KR101503332B1 - Polyimide film and preparation method thereof - Google Patents

Polyimide film and preparation method thereof Download PDF

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KR101503332B1
KR101503332B1 KR20130158268A KR20130158268A KR101503332B1 KR 101503332 B1 KR101503332 B1 KR 101503332B1 KR 20130158268 A KR20130158268 A KR 20130158268A KR 20130158268 A KR20130158268 A KR 20130158268A KR 101503332 B1 KR101503332 B1 KR 101503332B1
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particles
fluorine
average
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polyimide film
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Korean (ko)
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조성일
이길남
김성원
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에스케이씨코오롱피아이 주식회사
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Priority to KR20130158268A priority Critical patent/KR101503332B1/en
Priority to CN201480068818.5A priority patent/CN106062049B/en
Priority to PCT/KR2014/011634 priority patent/WO2015093749A1/en
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Abstract

The present invention relates to a polyimide film and a method for preparing the same. The polyimide film of the present invention comprises a polyimide resin; and fluorinated particles composed of first particles having an average particle diameter of 300 nm or smaller and second particles having an average particle diameter of 10 μm or smaller and an average appearance specific gravity of 1.2 g/ml or less, wherein the second particle is formed by agglomeration of the first particles and thus has pores with an average diameter of 300 nm or smaller. The polyimide film of the present invention can have excellent physical properties and exhibit a low dielectric constant, and thus can be favorably used in the manufacture of electric/electronic devices and components such as a printed circuit board requiring a low-dielectric constant.

Description

폴리이미드 필름 및 이의 제조방법{POLYIMIDE FILM AND PREPARATION METHOD THEREOF}BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a polyimide film,

본 발명은 우수한 물성을 갖는 저유전율 폴리이미드 필름 및 이의 제조방법에 관한 것이다.
The present invention relates to a low dielectric constant polyimide film having excellent physical properties and a method for producing the same.

일반적으로 폴리이미드(PI) 수지라 함은 방향족 산 이무수물과 방향족 디아민 또는 방향족 디이소시아네이트를 용액중합하여 폴리아믹산 유도체를 제조한 후, 고온에서 폐환탈수시켜 이미드화하여 제조되는 고내열 수지를 일컫는다.Generally, polyimide (PI) resin refers to a high heat-resistant resin prepared by preparing a polyamic acid derivative by combining an aromatic dianhydride and an aromatic diamine or an aromatic diisocyanate in solution, and then dehydrating and dehydrating the polymer at a high temperature.

폴리이미드 수지는 기계적 및 열적 치수 안정성, 및 화학적 안정성이 우수하여 전기/전자 재료, 우주/항공 및 전기통신 분야에 넓게 이용되고 있다. 특히, 폴리이미드 수지는 높은 절연 성능을 갖기 때문에 신뢰성이 필요한 부품 및 부재로서 인쇄 회로기판 등에 널리 응용되고 있다.Polyimide resins are widely used in the fields of electric / electronic materials, space / aviation and telecommunication because of their excellent mechanical and thermal dimensional stability and chemical stability. Particularly, since polyimide resin has high insulation performance, it is widely applied to printed circuit boards and the like as parts and members requiring reliability.

최근 고도 정보화 추세에 따라 대량의 정보를 축적하고 이러한 정보를 고속으로 처리하고 고속으로 전달하기 위한 전자기기에 있어서, 이들에 사용되는 폴리이미드 수지에도 고성능화, 특히 고주파화에 대응하는 전기적 특성으로서 저유전율화가 요구되고 있다.BACKGROUND ART [0002] In recent years, in electronic equipment for accumulating a large amount of information in accordance with the tendency of high-level informatization and processing such information at a high speed and delivering it at a high speed, polyimide resins used therefor are required to have high performance, Anger is being demanded.

이러한 폴리이미드 수지의 저유전율화의 시도로서, 예컨대 대한민국 특허 제 0859275 호는 폴리이미드 수지 전구체 용액 중에 분산성 화합물을 분산시킨 후 이 분산액을 이용하여 피막을 형성하고, 상기 피막으로부터 분산성 화합물을 추출하여 제거하여 다공질화함으로써 다공질 폴리이미드 수지를 제조하는 것을 개시하고 있다.As an attempt to lower the dielectric constant of such a polyimide resin, for example, Korean Patent No. 0859275 discloses a method of dispersing a dispersible compound in a polyimide resin precursor solution, forming a coating film using the dispersion solution, extracting a dispersing compound To thereby produce a porous polyimide resin.

그러나, 상기 방법에 의해 제조된 다공질 폴리이미드 수지는 마이크로 단위의 크기의 기공을 가지기 때문에 박막의 폴리이미드 필름을 구현하는 데에 한계가 있었다.
However, since the porous polyimide resin produced by the above method has pores of micro-unit size, there are limitations in realizing a thin polyimide film.

대한민국 특허 제 0859275 호Korean Patent No. 0859275

따라서, 본 발명의 목적은 우수한 물성을 가지며 나노 크기의 기공을 갖는 저유전율 폴리이미드 필름 및 이의 제조방법을 제공하는 것이다.
Accordingly, an object of the present invention is to provide a low dielectric constant polyimide film having excellent physical properties and having nano-sized pores and a method for producing the same.

상기 목적을 달성하기 위하여 본 발명은 In order to achieve the above object,

폴리이미드 수지; 및 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 포함하는 폴리이미드 필름을 제공한다.
Polyimide resin; And primary particles having an average particle diameter of 300 nm or less and fluorine-based particles composed of secondary particles having an average particle size of 10 탆 or less and an average apparent specific gravity of 1.2 g / ml or less, the primary particles having aggregated therein pores having an average diameter of 300 nm or less And a polyimide film.

본 발명은 또한, The present invention also relates to

폴리이미드 전구체, 이미드화 변환액, 및 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 혼합한 후 이미드화하는 것을 포함하는, 상기 폴리이미드 필름의 제조방법을 제공한다.
A primary particle having an average particle diameter of 300 nm or less and a primary particle having an average particle size of 10 mu m or less and an average apparent specific gravity of 1.2 g / ml or less having pores having an average diameter of 300 nm or less by agglomeration of the primary particles And then imidizing the fluorine-based particles composed of the second particles of the fluorine-based particles.

