KR101746606B1 - 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치 - Google Patents
포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치 Download PDFInfo
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- KR101746606B1 KR101746606B1 KR1020157003663A KR20157003663A KR101746606B1 KR 101746606 B1 KR101746606 B1 KR 101746606B1 KR 1020157003663 A KR1020157003663 A KR 1020157003663A KR 20157003663 A KR20157003663 A KR 20157003663A KR 101746606 B1 KR101746606 B1 KR 101746606B1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- H01L27/3246—
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- H01L27/3258—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/124—Insulating layers formed between TFT elements and OLED elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012183858 | 2012-08-23 | ||
JPJP-P-2012-183858 | 2012-08-23 | ||
PCT/JP2013/068462 WO2014030441A1 (ja) | 2012-08-23 | 2013-07-05 | ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機el表示装置および液晶表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20150036548A KR20150036548A (ko) | 2015-04-07 |
KR101746606B1 true KR101746606B1 (ko) | 2017-06-13 |
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Family Applications (1)
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KR1020157003663A KR101746606B1 (ko) | 2012-08-23 | 2013-07-05 | 포지티브형 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5914668B2 (ja) |
KR (1) | KR101746606B1 (ja) |
CN (1) | CN104583870A (ja) |
TW (1) | TWI587092B (ja) |
WO (1) | WO2014030441A1 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI559081B (zh) * | 2014-03-17 | 2016-11-21 | 奇美實業股份有限公司 | 感光性樹脂組成物及其應用 |
JP6118287B2 (ja) * | 2014-03-26 | 2017-04-19 | 富士フイルム株式会社 | 半導体素子及び半導体素子の絶縁層形成用組成物 |
TWI567500B (zh) * | 2014-04-30 | 2017-01-21 | 奇美實業股份有限公司 | 組成物、薄膜及其形成方法、保護膜、隔離壁及顯示元件 |
US10866512B2 (en) | 2015-10-21 | 2020-12-15 | Showa Denko K.K. | Positive photosensitive resin composition |
JP6588354B2 (ja) * | 2016-01-29 | 2019-10-09 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、液晶表示装置、有機エレクトロルミネッセンス表示装置および硬化膜の製造方法 |
KR102341494B1 (ko) * | 2016-11-02 | 2021-12-23 | 도레이 카부시키가이샤 | 수지 조성물, 수지 시트, 경화막, 유기 el 표시 장치, 반도체 전자 부품, 반도체 장치 및 유기 el 표시 장치의 제조 방법 |
JP6702251B2 (ja) * | 2017-04-17 | 2020-05-27 | 信越化学工業株式会社 | ポジ型レジストフィルム積層体及びパターン形成方法 |
WO2019065262A1 (ja) | 2017-09-29 | 2019-04-04 | 日本ゼオン株式会社 | ポジ型感放射線性樹脂組成物 |
KR102679663B1 (ko) * | 2020-09-08 | 2024-06-27 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터 |
WO2022080195A1 (ja) | 2020-10-13 | 2022-04-21 | 日本ゼオン株式会社 | 感放射線性樹脂組成物 |
TW202402821A (zh) * | 2022-04-28 | 2024-01-16 | 日商大阪有機化學工業股份有限公司 | 聚合物、與硬化性樹脂組合物、使該組合物硬化而成之伸長性絕緣性硬化膜及觸控面板用絕緣性硬化膜、觸控面板、可撓性印刷電路基板用絕緣性硬化膜、及可撓性印刷電路基板 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012036000A1 (ja) * | 2010-09-16 | 2012-03-22 | 日立化成工業株式会社 | ポジ型感光性樹脂組成物、レジストパターンの製造方法及び電子部品 |
JP5507208B2 (ja) | 2009-04-08 | 2014-05-28 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜、層間絶縁膜、有機el表示装置、及び液晶表示装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4497890A (en) * | 1983-04-08 | 1985-02-05 | Motorola, Inc. | Process for improving adhesion of resist to gold |
JP4386189B2 (ja) * | 2004-11-16 | 2009-12-16 | 信越化学工業株式会社 | スルフィド鎖含有有機珪素化合物の製造方法 |
JP4613763B2 (ja) * | 2005-09-12 | 2011-01-19 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物、およびそれを用いたパターン形成方法、半導体装置、半導体装置の製造方法、表示体装置、表示体装置の製造方法 |
JP5338258B2 (ja) * | 2008-10-30 | 2013-11-13 | Jnc株式会社 | ポジ型感光性組成物、この組成物から得られる硬化膜、及びこの硬化膜を有する表示素子 |
JP5917150B2 (ja) * | 2009-11-27 | 2016-05-11 | Jsr株式会社 | ポジ型感放射線性組成物、硬化膜及びその形成方法 |
CN102540726B (zh) * | 2010-12-13 | 2016-07-06 | 富士胶片株式会社 | 正型感光性树脂组成物、硬化膜及其形成方法、层间绝缘膜以及显示装置 |
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2013
- 2013-07-05 KR KR1020157003663A patent/KR101746606B1/ko active IP Right Grant
- 2013-07-05 JP JP2014531538A patent/JP5914668B2/ja active Active
- 2013-07-05 CN CN201380043962.9A patent/CN104583870A/zh active Pending
- 2013-07-05 WO PCT/JP2013/068462 patent/WO2014030441A1/ja active Application Filing
- 2013-08-23 TW TW102130237A patent/TWI587092B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5507208B2 (ja) | 2009-04-08 | 2014-05-28 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜、層間絶縁膜、有機el表示装置、及び液晶表示装置 |
WO2012036000A1 (ja) * | 2010-09-16 | 2012-03-22 | 日立化成工業株式会社 | ポジ型感光性樹脂組成物、レジストパターンの製造方法及び電子部品 |
Also Published As
Publication number | Publication date |
---|---|
TW201409179A (zh) | 2014-03-01 |
JP5914668B2 (ja) | 2016-05-11 |
WO2014030441A1 (ja) | 2014-02-27 |
JPWO2014030441A1 (ja) | 2016-07-28 |
KR20150036548A (ko) | 2015-04-07 |
CN104583870A (zh) | 2015-04-29 |
TWI587092B (zh) | 2017-06-11 |
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