KR20160093080A - 하프늄 산화물 또는 지르코늄 산화물 코팅 - Google Patents

하프늄 산화물 또는 지르코늄 산화물 코팅 Download PDF

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Publication number
KR20160093080A
KR20160093080A KR1020167020033A KR20167020033A KR20160093080A KR 20160093080 A KR20160093080 A KR 20160093080A KR 1020167020033 A KR1020167020033 A KR 1020167020033A KR 20167020033 A KR20167020033 A KR 20167020033A KR 20160093080 A KR20160093080 A KR 20160093080A
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KR
South Korea
Prior art keywords
coating
hafnium
layer
zirconium
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020167020033A
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English (en)
Korean (ko)
Inventor
미하엘 쉐러
Original Assignee
뷔흘러 알제나우 게엠베하
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Publication date
Application filed by 뷔흘러 알제나우 게엠베하 filed Critical 뷔흘러 알제나우 게엠베하
Publication of KR20160093080A publication Critical patent/KR20160093080A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
KR1020167020033A 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅 Ceased KR20160093080A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EPPCT/EP2008/09206 2008-10-31
PCT/EP2008/009206 WO2010048975A1 (de) 2008-10-31 2008-10-31 Hafniumoxid-beschichtung
PCT/EP2009/002138 WO2010049012A1 (de) 2008-10-31 2009-03-24 Hafnium- oder zirkoniumoxid-beschichtung

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020117012503A Division KR101918768B1 (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅

Publications (1)

Publication Number Publication Date
KR20160093080A true KR20160093080A (ko) 2016-08-05

Family

ID=40810751

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020167020033A Ceased KR20160093080A (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅
KR1020117012503A Active KR101918768B1 (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020117012503A Active KR101918768B1 (ko) 2008-10-31 2009-03-24 하프늄 산화물 또는 지르코늄 산화물 코팅

Country Status (4)

Country Link
JP (2) JP5665751B2 (enExample)
KR (2) KR20160093080A (enExample)
CN (1) CN102264940B (enExample)
WO (2) WO2010048975A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102241852B1 (ko) * 2019-12-31 2021-04-20 주식회사 이노션테크 친환경 하이브리드 자동차 부품용 코팅재 및 코팅 시스템

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100279124A1 (en) 2008-10-31 2010-11-04 Leybold Optics Gmbh Hafnium or zirconium oxide Coating
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung
US11752228B2 (en) * 2020-08-24 2023-09-12 Lumenlabs Llc Highly efficient UV C bulb with multifaceted filter

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU616736B2 (en) 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
JP2576662B2 (ja) * 1989-03-07 1997-01-29 旭硝子株式会社 熱線遮断ガラス
JPH03187955A (ja) * 1989-03-07 1991-08-15 Asahi Glass Co Ltd 選択透過物品及びその製造方法
JP2950886B2 (ja) * 1989-03-07 1999-09-20 旭硝子株式会社 選択透過膜付きガラスの製造方法
JP2917432B2 (ja) * 1989-08-01 1999-07-12 旭硝子株式会社 電導性ガラスの製造方法
US5268217A (en) * 1990-09-27 1993-12-07 Diamonex, Incorporated Abrasion wear resistant coated substrate product
JPH04291981A (ja) * 1991-03-20 1992-10-16 Fujitsu Ltd 半導体レーザ装置
US6587264B2 (en) * 2001-01-18 2003-07-01 Thermo Corion Corporation Selectively tuned ultraviolet optical filters and methods of use thereof
JP3995082B2 (ja) * 2001-07-18 2007-10-24 日鉱金属株式会社 ゲート酸化膜形成用ハフニウムシリサイドターゲット及びその製造方法
DE10141102A1 (de) * 2001-08-22 2003-04-03 Schott Glas Cadmiumfreie optische Steilkantenfilter
US20030207549A1 (en) * 2002-05-02 2003-11-06 Jenq Jason Jyh-Shyang Method of forming a silicate dielectric layer
JP2005197675A (ja) * 2003-12-11 2005-07-21 Mitsubishi Materials Corp ハフニウム含有膜形成材料及び該材料から作製されたハフニウム含有膜
US8454804B2 (en) * 2005-10-28 2013-06-04 Applied Materials Inc. Protective offset sputtering
JP4177857B2 (ja) * 2006-04-28 2008-11-05 株式会社東芝 半導体装置およびその製造方法
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102241852B1 (ko) * 2019-12-31 2021-04-20 주식회사 이노션테크 친환경 하이브리드 자동차 부품용 코팅재 및 코팅 시스템

Also Published As

Publication number Publication date
JP2012506950A (ja) 2012-03-22
JP5916821B2 (ja) 2016-05-11
WO2010049012A1 (de) 2010-05-06
JP2015025207A (ja) 2015-02-05
WO2010048975A1 (de) 2010-05-06
JP5665751B2 (ja) 2015-02-04
CN102264940B (zh) 2015-06-10
KR101918768B1 (ko) 2018-11-14
CN102264940A (zh) 2011-11-30
KR20110098720A (ko) 2011-09-01

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