CN102264940B - 氧化铪或氧化锆镀层 - Google Patents

氧化铪或氧化锆镀层 Download PDF

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Publication number
CN102264940B
CN102264940B CN200980152495.7A CN200980152495A CN102264940B CN 102264940 B CN102264940 B CN 102264940B CN 200980152495 A CN200980152495 A CN 200980152495A CN 102264940 B CN102264940 B CN 102264940B
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CN
China
Prior art keywords
coating
magnetron sputtering
reaction
preparation
internal stress
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200980152495.7A
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English (en)
Chinese (zh)
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CN102264940A (zh
Inventor
M·谢勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buehler Alzenau GmbH
Original Assignee
Leybold Optics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Optics GmbH filed Critical Leybold Optics GmbH
Publication of CN102264940A publication Critical patent/CN102264940A/zh
Application granted granted Critical
Publication of CN102264940B publication Critical patent/CN102264940B/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
CN200980152495.7A 2008-10-31 2009-03-24 氧化铪或氧化锆镀层 Active CN102264940B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EPPCT/EP2008/009206 2008-10-31
PCT/EP2008/009206 WO2010048975A1 (de) 2008-10-31 2008-10-31 Hafniumoxid-beschichtung
PCT/EP2009/002138 WO2010049012A1 (de) 2008-10-31 2009-03-24 Hafnium- oder zirkoniumoxid-beschichtung

Publications (2)

Publication Number Publication Date
CN102264940A CN102264940A (zh) 2011-11-30
CN102264940B true CN102264940B (zh) 2015-06-10

Family

ID=40810751

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980152495.7A Active CN102264940B (zh) 2008-10-31 2009-03-24 氧化铪或氧化锆镀层

Country Status (4)

Country Link
JP (2) JP5665751B2 (enExample)
KR (2) KR20160093080A (enExample)
CN (1) CN102264940B (enExample)
WO (2) WO2010048975A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100279124A1 (en) 2008-10-31 2010-11-04 Leybold Optics Gmbh Hafnium or zirconium oxide Coating
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung
KR102241852B1 (ko) * 2019-12-31 2021-04-20 주식회사 이노션테크 친환경 하이브리드 자동차 부품용 코팅재 및 코팅 시스템
US11752228B2 (en) * 2020-08-24 2023-09-12 Lumenlabs Llc Highly efficient UV C bulb with multifaceted filter

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030207549A1 (en) * 2002-05-02 2003-11-06 Jenq Jason Jyh-Shyang Method of forming a silicate dielectric layer
EP1408541A1 (en) * 2001-07-18 2004-04-14 Nikko Materials Company, Limited Hafnium silicide target for forming gate oxide film and method for preparation thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU616736B2 (en) 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
JP2576662B2 (ja) * 1989-03-07 1997-01-29 旭硝子株式会社 熱線遮断ガラス
JPH03187955A (ja) * 1989-03-07 1991-08-15 Asahi Glass Co Ltd 選択透過物品及びその製造方法
JP2950886B2 (ja) * 1989-03-07 1999-09-20 旭硝子株式会社 選択透過膜付きガラスの製造方法
JP2917432B2 (ja) * 1989-08-01 1999-07-12 旭硝子株式会社 電導性ガラスの製造方法
US5268217A (en) * 1990-09-27 1993-12-07 Diamonex, Incorporated Abrasion wear resistant coated substrate product
JPH04291981A (ja) * 1991-03-20 1992-10-16 Fujitsu Ltd 半導体レーザ装置
US6587264B2 (en) * 2001-01-18 2003-07-01 Thermo Corion Corporation Selectively tuned ultraviolet optical filters and methods of use thereof
DE10141102A1 (de) * 2001-08-22 2003-04-03 Schott Glas Cadmiumfreie optische Steilkantenfilter
JP2005197675A (ja) * 2003-12-11 2005-07-21 Mitsubishi Materials Corp ハフニウム含有膜形成材料及び該材料から作製されたハフニウム含有膜
US8454804B2 (en) * 2005-10-28 2013-06-04 Applied Materials Inc. Protective offset sputtering
JP4177857B2 (ja) * 2006-04-28 2008-11-05 株式会社東芝 半導体装置およびその製造方法
WO2010048975A1 (de) * 2008-10-31 2010-05-06 Leybold Optics Gmbh Hafniumoxid-beschichtung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1408541A1 (en) * 2001-07-18 2004-04-14 Nikko Materials Company, Limited Hafnium silicide target for forming gate oxide film and method for preparation thereof
US20030207549A1 (en) * 2002-05-02 2003-11-06 Jenq Jason Jyh-Shyang Method of forming a silicate dielectric layer

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
A comparative morphological study of electron beam co-deposited binary optical thin films of HfO2:SiO2 and ZrO2:SiO2;R.B. Tokas等;《Current Applied Physics》;20071101;第8卷;参见摘要、表1-2、4.Experomentaldetails *
SiO2添加剂对Zr02涂层抗热震性的影响;李慕勤等;《第十次全国焊接会议论文集》;20010901;1实验材料及方法、4结论 *

Also Published As

Publication number Publication date
JP2012506950A (ja) 2012-03-22
JP5916821B2 (ja) 2016-05-11
WO2010049012A1 (de) 2010-05-06
JP2015025207A (ja) 2015-02-05
WO2010048975A1 (de) 2010-05-06
JP5665751B2 (ja) 2015-02-04
KR20160093080A (ko) 2016-08-05
KR101918768B1 (ko) 2018-11-14
CN102264940A (zh) 2011-11-30
KR20110098720A (ko) 2011-09-01

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