본 발명의 폴리이미드 필름은 특정 크기의 기공을 갖는 불소계 입자를 필름 내에 균일하게 포함함으로써, 불소 단일 입자가 갖는 전기적 특성을 나타냄과 동시에, 기공에 기인하여 다공성 형태를 구현하여 보다 낮은 유전율을 발현할 수 있어, 저유전율이 요구되는 인쇄 회로기판 등의 전기/전자 기기 및 부품의 제조에 유용하게 사용될 수 있다. 또한 기공을 갖고 이를 통해 요구하는 수준의 평균 겉보기 비중을 구현할 수 있는 불소계 입자를 선택적으로 사용함으로써, 일반적으로 높은 비중을 갖는 불소 입자를 적용할 경우 야기되는 입자의 가라앉음 현상을 방지하여 제품 내에 불소계 입자를 균일하게 분포시킬 수 있고, 또한 분산성을 개선하기 위해 별도의 분산제를 첨가할 필요가 없다는 장점이 있다.
The polyimide film of the present invention uniformly contains the fluorine-containing particles having pores of a specific size in the film, thereby exhibiting the electrical characteristics of the fluorine single particles, and realizing a porous form due to the pores, And can be usefully used in the production of electric / electronic devices and parts such as a printed circuit board in which a low dielectric constant is required. In addition, by selectively using the fluorine-based particles capable of achieving the average apparent specific gravity through the pore, it is possible to prevent the particles from sinking due to application of fluorine particles having a high specific gravity, There is an advantage that it is not necessary to add a dispersant in order to uniformly distribute the particles and to improve dispersibility.

도 1은 본 발명의 구현을 위해 적용한 불소계 1차 입자의 SEM 사진을 나타낸 것이다.
도 2는 본 발명의 구현을 위해 적용한 불소계 1차 입자가 응집하여 형성된 2차 입자의 SEM 사진을 나타낸 것이다.
도 3은 본 발명의 구현을 위해 불소계 1차 입자가 응집하여 형성된 2차 입자를 적용하여 제조한(실시예 1에서 제조된) 폴리이미드 필름의 단면 SEM 사진을 나타낸 것이다.
1 is a SEM photograph of a fluorine-based primary particle applied for the realization of the present invention.
2 is a SEM photograph of secondary particles formed by aggregation of fluorine-based primary particles applied for the realization of the present invention.
FIG. 3 is a cross-sectional SEM photograph of a polyimide film (prepared in Example 1) prepared by applying secondary particles formed by aggregation of fluorine-based primary particles for realizing the present invention.

본 발명의 폴리이미드 필름은 폴리이미드 수지; 및 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 포함하는 것을 특징으로 하며, 상기 불소계 입자는 바람직하게는 상기 폴리이미드 수지에 균일하게 분산되어 있다.The polyimide film of the present invention includes a polyimide resin; And primary particles having an average particle diameter of 300 nm or less and fluorine-based particles composed of secondary particles having an average particle size of 10 탆 or less and an average apparent specific gravity of 1.2 g / ml or less, the primary particles having aggregated therein pores having an average diameter of 300 nm or less The fluorine-based particles are preferably uniformly dispersed in the polyimide resin.

이러한 본 발명의 폴리이미드 필름은 폴리이미드 전구체, 이미드화 변환액, 및 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 혼합한 후 이미드화 공정을 수행함으로써 제조된다.The polyimide film of the present invention comprises a polyimide precursor, an imidization conversion liquid, primary particles having an average particle diameter of 300 nm or less, primary particles having an average particle diameter of 10 mu m or less, By mixing fluorine-based particles composed of secondary particles having an average apparent specific gravity of 1.2 g / ml or less and performing an imidation process.

본 발명에 사용되는 불소계 입자를 제조하는 방법은 상기에 언급한 파라미터를 구현하여 제조될 수 있으면, 그 방법에 대해서는 특별히 제한되지 아니한다.The method for producing the fluorine-based particles used in the present invention is not particularly limited as long as it can be produced by implementing the above-mentioned parameters.

바람직하게는, 상기 불소계 입자를 구성하는 1차 입자는 50 내지 300nm의 평균 입경을 가질 수 있고, 2차 입자는 3 내지 10㎛의 평균 입경 및 50 내지 300nm의 평균 직경의 기공을 갖고 0.4 내지 1.2g/ml의 평균 겉보기 비중을 가질 수 있다.Preferably, the primary particles constituting the fluorine-based particles may have an average particle diameter of 50 to 300 nm, the secondary particles may have an average particle diameter of 3 to 10 μm and pores having an average diameter of 50 to 300 nm, g / ml. < / RTI >

폴리이미드의 유전율 특성을 구현하기 위해 첨가하는 상기 불소계 입자는 200℃ 이상의 융점을 갖는 불소계 수지가 바람직하며, 이의 구체적인 예로는 폴리테트라플루오로에틸렌(PTFE), 퍼플루오로알콕시(PFA) 및 불소화된(fluorinated) 에틸렌프로필렌(FEP)으로 이루어진 군으로부터 선택되는 1종 이상일 수 있다.The fluorine-based particles added for realizing the dielectric constant property of polyimide are preferably fluorine-based resins having a melting point of 200 DEG C or higher, and specific examples thereof include polytetrafluoroethylene (PTFE), perfluoroalkoxy (PFA) and fluorinated ethylene propylene (FEP).

본 발명의 폴리이미드 필름은 상기 불소계 입자를 필름 총 중량 기준으로 5 내지 40 중량%, 바람직하게는 10 내지 30 중량%의 양으로 포함할 수 있다. The polyimide film of the present invention may contain the fluorine-based particles in an amount of 5 to 40% by weight, preferably 10 to 30% by weight, based on the total weight of the film.

상기 특징을 갖는 불소계 입자를 상기의 함량 범위로 포함하는 경우 폴리이미드 필름의 제조공정의 고온에 의한 불소계 입자의 특성 저하를 방지하여 구현하고자 하는 폴리이미드 필름의 유전율 특성을 나타낼 수 있고, 또한 불소계 입자의 다량 첨가에 의해 폴리이미드 필름의 기계적 강도를 유지할 수 있다.When the content of the fluorine-containing particles having the above-mentioned characteristics is within the above-mentioned range, it is possible to prevent the deterioration of the properties of the fluorine-based particles due to the high temperature in the production process of the polyimide film and to exhibit the dielectric constant property of the polyimide film to be realized, The mechanical strength of the polyimide film can be maintained.

