KR101908739B1 - 막 두께 측정 방법 및 막 두께 측정 장치 - Google Patents

막 두께 측정 방법 및 막 두께 측정 장치 Download PDF

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Publication number
KR101908739B1
KR101908739B1 KR1020130107128A KR20130107128A KR101908739B1 KR 101908739 B1 KR101908739 B1 KR 101908739B1 KR 1020130107128 A KR1020130107128 A KR 1020130107128A KR 20130107128 A KR20130107128 A KR 20130107128A KR 101908739 B1 KR101908739 B1 KR 101908739B1
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KR
South Korea
Prior art keywords
film
wavelength region
thickness
light
wavelength
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KR1020130107128A
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English (en)
Korean (ko)
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KR20140034694A (ko
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구니카즈 다구치
소우타 오카모토
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오츠카 일렉트로닉스 가부시키가이샤
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Publication of KR20140034694A publication Critical patent/KR20140034694A/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020130107128A 2012-09-11 2013-09-06 막 두께 측정 방법 및 막 두께 측정 장치 KR101908739B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012199136A JP6363819B2 (ja) 2012-09-11 2012-09-11 膜厚測定方法及び膜厚測定装置
JPJP-P-2012-199136 2012-09-11

Publications (2)

Publication Number Publication Date
KR20140034694A KR20140034694A (ko) 2014-03-20
KR101908739B1 true KR101908739B1 (ko) 2018-10-16

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KR1020130107128A KR101908739B1 (ko) 2012-09-11 2013-09-06 막 두께 측정 방법 및 막 두께 측정 장치

Country Status (3)

Country Link
JP (1) JP6363819B2 (ja)
KR (1) KR101908739B1 (ja)
TW (1) TWI603053B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6502626B2 (ja) * 2014-07-10 2019-04-17 株式会社東京精密 距離測定装置、および距離測定方法
JP6487579B1 (ja) 2018-01-09 2019-03-20 浜松ホトニクス株式会社 膜厚計測装置、膜厚計測方法、膜厚計測プログラム、及び膜厚計測プログラムを記録する記録媒体
KR102202789B1 (ko) 2018-05-24 2021-01-14 주식회사 엘지화학 3층 구조의 연료전지용 수소이온교환 강화막 비파괴 두께 측정 방법
JP6686201B2 (ja) * 2019-03-22 2020-04-22 株式会社東京精密 距離測定装置、および距離測定方法
KR102659670B1 (ko) 2019-07-31 2024-04-19 에스케이하이닉스 주식회사 두께 측정 장치 및 방법
CN116878407B (zh) * 2023-09-08 2023-12-01 法博思(宁波)半导体设备有限公司 一种基于红外干涉的外延片测厚方法及装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009250783A (ja) * 2008-04-07 2009-10-29 Sonac Kk 多層薄膜の膜厚測定方法
JP2010002327A (ja) 2008-06-20 2010-01-07 Otsuka Denshi Co Ltd 膜厚測定装置および膜厚測定方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0252205A (ja) * 1988-08-17 1990-02-21 Dainippon Screen Mfg Co Ltd 膜厚測定方法
JP2840181B2 (ja) * 1993-08-20 1998-12-24 大日本スクリーン製造株式会社 多層膜試料の膜厚測定方法
US7646489B2 (en) * 2007-04-25 2010-01-12 Yokogawa Electric Corporation Apparatus and method for measuring film thickness

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009250783A (ja) * 2008-04-07 2009-10-29 Sonac Kk 多層薄膜の膜厚測定方法
JP2010002327A (ja) 2008-06-20 2010-01-07 Otsuka Denshi Co Ltd 膜厚測定装置および膜厚測定方法

Also Published As

Publication number Publication date
TW201414983A (zh) 2014-04-16
JP6363819B2 (ja) 2018-07-25
JP2014055780A (ja) 2014-03-27
KR20140034694A (ko) 2014-03-20
TWI603053B (zh) 2017-10-21

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