ＧｍｂＨ 酸化ハフニウム又は酸化ジルコニウム−コーティング

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100279124A1 (en) 2008-10-31 2010-11-04 Leybold Optics Gmbh Hafnium or zirconium oxide Coating
KR102241852B1 (ko) * 2019-12-31 2021-04-20 주식회사 이노션테크 친환경 하이브리드 자동차 부품용 코팅재 및 코팅 시스템
US11752228B2 (en) * 2020-08-24 2023-09-12 Lumenlabs Llc Highly efficient UV C bulb with multifaceted filter

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU616736B2 (en) 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
JP2576662B2 (ja) * 1989-03-07 1997-01-29 旭硝子株式会社 熱線遮断ガラス
JPH03187955A (ja) * 1989-03-07 1991-08-15 Asahi Glass Co Ltd 選択透過物品及びその製造方法
JP2950886B2 (ja) * 1989-03-07 1999-09-20 旭硝子株式会社 選択透過膜付きガラスの製造方法
JP2917432B2 (ja) * 1989-08-01 1999-07-12 旭硝子株式会社 電導性ガラスの製造方法
US5268217A (en) * 1990-09-27 1993-12-07 Diamonex, Incorporated Abrasion wear resistant coated substrate product
JPH04291981A (ja) * 1991-03-20 1992-10-16 Fujitsu Ltd 半導体レーザ装置
US6587264B2 (en) * 2001-01-18 2003-07-01 Thermo Corion Corporation Selectively tuned ultraviolet optical filters and methods of use thereof
JP3995082B2 (ja) * 2001-07-18 2007-10-24 日鉱金属株式会社 ゲート酸化膜形成用ハフニウムシリサイドターゲット及びその製造方法
DE10141102A1 (de) * 2001-08-22 2003-04-03 Schott Glas Cadmiumfreie optische Steilkantenfilter
US20030207549A1 (en) * 2002-05-02 2003-11-06 Jenq Jason Jyh-Shyang Method of forming a silicate dielectric layer
JP2005197675A (ja) * 2003-12-11 2005-07-21 Mitsubishi Materials Corp ハフニウム含有膜形成材料及び該材料から作製されたハフニウム含有膜
US8454804B2 (en) * 2005-10-28 2013-06-04 Applied Materials Inc. Protective offset sputtering
JP4177857B2 (ja) * 2006-04-28 2008-11-05 株式会社東芝 半導体装置およびその製造方法
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015025207A (ja) * 2008-10-31 2015-02-05 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツングＬｅｙｂｏｌｄ Ｏｐｔｉｃｓ ＧｍｂＨ 酸化ハフニウム又は酸化ジルコニウム−コーティング

Also Published As

Publication number Publication date
JP2012506950A (ja) 2012-03-22
JP5916821B2 (ja) 2016-05-11
WO2010049012A1 (de) 2010-05-06
JP2015025207A (ja) 2015-02-05
WO2010048975A1 (de) 2010-05-06
CN102264940B (zh) 2015-06-10
KR20160093080A (ko) 2016-08-05
KR101918768B1 (ko) 2018-11-14
CN102264940A (zh) 2011-11-30
KR20110098720A (ko) 2011-09-01

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