본 발명에 사용되는 폴리이미드 전구체는 이미드화에 의해 폴리이미드 수지가 될 수 있는 것이라면 무엇이든 사용할 수 있으며, 바람직하게는 산 이무수물 성분과 디아민 성분을 통상적인 방법으로 공중합하여 얻어진 폴리아믹산일 수 있다.The polyimide precursor used in the present invention may be any polyimide resin that can be made into a polyimide resin by imidization, preferably a polyamic acid obtained by copolymerizing an acid dianhydride component and a diamine component by a conventional method .

상기 산 이무수물 성분 및 상기 디아민 성분은 각각 통상적으로 사용되는 것 중에서 적절히 선택될 수 있다.The acid dianhydride component and the diamine component may be appropriately selected from conventionally used ones.

구체적으로, 산 이무수물 성분으로는 비페닐카르복실산 이무수물 또는 그 유도체, 피로멜리트산 이무수물 또는 그 유도체 등을 사용할 수 있고, 디아민 성분으로는 페닐렌디아민 또는 그 유도체, 디아미노페닐에테르 또는 그 유도체 등을 사용할 수 있다.Specific examples of the acid dianhydride component include biphenylcarboxylic acid dianhydride or derivatives thereof, pyromellitic dianhydride or derivatives thereof, and examples of the diamine component include phenylenediamine or a derivative thereof, diaminophenyl ether or A derivative thereof and the like can be used.

본 발명에 사용되는 이미드화 변환액은 화학적 경화를 일으키기 위해 통상적으로 사용되는 물질이면 무엇이든 사용할 수 있으며, 이는 탈수제, 촉매 및 극성 유기용제 등 3종의 혼합 용액일 수 있다. 보다 구체적으로, 이미드화 변환액은 아세트산 이무수물과 같은 탈수제; 피리딘, 베타피콜린 및 이소퀴놀린과 같은 3급 아민류 촉매; 및 N-메틸피롤리돈(NMP), 디메틸포름아미드(DMF) 및 디메틸아세트아미드(DMAc)와 같은 극성 유기용제를 포함하는 혼합 용액일 수 있다. The imidization conversion liquid used in the present invention may be any material conventionally used for causing chemical hardening, and it may be a mixed solution of three kinds of dehydrating agents, catalysts and polar organic solvents. More specifically, the imidization conversion liquid may include a dehydrating agent such as acetic acid dianhydride; Tertiary amine catalysts such as pyridine, beta picoline and isoquinoline; And a polar organic solvent such as N-methylpyrrolidone (NMP), dimethylformamide (DMF), and dimethylacetamide (DMAc).

상기 이미드화 변환액은 폴리이미드 전구체 100 중량부를 기준으로 30 내지 70 중량부의 양으로 사용될 수 있으나, 폴리이미드 전구체의 종류 및 제조되는 폴리이미드 필름의 두께 등에 의하여 달라질 수 있다.The imidization conversion liquid may be used in an amount of 30 to 70 parts by weight based on 100 parts by weight of the polyimide precursor, but may vary depending on the kind of the polyimide precursor and the thickness of the polyimide film to be produced.

보다 구체적인 일례로서, 본 발명의 폴리이미드 필름은 다음과 같은 당업계에 공지된 통상적인 방법으로 제조될 수 있다.As a more specific example, the polyimide film of the present invention can be produced by a conventional method known in the art as follows.

먼저, 유기용매 중에서 산 이무수물 성분과 디아민 성분을 공중합 반응시켜 폴리아믹산 용액을 얻는다. 이때, 상기 유기용매는 일반적으로 아미드계 용매로서 비양성자성 극성 용매(aprotic solvent), 예를 들어 N,N'-디메틸포름아미드, N,N'-디메틸아세트아미드, N-메틸-피롤리돈, 또는 이들의 혼합물을 사용할 수 있다. First, an acid dianhydride component and a diamine component are copolymerized in an organic solvent to obtain a polyamic acid solution. In this case, the organic solvent is generally an aprotic solvent such as N, N'-dimethylformamide, N, N'-dimethylacetamide, N-methyl-pyrrolidone , Or a mixture thereof.

이때, 폴리이미드 필름의 접동성, 열전도성, 도전성, 내코로나성과 같은 여러 가지 특성을 개선하기 위해 폴리아믹산 용액에 충전제를 첨가할 수도 있다. 사용될 수 있는 충전제의 예로는 실리카, 산화티탄, 알루미나, 질화규소, 질화붕소, 인산수소칼슘, 인산칼슘, 운모 등을 들 수 있으나, 이에 제한되지 않는다. At this time, a filler may be added to the polyamic acid solution to improve various properties such as the sliding properties, thermal conductivity, conductivity, and corona resistance of the polyimide film. Examples of fillers that can be used include, but are not limited to, silica, titanium oxide, alumina, silicon nitride, boron nitride, calcium hydrogen phosphate, calcium phosphate, mica and the like.

상기에서 얻어진 폴리아믹산 용액에, 탈수제, 촉매 및 극성 유기용제를 포함하는 이미드화 변환액을 첨가하여 1차 혼합하고, 여기에 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 첨가한 후 혼합한다.To the polyamic acid solution obtained above, an imidization conversion liquid containing a dehydrating agent, a catalyst and a polar organic solvent was added and primary mixed. Primary particles having an average particle diameter of 300 nm or less and primary particles thereof aggregated to form an average Based particles composed of secondary particles having an average particle size of 10 mu m or less and an average apparent specific gravity of 1.2 g / ml or less having pores of 300 nm or less in diameter are added and mixed.

이때, 이미드화 변환액과 불소계 입자의 투입 시점은 시차를 두지 않고 동시에 진행하여도 무방하며, 또한 불소계 입자를 투입함에 있어서 극성 유기용제에 분산한 분산액 상태로 투입해도 무방하다.At this time, the imidization conversion liquid and the fluorine-based particles may be introduced at the same time without any time difference, or they may be charged into a dispersion liquid in which the fluorine-based particles are dispersed in the polar organic solvent.

이 혼합액을 지지체(예컨대 유리판, 알루미늄박, 순환 스테인레스 벨트, 스테인레스 드럼 등)에 도포한 후 이미드화하여 목적하는 폴리이미드 필름을 얻을 수 있다. The mixed solution is coated on a support (for example, a glass plate, an aluminum foil, a circulating stainless belt, a stainless steel drum, etc.) and imidized to obtain a desired polyimide film.

