KR101452534B1 - 광학 시스템의 결상 특성을 향상시키기 위한 방법 및 광학 시스템 - Google Patents

광학 시스템의 결상 특성을 향상시키기 위한 방법 및 광학 시스템 Download PDF

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KR101452534B1
KR101452534B1 KR1020097014877A KR20097014877A KR101452534B1 KR 101452534 B1 KR101452534 B1 KR 101452534B1 KR 1020097014877 A KR1020097014877 A KR 1020097014877A KR 20097014877 A KR20097014877 A KR 20097014877A KR 101452534 B1 KR101452534 B1 KR 101452534B1
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optical element
thermal
action
mechanical
deform
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KR20090125042A (ko
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올라프 콘라디
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020097014877A 2007-01-22 2008-01-22 광학 시스템의 결상 특성을 향상시키기 위한 방법 및 광학 시스템 Active KR101452534B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007004723.3 2007-01-22
DE102007004723 2007-01-22
PCT/EP2008/000459 WO2008089953A1 (en) 2007-01-22 2008-01-22 Method for improving imaging properties of an optical system, and optical system

Publications (2)

Publication Number Publication Date
KR20090125042A KR20090125042A (ko) 2009-12-03
KR101452534B1 true KR101452534B1 (ko) 2014-10-21

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KR1020097014877A Active KR101452534B1 (ko) 2007-01-22 2008-01-22 광학 시스템의 결상 특성을 향상시키기 위한 방법 및 광학 시스템

Country Status (7)

Country Link
US (3) US8462315B2 (https=)
EP (1) EP2126635B1 (https=)
JP (1) JP5193227B2 (https=)
KR (1) KR101452534B1 (https=)
CN (1) CN101589342A (https=)
AT (1) ATE554427T1 (https=)
WO (1) WO2008089953A1 (https=)

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ATE554427T1 (de) 2007-01-22 2012-05-15 Zeiss Carl Smt Gmbh Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
DE102010044969A1 (de) * 2010-09-10 2012-03-15 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Projektionsbelichtungsanlage sowie Steuervorrichtung
JP6012628B2 (ja) 2011-01-20 2016-10-25 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
DE102011077784A1 (de) * 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
DE102012212758A1 (de) * 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
KR101398934B1 (ko) * 2014-01-23 2014-05-27 국방과학연구소 불균일 보정 기능이 제공되는 다 구간 시계 영상 확보 방식 적외선 광각 카메라
DE102015220537A1 (de) * 2015-10-21 2016-10-27 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
US10282822B2 (en) * 2016-12-01 2019-05-07 Almalence Inc. Digital correction of optical system aberrations
CN110799892B (zh) * 2017-06-23 2022-04-12 业纳光学系统有限公司 用于辅助调整射束扩展器的方法、调整辅助设备以及射束扩展器
CN115494639B (zh) * 2022-11-04 2023-02-17 中国航天三江集团有限公司 高功率激光光束合成系统内通道热效应仿真方法

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JP3291818B2 (ja) * 1993-03-16 2002-06-17 株式会社ニコン 投影露光装置、及び該装置を用いる半導体集積回路製造方法
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US5888675A (en) * 1996-12-04 1999-03-30 Advanced Micro Devices, Inc. Reticle that compensates for radiation-induced lens error in a photolithographic system
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ATE554427T1 (de) * 2007-01-22 2012-05-15 Zeiss Carl Smt Gmbh Verfahren zur verbesserung von bildgebungseigenschaften eines optischen systems und optisches system
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JP5193227B2 (ja) 2013-05-08
JP2010517279A (ja) 2010-05-20
US20150125968A1 (en) 2015-05-07
CN101589342A (zh) 2009-11-25
US20090231565A1 (en) 2009-09-17
US8947633B2 (en) 2015-02-03
US20130250261A1 (en) 2013-09-26
US8462315B2 (en) 2013-06-11
EP2126635B1 (en) 2012-04-18
ATE554427T1 (de) 2012-05-15
KR20090125042A (ko) 2009-12-03
US9823579B2 (en) 2017-11-21
EP2126635A1 (en) 2009-12-02
WO2008089953A1 (en) 2008-07-31

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