KR101700019B1 - 노광 장치 및 노광 방법 - Google Patents

노광 장치 및 노광 방법 Download PDF

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Publication number
KR101700019B1
KR101700019B1 KR1020147028124A KR20147028124A KR101700019B1 KR 101700019 B1 KR101700019 B1 KR 101700019B1 KR 1020147028124 A KR1020147028124 A KR 1020147028124A KR 20147028124 A KR20147028124 A KR 20147028124A KR 101700019 B1 KR101700019 B1 KR 101700019B1
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KR
South Korea
Prior art keywords
substrate
carry
substrates
exposure
mask
Prior art date
Application number
KR1020147028124A
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English (en)
Korean (ko)
Other versions
KR20140139543A (ko
Inventor
모토야스 스즈키
다카히로 니시카와
Original Assignee
가부시키가이샤 브이 테크놀로지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 가부시키가이샤 브이 테크놀로지 filed Critical 가부시키가이샤 브이 테크놀로지
Publication of KR20140139543A publication Critical patent/KR20140139543A/ko
Application granted granted Critical
Publication of KR101700019B1 publication Critical patent/KR101700019B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67225—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one lithography chamber

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020147028124A 2012-04-06 2013-04-04 노광 장치 및 노광 방법 KR101700019B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012087316 2012-04-06
JPJP-P-2012-087316 2012-04-06
PCT/JP2013/060400 WO2013151146A1 (ja) 2012-04-06 2013-04-04 露光装置及び露光方法

Publications (2)

Publication Number Publication Date
KR20140139543A KR20140139543A (ko) 2014-12-05
KR101700019B1 true KR101700019B1 (ko) 2017-02-13

Family

ID=49300624

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147028124A KR101700019B1 (ko) 2012-04-06 2013-04-04 노광 장치 및 노광 방법

Country Status (4)

Country Link
JP (1) JP2013231962A (zh)
KR (1) KR101700019B1 (zh)
TW (1) TWI499871B (zh)
WO (1) WO2013151146A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017211533A (ja) * 2016-05-26 2017-11-30 株式会社サーマプレシジョン 投影露光装置及びその投影露光方法
CN116339082B (zh) * 2023-05-30 2023-08-15 广东科视光学技术股份有限公司 一种全自动双装载台曝光机系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000321545A (ja) * 1999-03-05 2000-11-24 Ricoh Co Ltd 液晶パネル検査装置
JP2011164542A (ja) * 2010-02-15 2011-08-25 Nsk Ltd 近接露光装置及び近接露光方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JP2893222B2 (ja) * 1991-06-12 1999-05-17 菱和株式会社 包装機への物品の自動整列供給方法と装置
JP3203719B2 (ja) 1991-12-26 2001-08-27 株式会社ニコン 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JP4538884B2 (ja) 2000-03-08 2010-09-08 凸版印刷株式会社 大型基板の露光装置
JP4915033B2 (ja) * 2000-06-15 2012-04-11 株式会社ニコン 露光装置、基板処理装置及びリソグラフィシステム、並びにデバイス製造方法
JP4044722B2 (ja) * 2000-10-10 2008-02-06 上村工業株式会社 板状ワークの搬送方向変換装置
JP2002277502A (ja) * 2001-01-12 2002-09-25 Nidec-Read Corp 基板検査装置及び基板検査方法
JP2004319889A (ja) * 2003-04-18 2004-11-11 Seiko Epson Corp 製造対象物の受け渡し装置および製造対象物の受け渡し方法
JP4300067B2 (ja) 2003-07-02 2009-07-22 株式会社日立ハイテクノロジーズ 基板搬送装置、基板搬送方法、及び半導体デバイスの製造方法
AU2005272460B2 (en) * 2004-08-12 2012-03-22 Nikon Corporation Substrate Processing System, Method Of Confirmation Of Its State Of Use, And Method Of Prevention Of Illicit Use
WO2006023326A1 (en) 2004-08-17 2006-03-02 Mattson Technology, Inc. Advanced low cost high throughput processing platform
JP5189035B2 (ja) * 2004-12-30 2013-04-24 エーエスエムエル ネザーランズ ビー．ブイ． 基板ハンドラ
JP4638755B2 (ja) * 2005-03-25 2011-02-23 大日本印刷株式会社 露光装置および露光方法
TW200815935A (en) * 2006-05-31 2008-04-01 Nsk Ltd Exposure device and method
JP2007322706A (ja) * 2006-05-31 2007-12-13 Nsk Ltd 露光装置及び露光方法
JP4957133B2 (ja) * 2006-09-11 2012-06-20 株式会社Ｉｈｉ 基板搬送装置及び基板搬送方法
JP4933625B2 (ja) * 2007-09-19 2012-05-16 平田機工株式会社 基板搬送システム
JP4312248B2 (ja) 2008-02-06 2009-08-12 株式会社日立ハイテクノロジーズ プロキシミティ露光装置及び基板製造方法
JP4312247B2 (ja) 2008-02-06 2009-08-12 株式会社日立ハイテクノロジーズ プロキシミティ露光装置及び基板製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000321545A (ja) * 1999-03-05 2000-11-24 Ricoh Co Ltd 液晶パネル検査装置
JP2011164542A (ja) * 2010-02-15 2011-08-25 Nsk Ltd 近接露光装置及び近接露光方法

Also Published As

Publication number Publication date
JP2013231962A (ja) 2013-11-14
KR20140139543A (ko) 2014-12-05
TW201346454A (zh) 2013-11-16
TWI499871B (zh) 2015-09-11
WO2013151146A1 (ja) 2013-10-10

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