KR101503332B1 - 폴리이미드 필름 및 이의 제조방법 - Google Patents
폴리이미드 필름 및 이의 제조방법 Download PDFInfo
- Publication number
- KR101503332B1 KR101503332B1 KR20130158268A KR20130158268A KR101503332B1 KR 101503332 B1 KR101503332 B1 KR 101503332B1 KR 20130158268 A KR20130158268 A KR 20130158268A KR 20130158268 A KR20130158268 A KR 20130158268A KR 101503332 B1 KR101503332 B1 KR 101503332B1
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- KR
- South Korea
- Prior art keywords
- particles
- fluorine
- average
- less
- polyimide film
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130158268A KR101503332B1 (ko) | 2013-12-18 | 2013-12-18 | 폴리이미드 필름 및 이의 제조방법 |
CN201480068818.5A CN106062049B (zh) | 2013-12-18 | 2014-12-01 | 聚酰亚胺薄膜及其制备方法 |
PCT/KR2014/011634 WO2015093749A1 (ko) | 2013-12-18 | 2014-12-01 | 폴리이미드 필름 및 이의 제조방법 |
TW103143613A TWI661004B (zh) | 2013-12-18 | 2014-12-15 | 聚醯亞胺薄膜及其製備方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20130158268A KR101503332B1 (ko) | 2013-12-18 | 2013-12-18 | 폴리이미드 필름 및 이의 제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR101503332B1 true KR101503332B1 (ko) | 2015-03-18 |
Family
ID=53027802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR20130158268A KR101503332B1 (ko) | 2013-12-18 | 2013-12-18 | 폴리이미드 필름 및 이의 제조방법 |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR101503332B1 (zh) |
CN (1) | CN106062049B (zh) |
TW (1) | TWI661004B (zh) |
WO (1) | WO2015093749A1 (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019027207A1 (ko) * | 2017-08-02 | 2019-02-07 | 에스케이씨코오롱피아이 주식회사 | 흄드 실리카 입자를 이용한 폴리이미드 필름의 제조방법 및 저유전율의 폴리이미드 필름 |
WO2021101324A3 (ko) * | 2019-11-22 | 2021-07-15 | 피아이첨단소재 주식회사 | 저유전 폴리이미드 복합 분말 및 그 제조방법 |
KR102306950B1 (ko) * | 2021-02-05 | 2021-09-29 | 최유경 | 폴리이미드 필름, 이의 제조방법 및 이를 포함하는 연성인쇄회로기판 |
KR20220064771A (ko) | 2020-11-12 | 2022-05-19 | 한국화학연구원 | 저유전성 폴리이미드 수지 및 그 제조방법 |
WO2023017876A1 (ko) * | 2021-08-13 | 2023-02-16 | 엘지전자 주식회사 | 복합 폴리이미드 기판, 복합 폴리이미드 조성물 및 이를 이용한 인쇄 회로 기판 |
KR102550250B1 (ko) * | 2022-12-02 | 2023-06-30 | (주)상아프론테크 | 고속통신용 저유전 필름 및 이를 포함하는 동박적층판 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101728100B1 (ko) * | 2015-01-21 | 2017-04-18 | 에스케이씨코오롱피아이 주식회사 | 기공을 갖는 입자를 이용한 폴리이미드 필름의 제조방법 및 저유전율의 폴리이미드 필름 |
CN109867954B (zh) | 2017-12-05 | 2021-07-27 | 财团法人工业技术研究院 | 树脂组合物 |
KR102069709B1 (ko) * | 2018-01-22 | 2020-01-23 | 에스케이씨코오롱피아이 주식회사 | 2 종 이상의 필러를 포함하는 고열전도성 폴리이미드 필름 |
CN113248773B (zh) * | 2021-05-17 | 2022-07-08 | 上海瑞暨新材料科技有限公司 | 一种聚酰亚胺多孔膜及其制备方法 |
Citations (4)
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JP2005246793A (ja) | 2004-03-04 | 2005-09-15 | Nitto Denko Corp | 賦形加工したポリイミドフィルムの製造方法 |
