KR101688293B1 - 하전 입자선 장치 - Google Patents

하전 입자선 장치 Download PDF

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Publication number
KR101688293B1
KR101688293B1 KR1020147032861A KR20147032861A KR101688293B1 KR 101688293 B1 KR101688293 B1 KR 101688293B1 KR 1020147032861 A KR1020147032861 A KR 1020147032861A KR 20147032861 A KR20147032861 A KR 20147032861A KR 101688293 B1 KR101688293 B1 KR 101688293B1
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case
space
thin film
sample
charged particle
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Korean (ko)
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KR20140143462A (ko
Inventor
유스께 오미나미
스께히로 이또
도모히사 오따끼
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가부시키가이샤 히다치 하이테크놀로지즈
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020147032861A 2011-04-11 2012-03-02 하전 입자선 장치 Active KR101688293B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011086904A JP5699023B2 (ja) 2011-04-11 2011-04-11 荷電粒子線装置
JPJP-P-2011-086904 2011-04-11
PCT/JP2012/001431 WO2012140822A1 (ja) 2011-04-11 2012-03-02 荷電粒子線装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020147027512A Division KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치

Publications (2)

Publication Number Publication Date
KR20140143462A KR20140143462A (ko) 2014-12-16
KR101688293B1 true KR101688293B1 (ko) 2016-12-20

Family

ID=47009019

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020147032861A Active KR101688293B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020137026494A Active KR101519283B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020147027512A Active KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020137026494A Active KR101519283B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020147027512A Active KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치

Country Status (6)

Country Link
US (3) US8710439B2 (https=)
JP (1) JP5699023B2 (https=)
KR (3) KR101688293B1 (https=)
CN (1) CN103477415B (https=)
DE (1) DE112012001214B4 (https=)
WO (1) WO2012140822A1 (https=)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5923412B2 (ja) * 2012-08-24 2016-05-24 株式会社日立ハイテクノロジーズ 観察装置および光軸調整方法
GB2505517B (en) * 2012-09-04 2017-08-09 Restranaut Ltd System for monitoring evacuation of a facility
JP2014053073A (ja) * 2012-09-05 2014-03-20 Hitachi High-Technologies Corp 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
JP5909431B2 (ja) * 2012-09-27 2016-04-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6051014B2 (ja) * 2012-10-29 2016-12-21 株式会社日立ハイテクノロジーズ 試料格納用容器、荷電粒子線装置、及び画像取得方法
JP6035602B2 (ja) 2012-11-21 2016-11-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料台ユニット、及び試料観察方法
JP6309195B2 (ja) * 2013-02-18 2018-04-11 株式会社ホロン 走査型電子顕微鏡および検査装置
WO2014192361A1 (ja) * 2013-05-30 2014-12-04 株式会社 日立ハイテクノロジーズ 荷電粒子線装置、試料観察方法
WO2015025545A1 (ja) 2013-08-23 2015-02-26 株式会社 日立ハイテクノロジーズ 隔膜取付部材および荷電粒子線装置
WO2015033601A1 (ja) 2013-09-06 2015-03-12 株式会社 日立ハイテクノロジーズ 荷電粒子線装置及び試料画像取得方法
JP6117070B2 (ja) * 2013-09-26 2017-04-19 株式会社日立ハイテクノロジーズ 電子顕微鏡
US9881769B2 (en) * 2013-10-08 2018-01-30 Hitachi High-Technologies Corporation Charged particle beam device and charged particle beam device control method
KR101524215B1 (ko) * 2013-11-29 2015-05-29 (주)코셈 전자현미경
JP6047508B2 (ja) 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
WO2015130964A1 (en) 2014-02-28 2015-09-03 Gilead Sciences, Inc. Therapeutic compounds
JP6307622B2 (ja) * 2014-09-05 2018-04-04 株式会社日立ハイテクノロジーズ 電子線装置および電子線装置用ガス供給装置
JP6383650B2 (ja) 2014-11-28 2018-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN115901831A (zh) * 2014-12-22 2023-04-04 应用材料公司 用于检查基板的设备、用于检查基板的方法、大面积基板检查设备及其操作方法
US10304655B2 (en) 2015-04-15 2019-05-28 Hitachi High-Technologies Corporation Charged particle beam device and evacuation method for same
DE112016000047B4 (de) * 2015-04-28 2021-01-28 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Installationsverfahren
US10141157B2 (en) 2015-06-29 2018-11-27 Hitachi High-Technologies Corporation Method for adjusting height of sample and observation system
WO2017033219A1 (ja) * 2015-08-21 2017-03-02 株式会社 日立ハイテクノロジーズ 荷電粒子顕微鏡の観察支援ユニットおよびこれを用いた試料観察方法
JP6118870B2 (ja) * 2015-10-07 2017-04-19 株式会社日立ハイテクノロジーズ 試料観察方法
EP3171163B1 (en) * 2015-11-18 2022-05-04 FEI Company X-ray imaging technique
CN106783493B (zh) 2016-12-01 2018-07-10 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法
JP6928943B2 (ja) * 2017-03-28 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
KR20200002884A (ko) * 2017-04-24 2020-01-08 몰레큘라 비스타 인크. 헬륨 분위기를 가지는 힘 현미경
JP6500143B2 (ja) * 2018-03-23 2019-04-10 株式会社日立ハイテクノロジーズ 試料観察方法
JP6808691B2 (ja) * 2018-08-09 2021-01-06 日本電子株式会社 試料搬送装置及び電子顕微鏡
US11538659B2 (en) 2018-10-25 2022-12-27 Hitachi High-Tech Corporation Charged particle beam device, autofocus processing method of charged particle beam device, and detector
CN114556514B (zh) * 2019-10-10 2025-07-29 株式会社日立高新技术 试样支架、膜间距离调整机构以及带电粒子束装置
JP7430909B2 (ja) * 2020-08-19 2024-02-14 株式会社ブイ・テクノロジー 集束イオンビーム装置
JPWO2022264809A1 (https=) * 2021-06-14 2022-12-22
CN121331727A (zh) * 2025-08-14 2026-01-13 深圳市中图仪器股份有限公司 扫描电镜

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JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

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JP2008192616A (ja) * 2007-02-05 2008-08-21 Fei Co 粒子ビーム及び光を用いる顕微鏡で試料を観察する装置
JP2010192126A (ja) * 2009-02-16 2010-09-02 Hitachi High-Technologies Corp 電子線装置および電子線装置用試料保持装置

Also Published As

Publication number Publication date
KR20140143462A (ko) 2014-12-16
KR20130135341A (ko) 2013-12-10
WO2012140822A1 (ja) 2012-10-18
US20150076347A1 (en) 2015-03-19
US8710439B2 (en) 2014-04-29
CN103477415B (zh) 2016-10-12
US20140175278A1 (en) 2014-06-26
CN103477415A (zh) 2013-12-25
DE112012001214T5 (de) 2014-01-30
JP5699023B2 (ja) 2015-04-08
US20140021347A1 (en) 2014-01-23
US9105442B2 (en) 2015-08-11
US8921786B2 (en) 2014-12-30
KR20140130531A (ko) 2014-11-10
KR101519315B1 (ko) 2015-05-11
JP2012221766A (ja) 2012-11-12
KR101519283B1 (ko) 2015-05-11
DE112012001214B4 (de) 2022-02-10

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