KR101833234B1 - 박막 증착용 마스크 프레임 어셈블리 - Google Patents

박막 증착용 마스크 프레임 어셈블리 Download PDF

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Publication number
KR101833234B1
KR101833234B1 KR1020110060229A KR20110060229A KR101833234B1 KR 101833234 B1 KR101833234 B1 KR 101833234B1 KR 1020110060229 A KR1020110060229 A KR 1020110060229A KR 20110060229 A KR20110060229 A KR 20110060229A KR 101833234 B1 KR101833234 B1 KR 101833234B1
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KR
South Korea
Prior art keywords
support
mask
frame
fastening
fixing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020110060229A
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English (en)
Korean (ko)
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KR20120140473A (ko
Inventor
강택교
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삼성디스플레이 주식회사
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Application filed by 삼성디스플레이 주식회사 filed Critical 삼성디스플레이 주식회사
Priority to KR1020110060229A priority Critical patent/KR101833234B1/ko
Priority to US13/430,874 priority patent/US8631761B2/en
Priority to JP2012121818A priority patent/JP6073573B2/ja
Publication of KR20120140473A publication Critical patent/KR20120140473A/ko
Application granted granted Critical
Publication of KR101833234B1 publication Critical patent/KR101833234B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4085—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by the processes involved to create the masks

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020110060229A 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리 Expired - Fee Related KR101833234B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020110060229A KR101833234B1 (ko) 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리
US13/430,874 US8631761B2 (en) 2011-06-21 2012-03-27 Mask frame assembly for thin-film deposition
JP2012121818A JP6073573B2 (ja) 2011-06-21 2012-05-29 薄膜蒸着用マスクフレームアセンブリー

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110060229A KR101833234B1 (ko) 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리

Publications (2)

Publication Number Publication Date
KR20120140473A KR20120140473A (ko) 2012-12-31
KR101833234B1 true KR101833234B1 (ko) 2018-03-02

Family

ID=47360600

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110060229A Expired - Fee Related KR101833234B1 (ko) 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리

Country Status (3)

Country Link
US (1) US8631761B2 (https=)
JP (1) JP6073573B2 (https=)
KR (1) KR101833234B1 (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190140775A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20190140768A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20230139566A (ko) 2022-03-28 2023-10-05 스템코 주식회사 증착 마스크, 그 제조 방법 및 그 제조용 금속판
KR20230140975A (ko) 2022-03-30 2023-10-10 스템코 주식회사 증착 마스크 및 그 제조 방법
WO2026044189A1 (en) * 2024-08-22 2026-02-26 Applied Materials, Inc. Shadow frame having separable crossbeam
US12601042B2 (en) 2022-06-23 2026-04-14 Samsung Display Co., Ltd. Mask frame assembly and method of manufacturing the same

