KR101841775B1 - 기판 처리 장치 및 기판 처리 방법 - Google Patents

기판 처리 장치 및 기판 처리 방법 Download PDF

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Publication number
KR101841775B1
KR101841775B1 KR1020120070460A KR20120070460A KR101841775B1 KR 101841775 B1 KR101841775 B1 KR 101841775B1 KR 1020120070460 A KR1020120070460 A KR 1020120070460A KR 20120070460 A KR20120070460 A KR 20120070460A KR 101841775 B1 KR101841775 B1 KR 101841775B1
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KR
South Korea
Prior art keywords
temperature
substrate
adjusting
regulating
detecting
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KR1020120070460A
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English (en)
Korean (ko)
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KR20130007476A (ko
Inventor
신이찌 하야시
고오조오 가나가와
스구루 에노끼다
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도쿄엘렉트론가부시키가이샤
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20130007476A publication Critical patent/KR20130007476A/ko
Application granted granted Critical
Publication of KR101841775B1 publication Critical patent/KR101841775B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020120070460A 2011-07-01 2012-06-29 기판 처리 장치 및 기판 처리 방법 KR101841775B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2011-147601 2011-07-01
JP2011147601A JP5708310B2 (ja) 2011-07-01 2011-07-01 基板処理装置

Publications (2)

Publication Number Publication Date
KR20130007476A KR20130007476A (ko) 2013-01-18
KR101841775B1 true KR101841775B1 (ko) 2018-03-23

Family

ID=47688994

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120070460A KR101841775B1 (ko) 2011-07-01 2012-06-29 기판 처리 장치 및 기판 처리 방법

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JP (1) JP5708310B2 (ja)
KR (1) KR101841775B1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6442339B2 (ja) 2015-03-26 2018-12-19 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置および熱処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118557A (ja) * 2008-11-13 2010-05-27 Canon Inc 露光装置、基板処理装置、リソグラフィーシステムおよびデバイス製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02143440A (ja) * 1988-11-24 1990-06-01 Fuji Electric Co Ltd 半導体ウエハ処理装置のウエハチャック
JP2816756B2 (ja) * 1990-08-10 1998-10-27 東京エレクトロン株式会社 レジスト処理装置
JPH0689840A (ja) * 1992-09-09 1994-03-29 Nikon Corp 露光装置
JPH07142549A (ja) * 1993-11-22 1995-06-02 Hitachi Ltd 半導体製造装置
JPH10116772A (ja) * 1996-10-14 1998-05-06 Fujitsu Ltd 露光装置及び露光方法
JP2000208404A (ja) * 1999-01-18 2000-07-28 Canon Inc 露光装置およびデバイス製造方法
JP2005175187A (ja) * 2003-12-11 2005-06-30 Canon Inc 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
JP2006295146A (ja) * 2005-03-18 2006-10-26 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2006344986A (ja) * 2006-07-18 2006-12-21 Tokyo Electron Ltd 塗布、現像装置及びパターン形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118557A (ja) * 2008-11-13 2010-05-27 Canon Inc 露光装置、基板処理装置、リソグラフィーシステムおよびデバイス製造方法

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Publication number Publication date
JP5708310B2 (ja) 2015-04-30
JP2013016595A (ja) 2013-01-24
KR20130007476A (ko) 2013-01-18

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