상기 지지체 상에 형성된 폴리아믹산 코팅층을 1차 열처리에 의해 화학적으로 부분 이미드화시킨 후 2차 열처리에 의해 완전히 이미드화 시킴으로써 목적하는 폴리이미드 필름을 얻을 수 있다. 화학적 부분 이미드화를 위한 1차 열처리는 100 내지 200℃에서 5 내지 15분 동안 수행할 수 있고, 완전 이미드화를 위한 2차 열처리는 250 내지 850℃에서 5 내지 15분 동안 수행할 수 있다. 이때 1차 열처리된 화학적 부분 이미드화 상태의 폴리아믹산 필름을 지지체로부터 분리하여 2차 열처리할 수 있으며, 2차 열처리시 일정한 장력 하에서 열처리함으로써 제막 과정에서 발생한 필름 내부의 잔류응력을 제거할 수 있다.The polyamic acid coating layer formed on the support is chemically partially imidized by a first heat treatment and then imidized completely by a second heat treatment to obtain a desired polyimide film. The first heat treatment for chemical partial imidization may be performed at 100 to 200 ° C for 5 to 15 minutes and the second heat treatment for complete imidization may be performed at 250 to 850 ° C for 5 to 15 minutes. In this case, the first heat-treated polyimic acid film with the chemical partially imidized state can be separated from the support and subjected to the second heat treatment. In the second heat treatment, the residual stress inside the film can be removed by heat treatment under a certain tension.

이와 같이 제조된 본 발명에 따른 폴리이미드 필름은 1MHz에서 2.3 내지 2.9의 낮은 유전율을 갖는다.The thus-fabricated polyimide film according to the present invention has a low dielectric constant of 2.3 to 2.9 at 1 MHz.

또한, 필름의 열팽창계수는 폴리이미드 바니쉬(varnish)의 특성에 의존하기 때문에, 불소계 입자를 필름 내에 균일하게 포함한 본 발명의 폴리이미드 필름은 불소계 단량체를 적용하여 제작한 폴리이미드 필름에 비해 상대적으로 낮은 선팽창계수를 구현할 수 있고, 또한 불소계 입자가 필름의 표면에 직접적으로 돌출되지 않아 필름의 높은 접착력을 구현할 수 있어 동박 적층제나 보강판 등의 FPCB 소재로 적용이 가능하다.Since the coefficient of thermal expansion of the film depends on the characteristics of the polyimide varnish, the polyimide film of the present invention containing the fluorine-based particles uniformly in the film is relatively low in comparison with the polyimide film produced by applying the fluorine-based monomer And the fluorine-based particles can not be directly projected on the surface of the film, thereby realizing a high adhesive force of the film. Therefore, it can be applied to an FPCB material such as a copper-clad laminate or a reinforced plate.

본 발명의 폴리이미드 필름은 특정 크기의 기공을 갖는 불소계 입자를 필름 내에 균일하게 포함함으로써, 불소 단일 입자가 갖는 전기적 특성을 나타냄과 동시에, 기공에 기인하여 다공성 형태를 구현하여 보다 낮은 유전율을 발현할 수 있어, 저유전율이 요구되는 인쇄 회로기판 등의 전기/전자 기기 및 부품의 제조에 유용하게 사용될 수 있다. 또한 기공을 갖고 이를 통해 요구하는 수준의 평균 겉보기 비중을 구현할 수 있는 불소계 입자를 선택적으로 사용함으로써, 일반적으로 높은 비중을 갖는 불소 입자를 적용할 경우 야기되는 입자의 가라앉음 현상을 방지하여 제품 내에 불소계 입자를 균일하게 분포시킬 수 있고, 또한 분산성을 개선하기 위해 별도의 분산제를 첨가할 필요가 없다는 장점이 있다.
The polyimide film of the present invention uniformly contains the fluorine-containing particles having pores of a specific size in the film, thereby exhibiting the electrical characteristics of the fluorine single particles, and realizing a porous form due to the pores, And can be usefully used in the production of electric / electronic devices and parts such as a printed circuit board in which a low dielectric constant is required. In addition, by selectively using the fluorine-based particles capable of achieving the average apparent specific gravity through the pore, it is possible to prevent the particles from sinking due to application of fluorine particles having a high specific gravity, There is an advantage that it is not necessary to add a dispersant in order to uniformly distribute the particles and to improve dispersibility.

이하에서, 본 발명을 실시예를 들어 상세히 설명하나, 하기 실시예에 의해 본 발명이 한정되는 것은 아니다.
Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited by the following Examples.

제조예 1 : 폴리아믹산 용액의 제조Production Example 1: Preparation of polyamic acid solution

0.5L 반응기에 디메틸포름아미드(DMF) 320g을 넣고 온도를 20℃로 설정한 다음, 디아미노페닐에테르(ODA) 27.59g을 투입하여 용해시킨 뒤에 피로멜리트산 이무수물(PMDA)을 20.03g씩 2회 투입 후 용해하였다. 용해가 끝나면, 여기에 페닐렌디아민(pPDA) 3.97g을 투입하여 30분간 반응시킨 후에 용액을 샘플링하여 분자량을 측정하였다. 이 후 반응이 끝나면 반응기의 온도를 30℃로 승온한 뒤에 pPDA 1.00g을 투입하여 [디아민]/[산 이무수물]의 몰비를 1:1로 맞추었다. 원료 투입을 완료하면 40℃에서 2시간 동안 충분히 반응시켜 폴리아믹산 용액을 얻었다.
320 g of dimethylformamide (DMF) was placed in a 0.5 L reactor and the temperature was set to 20 ° C. 27.59 g of diaminophenyl ether (ODA) was added to dissolve and then 20.03 g of pyromellitic dianhydride (PMDA) And then dissolved. After dissolution, 3.97 g of phenylenediamine (pPDA) was added thereto and reacted for 30 minutes, and then the solution was sampled to measure the molecular weight. After the reaction was completed, the temperature of the reactor was raised to 30 ° C, and 1.00 g of pPDA was added thereto to adjust the molar ratio of [diamine] / [dianhydride] to 1: 1. After the addition of the raw material was completed, the reaction was sufficiently carried out at 40 ° C for 2 hours to obtain a polyamic acid solution.