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JP5258278B2 (ja) * 2007-12-13 2013-08-07 キヤノントッキ株式会社 成膜用マスク及びマスク密着方法
KR101030030B1 (ko) * 2009-12-11 2011-04-20 삼성모바일디스플레이주식회사 마스크 조립체
KR101813549B1 (ko) * 2011-05-06 2018-01-02 삼성디스플레이 주식회사 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치
KR20130028165A (ko) * 2011-06-21 2013-03-19 삼성디스플레이 주식회사 마스크 유닛
KR20130081528A (ko) * 2012-01-09 2013-07-17 삼성디스플레이 주식회사 증착 마스크 및 이를 이용한 증착 설비
KR101995500B1 (ko) * 2012-11-20 2019-10-02 삼성디스플레이 주식회사 단위 마스크 및 마스크 조립체
KR102079170B1 (ko) * 2013-04-09 2020-02-20 삼성디스플레이 주식회사 증착 장치 및 그에 적용되는 마스크 조립체
KR102106331B1 (ko) * 2013-07-08 2020-05-06 삼성디스플레이 주식회사 마스크 조립체 및 이의 제조 방법
JP2015069806A (ja) * 2013-09-27 2015-04-13 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置の製造方法
KR20150043908A (ko) * 2013-10-15 2015-04-23 삼성디스플레이 주식회사 트레이 조립체 및 이를 이용한 도너필름의 제조방법
KR102100296B1 (ko) * 2013-10-28 2020-04-13 엘지디스플레이 주식회사 분할 마스크 조립체
CN103757588B (zh) * 2013-12-30 2016-02-03 昆山工研院新型平板显示技术中心有限公司 一种掩膜板及该掩膜板的制备方法和应用
KR102273049B1 (ko) * 2014-07-04 2021-07-06 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 어셈블리
KR102273050B1 (ko) * 2014-09-17 2021-07-06 삼성디스플레이 주식회사 증착용 마스크 어셈블를 포함하는 증착 장치 및 증착 방법
CN104611668B (zh) * 2015-01-29 2017-03-01 京东方科技集团股份有限公司 用于掩膜板的框架和掩膜板
KR102334410B1 (ko) * 2015-04-13 2021-12-03 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리
KR102366570B1 (ko) * 2015-06-19 2022-02-25 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
KR102366569B1 (ko) * 2015-07-01 2022-02-25 삼성디스플레이 주식회사 박막 증착용 마스크 인장 용접 장치
KR102401484B1 (ko) * 2015-08-31 2022-05-25 삼성디스플레이 주식회사 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조 방법
KR102549358B1 (ko) 2015-11-02 2023-06-29 삼성디스플레이 주식회사 증착 마스크 조립체 및 이를 이용한 표시 장치의 제조 방법
KR102532305B1 (ko) * 2016-06-15 2023-05-15 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
KR102616578B1 (ko) * 2016-06-24 2023-12-22 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리와, 이의 제조 방법
CN106480404B (zh) * 2016-12-28 2019-05-03 京东方科技集团股份有限公司 一种掩膜集成框架及蒸镀装置
US20190044068A1 (en) * 2017-08-01 2019-02-07 Wuhan China Star Optoelectronics Semiconductor Dis play Technology Co., Ltd. Mask plate
KR102514115B1 (ko) * 2018-06-12 2023-03-28 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 마스크 조립체
KR102630638B1 (ko) * 2018-08-29 2024-01-30 삼성디스플레이 주식회사 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조방법
KR102837467B1 (ko) 2019-02-06 2025-07-24 다이니폰 인사츠 가부시키가이샤 증착 마스크 장치, 마스크 지지 기구 및 증착 마스크 장치의 제조 방법
US11613802B2 (en) * 2020-04-17 2023-03-28 Rockwell Collins, Inc. Additively manufactured shadow masks for material deposition control
CN111394692B (zh) * 2020-05-09 2022-05-13 京东方科技集团股份有限公司 掩膜版
CN111876725A (zh) * 2020-07-31 2020-11-03 京东方科技集团股份有限公司 组合掩膜板及其支撑掩膜板
KR102868862B1 (ko) * 2020-12-10 2025-10-13 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 증착 장치

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US3241519A (en) * 1962-04-05 1966-03-22 Western Electric Co Tensioned and cooled mask
KR100595310B1 (ko) 2002-02-22 2006-07-03 엘지.필립스 엘시디 주식회사 마스크 고정장치 및 그를 이용한 ｕｖ조사장치
US7006202B2 (en) 2002-02-21 2006-02-28 Lg.Philips Lcd Co., Ltd. Mask holder for irradiating UV-rays
JP4439203B2 (ja) * 2003-05-09 2010-03-24 大日本印刷株式会社 多面付けマスク装置及びその組立方法
KR100603400B1 (ko) 2004-11-18 2006-07-20 삼성에스디아이 주식회사 평판표시장치의 박막 증착용 마스크
JP4795842B2 (ja) * 2006-04-26 2011-10-19 日本冶金工業株式会社 蒸着用治具
JP2008156686A (ja) 2006-12-22 2008-07-10 Seiko Epson Corp マスクおよびマスク蒸着装置
KR101117645B1 (ko) 2009-02-05 2012-03-05 삼성모바일디스플레이주식회사 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치
KR101049804B1 (ko) 2009-02-19 2011-07-15 삼성모바일디스플레이주식회사 증착 장치용 마스크 밀착 수단 및 이를 이용한 증착 장치
KR20100008826U (ko) 2009-02-27 2010-09-06 주식회사 디엠에스 마스크글라스 지지유닛

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190140775A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20190140768A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20230139566A (ko) 2022-03-28 2023-10-05 스템코 주식회사 증착 마스크, 그 제조 방법 및 그 제조용 금속판
KR20230140975A (ko) 2022-03-30 2023-10-10 스템코 주식회사 증착 마스크 및 그 제조 방법
US12601042B2 (en) 2022-06-23 2026-04-14 Samsung Display Co., Ltd. Mask frame assembly and method of manufacturing the same
WO2026044189A1 (en) * 2024-08-22 2026-02-26 Applied Materials, Inc. Shadow frame having separable crossbeam

Also Published As

Publication number Publication date
KR20120140473A (ko) 2012-12-31
JP6073573B2 (ja) 2017-02-01
US20120325143A1 (en) 2012-12-27
US8631761B2 (en) 2014-01-21
JP2013004520A (ja) 2013-01-07

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