JP2007030501A (ja) | 2005-06-21 | 2007-02-08 | Ist Corp | ポリイミド複合フィルム及びその製造方法 |
JP2010043134A (ja) | 2008-08-08 | 2010-02-25 | Nitto Denko Corp | ポリイミド管状体及びその製造方法 |
KR20130027442A (ko) * | 2011-09-07 | 2013-03-15 | 주식회사 엘지화학 | 불소수지 함유 연성 금속 적층판 |
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WO1997017382A1 (fr) * | 1995-11-09 | 1997-05-15 | Daikin Industries, Ltd. | Poudre fine de polytetrafluoroethylene, sa fabrication et son utilisation |
CN1890838B (zh) * | 2003-12-08 | 2012-08-29 | 松下电器产业株式会社 | 半导体电极及其制造方法、和使用该半导体电极的光电池 |
JP2006232996A (ja) * | 2005-02-24 | 2006-09-07 | Toray Ind Inc | ポリイミド樹脂成形用材料、それを用いた成形品、ポリイミドのマテリアルリサイクル方法 |
WO2007011038A1 (ja) * | 2005-07-22 | 2007-01-25 | Krosaki Harima Corporation | カーボン含有耐火物及びその製造方法並びにピッチ含有耐火原料 |
CN101831175A (zh) * | 2010-04-01 | 2010-09-15 | 辽宁科技大学 | 一种无色透明的聚酰亚胺纳米复合材料膜及其制备方法 |
US9462688B2 (en) * | 2011-09-07 | 2016-10-04 | Lg Chem, Ltd. | Flexible metal laminate containing fluoropolymer |
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2013
- 2013-12-18 KR KR20130158268A patent/KR101503332B1/ko active IP Right Grant
-
2014
- 2014-12-01 WO PCT/KR2014/011634 patent/WO2015093749A1/ko active Application Filing
- 2014-12-01 CN CN201480068818.5A patent/CN106062049B/zh active Active
- 2014-12-15 TW TW103143613A patent/TWI661004B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005246793A (ja) | 2004-03-04 | 2005-09-15 | Nitto Denko Corp | 賦形加工したポリイミドフィルムの製造方法 |
JP2007030501A (ja) | 2005-06-21 | 2007-02-08 | Ist Corp | ポリイミド複合フィルム及びその製造方法 |
JP2010043134A (ja) | 2008-08-08 | 2010-02-25 | Nitto Denko Corp | ポリイミド管状体及びその製造方法 |
KR20130027442A (ko) * | 2011-09-07 | 2013-03-15 | 주식회사 엘지화학 | 불소수지 함유 연성 금속 적층판 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019027207A1 (ko) * | 2017-08-02 | 2019-02-07 | 에스케이씨코오롱피아이 주식회사 | 흄드 실리카 입자를 이용한 폴리이미드 필름의 제조방법 및 저유전율의 폴리이미드 필름 |
WO2021101324A3 (ko) * | 2019-11-22 | 2021-07-15 | 피아이첨단소재 주식회사 | 저유전 폴리이미드 복합 분말 및 그 제조방법 |
KR20220064771A (ko) | 2020-11-12 | 2022-05-19 | 한국화학연구원 | 저유전성 폴리이미드 수지 및 그 제조방법 |
KR102306950B1 (ko) * | 2021-02-05 | 2021-09-29 | 최유경 | 폴리이미드 필름, 이의 제조방법 및 이를 포함하는 연성인쇄회로기판 |
US11596065B2 (en) | 2021-02-05 | 2023-02-28 | Yu Kyoung Choi | Method of manufacturing polyimide film |
WO2023017876A1 (ko) * | 2021-08-13 | 2023-02-16 | 엘지전자 주식회사 | 복합 폴리이미드 기판, 복합 폴리이미드 조성물 및 이를 이용한 인쇄 회로 기판 |
KR102550250B1 (ko) * | 2022-12-02 | 2023-06-30 | (주)상아프론테크 | 고속통신용 저유전 필름 및 이를 포함하는 동박적층판 |
Also Published As
Publication number | Publication date |
---|---|
TW201529729A (zh) | 2015-08-01 |
TWI661004B (zh) | 2019-06-01 |
CN106062049A (zh) | 2016-10-26 |
WO2015093749A1 (ko) | 2015-06-25 |
CN106062049B (zh) | 2019-05-03 |
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