제조예 2 : 불소 입자가 첨가된 이미드화 변환액의 제조 (1)Production Example 2: Preparation of imidization conversion liquid to which fluorine particles are added (1)

이미드 경화용 촉매로서 이소퀴놀린(끓는점 242℃) 4.5g, 탈수제로서 아세트산 무수물 17.0g, 및 극성 유기용제로서 디메틸포름아미드(DMF) 17.0g에 폴리테트라플루오로에틸렌(PTFE) 분산액 9.3g(삼일물산 SS-5000CR, 1차 입자의 평균 입경: 200nm, 2차 입자의 평균 입경, 기공, 평균 겉보기 비중: 10㎛, 200nm, 0.6g/ml, PTFE 고형분 30%)을 섞어 교반하여 불소 입자가 첨가된 이미드화 변환액 46.9g을 얻었다.
4.5 g of isoquinoline (boiling point 242 占 폚) as an imide curing catalyst, 17.0 g of acetic anhydride as a dehydrating agent and 17.0 g of dimethylformamide (DMF) as a polar organic solvent were added 9.3 g of polytetrafluoroethylene (PTFE) 200 nm, 0.6 g / ml, and PTFE solid content: 30%) were mixed and stirred to prepare a fluorine-containing polymer fine particle having a mean particle diameter of 2 탆, porosity, average apparent specific gravity: 10 탆, To obtain 46.9 g of the imidized conversion solution.

제조예 3 : 불소 입자가 첨가된 이미드화 변환액의 제조 (2)Preparation Example 3: Preparation of imidization conversion liquid containing fluorine particles (2)

이미드 경화용 촉매로서 이소퀴놀린(끓는점 242℃) 4.5g, 탈수제로서 아세트산 무수물 17.0g, 및 극성 유기용제로서 DMF 14.9g에 PTFE 분산액 12.3g(삼일물산 SS-5000CR, 1차 입자의 평균 입경: 200nm, 2차 입자의 평균 입경, 기공, 평균 겉보기 비중: 10㎛, 200nm, 0.6g/ml, PTFE 고형분 30%)을 섞어 교반하여 불소 입자가 첨가된 이미드화 변환액 48.7g을 얻었다.
4.5 g of isoquinoline (boiling point: 242 DEG C) as an imide curing catalyst, 17.0 g of acetic anhydride as a dehydrating agent, and 14.9 g of DMF as a polar organic solvent were added 12.3 g of PTFE dispersion (available from Samil Chemical Co., 200 nm, 0.6 g / ml, solid content of PTFE: 30%) were mixed and stirred to obtain 48.7 g of an imidization conversion liquid to which fluorine particles were added.

제조예 4 : 불소 입자가 첨가된 이미드화 변환액의 제조 (3)Production Example 4: Preparation of imidization conversion liquid added with fluorine particles (3)

이미드 경화용 촉매로서 이소퀴놀린(끓는점 242℃) 4.5g, 탈수제로서 아세트산 무수물 17.0g, 및 극성 유기용제로서 DMF 22.6g에 밀링한 PTFE 입자 2.8g(DAIKIN사 제품, 평균 입경 22㎛, 평균 겉보기 비중 0.4g/ml)을 섞어 교반하여 불소 입자가 첨가된 이미드화 변환액 46.9g을 얻었다.
4.5 g of isoquinoline (boiling point 242 占 폚) as an imide curing catalyst, 17.0 g of acetic anhydride as a dehydrating agent, and 2.8 g of PTFE particles (manufactured by DAIKIN, average particle diameter 22 mu m, average apparent surface Specific gravity: 0.4 g / ml) were mixed and stirred to obtain 46.9 g of an imidization conversion liquid to which fluorine particles were added.

제조예 5 : 불소 입자가 첨가된 이미드화 변환액의 제조 (4)Preparation Example 5: Preparation of imidization conversion liquid containing fluorine particles (4)

이미드 경화용 촉매로서 이소퀴놀린(끓는점 242℃) 4.5g, 탈수제로서 아세트산 무수물 17.0g, 및 극성 유기용제로서 DMF 23.5g에 밀링한 PTFE 입자 3.7g(DAIKIN사 제품, 평균 입경 22㎛, 평균 겉보기 비중 0.4g/ml)을 섞어 교반하여 불소 입자가 첨가된 이미드화 변환액 48.7g을 얻었다.
4.5 g of isoquinoline (boiling point 242 DEG C) as an imide curing catalyst, 17.0 g of acetic anhydride as a dehydrating agent and 3.7 g of PTFE particles (manufactured by DAIKIN, average particle diameter 22 mu m, average apparent surface Specific gravity: 0.4 g / ml) were mixed and stirred to obtain 48.7 g of an imidization conversion liquid to which fluorine particles were added.

제조예 6 : 불소 입자를 첨가하지 않은 이미드화 변환액의 제조 (1)Production Example 6: Preparation of Imidization Conversion Liquid without Addition of Fluorine Particles (1)

이미드 경화용 촉매로서 이소퀴놀린(끓는점 242℃) 4.5g, 탈수제로서 아세트산 무수물 17.0g, 및 극성 유기용제로서 DMF 23.5g을 섞어 교반하여 이미드화 변환액 45g을 얻었다.
4.5 g of isoquinoline (boiling point: 242 DEG C) as an imide curing catalyst, 17.0 g of acetic anhydride as a dehydrating agent, and 23.5 g of DMF as a polar organic solvent were mixed and stirred to obtain 45 g of an imidation conversion liquid.

제조예 7 : 불소 입자를 첨가하지 않은 이미드화 변환액의 제조 (2)Production Example 7: Preparation of imidization conversion liquid without addition of fluorine particles (2)

이미드 경화용 촉매로서 베타피콜린(끓는점 144℃)4.4g, 탈수제로서 아세트산 무수물 16.7g, 및 극성 유기용제로서 DMF 23.1g을 섞어 교반하여 이미드화 변환액 45g을 얻었다.
4.4 g of beta-picoline (boiling point 144 DEG C) as an imide curing catalyst, 16.7 g of acetic anhydride as a dehydrating agent, and 23.1 g of DMF as a polar organic solvent were mixed and stirred to obtain 45 g of an imidation conversion liquid.

실시예 1 : 불소 입자 적용 폴리이미드 필름 제조Example 1: Production of fluorine-containing polyimide film

제조예 1에서 얻은 폴리아믹산 중합 용액 100g에 제조예 2에서 얻은 이미드화 변환액 45g을 섞은 후 스테인레스 판에 도포하고, 120℃ 오븐에서 열풍으로 3분간 건조한 후 필름을 스테인레스 판으로부터 떼어내어 프레임 핀으로 고정하였다. 필름이 고정된 프레임을 450℃에서 7분간 열처리한 후에 필름을 떼어내 평균 두께 25㎛의 폴리이미드 필름을 얻었다. 제조된 폴리이미드 필름의 단면 SEM 사진을 도 3에 나타내었다.
45 g of the imidization conversion solution obtained in Preparation Example 2 was mixed with 100 g of the polyamic acid polymer solution obtained in Preparation Example 1, and the resulting mixture was applied to a stainless steel plate. After drying for 3 minutes in a 120 ° C oven with hot air, the film was removed from the stainless plate, Respectively. After the film-fixed frame was heat-treated at 450 캜 for 7 minutes, the film was peeled off to obtain a polyimide film having an average thickness of 25 탆. A sectional SEM photograph of the polyimide film was shown in Fig.

