KR101459259B1 - 비구면을 정밀 고해상도로 측정하는 방법 - Google Patents

비구면을 정밀 고해상도로 측정하는 방법 Download PDF

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Publication number
KR101459259B1
KR101459259B1 KR1020137034713A KR20137034713A KR101459259B1 KR 101459259 B1 KR101459259 B1 KR 101459259B1 KR 1020137034713 A KR1020137034713 A KR 1020137034713A KR 20137034713 A KR20137034713 A KR 20137034713A KR 101459259 B1 KR101459259 B1 KR 101459259B1
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gauge
measurements
wavefront
test
measurement
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KR20140008469A (ko
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폴 이. 머피
드라기샤 밀라디노빅
그렉 더블유. 포브스
게리 엠. 데브리스
존 에프. 플라익
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퀘드 테크놀러지즈 인터내셔날, 인크.
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02063—Active error reduction, i.e. varying with time by particular alignment of focus position, e.g. dynamic focussing in optical coherence tomography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02085—Combining two or more images of different regions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Signal Processing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
KR1020137034713A 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법 Expired - Lifetime KR101459259B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66838505P 2005-04-05 2005-04-05
US60/668,385 2005-04-05
PCT/US2006/012527 WO2006107985A2 (en) 2005-04-05 2006-04-05 Method for accurate high-resolution measurements of aspheric surfaces

Related Parent Applications (1)

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KR1020077020800A Division KR101427425B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

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KR20140008469A KR20140008469A (ko) 2014-01-21
KR101459259B1 true KR101459259B1 (ko) 2014-11-12

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KR1020137034713A Expired - Lifetime KR101459259B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020077020800A Expired - Lifetime KR101427425B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137034715A Expired - Lifetime KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137004413A Expired - Lifetime KR101393171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

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KR1020137034715A Expired - Lifetime KR101370171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법
KR1020137004413A Expired - Lifetime KR101393171B1 (ko) 2005-04-05 2006-04-05 비구면을 정밀 고해상도로 측정하는 방법

Country Status (6)

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US (1) US7433057B2 (https=)
EP (1) EP1869401B1 (https=)
JP (1) JP4917088B2 (https=)
KR (4) KR101459259B1 (https=)
CN (3) CN102353522B (https=)
WO (1) WO2006107985A2 (https=)

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JP5339934B2 (ja) 2009-01-22 2013-11-13 キヤノン株式会社 光断層撮像装置および光断層撮像方法
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KR101336399B1 (ko) * 2009-11-19 2013-12-04 캐논 가부시끼가이샤 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체
WO2012008031A1 (ja) * 2010-07-15 2012-01-19 キヤノン株式会社 被検面の形状を計測する計測方法、計測装置及び光学素子の製造方法
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TWI470184B (zh) * 2011-08-20 2015-01-21 Tonta Electro Optical Co Ltd 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法
GB2508219A (en) * 2012-11-26 2014-05-28 Taylor Hobson Ltd Analysing and machining an optical profile
US9212901B2 (en) * 2013-04-17 2015-12-15 Corning Incorporated Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface
CN103439090B (zh) * 2013-09-01 2015-11-18 中国科学院光电技术研究所 一种用于子孔径拼接检测的数据采样路径规划方法
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JP6162907B2 (ja) * 2014-12-16 2017-07-12 富士フイルム株式会社 形状測定装置及び形状測定方法
JP6558975B2 (ja) * 2015-06-22 2019-08-14 キヤノン株式会社 形状計測方法、形状計測装置および形状計測プログラム
CN105423948B (zh) * 2015-12-14 2018-10-16 中国科学院长春光学精密机械与物理研究所 采用变形镜的拼接干涉检测非球面面形的装置
EP3190379A1 (de) 2016-01-08 2017-07-12 SwissOptic AG Interferometrisches stitching-verfahren
CN109997010B (zh) * 2016-11-18 2022-06-24 齐戈股份有限公司 用于优化干涉仪的光学性能的方法及设备
CN106768892A (zh) * 2016-12-28 2017-05-31 中国计量大学 基于哈特曼‑夏克波前传感器的自由曲面镜片波面拼接方法
CN109425313B (zh) * 2017-08-30 2022-12-13 上汽通用汽车有限公司 手持光泽仪定位装置及手持光泽仪套件
CN107796329B (zh) * 2017-09-29 2019-08-06 中国科学院长春光学精密机械与物理研究所 一种凸非球面反射镜面形检测装置及检测方法
US11221211B2 (en) 2018-01-26 2022-01-11 Vanderbilt University Systems and methods for non-destructive evaluation of optical material properties and surfaces
US11493751B2 (en) 2019-01-23 2022-11-08 Vanderbilt University Systems and methods for compact optical relay
CN109955148B (zh) * 2019-03-18 2023-09-22 中国工程物理研究院激光聚变研究中心 用于非球面光学元件中频波纹误差的在位检测装置及方法
CN109990983B (zh) * 2019-04-19 2020-12-11 北京理工大学 双边错位差动共焦超长焦距测量方法
CN110307962B (zh) * 2019-06-28 2020-10-27 苏州维纳仪器有限责任公司 检测光学系统任意波长透射波前的方法
CN110307963B (zh) * 2019-08-08 2020-11-03 苏州维纳仪器有限责任公司 检测透射式光学系统任意波长焦距的方法
CN111811429B (zh) * 2020-07-14 2021-04-20 北京理工大学 一种子孔径拼接干涉测量方法和装置
CN113916510B (zh) * 2021-11-23 2023-09-26 江苏北方湖光光电有限公司 基于伺服转动下的多光轴图像偏差校准方法
CN115597484B (zh) * 2022-09-26 2025-06-24 南京理工大学 一种基于多球随机的球面参考镜校正方法
CN117906913B (zh) * 2023-12-04 2024-11-15 武汉光谷航天三江激光产业技术研究院有限公司 一种高功率光学元件激光负载能力自动筛选装置及方法
CN117451324B (zh) * 2023-12-22 2024-02-27 中国科学院合肥物质科学研究院 用于大相对口径的二次凹曲面检测光路系统及设计方法

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Publication number Publication date
WO2006107985A3 (en) 2008-02-14
US20060221350A1 (en) 2006-10-05
JP2008534986A (ja) 2008-08-28
KR20130037723A (ko) 2013-04-16
KR20070121663A (ko) 2007-12-27
CN102288390A (zh) 2011-12-21
CN102353522A (zh) 2012-02-15
CN101268331A (zh) 2008-09-17
CN102353522B (zh) 2014-11-05
KR20140008469A (ko) 2014-01-21
CN102288390B (zh) 2014-11-26
KR101393171B1 (ko) 2014-05-08
EP1869401A4 (en) 2013-03-20
JP4917088B2 (ja) 2012-04-18
US7433057B2 (en) 2008-10-07
WO2006107985A2 (en) 2006-10-12
EP1869401A2 (en) 2007-12-26
CN101268331B (zh) 2012-02-22
KR101427425B1 (ko) 2014-08-08
KR101370171B1 (ko) 2014-03-04
EP1869401B1 (en) 2016-02-03
KR20140008470A (ko) 2014-01-21

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