KR101779807B1 - 유기할로실란과 할로실란을 제조하는 개선 방법 - Google Patents
유기할로실란과 할로실란을 제조하는 개선 방법 Download PDFInfo
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- KR101779807B1 KR101779807B1 KR1020177005856A KR20177005856A KR101779807B1 KR 101779807 B1 KR101779807 B1 KR 101779807B1 KR 1020177005856 A KR1020177005856 A KR 1020177005856A KR 20177005856 A KR20177005856 A KR 20177005856A KR 101779807 B1 KR101779807 B1 KR 101779807B1
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- South Korea
- Prior art keywords
- silicon
- reactor
- fluidized bed
- contact mass
- organohalosilane
- Prior art date
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- 238000002360 preparation method Methods 0.000 title description 6
- 230000006872 improvement Effects 0.000 title description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 138
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 109
- 239000010703 silicon Substances 0.000 claims abstract description 109
- 238000000034 method Methods 0.000 claims abstract description 102
- 239000003054 catalyst Substances 0.000 claims abstract description 47
- 239000012433 hydrogen halide Substances 0.000 claims abstract description 15
- 229910000039 hydrogen halide Inorganic materials 0.000 claims abstract description 15
- 230000005484 gravity Effects 0.000 claims abstract description 8
- 230000008569 process Effects 0.000 claims description 82
- 239000002245 particle Substances 0.000 claims description 66
- 238000006243 chemical reaction Methods 0.000 claims description 57
- -1 copper halides Chemical class 0.000 claims description 27
- 230000001186 cumulative effect Effects 0.000 claims description 26
- 150000004820 halides Chemical class 0.000 claims description 24
- 239000010949 copper Substances 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 22
- 229910052802 copper Inorganic materials 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 22
- 238000009826 distribution Methods 0.000 claims description 16
- 238000003786 synthesis reaction Methods 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 239000012535 impurity Substances 0.000 claims description 11
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 150000001350 alkyl halides Chemical class 0.000 claims description 8
- 238000009825 accumulation Methods 0.000 claims description 7
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 239000010419 fine particle Substances 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 4
- 239000005052 trichlorosilane Substances 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 3
- 239000005751 Copper oxide Substances 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 229910000431 copper oxide Inorganic materials 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 3
- 239000005055 methyl trichlorosilane Substances 0.000 claims description 3
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 239000005749 Copper compound Substances 0.000 claims description 2
- 229910017518 Cu Zn Inorganic materials 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 2
- 229910017758 Cu-Si Inorganic materials 0.000 claims description 2
- 229910017752 Cu-Zn Inorganic materials 0.000 claims description 2
- 229910017932 Cu—Sb Inorganic materials 0.000 claims description 2
- 229910017931 Cu—Si Inorganic materials 0.000 claims description 2
- 229910017943 Cu—Zn Inorganic materials 0.000 claims description 2
- 229940075103 antimony Drugs 0.000 claims description 2
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 claims description 2
- 150000001463 antimony compounds Chemical class 0.000 claims description 2
- 229940091658 arsenic Drugs 0.000 claims description 2
- 150000001495 arsenic compounds Chemical class 0.000 claims description 2
- 150000005840 aryl radicals Chemical class 0.000 claims description 2
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 claims description 2
- 150000001880 copper compounds Chemical class 0.000 claims description 2
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 claims description 2
- 229960003750 ethyl chloride Drugs 0.000 claims description 2
- 229940093920 gynecological arsenic compound Drugs 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000003018 phosphorus compounds Chemical class 0.000 claims description 2
- 150000003606 tin compounds Chemical class 0.000 claims description 2
- 150000003752 zinc compounds Chemical class 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 150000008282 halocarbons Chemical class 0.000 abstract description 6