실시예Example 2 : 불소 입자 적용 폴리이미드 필름 제조 2: Manufacture of polyimide film with fluorine particles

제조예 2에서 얻은 이미드화 변환액 대신에 제조예 3에서 얻은 이미드화 변환액 45g을 사용한 것을 제외하고는, 실시예 1과 동일한 공정을 수행하여 평균 두께 25㎛의 폴리이미드 필름을 얻었다.
A polyimide film having an average thickness of 25 占 퐉 was obtained by carrying out the same processes as in Example 1 except that 45g of the imidation conversion solution obtained in Production Example 3 was used instead of the imidization conversion solution obtained in Production Example 2.

비교예 1 및 2 : 입자 크기 및 겉보기 밀도가 다른 불소 입자 적용 폴리이미드 필름 제조Comparative Examples 1 and 2: Production of polyimide film using fluorine particles having different particle sizes and apparent density

제조예 2에서 얻은 이미드화 변환액 대신에 제조예 4 또는 5에서 얻은 이미드화 변환액 45g을 사용한 것을 제외하고는, 실시예 1과 동일한 공정을 수행하여 평균 두께 25㎛의 폴리이미드 필름을 얻었다.
A polyimide film having an average thickness of 25 占 퐉 was obtained by carrying out the same processes as in Example 1 except that 45g of the imidization conversion solution obtained in Production Example 4 or 5 was used instead of the imidization conversion solution obtained in Production Example 2.

비교예 3 및 4 : 불소 입자 미적용 폴리이미드 필름 제조Comparative Examples 3 and 4: Production of fluorine-free polyimide film

제조예 2에서 얻은 이미드화 변환액 대신에 제조예 6 또는 7에서 얻은 이미드화 변환액 45g을 사용한 것을 제외하고는, 실시예 1과 동일한 공정을 수행하여 평균 두께 25㎛의 폴리이미드 필름을 얻었다.
A polyimide film having an average thickness of 25 탆 was obtained by carrying out the same processes as in Example 1 except that 45 g of the imidization conversion solution obtained in Production Example 6 or 7 was used in place of the imidization conversion solution obtained in Production Example 2.

필름의 코로나 처리Corona treatment of film

실시예 1 내지 2 및 비교예 1 내지 4에서 제조된 폴리이미드 필름에 대하여 코로나 방전 처리 장치(모델명 AGI:060M, 063M, 카스가덴끼(春日電機)사 제조)를 이용하여 상기 4kW 출력으로 코로나 처리를 실시했다.
The polyimide films produced in Examples 1 to 2 and Comparative Examples 1 to 4 were subjected to corona treatment with the above 4 kW output using a corona discharge treatment apparatus (model name: AGI: 060M, 063M, manufactured by Kasuga Denki K.K.) .

시험예 1: 1차 입자의 평균 입경 및 기공의 평균 직경 측정Test Example 1: Measurement of average particle diameter of primary particles and average diameter of pores

본 발명을 위해 사용한 불소계 입자의 1차 입자의 평균 입경 및 기공의 평균 직경은 주사전자현미경 FE-SEM(JEOL(제올)로부터 입수 가능한 모델 JSM-6700F)을 사용하여 관찰하여, SEM 이미지에서 랜덤으로 200개의 1차 입자 및 기공의 이미지를 선택하고, 그 크기를 측정하여 평균을 계산하였다. 측정된 값을 하기 표 1에 나타내고, 불소계 1차 입자의 SEM 사진을 도 1에 나타내었다.
The average particle diameter and pore diameter of the primary particles of the fluorine-based particles used for the present invention were observed using a scanning electron microscope FE-SEM (model JSM-6700F available from JEOL) The images of 200 primary particles and pores were selected and the average was calculated by measuring the size. The measured values are shown in Table 1, and an SEM photograph of the fluorine primary particles is shown in FIG.

시험예 2: 2차 입자의 평균 입경 측정Test Example 2: Measurement of average particle diameter of secondary particles

본 발명을 위해 사용한 불소계 입자의 2차 입자의 평균 입경은 레이저 회절 입자크기 측정기(Laser Diffraction Particle Size Analyzer, SHIMADZU사, 모델 SALD-2201)를 사용하여 측정하였다. 측정된 값을 하기 표 1에 나타내고, 불소계 1차 입자가 응집하여 형성된 2차 입자의 SEM 사진을 도 2에 나타내었다.
The average particle size of the secondary particles of the fluorine-based particles used for the present invention was measured using a laser diffraction particle size analyzer (SHIMADZU, model SALD-2201). The measured values are shown in Table 1 below, and an SEM photograph of the secondary particles formed by aggregation of the fluorine primary particles is shown in Fig.

시험예 3: 2차 입자의 평균 겉보기 비중 측정Test Example 3: Measurement of average apparent specific gravity of secondary particles

본 발명을 위해 사용한 불소계 입자의 2차 입자의 평균 겉보기 비중은 부피 밀도 측정기(Volume density meter)와 밀도 컵(Density cup, YASUDA사, 모델 536, 558)을 사용하여 측정하였다. 측정된 값을 하기 표 1에 나타내었다.
The average apparent specific gravity of the secondary particles of the fluorine-based particles used for the present invention was measured using a volume density meter and a density cup (YASUDA, Model 536, 558). The measured values are shown in Table 1 below.

시험예 4 : 유전율 및 유전정접 측정Test Example 4: Measurement of dielectric constant and dielectric tangent

상기 실시예 1 내지 2 및 비교예 1 내지 4에서 제조된 폴리이미드 필름의 1MHz 유전율 및 유전정접을 Lacerta사의 DS-6000을 이용하여 측정하였다. 측정된 유전율 및 유전정접 값을 하기 표 1에 나타내었다.
The 1 MHz dielectric constant and dielectric tangent of the polyimide films prepared in Examples 1 to 2 and Comparative Examples 1 to 4 were measured using DS-6000 manufactured by Lacerta. The measured dielectric constant and dielectric loss tangent are shown in Table 1 below.

시험예 5 : 열팽창계수(선팽창계수) 측정Test Example 5: Measurement of thermal expansion coefficient (linear expansion coefficient)

상기 실시예 1 내지 2 및 비교예 1 내지 4에서 제조된 폴리이미드 필름을 폭 5mmㅧ길이 16mm로 잘라 TA사 열분석장치(Thermal mechanical apparatus) Q400을 이용해 열팽창계수(Coefficient of thermal expansion, CTE) 값을 측정하였다. 샘플을 30℃에서 420℃까지 10℃/분의 속도로 가열하였고, 열팽창계수 값은 50℃ 에서 200℃ 범위 내에서 구하였다. 측정된 열팽창계수(선팽창계수) 값을 하기 표 1에 나타내었다.
The polyimide films prepared in Examples 1 to 2 and Comparative Examples 1 to 4 were cut to a width of 5 mm and a length of 16 mm and a coefficient of thermal expansion (CTE) value was measured using a thermal mechanical apparatus Q400 Were measured. The sample was heated from 30 占 폚 to 420 占 폚 at a rate of 10 占 폚 / min and the coefficient of thermal expansion was determined within the range of 50 占 폚 to 200 占 폚. The measured values of the thermal expansion coefficient (linear expansion coefficient) are shown in Table 1 below.

시험예 6 : 접착력 측정Test Example 6: Measurement of Adhesion

상기 실시예 1 내지 2 및 비교예 1 내지 4에서 제조된 폴리이미드 필름과 동박(2/3oz, 일진소재제품) 사이에 본딩 쉬트(1mil, Epoxy type, 한화L&C제품)를 놓고 위, 아래에 보호용 필름을 놓고 180℃로 승온한 뒤 30분간 3Mpa의 압력으로 열압착한 후, 압력을 해소하여 추가로 200℃ 오븐에서 30분간 후경화하여 연성기판을 얻었다. 얻어진 연성기판을 5mm 폭으로 잘라 재단한 후에 IPC TM 659 2.4.9D 방법의 90° Wheel test를 통하여 접착력을 측정하였다. 측정된 접착력 값을 하기 표 1에 나타내었다.Bonding sheets (1 mil, Epoxy type, Hanwha L & C products) were placed between the polyimide films prepared in Examples 1 and 2 and Comparative Examples 1 to 4 and copper foil (2/3 oz, manufactured by Iljin Materials) The film was heated to 180 ° C., thermocompressed at a pressure of 3 Mpa for 30 minutes, and then the pressure was released. Further, the film was cured in an oven at 200 ° C. for 30 minutes to obtain a flexible substrate. The resulting flexible substrate was cut to a width of 5 mm, and its adhesion was measured by a 90 ° wheel test of the IPC TM 659 2.4.9D method. The measured adhesion values are shown in Table 1 below.

실시예1Example 1 실시예2Example 2 비교예1Comparative Example 1 비교예2Comparative Example 2 비교예3Comparative Example 3 비교예4Comparative Example 4 폴리아믹산 용액Polyamic acid solution 제조예1Production Example 1 이미드화 변환액Imidization conversion amount 제조예2Production Example 2 제조예3Production Example 3 제조예4Production Example 4 제조예5Production Example 5 제조예6Production Example 6 제조예7Production Example 7 불소계 입자 종류Fluorine-based particle type PTFEPTFE PTFEPTFE PTFEPTFE PTFEPTFE -- -- 불소계 입자
사용비율 (중량%)
Fluorine-based particles
Usage ratio (% by weight)
1515 2020 1515 2020 00 00
1차입자의 평균입경 (nm)Average particle size of primary particles (nm) 200200 200200 -- -- -- -- 기공의 평균직경 (nm)Average diameter of pores (nm) 200200 200200 없음none 없음none -- -- 2차입자의 평균입경 (um)The average grain size (um) of the two- 1010 1010 2222 2222 -- -- 2차입자의 평균 겉보기 비중 (g/ml)Average apparent specific gravity of the two investors (g / ml) 0.60.6 0.60.6 0.40.4 0.40.4 -- -- 유전율 (1kHz)Permittivity (1 kHz) 2.912.91 2.662.66 3.253.25 3.153.15 3.413.41 3.393.39 유전정접 (1kHz)Dielectric tangent (1 kHz) 0.0010.001 0.0010.001 0.0010.001 0.0010.001 0.0020.002 0.0030.003 필름 평균두께 (um)Film average thickness (um) 2525 2525 2525 2525 2525 2525 접착력 (N/cm)Adhesion (N / cm) 1.2~1.51.2 to 1.5 1.2~1.51.2 to 1.5 1.2~1.51.2 to 1.5 1.2~1.51.2 to 1.5 1.2~1.51.2 to 1.5 1.2~1.51.2 to 1.5 선팽창계수 (ppm/℃)Linear expansion coefficient (ppm / ° C) 18.318.3 17.517.5 18.118.1 18.518.5 16.516.5 16.316.3

상기 표 1의 결과로부터, 본 발명의 실시예 1 및 2의 폴리이미드 필름은 우수한 물성을 나타내면서도 비교예 1 내지 4의 폴리이미드 필름에 비해 낮은 유전율을 발현할 수 있음을 알 수 있다. 따라서, 본 발명의 폴리이미드 필름은 저유전율이 요구되는 인쇄 회로기판 등의 전기/전자 기기 및 부품의 제조에 유용하게 사용될 수 있다. From the results shown in Table 1, it can be seen that the polyimide films of Examples 1 and 2 of the present invention exhibit a lower dielectric constant than the polyimide films of Comparative Examples 1 to 4 while exhibiting excellent physical properties. Therefore, the polyimide film of the present invention can be usefully used for the production of electric / electronic devices and parts such as a printed circuit board in which a low dielectric constant is required.