- 238000010924 continuous production Methods 0.000 abstract description 2
- 239000000047 product Substances 0.000 description 19
- 239000007789 gas Substances 0.000 description 16
- 239000011863 silicon-based powder Substances 0.000 description 16
- 239000005046 Chlorosilane Substances 0.000 description 11
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 238000005243 fluidization Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 239000011856 silicon-based particle Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 229910005329 FeSi 2 Inorganic materials 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229940050176 methyl chloride Drugs 0.000 description 4
- 150000001367 organochlorosilanes Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910004706 CaSi2 Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical class C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 2
- 230000009849 deactivation Effects 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000013467 fragmentation Methods 0.000 description 2
- 238000006062 fragmentation reaction Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002367 halogens Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 125000005375 organosiloxane group Chemical group 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000010909 process residue Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000002594 sorbent Substances 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 1
- KQHIGRPLCKIXNJ-UHFFFAOYSA-N chloro-methyl-silylsilane Chemical compound C[SiH]([SiH3])Cl KQHIGRPLCKIXNJ-UHFFFAOYSA-N 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- PJMZOZSTBHYHFW-UHFFFAOYSA-N dibenzyl(dichloro)silane Chemical compound C=1C=CC=CC=1C[Si](Cl)(Cl)CC1=CC=CC=C1 PJMZOZSTBHYHFW-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000008394 flocculating agent Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 238000011020 pilot scale process Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/80—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with zinc, cadmium or mercury
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (3)
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| US5877308P | 2008-06-04 | 2008-06-04 | |
| US61/058,773 | 2008-06-04 | ||
| PCT/US2009/003392 WO2009148601A1 (fr) | 2008-06-04 | 2009-06-04 | Perfectionnements dans la fabrication d'organohalosilanes et d'halosilanes |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| KR1020167009420A Division KR101910028B1 (ko) | 2008-06-04 | 2009-06-04 | 유기할로실란과 할로실란을 제조하는 개선 방법 |
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|---|---|
| KR20170027879A KR20170027879A (ko) | 2017-03-10 |
| KR101779807B1 true KR101779807B1 (ko) | 2017-09-19 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020177005856A KR101779807B1 (ko) | 2008-06-04 | 2009-06-04 | 유기할로실란과 할로실란을 제조하는 개선 방법 |
| KR1020167009420A KR101910028B1 (ko) | 2008-06-04 | 2009-06-04 | 유기할로실란과 할로실란을 제조하는 개선 방법 |
| KR1020107029756A KR20110015653A (ko) | 2008-06-04 | 2009-06-04 | 유기할로실란과 할로실란을 제조하는 개선 방법 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020167009420A KR101910028B1 (ko) | 2008-06-04 | 2009-06-04 | 유기할로실란과 할로실란을 제조하는 개선 방법 |
| KR1020107029756A KR20110015653A (ko) | 2008-06-04 | 2009-06-04 | 유기할로실란과 할로실란을 제조하는 개선 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20110158884A1 (fr) |
| EP (1) | EP2313420A1 (fr) |
| JP (1) | JP5492878B2 (fr) |
| KR (3) | KR101779807B1 (fr) |
| CN (2) | CN106349275A (fr) |
| WO (1) | WO2009148601A1 (fr) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102574874B (zh) * | 2009-10-16 | 2016-03-02 | 道康宁公司 | 制备有机卤硅烷的方法 |
| DE102011110040B4 (de) * | 2011-04-14 | 2024-07-11 | Evonik Operations Gmbh | Verfahren zur Herstellung von Chlorsilanen mittels hochsiedender Chlorsilane oder chlorsilanhaltiger Gemische |
| EP2792640B1 (fr) * | 2011-12-16 | 2016-11-16 | Toagosei Co., Ltd. | Procédé de production de chloropolysilane très pur |
| CN102935369B (zh) * | 2012-11-30 | 2014-07-09 | 湖南省天心博力科技有限公司 | 一种片状纯铜粉催化剂的制备工艺 |
| US9688703B2 (en) | 2013-11-12 | 2017-06-27 | Dow Corning Corporation | Method for preparing a halosilane |
| WO2016099689A1 (fr) * | 2014-12-18 | 2016-06-23 | Dow Corning Corporation | Procédé pour la production d'halogénosilanes à partir de composés intermétalliques ternaires contenant du silicium |
| CN107001054B (zh) * | 2014-12-19 | 2019-09-03 | 美国陶氏有机硅公司 | 用于制备一氢三卤代硅烷的方法 |
| CN106279238A (zh) * | 2016-08-18 | 2017-01-04 | 湖北兴瑞化工有限公司 | 一种合成甲基氯硅烷的工艺及装置 |
| KR102619993B1 (ko) | 2017-11-20 | 2024-01-03 | 가부시끼가이샤 도꾸야마 | 유동상 방식 반응 용기 및 트리클로로실란의 제조 방법 |