Claims (6)

폴리이미드 수지; 및 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 포함하는 폴리이미드 필름.Polyimide resin; And primary particles having an average particle diameter of 300 nm or less and fluorine-based particles composed of secondary particles having an average particle size of 10 탆 or less and an average apparent specific gravity of 1.2 g / ml or less, the primary particles having aggregated therein pores having an average diameter of 300 nm or less Containing polyimide film. 제 1 항에 있어서,
상기 불소계 입자가 50 내지 300nm의 평균 입경을 갖는 1차 입자, 및 3 내지 10㎛의 평균 입경 및 0.4 내지 1.2g/ml의 평균 겉보기 비중을 가지면서 50 내지 300nm의 평균 직경을 갖는 기공을 갖는 2차 입자로 구성되고, 필름 총 중량 기준으로 5 내지 40 중량%의 양으로 포함되는 것을 특징으로 하는 폴리이미드 필름.
The method according to claim 1,
Wherein the fluorine-based particles have a primary particle having an average particle diameter of 50 to 300 nm and a secondary particle having an average particle diameter of 3 to 10 占 퐉 and an average apparent specific gravity of 0.4 to 1.2 g / ml and having pores having an average diameter of 50 to 300 nm By weight based on the total weight of the film, and is contained in an amount of 5 to 40% by weight based on the total weight of the film.
제 1 항에 있어서,
상기 불소계 입자가 200℃ 이상의 융점을 갖는 불소계 수지인 것을 특징으로 하는 폴리이미드 필름.
The method according to claim 1,
Wherein the fluorine-based particles are a fluorine-based resin having a melting point of 200 캜 or more.
제 3 항에 있어서,
상기 불소계 수지가 폴리테트라플루오로에틸렌 (PTFE), 퍼플루오로알콕시 (PFA) 및 불소화된(fluorinated) 에틸렌프로필렌 (FEP)으로 이루어진 군으로부터 선택되는 1종 이상인 것을 특징으로 하는 폴리이미드 필름.
The method of claim 3,
Wherein the fluororesin is at least one selected from the group consisting of polytetrafluoroethylene (PTFE), perfluoroalkoxy (PFA), and fluorinated ethylene propylene (FEP).
제 1 항에 있어서,
상기 폴리이미드 필름이 1MHz에서 2.3 내지 2.9의 낮은 유전율을 갖는 것을 특징으로 하는 폴리이미드 필름.
The method according to claim 1,
Wherein the polyimide film has a low dielectric constant of 2.3 to 2.9 at 1 MHz.
폴리이미드 전구체, 이미드화 변환액, 및 평균 입경 300nm 이하의 1차 입자와, 그 1차 입자가 응집되어 평균 직경 300nm 이하의 기공을 갖는, 평균 입경 10㎛ 이하 및 평균 겉보기 비중 1.2g/ml 이하의 2차 입자로 구성된 불소계 입자를 혼합한 후 이미드화하는 것을 포함하는, 제 1 항 내지 제 5 항 중 어느 한 항의 폴리이미드 필름의 제조방법.A primary particle having an average particle size of 300 nm or less and a primary particle having an average particle size of 10 mu m or less and an average apparent specific gravity of 1.2 g / ml or less having pores having an average diameter of 300 nm or less by agglomeration of the primary particles Wherein the fluorine-based particles composed of the secondary particles of the fluorine-containing particles are mixed and then imidized.
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WO2019027207A1 (en) * 2017-08-02 2019-02-07 에스케이씨코오롱피아이 주식회사 Method for manufacturing polyimide film using fumed silica particles and polyimide film having low dielectric constant
WO2021101324A3 (en) * 2019-11-22 2021-07-15 피아이첨단소재 주식회사 Low-dielectric-constant polyimide composite powder, and method for producing same
KR102306950B1 (en) * 2021-02-05 2021-09-29 최유경 Polyimide film, method of manufacturing the same, and flexible printed circuit board
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WO2023017876A1 (en) * 2021-08-13 2023-02-16 엘지전자 주식회사 Composite polyimide substrate, composite polyimide composition, and printed circuit board using same
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* Cited by examiner, † Cited by third party
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005246793A (en) 2004-03-04 2005-09-15 Nitto Denko Corp Method for producing shaped polyimide film
JP2007030501A (en) 2005-06-21 2007-02-08 Ist Corp Polyimide composite film and its manufacturing process
JP2010043134A (en) 2008-08-08 2010-02-25 Nitto Denko Corp Polyimide tubular article and its preparation
KR20130027442A (en) * 2011-09-07 2013-03-15 주식회사 엘지화학 Flexible metal laminate containing fluoropolymer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100270136B1 (en) * 1995-11-09 2000-10-16 이노우에 노리유끼 Fine polytetrafluoroethylene powder and production and uses thereof
WO2005057716A1 (en) * 2003-12-08 2005-06-23 Matsushita Electric Industrial Co., Ltd. Semiconductor electrode, process for producing the same and photocell including the semiconductor electrode
JP2006232996A (en) * 2005-02-24 2006-09-07 Toray Ind Inc Molding material of polyimide resin, molded product using the same and material recycling method for polyimide
US8182599B2 (en) * 2005-07-22 2012-05-22 Krosaki Harima Corporation Carbon-containing refractory, production method thereof, and pitch-containing refractory raw material
CN101831175A (en) * 2010-04-01 2010-09-15 辽宁科技大学 Colorless and transparent polyimide nano-composite material membrane and preparation method thereof
US9462688B2 (en) * 2011-09-07 2016-10-04 Lg Chem, Ltd. Flexible metal laminate containing fluoropolymer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005246793A (en) 2004-03-04 2005-09-15 Nitto Denko Corp Method for producing shaped polyimide film
JP2007030501A (en) 2005-06-21 2007-02-08 Ist Corp Polyimide composite film and its manufacturing process
JP2010043134A (en) 2008-08-08 2010-02-25 Nitto Denko Corp Polyimide tubular article and its preparation
KR20130027442A (en) * 2011-09-07 2013-03-15 주식회사 엘지화학 Flexible metal laminate containing fluoropolymer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019027207A1 (en) * 2017-08-02 2019-02-07 에스케이씨코오롱피아이 주식회사 Method for manufacturing polyimide film using fumed silica particles and polyimide film having low dielectric constant
WO2021101324A3 (en) * 2019-11-22 2021-07-15 피아이첨단소재 주식회사 Low-dielectric-constant polyimide composite powder, and method for producing same
KR20220064771A (en) 2020-11-12 2022-05-19 한국화학연구원 Low dielectric polyimide resin and its manufacturing method
KR102306950B1 (en) * 2021-02-05 2021-09-29 최유경 Polyimide film, method of manufacturing the same, and flexible printed circuit board
US11596065B2 (en) 2021-02-05 2023-02-28 Yu Kyoung Choi Method of manufacturing polyimide film
WO2023017876A1 (en) * 2021-08-13 2023-02-16 엘지전자 주식회사 Composite polyimide substrate, composite polyimide composition, and printed circuit board using same
KR102550250B1 (en) * 2022-12-02 2023-06-30 (주)상아프론테크 Low dielectric film for high speed communication and Copper clad laminate containing the same

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