| CN109836449B (zh) * | 2017-11-29 | 2021-07-16 | 蓝星（北京）技术中心有限公司 | 一种有机硅单体合成方法及其生产装置 |
| WO2020125955A1 (fr) * | 2018-12-18 | 2020-06-25 | Wacker Chemie Ag | Procédé de préparation de chlorosilanes |
| EP3898509B1 (fr) * | 2018-12-18 | 2023-02-22 | Wacker Chemie AG | Procédé de préparation de chlorosilanes |
| CN110218222B (zh) * | 2019-05-30 | 2020-09-08 | 鲁西化工集团股份有限公司 | 一种延长流化床运行周期提高运行质量的方法 |
| CN113286800B (zh) * | 2019-06-14 | 2024-08-23 | 瓦克化学股份公司 | 采用结构优化的硅颗粒的用于制备甲基氯硅烷的方法 |
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| US4281149A (en) | 1980-03-24 | 1981-07-28 | General Electric Company | Process for treating silicon particles within a silicone reactor system |
| US4307242A (en) | 1980-10-03 | 1981-12-22 | General Electric Company | Process for removing impurities from residual silicon powder |
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| US2380995A (en) * | 1941-09-26 | 1945-08-07 | Gen Electric | Preparation of organosilicon halides |
| US2389931A (en) * | 1943-09-27 | 1945-11-27 | Gen Electric | Method for producing organosiliconhalides |
| US2481149A (en) * | 1945-04-17 | 1949-09-06 | Adolphe C Peterson | Air-conditioning and heating means |
| CH279908A (de) * | 1949-04-13 | 1951-12-31 | Bayer Ag | Verfahren zur Herstellung von Alkylhalogensilanen. |
| US3133109A (en) * | 1960-11-28 | 1964-05-12 | Gen Electric | Silicon compound process and apparatus |
| USRE33452E (en) * | 1983-07-28 | 1990-11-20 | General Electric Company | Method for making alkylhalosilanes |
| GB2153697B (en) * | 1984-02-13 | 1988-04-27 | Gen Electric | Catalysts for the production of organohalosilanes |
| US4602101A (en) * | 1985-11-12 | 1986-07-22 | Dow Corning Corporation | Method of manufacturing alkylhalosilanes |
| US4946978A (en) * | 1986-12-22 | 1990-08-07 | Dow Corning Corporation | Method of direct process performance improvement via control of silicon manufacture |
| US4762940A (en) * | 1987-12-11 | 1988-08-09 | Dow Corning Corporation | Method for preparation of alkylhalosilanes |
| US5312948A (en) * | 1993-10-08 | 1994-05-17 | Dow Corning Corporation | Particle size distribution for fluidized-bed process for making alkylhalosilanes |
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| JPH10279584A (ja) * | 1997-04-01 | 1998-10-20 | Shin Etsu Chem Co Ltd | アルキルハロシランの製造方法 |
| JP3346222B2 (ja) * | 1997-05-13 | 2002-11-18 | 信越化学工業株式会社 | アルキルハロシラン製造用触体の製造方法及びアルキルハロシランの製造方法 |
| DE19951773C1 (de) * | 1999-10-27 | 2001-03-15 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Methylchlorsilanen |
| KR20010065810A (ko) * | 1999-12-30 | 2001-07-11 | 김충세 | 알킬할로실란의 제조방법 |
| US6423860B1 (en) * | 2000-09-05 | 2002-07-23 | General Electric Company | Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production |
| US6433205B1 (en) * | 2002-01-15 | 2002-08-13 | Dow Corning Corporation | Magnetic separation for silicon-containing materials |
| CN1819873B (zh) * | 2003-06-09 | 2010-04-28 | 陶氏康宁公司 | 磁力分离器装置 |
| JP2006057085A (ja) * | 2004-07-22 | 2006-03-02 | Mizusawa Ind Chem Ltd | ガスバリア性付与剤 |
-
2009
- 2009-06-04 KR KR1020177005856A patent/KR101779807B1/ko active IP Right Grant
- 2009-06-04 JP JP2011512473A patent/JP5492878B2/ja active Active
- 2009-06-04 US US12/995,931 patent/US20110158884A1/en not_active Abandoned
- 2009-06-04 KR KR1020167009420A patent/KR101910028B1/ko active IP Right Grant
- 2009-06-04 CN CN201610630289.4A patent/CN106349275A/zh active Pending
- 2009-06-04 KR KR1020107029756A patent/KR20110015653A/ko active Search and Examination
- 2009-06-04 WO PCT/US2009/003392 patent/WO2009148601A1/fr active Application Filing
- 2009-06-04 CN CN2009801278740A patent/CN102099363A/zh active Pending
- 2009-06-04 EP EP09700063A patent/EP2313420A1/fr not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US4281149A (en) | 1980-03-24 | 1981-07-28 | General Electric Company | Process for treating silicon particles within a silicone reactor system |
| US4307242A (en) | 1980-10-03 | 1981-12-22 | General Electric Company | Process for removing impurities from residual silicon powder |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101910028B1 (ko) | 2018-10-25 |
| WO2009148601A1 (fr) | 2009-12-10 |
| KR20110015653A (ko) | 2011-02-16 |
| US20110158884A1 (en) | 2011-06-30 |
| JP5492878B2 (ja) | 2014-05-14 |
| KR20170027879A (ko) | 2017-03-10 |
| CN106349275A (zh) | 2017-01-25 |
| JP2011522821A (ja) | 2011-08-04 |
| CN102099363A (zh) | 2011-06-15 |
| EP2313420A1 (fr) | 2011-04-27 |
| KR20160043153A (ko) | 2016-04-20 |
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